Claims
- 1. An oscillating magnetron configured for used with a sputtering target generally symmetric about a central axis for use in a magnetron sputter reactor generally symmetrically arranged around said central axis, comprising:
a magnet assembly comprising
an inner magnetic pole having a first magnetic polarity along said central axis and a first total magnetic intensity, and an outer magnetic pole surrounding said inner magnetic pole and having a second magnetic polarity opposed to said first magnetic polarity and a second total magnetic intensity at least 150% of said first magnet intensity; and a scanning mechanism moving said magnet assembly in a path extending both radially and circumferentially of said central axis.
- 2. The magnetron of claim 1, wherein said scanning mechanism includes a rotary shaft passing along and rotating about said central axis and providing the sole motive power for said scanning mechanism.
- 3. The magnetron of claim 1, wherein said scanning mechanism is a planetary scanning mechanism moving a point of said magnet assembly in a planetary motion about said central axis.
- 4. The magnetron of claim 3, wherein said planetary motion is a retrograde planetary motion.
- 5. The magnetron of claim 3, wherein said planetary scanning mechanism includes a fixed gear, a rotary drive shaft extending along said central axis, a first plate fixed to said rotary drive shaft, an idler gear rotatably supported on said first plate and engaged with said fixed gear, a follower gear rotatably supported on said first plate and engaged with said idler gear, and a second plate fixed to said follower gear, wherein said magnet assembly is fixed to said second plate at a position away from an axis of said follower gear.
- 6. An oscillating magnetron configured for used with a sputtering target generally symmetric about a central axis for use in a magnetron sputter reactor generally symmetrically arranged around said central axis, comprising:
a planetary scanning mechanism including
a fixed gear arranged around said central axis and fixed to said reactor, a rotary drive shaft extending along said central axis, a first member fixed to said rotary drive shaft, an idler gear rotatably supported on said first member and engaged with said fixed gear, a follower gear rotatably supported on said first member and engaged with said idler gear, a second member fixed to said follower gear; and a magnet assembly fixed to said second member at a position away from an axis of said follower gear.
- 7. The magnetron of claim 6, wherein said planetary scanning mechanism is configured such that a length of said second member and a point of attachment of said magnet assembly to said second member can be selected to pass said magnet assembly through said central axis.
- 8. A rotating magnetron configured for use with a sputtering target, comprising:
a magnet assembly having multiple opposed magnetic poles arranged in a plane; and a planetary mechanism at least partially supported and rotated by a first shaft extending along a central axis perpendicular to said plane and mounting said magnet assembly in a position to perform planetary motion about said central axis, wherein said planetary mechanism includes a member mounting said magnet assembly and rotatable about a follower axis and further mounting a counterbalance mounted on a portion of said member opposite said magnet assembly with respect to said follower axis and counterbalancing said magnet assembly in rotation about said follower axis.
- 9. The magnetron of claim 8, wherein said planetary motion is retrograde planetary motion.
- 10. The magnetron of claim 9, wherein said planetary motion includes a orbital component and planetary rotational component having an opposite rotational direction than said orbital component.
- 11. The magnetron of claim 10, wherein a rotational rate ratio between said planetary rotational component and said orbital component about respective axes is in a range of 1.03 to 5.
- 12. The magnetron of claim 11, wherein said rotation rate ratio is not an integer.
- 13. The magnetron of claim 8, wherein said planetary mechanism comprises:
a first gear arranged around said central axis; a drive member fixed to said first shaft and rotated thereby; an idler gear rotatably supported by said drive member and engaging said fixed gear; a follower gear rotatably supported by said drive member and engaging said idler gear; and a support plate rotating with said follower gear and supporting said magnet assembly.
- 14. The magnetron of claim 13, wherein said first gear is rotatable.
- 15. The magnetron of claim 13, wherein said first gear is fixed.
- 16. The magnetron of claim 15, wherein a gear ratio between a first one and a second one of said first gear and said follower gear is greater than 1.03 and is not an integer.
- 17. The magnetron of claim 16, wherein said gear ratio is in a range of 1.03 to 6.
- 18. The magnetron of claim 17, wherein gear ratio is in a range of between 2.5 to 4.97
- 19. The magnetron of claim 13, wherein said idler and follower gears are disposed on a first side of said drive member and said support plate is disposed on a second side of said drive member.
- 20. The magnetron of claim 19, further comprising a counterbalance disposed on a second side of said drive support plate with respect to a rotation axis of said support plate on said drive member and counterbalancing said magnet assembly.
- 21. The magnetron of claim 8, wherein said planetary mechanism comprises:
a first gear arranged around said central axis and having teeth on an interior surface facing said central axis; a drive member fixed to said first shaft and rotated thereby; a follower gear rotatably supported engaging said first gear; and a support plate rotating with said follower gear and supporting said magnet assembly.
RELATED APPLICATION
[0001] This application is a continuation of Ser. No. 10/152,494, filed May 21, 2002, issue fee paid.
Continuations (1)
|
Number |
Date |
Country |
Parent |
10152494 |
May 2002 |
US |
Child |
10862257 |
Jun 2004 |
US |