Daniel C. Lubben

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Self-ionized and inductively-coupled plasma for sputtering and resp...
- Patent number 10,047,430
- Issue date Aug 14, 2018
- Applied Materials, Inc.
- Peijun Ding
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Prediction and compensation of erosion in a magnetron sputtering ta...
- Patent number 8,764,949
- Issue date Jul 1, 2014
- Applied Materials, Inc.
- Keith A. Miller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Self-ionized and inductively-coupled plasma for sputtering and resp...
- Patent number 8,696,875
- Issue date Apr 15, 2014
- Applied Materials, Inc.
- Peijun Ding
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Self-ionized and inductively-coupled plasma for sputtering and resp...
- Patent number 8,668,816
- Issue date Mar 11, 2014
- Applied Materials Inc.
- Peijun Ding
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for predicting and compensating erosion in a magnetron sputt...
- Patent number 8,518,220
- Issue date Aug 27, 2013
- Applied Materials, Inc.
- Keith A. Miller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Prediction and compensation of erosion in a magnetron sputtering ta...
- Patent number 8,133,360
- Issue date Mar 13, 2012
- Applied Materials, Inc.
- Keith A. Miller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Small scanned magentron
- Patent number 7,807,030
- Issue date Oct 5, 2010
- Applied Materials, Inc.
- Ilyoung Richard Hong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mechanism for varying the spacing between sputter magnetron and target
- Patent number 7,674,360
- Issue date Mar 9, 2010
- Applied Materials, Inc.
- Ilyoung Richard Hong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetron executing planetary motion adjacent a sputtering target
- Patent number 7,169,271
- Issue date Jan 30, 2007
- Applied Materials, Inc.
- Ilyoung Richard Hong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Small epicyclic magnetron with controlled radial sputtering profile
- Patent number 6,852,202
- Issue date Feb 8, 2005
- Applied Materials, Inc.
- Michael Andrew Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Small planetary magnetron
- Patent number 6,841,050
- Issue date Jan 11, 2005
- Applied Materials, Inc.
- Ilyoung Richard Hong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SELF-IONIZED AND INDUCTIVELY-COUPLED PLASMA FOR SPUTTERING AND RESP...
- Publication number 20180327893
- Publication date Nov 15, 2018
- Applied Materials, Inc.
- Peijun Ding
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELF-IONIZED AND INDUCTIVELY-COUPLED PLASMA FOR SPUTTERING AND RESP...
- Publication number 20140305802
- Publication date Oct 16, 2014
- Applied Materials, Inc.
- Peijun Ding
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Prediction and compensation of erosion in a magnetron sputtering ta...
- Publication number 20130313107
- Publication date Nov 28, 2013
- Applied Materials, Inc.
- Keith A. Miller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for Predicting and Compensating Erosion in a Magnetron Sputt...
- Publication number 20120132518
- Publication date May 31, 2012
- Applied Materials, Inc.
- KEITH A. MILLER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR UNIFORM DEPOSITION
- Publication number 20090308732
- Publication date Dec 17, 2009
- Applied Materials, Inc.
- Yong Cao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELF-IONIZED AND INDUCTIVELY-COUPLED PLASMA FOR SPUTTERING AND RESP...
- Publication number 20090233438
- Publication date Sep 17, 2009
- Applied Materials, Inc.
- Peijun DING
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PREDICTION AND COMPENSATION OF EROSION IN A MAGNETRON SPUTTERING TA...
- Publication number 20090159428
- Publication date Jun 25, 2009
- Applied Materials, Inc.
- KEITH A. MILLER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RESPUTTERED COPPER SEED LAYER
- Publication number 20080190760
- Publication date Aug 14, 2008
- Applied Materials, Inc.
- XIANMIN TANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELF-IONIZED AND INDUCTIVELY-COUPLED PLASMA FOR SPUTTERING AND RESP...
- Publication number 20080110747
- Publication date May 15, 2008
- Applied Materials, Inc.
- Peijun Ding
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Small Scanned Magentron
- Publication number 20070102284
- Publication date May 10, 2007
- Applied Materials, Inc.
- Ilyoung Richard Hong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Self-ionized and inductively-coupled plasma for sputtering and resp...
- Publication number 20050255691
- Publication date Nov 17, 2005
- APPLIED MATERIALS, INC.
- Peijun Ding
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Mechanism for varying the spacing between sputter magnetron and target
- Publication number 20050133365
- Publication date Jun 23, 2005
- Ilyoung Richard Hong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Compensation of spacing between magnetron and sputter target
- Publication number 20050133361
- Publication date Jun 23, 2005
- APPLIED MATERIALS, INC.
- Peijun Ding
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Self-ionized and inductively-coupled plasma for sputtering and resp...
- Publication number 20050006222
- Publication date Jan 13, 2005
- Peijun Ding
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Magnetron executing planetary motion adjacent a sputtering target
- Publication number 20040222087
- Publication date Nov 11, 2004
- Ilyoung Richard Hong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Small planetary magnetron
- Publication number 20030217913
- Publication date Nov 27, 2003
- APPLIED MATERIALS, INC.
- Ilyoung Richard Hong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Small epicyclic magnetron with controlled radial sputtering profile
- Publication number 20030217914
- Publication date Nov 27, 2003
- APPLIED MATERIALS, INC.
- Michael Andrew Miller
- H01 - BASIC ELECTRIC ELEMENTS

Daniel C. Lubben

Person

Patents Grantslast 30 patents

Self-ionized and inductively-coupled plasma for sputtering and resp...

Prediction and compensation of erosion in a magnetron sputtering ta...

Self-ionized and inductively-coupled plasma for sputtering and resp...

Self-ionized and inductively-coupled plasma for sputtering and resp...

Method for predicting and compensating erosion in a magnetron sputt...

Prediction and compensation of erosion in a magnetron sputtering ta...

Small scanned magentron

Mechanism for varying the spacing between sputter magnetron and target

Magnetron executing planetary motion adjacent a sputtering target

Small epicyclic magnetron with controlled radial sputtering profile

Small planetary magnetron

Patents Applicationslast 30 patents

SELF-IONIZED AND INDUCTIVELY-COUPLED PLASMA FOR SPUTTERING AND RESP...

SELF-IONIZED AND INDUCTIVELY-COUPLED PLASMA FOR SPUTTERING AND RESP...

Prediction and compensation of erosion in a magnetron sputtering ta...

Method for Predicting and Compensating Erosion in a Magnetron Sputt...

APPARATUS AND METHOD FOR UNIFORM DEPOSITION

SELF-IONIZED AND INDUCTIVELY-COUPLED PLASMA FOR SPUTTERING AND RESP...

PREDICTION AND COMPENSATION OF EROSION IN A MAGNETRON SPUTTERING TA...

RESPUTTERED COPPER SEED LAYER

SELF-IONIZED AND INDUCTIVELY-COUPLED PLASMA FOR SPUTTERING AND RESP...

Small Scanned Magentron

Self-ionized and inductively-coupled plasma for sputtering and resp...

Mechanism for varying the spacing between sputter magnetron and target

Compensation of spacing between magnetron and sputter target

Self-ionized and inductively-coupled plasma for sputtering and resp...

Magnetron executing planetary motion adjacent a sputtering target

Small planetary magnetron

Small epicyclic magnetron with controlled radial sputtering profile