Gowri Kamarthy

Person

Pleasanton, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Film stack simplification for high aspect ratio patterning and vert...
- Patent number 12,080,592
- Issue date Sep 3, 2024
- Lam Research Corporation
- Hui-Jung Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlling ion energy within a plasma chamber
- Patent number 10,424,461
- Issue date Sep 24, 2019
- Lam Research Corporation
- Thorsten Lill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Internal plasma grid for semiconductor fabrication
- Patent number 10,224,221
- Issue date Mar 5, 2019
- Lam Research Corporation
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlling ion energy within a plasma chamber
- Patent number 10,141,163
- Issue date Nov 27, 2018
- Lam Research Corporation
- Thorsten Lill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Internal plasma grid applications for semiconductor fabrication
- Patent number 9,633,846
- Issue date Apr 25, 2017
- Lam Research Corporation
- Alex Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of planarizing an upper surface of a semiconductor substrate...
- Patent number 9,589,853
- Issue date Mar 7, 2017
- Lam Research Corporation
- Monica Titus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlling ion energy within a plasma chamber
- Patent number 9,460,894
- Issue date Oct 4, 2016
- Lam Research Corporation
- Thorsten Lill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Residue free systems and methods for isotropically etching silicon...
- Patent number 9,385,003
- Issue date Jul 5, 2016
- Lam Research Corporation
- Ming-Shu Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structures with coplanar recessed gate layers and fab...
- Patent number 9,252,238
- Issue date Feb 2, 2016
- Lam Research Corporation
- Kristina Trevino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Internal plasma grid for semiconductor fabrication
- Patent number 9,245,761
- Issue date Jan 26, 2016
- Lam Research Corporation
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Internal plasma grid applications for semiconductor fabrication in...
- Patent number 9,230,819
- Issue date Jan 5, 2016
- Lam Research Corporation
- Alex Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlling CD and CD uniformity with trim time and temperature on...
- Patent number 9,012,243
- Issue date Apr 21, 2015
- Lam Research Corporation
- Yoshie Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for providing vias
- Patent number 8,999,184
- Issue date Apr 7, 2015
- Lam Research Corporation
- Ming-Shu Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlling CD and CD uniformity with trim time and temperature on...
- Patent number 8,852,964
- Issue date Oct 7, 2014
- Lam Research Corporation
- Yoshie Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Profile and CD uniformity control by plasma oxidation treatment
- Patent number 8,671,878
- Issue date Mar 18, 2014
- Lam Research Corporation
- Qinghua Zhong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Profile and CD uniformity control by plasma oxidation treatment
- Patent number 8,298,949
- Issue date Oct 30, 2012
- Lam Research Corporation
- Qinghua Zhong
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
FILM STACK SIMPLIFICATION FOR HIGH ASPECT RATIO PATTERNING AND VERT...
- Publication number 20240387258
- Publication date Nov 21, 2024
- LAM RESEARCH CORPORATION
- Hui-Jung Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE ETCHING AND DEPOSITION OF MEMORY LAYERS TO PROVIDE CAPACI...
- Publication number 20230320062
- Publication date Oct 5, 2023
- LAM RESEARCH CORPORATION
- Ratndeep SRIVASTAVA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION BEAM ETCHING WITH GAS TREATMENT AND PULSING
- Publication number 20220102624
- Publication date Mar 31, 2022
- LAM RESEARCH CORPORATION
- Seokmin YUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM STACK SIMPLIFICATION FOR HIGH ASPECT RATIO PATTERNING AND VERT...
- Publication number 20220051938
- Publication date Feb 17, 2022
- LAM RESEARCH CORPORATION
- Hui-Jung Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROLLING ION ENERGY WITHIN A PLASMA CHAMBER
- Publication number 20190103253
- Publication date Apr 4, 2019
- LAM RESEARCH CORPORATION
- Thorsten Lill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROLLING ION ENERGY WITHIN A PLASMA CHAMBER
- Publication number 20160379804
- Publication date Dec 29, 2016
- LAM RESEARCH CORPORATION
- Thorsten Lill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERNAL PLASMA GRID FOR SEMICONDUCTOR FABRICATION
- Publication number 20160203990
- Publication date Jul 14, 2016
- LAM RESEARCH CORPORATION
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERNAL PLASMA GRID FOR SEMICONDUCTOR FABRICATION
- Publication number 20160181130
- Publication date Jun 23, 2016
- LAM RESEARCH CORPORATION
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERNAL PLASMA GRID APPLICATIONS FOR SEMICONDUCTOR FABRICATION
- Publication number 20160086795
- Publication date Mar 24, 2016
- LAM RESEARCH CORPORATION
- Alex Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURES WITH COPLANAR RECESSED GATE LAYERS AND FAB...
- Publication number 20160049495
- Publication date Feb 18, 2016
- LAM RESEARCH CORPORATION
- Kristina TREVINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PLANARIZING AN UPPER SURFACE OF A SEMICONDUCTOR SUBSTRATE...
- Publication number 20150249016
- Publication date Sep 3, 2015
- LAM RESEARCH CORPORATION
- Monica Titus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROLLING CD AND CD UNIFORMITY WITH TRIM TIME AND TEMPERATURE ON...
- Publication number 20150053347
- Publication date Feb 26, 2015
- LAM RESEARCH CORPORATION
- Yoshie Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Controlling Ion Energy Within A Plasma Chamber
- Publication number 20150002018
- Publication date Jan 1, 2015
- LAM RESEARCH CORPORATION
- Thorsten Lill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERNAL PLASMA GRID APPLICATIONS FOR SEMICONDUCTOR FABRICATION
- Publication number 20140302678
- Publication date Oct 9, 2014
- Alex Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERNAL PLASMA GRID FOR SEMICONDUCTOR FABRICATION
- Publication number 20140302680
- Publication date Oct 9, 2014
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROLLING CD AND CD UNIFORMITY WITH TRIM TIME AND TEMPERATURE ON...
- Publication number 20140220709
- Publication date Aug 7, 2014
- LAM RESEARCH CORPORATION
- Yoshie Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU METAL RESIDUE CLEAN
- Publication number 20140179106
- Publication date Jun 26, 2014
- LAM RESEARCH CORPORATION
- Qinghua ZHONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCH WITH MIXED MODE PULSING
- Publication number 20140051256
- Publication date Feb 20, 2014
- LAM RESEARCH CORPORATION
- Qinghua ZHONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PROVIDING VIAS
- Publication number 20140038419
- Publication date Feb 6, 2014
- LAM RESEARCH CORPORATION
- Ming-Shu KUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SHRINK AND TUNE TRENCH/VIA CD
- Publication number 20140030893
- Publication date Jan 30, 2014
- LAM RESEARCH CORPORATION
- Ming-Shu KUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR FORMING FEATURES WITH PLASMA PRE-ETCH TREA...
- Publication number 20130267097
- Publication date Oct 10, 2013
- LAM RESEARCH CORPORATION
- Ratndeep SRIVASTAVA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROFILE AND CD UNIFORMITY CONTROL BY PLASMA OXIDATION TREATMENT
- Publication number 20130025785
- Publication date Jan 31, 2013
- LAM RESEARCH CORPORATION
- Qinghua Zhong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROFILE AND CD UNIFORMITY CONTROL BY PLASMA OXIDATION TREATMENT
- Publication number 20100173496
- Publication date Jul 8, 2010
- LAM RESEARCH CORPORATION
- Qinghua Zhong
- H01 - BASIC ELECTRIC ELEMENTS

Gowri Kamarthy

Person

Patents Grantslast 30 patents

Film stack simplification for high aspect ratio patterning and vert...

Controlling ion energy within a plasma chamber

Internal plasma grid for semiconductor fabrication

Controlling ion energy within a plasma chamber

Internal plasma grid applications for semiconductor fabrication

Method of planarizing an upper surface of a semiconductor substrate...

Controlling ion energy within a plasma chamber

Residue free systems and methods for isotropically etching silicon...

Semiconductor structures with coplanar recessed gate layers and fab...

Internal plasma grid for semiconductor fabrication

Internal plasma grid applications for semiconductor fabrication in...

Controlling CD and CD uniformity with trim time and temperature on...

Method for providing vias

Controlling CD and CD uniformity with trim time and temperature on...

Profile and CD uniformity control by plasma oxidation treatment

Profile and CD uniformity control by plasma oxidation treatment

Patents Applicationslast 30 patents

FILM STACK SIMPLIFICATION FOR HIGH ASPECT RATIO PATTERNING AND VERT...

SELECTIVE ETCHING AND DEPOSITION OF MEMORY LAYERS TO PROVIDE CAPACI...

ION BEAM ETCHING WITH GAS TREATMENT AND PULSING

FILM STACK SIMPLIFICATION FOR HIGH ASPECT RATIO PATTERNING AND VERT...

CONTROLLING ION ENERGY WITHIN A PLASMA CHAMBER

CONTROLLING ION ENERGY WITHIN A PLASMA CHAMBER

INTERNAL PLASMA GRID FOR SEMICONDUCTOR FABRICATION

INTERNAL PLASMA GRID FOR SEMICONDUCTOR FABRICATION

INTERNAL PLASMA GRID APPLICATIONS FOR SEMICONDUCTOR FABRICATION

SEMICONDUCTOR STRUCTURES WITH COPLANAR RECESSED GATE LAYERS AND FAB...

METHOD OF PLANARIZING AN UPPER SURFACE OF A SEMICONDUCTOR SUBSTRATE...

CONTROLLING CD AND CD UNIFORMITY WITH TRIM TIME AND TEMPERATURE ON...

Controlling Ion Energy Within A Plasma Chamber

INTERNAL PLASMA GRID APPLICATIONS FOR SEMICONDUCTOR FABRICATION

INTERNAL PLASMA GRID FOR SEMICONDUCTOR FABRICATION

CONTROLLING CD AND CD UNIFORMITY WITH TRIM TIME AND TEMPERATURE ON...

IN-SITU METAL RESIDUE CLEAN

ETCH WITH MIXED MODE PULSING

METHOD FOR PROVIDING VIAS

METHOD FOR SHRINK AND TUNE TRENCH/VIA CD

METHOD AND APPARATUS FOR FORMING FEATURES WITH PLASMA PRE-ETCH TREA...

PROFILE AND CD UNIFORMITY CONTROL BY PLASMA OXIDATION TREATMENT

PROFILE AND CD UNIFORMITY CONTROL BY PLASMA OXIDATION TREATMENT