Feler Yoel

Person

Haifa, IL

People

Patents Grantslast 30 patents

Information Patent Grant
Multi-layered moiré targets and methods for using the same in measu...
- Patent number 12,204,254
- Issue date Jan 21, 2025
- KLA Corporation
- Yoel Feler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging overlay targets using moiré elements and rotational symmetr...
- Patent number 12,105,433
- Issue date Oct 1, 2024
- KLA Corporation
- Yoel Feler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement of stitching error using split targets
- Patent number 12,094,100
- Issue date Sep 17, 2024
- KLA Corporation
- Mark Ghinovker
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Overlay mark design for electron beam overlay
- Patent number 12,055,859
- Issue date Aug 6, 2024
- Inna Steely-Tarshish
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reduction or elimination of pattern placement error in metrology me...
- Patent number 12,013,634
- Issue date Jun 18, 2024
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Overlay mark design for electron beam overlay
- Patent number 11,862,524
- Issue date Jan 2, 2024
- Inna Steely-Tarshish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Accuracy improvements in optical metrology
- Patent number 11,862,522
- Issue date Jan 2, 2024
- Barak Bringoltz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Induced displacements for improved overlay error metrology
- Patent number 11,774,863
- Issue date Oct 3, 2023
- KLA Corporation
- Mark Ghinovker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay design for electron beam and scatterometry overlay measurem...
- Patent number 11,720,031
- Issue date Aug 8, 2023
- KLA Corporation
- Inna Steely-Tarshish
- G01 - MEASURING TESTING
Information Patent Grant
Metrology target for one-dimensional measurement of periodic misreg...
- Patent number 11,686,576
- Issue date Jun 27, 2023
- KLA Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Self-Moire grating design for use in metrology
- Patent number 11,614,692
- Issue date Mar 28, 2023
- KLA Corporation
- Vladimir Levinski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology methods and optical schemes for measurement of misregistr...
- Patent number 11,604,149
- Issue date Mar 14, 2023
- KLA Corporation
- Yoel Feler
- G01 - MEASURING TESTING
Information Patent Grant
Reduction or elimination of pattern placement error in metrology me...
- Patent number 11,537,043
- Issue date Dec 27, 2022
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for measuring and correcting misregistration between layers...
- Patent number 11,302,544
- Issue date Apr 12, 2022
- KLA-Tencor Corporation
- Roie Volkovich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Imaging overlay targets using Moiré elements and rotational symmetr...
- Patent number 11,256,177
- Issue date Feb 22, 2022
- KLA Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Periodic semiconductor device misregistration metrology system and...
- Patent number 11,182,892
- Issue date Nov 23, 2021
- KLA Corporation
- Detlef Michelsson
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Misregistration metrology by using fringe Moiré and optical Moiré e...
- Patent number 11,164,307
- Issue date Nov 2, 2021
- KLA Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology targets and methods with oblique periodic structures
- Patent number 11,137,692
- Issue date Oct 5, 2021
- KLA-Tencor Corporation
- Yoel Feler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology target for scanning metrology
- Patent number 11,073,768
- Issue date Jul 27, 2021
- KLA Corporation
- Andrew V. Hill
- G01 - MEASURING TESTING
Information Patent Grant
Determining the impacts of stochastic behavior on overlay metrology...
- Patent number 10,901,325
- Issue date Jan 26, 2021
- KLA-Tencor Corporation
- Evgeni Gurevich
- G01 - MEASURING TESTING
Information Patent Grant
Method of analyzing and utilizing landscapes to reduce or eliminate...
- Patent number 10,831,108
- Issue date Nov 10, 2020
- KLA Corporation
- Tal Marciano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Estimation of asymmetric aberrations
- Patent number 10,824,082
- Issue date Nov 3, 2020
- KLA-Tencor Corporation
- Yoel Feler
- G01 - MEASURING TESTING
Information Patent Grant
Reticle optimization algorithms and optimal target design
- Patent number 10,754,261
- Issue date Aug 25, 2020
- KLA-Tencor Corporation
- Yoel Feler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Symmetric target design in scatterometry overlay metrology
- Patent number 10,591,406
- Issue date Mar 17, 2020
- KLA-Tencor Corporation
- Barak Bringoltz
- G01 - MEASURING TESTING
Information Patent Grant
Method and system for selection of metrology targets for use in foc...
- Patent number 10,340,196
- Issue date Jul 2, 2019
- KLA-Tencor Corporation
- Roie Volkovich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Near field metrology
- Patent number 10,261,014
- Issue date Apr 16, 2019
- KLA-Tencor Corporation
- Noam Sapiens
- G02 - OPTICS
Information Patent Grant
Method, system, and user interface for metrology target characteriz...
- Patent number 10,242,290
- Issue date Mar 26, 2019
- KLA-Tencor Corporation
- Inna Tarshish-Shapir
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Focus metrology and targets which utilize transformations based on...
- Patent number 10,197,922
- Issue date Feb 5, 2019
- KLA-Tencor Corporation
- Nadav Gutman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Focus measurements using scatterometry metrology
- Patent number 9,934,353
- Issue date Apr 3, 2018
- KLA-Tencor Corporation
- Mohamed El Kodadi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Approach for model calibration used for focus and dose measurement
- Patent number 9,841,689
