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Fumihiko Higuchi

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  • Yokohama, JP
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Patents Grantslast 30 patents

  • Information Patent Grant

    Dry etching method
    • Patent number 7,192,532
    • Issue date Mar 20, 2007
    • Tokyo Electron Limited
    • Akiteru Koh
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Etching method for silicon containing layer
    • Patent number 5,560,804
    • Issue date Oct 1, 1996
    • Tokyo Electron Limited
    • Fumihiko Higuchi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Magnetron plasma processing system
    • Patent number 5,554,249
    • Issue date Sep 10, 1996
    • Tokyo Electron Limited
    • Makoto Hasegawa
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Dry etching method
    • Patent number 5,411,631
    • Issue date May 2, 1995
    • Tokyo Electron Limited
    • Masaru Hori
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Dry etching polysilicon using a bromine-containing gas
    • Patent number 5,314,573
    • Issue date May 24, 1994
    • Tokyo Electron Limited
    • Fumihiko Higuchi
    • H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents