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Erik Wilson
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Santa Clara, CA, US
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last 30 patents
Information
Patent Grant
Ruthenium interconnect with high aspect ratio and method of fabrica...
Patent number
9,299,643
Issue date
Mar 29, 2016
Cypress Semiconductor Corporation
Zheng Wang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Gap-filling with uniform properties
Patent number
8,415,256
Issue date
Apr 9, 2013
Alexander Nickel
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Low-H plasma treatment with N2 anneal for electronic memory devices
Patent number
8,202,810
Issue date
Jun 19, 2012
Spansion LLC
Alexander H. Nickel
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Cu annealing for improved data retention in flash memory devices
Patent number
8,026,169
Issue date
Sep 27, 2011
Advanced Micro Devices, Inc.
Lu You
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Gap-filling with uniform properties
Patent number
7,884,030
Issue date
Feb 8, 2011
Advanced Micro Devices, Inc. and Spansion LLC
Alexander Nickel
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Semiconductor devices with copper interconnects and composite silic...
Patent number
7,534,732
Issue date
May 19, 2009
Spansion LLC
Minh Van Ngo
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Patents Applications
last 30 patents
Information
Patent Application
Ruthenium interconnect with high aspect ratio and method of fabrica...
Publication number
20100078815
Publication date
Apr 1, 2010
Zheng Wang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Cu annealing for improved data retention in flash memory devices
Publication number
20080108193
Publication date
May 8, 2008
Spansion LLC
Lu You
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Conformal liner for gap-filling
Publication number
20080096364
Publication date
Apr 24, 2008
Spansion LLC
Erik Wilson
H01 - BASIC ELECTRIC ELEMENTS