Gregory J. Wilson

Person

Kalispell, MT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Parameter adjustment model for semiconductor processing chambers
- Patent number 12,116,686
- Issue date Oct 15, 2024
- Applied Materials, Inc.
- Eric J. Bergman
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Mechanically-driven oscillating flow agitation
- Patent number 12,104,269
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Paul R. McHugh
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Methods, systems, and apparatus for tape-frame substrate cleaning a...
- Patent number 12,087,571
- Issue date Sep 10, 2024
- Applied Materials, Inc.
- Ying Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electroplating system
- Patent number 11,982,008
- Issue date May 14, 2024
- Applied Materials, Inc.
- Paul R McHugh
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Systems and methods for improving within die co-planarity uniformity
- Patent number 11,984,358
- Issue date May 14, 2024
- Applied Materials, Inc.
- Paul McHugh
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods, systems, and apparatus for tape-frame substrate cleaning a...
- Patent number 11,837,464
- Issue date Dec 5, 2023
- Applied Materials, Inc.
- Ying Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning components and methods in a plating system
- Patent number 11,814,744
- Issue date Nov 14, 2023
- Applied Materials, Inc.
- Nolan Zimmerman
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Vertically adjustable plasma source
- Patent number 11,705,312
- Issue date Jul 18, 2023
- Applied Materials, Inc.
- Tsutomu Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-compartment electrochemical replenishment cell
- Patent number 11,697,887
- Issue date Jul 11, 2023
- Applied Materials, Inc.
- Nolan L. Zimmerman
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Mechanically-driven oscillating flow agitation
- Patent number 11,585,009
- Issue date Feb 21, 2023
- Applied Materials, Inc.
- Paul R. McHugh
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Electroplating system
- Patent number 11,578,422
- Issue date Feb 14, 2023
- Applied Materials, Inc.
- Paul R McHugh
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Apparatus for post exposure bake
- Patent number 11,550,224
- Issue date Jan 10, 2023
- Applied Materials, Inc.
- Kyle M. Hanson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for improving within die co-planarity uniformity
- Patent number 11,367,653
- Issue date Jun 21, 2022
- Applied Materials, Inc.
- Paul McHugh
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Electroplating system
- Patent number 11,268,208
- Issue date Mar 8, 2022
- Applied Materials, Inc.
- Paul R McHugh
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Cleaning components and methods in a plating system
- Patent number 11,241,718
- Issue date Feb 8, 2022
- Applied Materials, Inc.
- Joseph Antony Jonathan
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Mechanically-driven oscillating flow agitation
- Patent number 11,230,793
- Issue date Jan 25, 2022
- Applied Materials, Inc.
- Paul R. McHugh
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Microelectronic substrate electro processing system
- Patent number 10,837,119
- Issue date Nov 17, 2020
- Applied Materials, Inc.
- Robert B. Moore
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Apparatus for post exposure bake
- Patent number 10,754,252
- Issue date Aug 25, 2020
- Applied Materials, Inc.
- Kyle M. Hanson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and methods to improve ALD uniformity
- Patent number 10,655,226
- Issue date May 19, 2020
- Applied Materials, Inc.
- Gregory J. Wilson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electroplating apparatus with electrolyte agitation
- Patent number 10,577,712
- Issue date Mar 3, 2020
- Applied Materials, Inc.
- Gregory J. Wilson
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Electroplating wafers having a pattern induced non-uniformity
- Patent number 10,570,526
- Issue date Feb 25, 2020
- Applied Materials, Inc.
- Paul R. McHugh
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Electroplating dynamic edge control
- Patent number 10,494,731
- Issue date Dec 3, 2019
- Applied Materials, Inc.
- Paul McHugh
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Electroplating apparatus with current crowding adapted contact ring...
- Patent number 10,364,506
- Issue date Jul 30, 2019
- Applied Materials, Inc.
- Gregory J. Wilson
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Adaptive electric field shielding in an electroplating processor us...
- Patent number 10,240,248
- Issue date Mar 26, 2019
- Applied Materials, Inc.
- Paul Van Valkenburg
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Electroplating apparatus with electrolyte agitation
- Patent number 10,227,706
- Issue date Mar 12, 2019
- Applied Materials, Inc.
- Gregory J. Wilson
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Inert anode electroplating processor and replenisher
- Patent number 10,227,707
- Issue date Mar 12, 2019
- Applied Materials, Inc.
- Gregory J. Wilson
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Removing photoresist from a wafer
- Patent number 10,191,379
- Issue date Jan 29, 2019
- Applied Materials, Inc.
- Paul R. McHugh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electroplating contact ring with radially offset contact fingers
- Patent number 10,113,245
- Issue date Oct 30, 2018
- Applied Materials, Inc.
- Gregory J. Wilson
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Seal rings in electrochemical processors
- Patent number 10,087,543
- Issue date Oct 2, 2018
- Applied Materials, Inc.
- Nolan L. Zimmerman
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Electroplating apparatus with membrane tube shield
- Patent number 10,081,881
- Issue date Sep 25, 2018
- Applied Materials, Inc.
- Paul R. McHugh
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR

