Ei Yano

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device and manufacturing method therefor
- Patent number 8,378,489
- Issue date Feb 19, 2013
- Fujitsu Limited
- Shiro Ozaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Manufacturing process of semiconductor device
- Patent number 8,349,542
- Issue date Jan 8, 2013
- Fujitsu Limited
- Miwa Kozawa
- G11 - INFORMATION STORAGE
Information Patent Grant
Resist pattern swelling material, and method for patterning using same
- Patent number 8,334,091
- Issue date Dec 18, 2012
- Fujitsu Limited
- Koji Nozaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon compound, ultraviolet absorbent, method for manufacturing m...
- Patent number 8,207,059
- Issue date Jun 26, 2012
- Fujitsu Limited
- Shirou Ozaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Silica film forming material, silica film and method of manufacturi...
- Patent number 8,124,239
- Issue date Feb 28, 2012
- Fujitsu Limited
- Yoshihiro Nakata
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Coating liquid for forming amorphous silica-based coating film with...
- Patent number 8,062,414
- Issue date Nov 22, 2011
- JGC Catalysts and Chemicals Ltd.
- Akira Nakashima
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for forming resist pattern and method for manufacturing a se...
- Patent number 8,057,986
- Issue date Nov 15, 2011
- Fujitsu Limited
- Junichi Kon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming insulating film and method for fabricating...
- Patent number 7,985,700
- Issue date Jul 26, 2011
- Fujitsu Limited
- Shirou Ozaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Roughness reducing film at interface, materials for forming roughne...
- Patent number 7,928,536
- Issue date Apr 19, 2011
- Fujitsu Limited
- Tadahiro Imada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Material for forming adhesion reinforcing layer, adhesion reinforci...
- Patent number 7,830,013
- Issue date Nov 9, 2010
- Fujitsu Limited
- Junichi Kon
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist pattern thickening material, resist pattern and forming proc...
- Patent number 7,744,768
- Issue date Jun 29, 2010
- Fujitsu Limited
- Miwa Kozawa
- G11 - INFORMATION STORAGE
Information Patent Grant
Method for forming resist pattern and method for manufacturing a se...
- Patent number 7,723,016
- Issue date May 25, 2010
- Fujitsu Limited
- Junichi Kon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silica film forming material, silica film and method of manufacturi...
- Patent number 7,659,357
- Issue date Feb 9, 2010
- Fujitsu Limited
- Yoshihiro Nakata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insulator film, manufacturing method of multilayer wiring device an...
- Patent number 7,655,576
- Issue date Feb 2, 2010
- Fujitsu Limited
- Shirou Ozaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative resist composition, a method for forming a resist pattern...
- Patent number 7,488,569
- Issue date Feb 10, 2009
- Fujitsu Limited
- Miwa Kozawa
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Composition for forming insulating film and method for fabricating...
- Patent number 7,476,970
- Issue date Jan 13, 2009
- Fujitsu Limited
- Shirou Ozaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist material, resist pattern and forming method for the same, an...
- Patent number 7,465,527
- Issue date Dec 16, 2008
- Fujitsu Limited
- Junichi Kon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Contactor having contact electrodes of metal springs embedded in a...
- Patent number 7,403,024
- Issue date Jul 22, 2008
- Fujitsu Limited
- Shigeyuki Maruyama
- G01 - MEASURING TESTING
Information Patent Grant
Silicon-based composition, low dielectric constant film, semiconduc...
- Patent number 7,358,299
- Issue date Apr 15, 2008
- Fujitsu Limited
- Yoshihiro Nakata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device fabrication method
- Patent number 7,262,142
- Issue date Aug 28, 2007
- Fujitsu Limited
- Yoshihiro Nakata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low dielectric constant film material, film and semiconductor devic...
- Patent number 7,235,866
- Issue date Jun 26, 2007
- Fujitsu Limited
- Yoshihiro Nakata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming amorphous silica-based coating film with low diel...
- Patent number 7,232,769
- Issue date Jun 19, 2007
- Catalysts & Chemicals Industries Co., Ltd.
- Akira Nakashima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Contactor having conductive particles in a hole as a contact electrode
- Patent number 7,202,679
- Issue date Apr 10, 2007
- Fujitsu Limited
- Shigeyuki Maruyama
- G01 - MEASURING TESTING
Information Patent Grant
Resist pattern thickening material, resist pattern and forming proc...
- Patent number 7,189,783
- Issue date Mar 13, 2007
- Fujitsu Limited
- Miwa Kozawa
- G11 - INFORMATION STORAGE
Information Patent Grant
Semiconductor apparatus
- Patent number 7,170,177
- Issue date Jan 30, 2007
- Fujitsu Limited
- Yoshihiro Nakata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon-containing polymer, process for its production, resist comp...
- Patent number 7,144,968
- Issue date Dec 5, 2006
- Fujitsu Limited
- Miwa Kozawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative resist composition, a method for forming a resist pattern...
- Patent number 7,122,288
- Issue date Oct 17, 2006
- Fujitsu Limited
- Miwa Kozawa
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Contactor having conductive particles in a hole as a contact electrode
- Patent number 7,038,477
- Issue date May 2, 2006
- Fujitsu Limited
- Shigeyuki Maruyama
- G01 - MEASURING TESTING
Information Patent Grant
Low dielectric constant film material, film and semiconductor devic...
- Patent number 6,958,525
- Issue date Oct 25, 2005
- Fujitsu Limited
- Yoshihiro Nakata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contactor having conductive particles in a hole as a contact electrode
- Patent number 6,937,038
- Issue date Aug 30, 2005
- Fujitsu Limited
- Shigeyuki Maruyama
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
MANUFACTURING PROCESS OF SEMICONDUCTOR DEVICE
- Publication number 20100227278
- Publication date Sep 9, 2010
- Fujitsu Limited
- Miwa Kozawa
- G11 - INFORMATION STORAGE
Information Patent Application
METHOD FOR FORMING RESIST PATTERN AND METHOD FOR MANUFACTURING A SE...
- Publication number 20100193841
- Publication date Aug 5, 2010
- Fujitsu Limited
- Junichi Kon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURI...
- Publication number 20100155121
- Publication date Jun 24, 2010
- Fujitsu Limited
- Yoshihiro Nakata
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR
- Publication number 20090309221
- Publication date Dec 17, 2009
- Fujitsu Limited
- Shiro Ozaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Composition for forming insulating film and method for fabricating...
- Publication number 20090163039
- Publication date Jun 25, 2009
- Fujitsu Limited
- Shirou Ozaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method for forming resist pattern and method for manufacturing a se...
- Publication number 20090081593
- Publication date Mar 26, 2009
- Fujitsu Limited
- Junichi Kon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20090061633
- Publication date Mar 5, 2009
- Fujitsu Limited
- Yoshihiro NAKATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON COMPOUND, ULTRAVIOLET ABSORBENT, METHOD FOR MANUFACTURING M...
- Publication number 20090038833
- Publication date Feb 12, 2009
- Fujitsu Limited
- Shirou Ozaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist pattern swelling material, and method for patterning using same
- Publication number 20080274431
- Publication date Nov 6, 2008
- Fujitsu Limited
- Koji Nozaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSULATOR FILM, MANUFACTURING METHOD OF MULTILAYER WIRING DEVICE AN...
- Publication number 20080050933
- Publication date Feb 28, 2008
- Fujitsu Limited
- Shirou Ozaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Composition for forming insulating film and method for fabricating...
- Publication number 20070232058
- Publication date Oct 4, 2007
- FUJITSU LIMITED
- Shirou Ozaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Roughness reducing film at interface, materials for forming roughne...
- Publication number 20070232075
- Publication date Oct 4, 2007
- FUJITSU LIMITED
- Tadahiro Imada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for fabricating magnetic head
- Publication number 20070230061
- Publication date Oct 4, 2007
- FUJITSU LIMITED
- Hiroshi Endo
- G11 - INFORMATION STORAGE
Information Patent Application
Method for fabricating magnetic head
- Publication number 20070226987
- Publication date Oct 4, 2007
- FUJITSU LIMITED
- Hiroshi Endo
- G11 - INFORMATION STORAGE
Information Patent Application
Material for forming adhesion reinforcing layer, adhesion reinforci...
- Publication number 20070111539
- Publication date May 17, 2007
- FUJITSU LIMITED
- Junichi Kon
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Resist pattern thickening material, resist pattern and forming proc...
- Publication number 20070106021
- Publication date May 10, 2007
- FUJITSU LIMITED
- Miwa Kozawa
- G11 - INFORMATION STORAGE
Information Patent Application
Silica film forming material, silica film and method of manufacturi...
- Publication number 20070026689
- Publication date Feb 1, 2007
- FUJITSU LIMITED
- Yoshihiro Nakata
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Negative resist composition, a method for forming a resist pattern...
- Publication number 20060263723
- Publication date Nov 23, 2006
- FUJITSU LIMITED
- Miwa Kozawa
- B82 - NANO-TECHNOLOGY
Information Patent Application
Semiconductor device fabrication method
- Publication number 20060128167
- Publication date Jun 15, 2006
- FUJITSU LIMITED
- Yoshihiro Nakata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device fabrication method
- Publication number 20060128166
- Publication date Jun 15, 2006
- FUJITSU LIMITED
- Yoshihiro Nakata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Contactor having conductive particles in a hole as a contact electrode
- Publication number 20060119374
- Publication date Jun 8, 2006
- FUJITSU LIMITED
- Shigeyuki Maruyama
- G01 - MEASURING TESTING
Information Patent Application
Method of forming amorphous silica-based coating film with low diel...
- Publication number 20060084277
- Publication date Apr 20, 2006
- Catalysts & Chemicals Industries Co., Ltd.
- Akira Nakashima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Low dielectric constant film material, film and semiconductor devic...
- Publication number 20060022357
- Publication date Feb 2, 2006
- FUJITSU LIMITED
- Yoshihiro Nakata
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Semiconductor apparatus
- Publication number 20050253271
- Publication date Nov 17, 2005
- Yoshihiro Nakata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Contactor having conductive particles in a hole as a contact electrode
- Publication number 20050110509
- Publication date May 26, 2005
- FUJITSU LIMITED
- Shigeyuki Maruyama
- G01 - MEASURING TESTING
Information Patent Application
Silicon-containing polymer, process for its production, resist comp...
- Publication number 20050038216
- Publication date Feb 17, 2005
- FUJITSU LIMITED
- Miwa Kozawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Contactor for testing semiconductor device and manufacturing method...
- Publication number 20040266272
- Publication date Dec 30, 2004
- FUJITSU LIMITED
- Shigeyuki Maruyama
- G01 - MEASURING TESTING
Information Patent Application
Silicon-based composition, low dielectric constant film, semiconduc...
- Publication number 20040180188
- Publication date Sep 16, 2004
- FUJITSU LIMITED
- Yoshihiro Nakata
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemically amplified resist material and patterning method using same
- Publication number 20040013975
- Publication date Jan 22, 2004
- FUJITSU LIMITED
- Junichi Kon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Low dielectric constant film material, film and semiconductor devic...
- Publication number 20030207131
- Publication date Nov 6, 2003
- FUJITSU LIMITED
- Yoshihiro Nakata
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Person

Patents Grantslast 30 patents

Semiconductor device and manufacturing method therefor

Manufacturing process of semiconductor device

Resist pattern swelling material, and method for patterning using same

Silicon compound, ultraviolet absorbent, method for manufacturing m...

Silica film forming material, silica film and method of manufacturi...

Coating liquid for forming amorphous silica-based coating film with...

Method for forming resist pattern and method for manufacturing a se...

Composition for forming insulating film and method for fabricating...

Roughness reducing film at interface, materials for forming roughne...

Material for forming adhesion reinforcing layer, adhesion reinforci...

Resist pattern thickening material, resist pattern and forming proc...

Method for forming resist pattern and method for manufacturing a se...

Silica film forming material, silica film and method of manufacturi...

Insulator film, manufacturing method of multilayer wiring device an...

Negative resist composition, a method for forming a resist pattern...

Composition for forming insulating film and method for fabricating...

Resist material, resist pattern and forming method for the same, an...

Contactor having contact electrodes of metal springs embedded in a...

Silicon-based composition, low dielectric constant film, semiconduc...

Semiconductor device fabrication method

Low dielectric constant film material, film and semiconductor devic...

Method of forming amorphous silica-based coating film with low diel...

Contactor having conductive particles in a hole as a contact electrode

Resist pattern thickening material, resist pattern and forming proc...

Semiconductor apparatus

Silicon-containing polymer, process for its production, resist comp...

Negative resist composition, a method for forming a resist pattern...

Contactor having conductive particles in a hole as a contact electrode

Low dielectric constant film material, film and semiconductor devic...

Contactor having conductive particles in a hole as a contact electrode

Patents Applicationslast 30 patents

MANUFACTURING PROCESS OF SEMICONDUCTOR DEVICE

METHOD FOR FORMING RESIST PATTERN AND METHOD FOR MANUFACTURING A SE...

SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURI...

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR

Composition for forming insulating film and method for fabricating...

Method for forming resist pattern and method for manufacturing a se...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

SILICON COMPOUND, ULTRAVIOLET ABSORBENT, METHOD FOR MANUFACTURING M...

Resist pattern swelling material, and method for patterning using same

INSULATOR FILM, MANUFACTURING METHOD OF MULTILAYER WIRING DEVICE AN...

Composition for forming insulating film and method for fabricating...

Roughness reducing film at interface, materials for forming roughne...

Method for fabricating magnetic head

Method for fabricating magnetic head

Material for forming adhesion reinforcing layer, adhesion reinforci...

Resist pattern thickening material, resist pattern and forming proc...

Silica film forming material, silica film and method of manufacturi...

Negative resist composition, a method for forming a resist pattern...

Semiconductor device fabrication method

Semiconductor device fabrication method

Contactor having conductive particles in a hole as a contact electrode

Method of forming amorphous silica-based coating film with low diel...

Low dielectric constant film material, film and semiconductor devic...

Semiconductor apparatus

Contactor having conductive particles in a hole as a contact electrode

Silicon-containing polymer, process for its production, resist comp...

Contactor for testing semiconductor device and manufacturing method...

Silicon-based composition, low dielectric constant film, semiconduc...

Chemically amplified resist material and patterning method using same

Low dielectric constant film material, film and semiconductor devic...