Eiichi Nishimura

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Malden, MA, US

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Patents Grantslast 30 patents

Information Patent Grant
Low-pressure removal of photoresist and etch residue
- Patent number 7,700,494
- Issue date Apr 20, 2010
- Tokyo Electron Limited, Inc.
- Vaidyanathan Balasubramaniam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for bilayer photoresist dry development
- Patent number 7,465,673
- Issue date Dec 16, 2008
- Tokyo Electron Limited
- Yoshiki Igarashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low-pressure removal of photoresist and etch residue
- Patent number 7,344,993
- Issue date Mar 18, 2008
- Tokyo Electron Limited, Inc.
- Vaidyanathan Balasubramaniam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for removing photoresist and etch residues
- Patent number 7,169,440
- Issue date Jan 30, 2007
- Tokyo Electron Limited
- Vaidyanathan Balasubramaniam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for removing photoresist and etch residues
- Patent number 6,849,559
- Issue date Feb 1, 2005
- Tokyo Electron Limited
- Vaidyanathan Balasubramaniam
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Low-pressure removal of photoresist and etch residue
- Publication number 20060154486
- Publication date Jul 13, 2006
- TOKYO ELECTRON LIMITED
- Vaidyanathan Balasubramaniam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Low-pressure removal of photoresist and etch residue
- Publication number 20060144817
- Publication date Jul 6, 2006
- TOKYO ELECTRON LIMITED
- Vaidyanathan Balasubramaniam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for bilayer photoresist dry development
- Publication number 20040185380
- Publication date Sep 23, 2004
- TOKYO ELECTRON LIMITED
- Yoshiki Igarashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for removing photoresist and etch residues
- Publication number 20030192856
- Publication date Oct 16, 2003
- TOKYO ELECTRON LIMITED
- Vaidyanathan Balasubramaniam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for removing photoresist and etch residues
- Publication number 20030194876
- Publication date Oct 16, 2003
- TOKYO ELECTRON LIMITED
- Vaidyanathan Balasubramaniam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY