David B. Noble

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Sunnyvale, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Apparatus for exposing a substrate to plasma radicals
- Patent number 6,450,116
- Issue date Sep 17, 2002
- Applied Materials, Inc.
- David B. Noble
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fabricating a semiconductor device with strained Si.sub.1-x Ge.sub....
- Patent number 5,256,550
- Issue date Oct 26, 1993
- Hewlett-Packard Company
- Stephen Laderman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective and non-selective deposition of Si.sub.1-x Ge.sub.x on a...
- Patent number 5,202,284
- Issue date Apr 13, 1993
- Hewlett-Packard Company
- Theodore I. Kamins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing with silicon cap over Si.sub.1-x Ge.sub.x...
- Patent number 5,084,411
- Issue date Jan 28, 1992
- Hewlett-Packard Company
- Stephen Laderman
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS AND METHOD FOR EXPOSING A SUBSTRATE TO PLASMA RADICALS
- Publication number 20020073925
- Publication date Jun 20, 2002
- DAVID B. NOBLE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...