David F. Witman

Person

Pleasantville, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for fabricating multi-layer thin film structure having a sep...
- Patent number 5,534,094
- Issue date Jul 9, 1996
- IBM Corporation
- Gnanalingam Arjavalingam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Base developable negative photoresist composition and use thereof
- Patent number 5,286,599
- Issue date Feb 15, 1994
- International Business Machines Corporation
- Edward D. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-layer thin film structure and parallel processing method for...
- Patent number 5,258,236
- Issue date Nov 2, 1993
- IBM Corporation
- Gnanalingam Arjavalingam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alkaline developable photoresist composition containing radiation s...
- Patent number 5,238,773
- Issue date Aug 24, 1993
- International Business Machines Corporation
- Edward D. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Epoxy functional organosilicon polymer
- Patent number 5,115,095
- Issue date May 19, 1992
- International Business Machines Corporation
- Edward D. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming a pattern
- Patent number 5,110,711
- Issue date May 5, 1992
- International Business Machines Corporation
- Edward D. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming a pattern of a photoresist
- Patent number 5,098,816
- Issue date Mar 24, 1992
- International Business Machines Corporation
- Edward D. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ultraviolet light sensitive photoinitiator compositions, use thereo...
- Patent number 5,059,512
- Issue date Oct 22, 1991
- International Business Machines Corporation
- Edward D. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma-resistant polymeric material, preparation thereof, and use t...
- Patent number 4,981,909
- Issue date Jan 1, 1991
- International Business Machines Corporation
- Edward D. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Simultaneous multiple level interconnection process
- Patent number 4,840,923
- Issue date Jun 20, 1989
- International Business Machine Corporation
- Donis G. Flagello
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma-resistant polymeric material, preparation thereof, and use t...
- Patent number 4,782,008
- Issue date Nov 1, 1988
- International Business Machines Corporation
- Edward D. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multiple density mask and fabrication thereof
- Patent number 4,770,947
- Issue date Sep 13, 1988
- International Business Machines Corporation
- Donis G. Flagello
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Laser beam homogenizer
- Patent number 4,744,615
- Issue date May 17, 1988
- International Business Machines Corporation
- Bunsen Fan
- G02 - OPTICS

David F. Witman

Person

Patents Grantslast 30 patents

Method for fabricating multi-layer thin film structure having a sep...

Base developable negative photoresist composition and use thereof

Multi-layer thin film structure and parallel processing method for...

Alkaline developable photoresist composition containing radiation s...

Epoxy functional organosilicon polymer

Method for forming a pattern

Method for forming a pattern of a photoresist

Ultraviolet light sensitive photoinitiator compositions, use thereo...

Plasma-resistant polymeric material, preparation thereof, and use t...

Simultaneous multiple level interconnection process

Plasma-resistant polymeric material, preparation thereof, and use t...

Multiple density mask and fabrication thereof

Laser beam homogenizer