Hans-Jochen Paul

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Optical element and optical arrangement therewith
- Patent number 10,474,036
- Issue date Nov 12, 2019
- Carl Zeiss SMT GmbH
- Hans-Jochen Paul
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV mirror and optical system comprising EUV mirror
- Patent number 9,915,876
- Issue date Mar 13, 2018
- Carl Zeiss SMT GmbH
- Thomas Schicketanz
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective optical element, and optical system of a microlithograph...
- Patent number 9,915,873
- Issue date Mar 13, 2018
- Carl Zeiss SMT GmbH
- Hartmut Enkisch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror for the EUV wavelength range, substrate for such a mirror, p...
- Patent number 9,494,718
- Issue date Nov 15, 2016
- Carl Zeiss SMT GmbH
- Stephan Muellender
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective optical imaging system
- Patent number 9,188,771
- Issue date Nov 17, 2015
- Carl Zeiss SMT GmbH
- Aurelian Dodoc
- G02 - OPTICS
Information Patent Grant
Interference systems for microlithgraphic projection exposure systems
- Patent number 8,294,991
- Issue date Oct 23, 2012
- Carl Zeiss SMT GmbH
- Ralf Mueller
- G02 - OPTICS
Information Patent Grant
Attenuating filter for ultraviolet light
- Patent number 7,196,842
- Issue date Mar 27, 2007
- Carl Zeiss SMT AG
- Bernhard Weigl
- G02 - OPTICS
Information Patent Grant
Optical component and coating system for coating substrates for opt...
- Patent number 7,093,937
- Issue date Aug 22, 2006
- Carl Zeiss SMT AG
- Harry Bauer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Antireflection coating for ultraviolet light at large angles of inc...
- Patent number 6,967,771
- Issue date Nov 22, 2005
- Carl Zeiss SMT AG
- Ralf Kuschnereit
- G02 - OPTICS
Information Patent Grant
Method and coating system for coating substrates for optical compon...
- Patent number 6,863,398
- Issue date Mar 8, 2005
- Carl Zeiss SMT AG
- Harry Bauer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Catadioptric objective
- Patent number 6,836,379
- Issue date Dec 28, 2004
- Carl Zeiss SMT AG
- Michael Gerhard
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflection coating for ultraviolet light
- Patent number 6,825,976
- Issue date Nov 30, 2004
- Carl Zeiss SMT AG
- Hans-Jochen Paul
- G02 - OPTICS
Information Patent Grant
Antireflection coating for ultraviolet light at large angles of inc...
- Patent number 6,697,194
- Issue date Feb 24, 2004
- Carl Zeiss SMT AG
- Ralf Kuschnereit
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL ELEMENT AND OPTICAL ARRANGEMENT THEREWITH
- Publication number 20160377988
- Publication date Dec 29, 2016
- Carl Zeiss SMT GMBH
- Hans-Jochen PAUL
- G02 - OPTICS
Information Patent Application
REFLECTIVE OPTICAL ELEMENT, AND OPTICAL SYSTEM OF A MICROLITHOGRAPH...
- Publication number 20160266499
- Publication date Sep 15, 2016
- Carl Zeiss SMT GMBH
- Hartmut ENKISCH
- G02 - OPTICS
Information Patent Application
EUV MIRROR AND OPTICAL SYSTEM COMPRISING EUV MIRROR
- Publication number 20160195648
- Publication date Jul 7, 2016
- Carl Zeiss SMT GMBH
- Thomas Schicketanz
- G02 - OPTICS
Information Patent Application
MIRROR FOR THE EUV WAVELENGTH RANGE, SUBSTRATE FOR SUCH A MIRROR, P...
- Publication number 20130038929
- Publication date Feb 14, 2013
- Carl Zeiss SMT GMBH
- Stephan MUELLENDER
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE OPTICAL IMAGING SYSTEM
- Publication number 20120224160
- Publication date Sep 6, 2012
- Carl Zeiss SMT GMBH
- Aurelian Dodoc
- G02 - OPTICS
Information Patent Application
MIRROR FOR THE EUV WAVELENGTH RANGE, PROJECTION OBJECTIVE FOR MICRO...
- Publication number 20120212810
- Publication date Aug 23, 2012
- Carl Zeiss SMT GMBH
- Hans-Jochen PAUL
- G02 - OPTICS
Information Patent Application
MIRROR FOR EUV WAVELENGTHS, PROJECTION OBJECTIVE FOR MICROLITHOGRAP...
- Publication number 20120134015
- Publication date May 31, 2012
- Carl Zeiss SMT GMBH
- Hans-Jochen PAUL
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20100134891
- Publication date Jun 3, 2010
- Carl Zeiss SMT AG
- Ralf Mueller
- G02 - OPTICS
Information Patent Application
Antireflection coating for ultraviolet light at large angles of inc...
- Publication number 20060050371
- Publication date Mar 9, 2006
- Carl Zeiss SMT AG
- Ralf Kuschnereit
- G02 - OPTICS
Information Patent Application
Attenuating filter for ultraviolet light
- Publication number 20050179996
- Publication date Aug 18, 2005
- Carl Zeiss SMT AG
- Bernhard Weigl
- G02 - OPTICS
Information Patent Application
Optical component and coating system for coating substrates for opt...
- Publication number 20050146683
- Publication date Jul 7, 2005
- Carl Zeiss SMT AG
- Harry Bauer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Antireflection coating for ultraviolet light at large angels of inc...
- Publication number 20040174587
- Publication date Sep 9, 2004
- Carl Zeiss SMT AG
- Ralf Kuschnereit
- G02 - OPTICS
Information Patent Application
Method and coating system for coating substrates for optical compon...
- Publication number 20030082298
- Publication date May 1, 2003
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Harry Bauer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Catadioptric objective
- Publication number 20020196550
- Publication date Dec 26, 2002
- Michael Gerhard
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Attenuating filter for ultraviolet light
- Publication number 20020191310
- Publication date Dec 19, 2002
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Bernhard Weigl
- G02 - OPTICS
Information Patent Application
Antireflection coating for ultraviolet light at large angles of inc...
- Publication number 20020114068
- Publication date Aug 22, 2002
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Ralf Kuschnereit
- G02 - OPTICS
Information Patent Application
Antireflection coating for ultraviolet light
- Publication number 20020105721
- Publication date Aug 8, 2002
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Hans-Jochen Paul
- G02 - OPTICS

Hans-Jochen Paul

Person

Patents Grantslast 30 patents

Optical element and optical arrangement therewith

EUV mirror and optical system comprising EUV mirror

Reflective optical element, and optical system of a microlithograph...

Mirror for the EUV wavelength range, substrate for such a mirror, p...

Reflective optical imaging system

Interference systems for microlithgraphic projection exposure systems

Attenuating filter for ultraviolet light

Optical component and coating system for coating substrates for opt...

Antireflection coating for ultraviolet light at large angles of inc...

Method and coating system for coating substrates for optical compon...

Catadioptric objective

Antireflection coating for ultraviolet light

Antireflection coating for ultraviolet light at large angles of inc...

Patents Applicationslast 30 patents

OPTICAL ELEMENT AND OPTICAL ARRANGEMENT THEREWITH

REFLECTIVE OPTICAL ELEMENT, AND OPTICAL SYSTEM OF A MICROLITHOGRAPH...

EUV MIRROR AND OPTICAL SYSTEM COMPRISING EUV MIRROR

MIRROR FOR THE EUV WAVELENGTH RANGE, SUBSTRATE FOR SUCH A MIRROR, P...

REFLECTIVE OPTICAL IMAGING SYSTEM

MIRROR FOR THE EUV WAVELENGTH RANGE, PROJECTION OBJECTIVE FOR MICRO...

MIRROR FOR EUV WAVELENGTHS, PROJECTION OBJECTIVE FOR MICROLITHOGRAP...

OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

Antireflection coating for ultraviolet light at large angles of inc...

Attenuating filter for ultraviolet light

Optical component and coating system for coating substrates for opt...

Antireflection coating for ultraviolet light at large angels of inc...

Method and coating system for coating substrates for optical compon...

Catadioptric objective

Attenuating filter for ultraviolet light

Antireflection coating for ultraviolet light at large angles of inc...

Antireflection coating for ultraviolet light