- Issue date Dec 12, 2017
- KLA-Tencor Corporation
- Vladimir Levinski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETR...
- Publication number 20250021019
- Publication date Jan 16, 2025
- KLA Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CALIBRATED MEASUREMENT OF OVERLAY ERROR USING SMALL TARGETS
- Publication number 20240295827
- Publication date Sep 5, 2024
- KLA Corporation
- Yoel Feler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETR...
- Publication number 20240210841
- Publication date Jun 27, 2024
- KLA Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MOSAIC OVERLAY TARGETS
- Publication number 20240110780
- Publication date Apr 4, 2024
- KLA Corporation
- Yoel Feler
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY TARGET FOR ONE-DIMENSIONAL MEASUREMENT OF PERIODIC MISREG...
- Publication number 20240035812
- Publication date Feb 1, 2024
- KLA Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OVERLAY MARK DESIGN FOR ELECTRON BEAM OVERLAY
- Publication number 20230324810
- Publication date Oct 12, 2023
- KLA Corporation
- Inna Steely-Tarshish
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASUREMENT OF STITCHING ERROR USING SPLIT TARGETS
- Publication number 20230281779
- Publication date Sep 7, 2023
- KLA Corporation
- Mark GHINOVKER
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Induced Displacements for Improved Overlay Error Metrology
- Publication number 20230129618
- Publication date Apr 27, 2023
- KLA Corporation
- Mark Ghinovker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...
- Publication number 20230099105
- Publication date Mar 30, 2023
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEMS AND METHODS FOR ROTATIONAL CALIBRATION OF METROLOGY TOOLS
- Publication number 20230068016
- Publication date Mar 2, 2023
- KLA Corporation
- Alexander Novikov
- G01 - MEASURING TESTING
Information Patent Application
OVERLAY MARK DESIGN FOR ELECTRON BEAM OVERLAY
- Publication number 20220415725
- Publication date Dec 29, 2022
- KLA Corporation
- Inna Steely-Tarshish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OVERLAY MARK DESIGN FOR ELECTRON BEAM OVERLAY
- Publication number 20220413395
- Publication date Dec 29, 2022
- KLA Corporation
- Inna Steely-Tarshish
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY DESIGN FOR ELECTRON BEAM AND SCATTEROMETRY OVERLAY MEASUREM...
- Publication number 20220413394
- Publication date Dec 29, 2022
- KLA Corporation
- Inna Steely-Tarshish
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OBLIQUE ILLUMINATION FOR OVERLAY METROLOGY
- Publication number 20220357674
- Publication date Nov 10, 2022
- Andrew V. Hill
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MEASURING AND CORRECTING MISREGISTRATION BETWEEN LAYERS...
- Publication number 20220199437
- Publication date Jun 23, 2022
- KLA-Tencor Corporation
- Roie Volkovich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETR...
- Publication number 20220171297
- Publication date Jun 2, 2022
- KLA Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY TARGET FOR ONE-DIMENSIONAL MEASUREMENT OF PERIODIC MISREG...
- Publication number 20210381825
- Publication date Dec 9, 2021
- KLA Corporation
- Yoel Feler
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHODS AND OPTICAL SCHEMES FOR MEASUREMENT OF MISREGISTR...
- Publication number 20210333218
- Publication date Oct 28, 2021
- KLA Corporation
- Yoel Feler
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY TARGET FOR SCANNING METROLOGY
- Publication number 20210311401
- Publication date Oct 7, 2021
- KLA Corporation
- Andrew V. Hill
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI-LAYERED MOIRÉ TARGETS AND METHODS FOR USING THE SAME IN MEASU...
- Publication number 20210233821
- Publication date Jul 29, 2021
- KLA CORPORATION
- Yoel FELER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPROVED SELF-MOIRE GRATING DESIGN FOR USE IN METROLOGY
- Publication number 20210200106
- Publication date Jul 1, 2021
- KLA Corporation
- Vladimir Levinski
- G02 - OPTICS
Information Patent Application
ACCURACY IMPROVEMENTS IN OPTICAL METROLOGY
- Publication number 20210175132
- Publication date Jun 10, 2021
- KLA-Tencor Corporation
- Barak Bringoltz
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...
- Publication number 20210149296
- Publication date May 20, 2021
- KLA-Tencor Corporation
- Yoel Feler
- G01 - MEASURING TESTING
Information Patent Application
Periodic Semiconductor Device Misregistration Metrology System and...
- Publication number 20210082099
- Publication date Mar 18, 2021
- KLA Corporation
- Detlef Michelsson
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Imaging Overlay Targets Using Moire Elements and Rotational Symmetr...
- Publication number 20210072650
- Publication date Mar 11, 2021
- KLA Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Metrology Target for Scanning Metrology
- Publication number 20200409271
- Publication date Dec 31, 2020
- KLA Corporation
- Andrew V. Hill
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR MEASURING AND CORRECTING MISREGISTRATION BETWEEN LAYERS...
- Publication number 20200312687
- Publication date Oct 1, 2020
- KLA-Tencor Corporation
- Roie Volkovich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ESTIMATION OF ASYMMETRIC ABERRATIONS
- Publication number 20200133135
- Publication date Apr 30, 2020
- KLA-Tencor Corporation
- Yoel Feler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY TARGETS AND METHODS WITH OBLIQUE PERIODIC STRUCTURES
- Publication number 20200124982
- Publication date Apr 23, 2020
- KLA-TENCOR CORPORATION
- Yoel Feler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...
- Publication number 20190250504
- Publication date Aug 15, 2019
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING

Person

Patents Grantslast 30 patents

Multi-layered moiré targets and methods for using the same in measu...

Imaging overlay targets using moiré elements and rotational symmetr...

Measurement of stitching error using split targets

Overlay mark design for electron beam overlay

Reduction or elimination of pattern placement error in metrology me...

Overlay mark design for electron beam overlay

Accuracy improvements in optical metrology

Induced displacements for improved overlay error metrology

Overlay design for electron beam and scatterometry overlay measurem...

Metrology target for one-dimensional measurement of periodic misreg...

Self-Moire grating design for use in metrology

Metrology methods and optical schemes for measurement of misregistr...

Reduction or elimination of pattern placement error in metrology me...

Method for measuring and correcting misregistration between layers...

Imaging overlay targets using Moiré elements and rotational symmetr...

Periodic semiconductor device misregistration metrology system and...

Misregistration metrology by using fringe Moiré and optical Moiré e...

Metrology targets and methods with oblique periodic structures

Metrology target for scanning metrology

Determining the impacts of stochastic behavior on overlay metrology...

Method of analyzing and utilizing landscapes to reduce or eliminate...

Estimation of asymmetric aberrations

Reticle optimization algorithms and optimal target design

Symmetric target design in scatterometry overlay metrology

Method and system for selection of metrology targets for use in foc...

Near field metrology

Method, system, and user interface for metrology target characteriz...

Focus metrology and targets which utilize transformations based on...

Focus measurements using scatterometry metrology

Approach for model calibration used for focus and dose measurement

Patents Applicationslast 30 patents

IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETR...

CALIBRATED MEASUREMENT OF OVERLAY ERROR USING SMALL TARGETS

IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETR...

MOSAIC OVERLAY TARGETS

METROLOGY TARGET FOR ONE-DIMENSIONAL MEASUREMENT OF PERIODIC MISREG...

OVERLAY MARK DESIGN FOR ELECTRON BEAM OVERLAY

MEASUREMENT OF STITCHING ERROR USING SPLIT TARGETS

Induced Displacements for Improved Overlay Error Metrology

REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...

SYSTEMS AND METHODS FOR ROTATIONAL CALIBRATION OF METROLOGY TOOLS

OVERLAY MARK DESIGN FOR ELECTRON BEAM OVERLAY

OVERLAY MARK DESIGN FOR ELECTRON BEAM OVERLAY

OVERLAY DESIGN FOR ELECTRON BEAM AND SCATTEROMETRY OVERLAY MEASUREM...

OBLIQUE ILLUMINATION FOR OVERLAY METROLOGY

METHOD FOR MEASURING AND CORRECTING MISREGISTRATION BETWEEN LAYERS...

IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETR...

METROLOGY TARGET FOR ONE-DIMENSIONAL MEASUREMENT OF PERIODIC MISREG...

METROLOGY METHODS AND OPTICAL SCHEMES FOR MEASUREMENT OF MISREGISTR...

METROLOGY TARGET FOR SCANNING METROLOGY

MULTI-LAYERED MOIRÉ TARGETS AND METHODS FOR USING THE SAME IN MEASU...

IMPROVED SELF-MOIRE GRATING DESIGN FOR USE IN METROLOGY

ACCURACY IMPROVEMENTS IN OPTICAL METROLOGY

REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...

Periodic Semiconductor Device Misregistration Metrology System and...

Imaging Overlay Targets Using Moire Elements and Rotational Symmetr...

Metrology Target for Scanning Metrology

METHOD FOR MEASURING AND CORRECTING MISREGISTRATION BETWEEN LAYERS...

ESTIMATION OF ASYMMETRIC ABERRATIONS

METROLOGY TARGETS AND METHODS WITH OBLIQUE PERIODIC STRUCTURES

REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...