Patents Applicationslast 30 patents

Information Patent Application
ELECTROPLATING CHAMBER USING JET ARRAY TO ENABLE HIGH MASS-TRANSFER
- Publication number 20250116028
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Paul R. McHugh
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ANNEAL CHAMBER
- Publication number 20250118572
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Paul R. McHugh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROPLATING WETTING CHAMBER WITH REDUCED BUBBLE ENTRAPMENT
- Publication number 20250006519
- Publication date Jan 2, 2025
- Applied Materials, Inc.
- Kyle M. Hanson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS, SYSTEMS, AND APPARATUS FOR TAPE-FRAME SUBSTRATE CLEANING A...
- Publication number 20240071745
- Publication date Feb 29, 2024
- Ying WANG
- B08 - CLEANING
Information Patent Application
ELECTROPLATING SYSTEMS AND METHODS WITH INCREASED METAL ION CONCENT...
- Publication number 20230313405
- Publication date Oct 5, 2023
- Applied Materials, Inc.
- Paul R. McHugh
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ELECTROPLATING SYSTEMS AND METHODS WITH INCREASED METAL ION CONCENT...
- Publication number 20230313406
- Publication date Oct 5, 2023
- Applied Materials, Inc.
- Paul R. McHugh
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
VERTICALLY ADJUSTABLE PLASMA SOURCE
- Publication number 20230307213
- Publication date Sep 28, 2023
- Applied Materials, Inc.
- Tsutomu Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARAMETER ADJUSTMENT MODEL FOR SEMICONDUCTOR PROCESSING CHAMBERS
- Publication number 20230257900
- Publication date Aug 17, 2023
- Applied Materials, Inc.
- Eric J. Bergman
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
SURGING FLOW FOR BUBBLE CLEARING IN ELECTROPLATING SYSTEMS
- Publication number 20230235474
- Publication date Jul 27, 2023
- Applied Materials, Inc.
- Joel L. Cannone
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
METHODS, SYSTEMS, AND APPARATUS FOR TAPE-FRAME SUBSTRATE CLEANING A...
- Publication number 20230215722
- Publication date Jul 6, 2023
- Ying WANG
- B08 - CLEANING
Information Patent Application
MECHANICALLY-DRIVEN OSCILLATING FLOW AGITATION
- Publication number 20230193504
- Publication date Jun 22, 2023
- Applied Materials, Inc.
- Paul R. McHugh
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ELECTROPLATING SYSTEM
- Publication number 20230167573
- Publication date Jun 1, 2023
- Applied Materials, Inc.
- Paul R McHugh
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ELECTROPLATING CO-PLANARITY IMPROVEMENT BY DIE SHIELDING
- Publication number 20230092346
- Publication date Mar 23, 2023
- Applied Materials, Inc.
- Charles Sharbono
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
SYSTEMS AND METHODS FOR IMPROVING WITHIN DIE CO-PLANARITY UNIFORMITY
- Publication number 20220270923
- Publication date Aug 25, 2022
- Applied Materials, Inc.
- Paul McHugh
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
VERTICALLY ADJUSTABLE PLASMA SOURCE
- Publication number 20220208531
- Publication date Jun 30, 2022
- Applied Materials, Inc.
- Tsutomu Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MECHANICALLY-DRIVEN OSCILLATING FLOW AGITATION
- Publication number 20220145485
- Publication date May 12, 2022
- Applied Materials, Inc.
- Paul R. McHugh
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ELECTROPLATING SYSTEM
- Publication number 20220145489
- Publication date May 12, 2022
- Applied Materials, Inc.
- Paul R McHugh
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
MULTI-COMPARTMENT ELECTROCHEMICAL REPLENISHMENT CELL
- Publication number 20220127747
- Publication date Apr 28, 2022
- Applied Materials, Inc.
- Nolan L. Zimmerman
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ELECTROPLATING SYSTEM
- Publication number 20210348296
- Publication date Nov 11, 2021
- Applied Materials, Inc.
- Paul R McHugh
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
MECHANICALLY-DRIVEN OSCILLATING FLOW AGITATION
- Publication number 20210102307
- Publication date Apr 8, 2021
- Applied Materials, Inc.
- Paul R. McHugh
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
PBN Heaters For ALD Temperature Uniformity
- Publication number 20210092800
- Publication date Mar 25, 2021
- Applied Materials, Inc.
- Kenneth Brian Doering
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR POST EXPOSURE BAKE
- Publication number 20200387074
- Publication date Dec 10, 2020
- Applied Materials, Inc.
- Kyle M. HANSON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS FOR IMPROVING WITHIN DIE CO-PLANARITY UNIFORMITY
- Publication number 20200098628
- Publication date Mar 26, 2020
- Applied Materials, Inc.
- Paul McHugh
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CLEANING COMPONENTS AND METHODS IN A PLATING SYSTEM
- Publication number 20190321861
- Publication date Oct 24, 2019
- Applied Materials, Inc.
- Joseph A. Jonathan
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING COMPONENTS AND METHODS IN A PLATING SYSTEM
- Publication number 20190301049
- Publication date Oct 3, 2019
- Applied Materials, Inc.
- Nolan Zimmerman
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ELECTROPLATING DYNAMIC EDGE CONTROL
- Publication number 20190177869
- Publication date Jun 13, 2019
- Applied Materials, Inc.
- Paul McHugh
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ELECTROPLATING APPARATUS WITH ELECTROLYTE AGITATION
- Publication number 20190153611
- Publication date May 23, 2019
- Applied Materials, Inc.
- Gregory J. Wilson
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Apparatus and Methods to Improve ALD Uniformity
- Publication number 20180340259
- Publication date Nov 29, 2018
- Applied Materials, Inc.
- Gregory J. Wilson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH PERFORMANCE FLOW BATTERY
- Publication number 20180277864
- Publication date Sep 27, 2018
- Applied Materials, Inc.
- Joseph Grover GORDON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR POST EXPOSURE BAKE
- Publication number 20180217504
- Publication date Aug 2, 2018
- Applied Materials, Inc.
- Kyle M. HANSON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Gregory J. Wilson

Person

Patents Grantslast 30 patents

Parameter adjustment model for semiconductor processing chambers

Mechanically-driven oscillating flow agitation

Methods, systems, and apparatus for tape-frame substrate cleaning a...

Electroplating system

Systems and methods for improving within die co-planarity uniformity

Methods, systems, and apparatus for tape-frame substrate cleaning a...

Substrate cleaning components and methods in a plating system

Vertically adjustable plasma source

Multi-compartment electrochemical replenishment cell

Mechanically-driven oscillating flow agitation

Electroplating system

Apparatus for post exposure bake

Systems and methods for improving within die co-planarity uniformity

Electroplating system

Cleaning components and methods in a plating system

Mechanically-driven oscillating flow agitation

Microelectronic substrate electro processing system

Apparatus for post exposure bake

Apparatus and methods to improve ALD uniformity

Electroplating apparatus with electrolyte agitation

Electroplating wafers having a pattern induced non-uniformity

Electroplating dynamic edge control

Electroplating apparatus with current crowding adapted contact ring...

Adaptive electric field shielding in an electroplating processor us...

Electroplating apparatus with electrolyte agitation

Inert anode electroplating processor and replenisher

Removing photoresist from a wafer

Electroplating contact ring with radially offset contact fingers

Seal rings in electrochemical processors

Electroplating apparatus with membrane tube shield

Patents Applicationslast 30 patents

ELECTROPLATING CHAMBER USING JET ARRAY TO ENABLE HIGH MASS-TRANSFER

ANNEAL CHAMBER

ELECTROPLATING WETTING CHAMBER WITH REDUCED BUBBLE ENTRAPMENT

METHODS, SYSTEMS, AND APPARATUS FOR TAPE-FRAME SUBSTRATE CLEANING A...

ELECTROPLATING SYSTEMS AND METHODS WITH INCREASED METAL ION CONCENT...

ELECTROPLATING SYSTEMS AND METHODS WITH INCREASED METAL ION CONCENT...

VERTICALLY ADJUSTABLE PLASMA SOURCE

PARAMETER ADJUSTMENT MODEL FOR SEMICONDUCTOR PROCESSING CHAMBERS

SURGING FLOW FOR BUBBLE CLEARING IN ELECTROPLATING SYSTEMS

METHODS, SYSTEMS, AND APPARATUS FOR TAPE-FRAME SUBSTRATE CLEANING A...

MECHANICALLY-DRIVEN OSCILLATING FLOW AGITATION

ELECTROPLATING SYSTEM

ELECTROPLATING CO-PLANARITY IMPROVEMENT BY DIE SHIELDING

SYSTEMS AND METHODS FOR IMPROVING WITHIN DIE CO-PLANARITY UNIFORMITY

VERTICALLY ADJUSTABLE PLASMA SOURCE

MECHANICALLY-DRIVEN OSCILLATING FLOW AGITATION

ELECTROPLATING SYSTEM

MULTI-COMPARTMENT ELECTROCHEMICAL REPLENISHMENT CELL

ELECTROPLATING SYSTEM

MECHANICALLY-DRIVEN OSCILLATING FLOW AGITATION

PBN Heaters For ALD Temperature Uniformity

APPARATUS FOR POST EXPOSURE BAKE

SYSTEMS AND METHODS FOR IMPROVING WITHIN DIE CO-PLANARITY UNIFORMITY

CLEANING COMPONENTS AND METHODS IN A PLATING SYSTEM

SUBSTRATE CLEANING COMPONENTS AND METHODS IN A PLATING SYSTEM

ELECTROPLATING DYNAMIC EDGE CONTROL

ELECTROPLATING APPARATUS WITH ELECTROLYTE AGITATION

Apparatus and Methods to Improve ALD Uniformity

HIGH PERFORMANCE FLOW BATTERY

APPARATUS FOR POST EXPOSURE BAKE