German E. Rylov

Person

Poway, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Line narrowing module
- Patent number 8,126,027
- Issue date Feb 28, 2012
- Cymer, Inc.
- J. Martin Algots
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Active bandwidth control for a laser
- Patent number 7,653,095
- Issue date Jan 26, 2010
- Cymer, Inc.
- Daniel J. Reiley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Immersion lithography laser light source with pulse stretcher
- Patent number 7,643,528
- Issue date Jan 5, 2010
- Cymer, Inc.
- William N. Partlo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Line narrowing module
- Patent number 7,366,219
- Issue date Apr 29, 2008
- Cymer, Inc.
- J. Martin Algots
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Line selected F2 two chamber laser system
- Patent number 7,218,661
- Issue date May 15, 2007
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Grant
Relax gas discharge laser lithography light source
- Patent number 7,088,758
- Issue date Aug 8, 2006
- Cymer, Inc.
- Richard L. Sandstrom
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Line selected F2 two chamber laser system
- Patent number 7,058,107
- Issue date Jun 6, 2006
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Grant
Line selected F2 two chamber laser system
- Patent number 6,801,560
- Issue date Oct 5, 2004
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Grant
Two chamber F2 laser system with F2 pressure based line selection
- Patent number 6,798,812
- Issue date Sep 28, 2004
- Cymer, Inc.
- German E. Rylov
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Line Narrowing Module
- Publication number 20110194580
- Publication date Aug 11, 2011
- Cymer, Inc.
- J. Martin Algots
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Line narrowing module
- Publication number 20100097704
- Publication date Apr 22, 2010
- Cymer, Inc.
- J. Martin Algots
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Immersion lithography laser light source with pulse stretcher
- Publication number 20100074295
- Publication date Mar 25, 2010
- Cymer, Inc.
- William N. Partlo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Immersion lithography laser light source with pulse stretcher
- Publication number 20090080476
- Publication date Mar 26, 2009
- Cymer, Inc.
- William N. Partlo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Line narrowing module
- Publication number 20080151944
- Publication date Jun 26, 2008
- Cymer, Inc.
- J. Martin Algots
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Active bandwidth control for a laser
- Publication number 20070001127
- Publication date Jan 4, 2007
- Cymer, Inc.
- Daniel J. Reiley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Line narrowing module
- Publication number 20060114957
- Publication date Jun 1, 2006
- J. Martin Algots
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Relax gas discharge laser lithography light source
- Publication number 20050083983
- Publication date Apr 21, 2005
- Richard L. Sandstrom
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Line selected F2 two chamber laser system
- Publication number 20040258122
- Publication date Dec 23, 2004
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Application
Line selected F2 two chamber laser system
- Publication number 20040174919
- Publication date Sep 9, 2004
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Application
Two chamber F2 laser system with F2 pressure based line selection
- Publication number 20030138019
- Publication date Jul 24, 2003
- German E. Rylov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Line selected F2 two chamber laser system
- Publication number 20020154671
- Publication date Oct 24, 2002
- David S. Knowles
- G01 - MEASURING TESTING

German E. Rylov

Person

Patents Grantslast 30 patents

Line narrowing module

Active bandwidth control for a laser

Immersion lithography laser light source with pulse stretcher

Line narrowing module

Line selected F2 two chamber laser system

Relax gas discharge laser lithography light source

Line selected F2 two chamber laser system

Line selected F2 two chamber laser system

Two chamber F2 laser system with F2 pressure based line selection

Patents Applicationslast 30 patents

Line Narrowing Module

Line narrowing module

Immersion lithography laser light source with pulse stretcher

Immersion lithography laser light source with pulse stretcher

Line narrowing module

Active bandwidth control for a laser

Line narrowing module

Relax gas discharge laser lithography light source

Line selected F2 two chamber laser system

Line selected F2 two chamber laser system

Two chamber F2 laser system with F2 pressure based line selection

Line selected F2 two chamber laser system