David Stanasolovich

Person

Montgomery, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Precise endpoint detection for etching processes
- Patent number 6,258,497
- Issue date Jul 10, 2001
- International Business Machines Corporation
- Lawrence Andrew Kropp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for uniform cleaning of wafers using megasonic energy
- Patent number 5,579,792
- Issue date Dec 3, 1996
- International Business Machines Corporation
- David Stanasolovich
- E04 - BUILDING
Information Patent Grant
Apparatus for uniform cleaning of wafers using megasonic energy
- Patent number 5,533,540
- Issue date Jul 9, 1996
- Inernational Business Machines Corporation
- David Stanasolovich
- E04 - BUILDING
Information Patent Grant
Method for uniform cleaning of wafers using megasonic energy
- Patent number 5,427,622
- Issue date Jun 27, 1995
- International Business Machines Corporation
- David Stanasolovich
- E04 - BUILDING
Information Patent Grant
Self-aligned contact studs for semiconductor structures
- Patent number 5,352,927
- Issue date Oct 4, 1994
- International Business Machines Corporation
- Donna R. Cote
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process of forming a dual overhang collimated lift-off stencil with...
- Patent number 5,258,264
- Issue date Nov 2, 1993
- International Business Machines Corporation
- Gangadhara S. Mathad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned contact studs for semiconductor structures
- Patent number 5,216,282
- Issue date Jun 1, 1993
- International Business Machines Corporation
- Donna R. Cote
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for fabrication of a semiconductor structure and contact stud
- Patent number 5,187,121
- Issue date Feb 16, 1993
- International Business Machines Corporation
- Donna R. Cote
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for fabricating self-aligned contact studs for semiconducto...
- Patent number 5,166,096
- Issue date Nov 24, 1992
- International Business Machines Corporation
- Donna R. Cote
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating high circuit density, self-aligned metal lin...
- Patent number 5,143,820
- Issue date Sep 1, 1992
- International Business Machines Corporation
- Harish N. Kotecha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Collimated metal deposition
- Patent number 5,024,896
- Issue date Jun 18, 1991
- International Business Machines Corporation
- Gangadhara S. Mathad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for defining vias through silicon nitride and polyamide
- Patent number 4,978,419
- Issue date Dec 18, 1990
- International Business Machines Corporation
- Madan M. Nanda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for making borderless contacts
- Patent number 4,966,870
- Issue date Oct 30, 1990
- International Business Machines Corporation
- Jeffrey R. Barber
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for making self-aligned contacts
- Patent number 4,855,252
- Issue date Aug 8, 1989
- International Business Machines Corporation
- Steven Peterman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Planarization process for wide trench isolation
- Patent number 4,836,885
- Issue date Jun 6, 1989
- International Business Machines Corporation
- Charles P. Breiten
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for providing increased dopant concentration in selected reg...
- Patent number 4,814,290
- Issue date Mar 21, 1989
- International Business Machines Corporation
- Jeffrey R. Barber
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective and anisotropic dry etching
- Patent number 4,734,157
- Issue date Mar 29, 1988
- International Business Machines Corporation
- Susanna R. Carbaugh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process using dry etchant to avoid mask-and-etch cycle
- Patent number 4,624,739
- Issue date Nov 25, 1986
- International Business Machines Corporation
- Paul E. Nixon
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Selective anisotropic reactive ion etching process for polysilicide...
- Patent number 4,528,066
- Issue date Jul 9, 1985
- IBM Corporation
- Robert M. Merkling
- H01 - BASIC ELECTRIC ELEMENTS

David Stanasolovich

Person

Patents Grantslast 30 patents

Precise endpoint detection for etching processes

Apparatus for uniform cleaning of wafers using megasonic energy

Apparatus for uniform cleaning of wafers using megasonic energy

Method for uniform cleaning of wafers using megasonic energy

Self-aligned contact studs for semiconductor structures

Process of forming a dual overhang collimated lift-off stencil with...

Self-aligned contact studs for semiconductor structures

Process for fabrication of a semiconductor structure and contact stud

Process for fabricating self-aligned contact studs for semiconducto...

Method for fabricating high circuit density, self-aligned metal lin...

Collimated metal deposition

Process for defining vias through silicon nitride and polyamide

Method for making borderless contacts

Process for making self-aligned contacts

Planarization process for wide trench isolation

Method for providing increased dopant concentration in selected reg...

Selective and anisotropic dry etching

Process using dry etchant to avoid mask-and-etch cycle

Selective anisotropic reactive ion etching process for polysilicide...