Hans Loschner

Person

Vienna, AT

People

Patents Grantslast 30 patents

Information Patent Grant
Multi-beam tool for cutting patterns
- Patent number 9,443,699
- Issue date Sep 13, 2016
- IMS Nanofabrication AG
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam deflector array device for maskless particle-beam proces...
- Patent number 7,687,783
- Issue date Mar 30, 2010
- IMS Nanofabrication AG
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle multi-beam exposure apparatus
- Patent number 7,214,951
- Issue date May 8, 2007
- IMS Nanofabrication GmbH
- Gerhard Stengl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle multi-beam exposure apparatus
- Patent number 7,041,992
- Issue date May 9, 2006
- IMS Nanofabrication GmbH
- Gerhard Stengl
Information Patent Grant
Method of synthesising carbon nano tubes
- Patent number 7,033,647
- Issue date Apr 25, 2006
- Electrovac, Fabrikation elektrotechnischer Spezialartikel Gesellschaft m.b.H.
- Xinhe Tang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Particle multibeam lithography
- Patent number 6,989,546
- Issue date Jan 24, 2006
- IMS-Innenmikrofabrikations Systeme GmbH
- Hans Loschner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for enhancing the lifetime of stencil masks
- Patent number 6,858,118
- Issue date Feb 22, 2005
- IMS-Ionen Mikrofabrikations Systeme GmbH
- Elmar Platzgummer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Large-area membrane mask and method for fabricating the mask
- Patent number 6,835,508
- Issue date Dec 28, 2004
- Infineon Technologies AG
- Jörg Butschke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern lock system
- Patent number 6,661,015
- Issue date Dec 9, 2003
- IMS-Ionen Mikrofabrikations Systeme GmbH
- Alfred Chalupka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structuring device for processing a substrate
- Patent number 6,419,752
- Issue date Jul 16, 2002
- The Provost, Fellows and Scholars of The College of the Holy and Undivided Tr...
- Igor V. Shvets
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of producing a structured layer
- Patent number 6,296,700
- Issue date Oct 2, 2001
- IMS-Ionen Mikrofabrikations Systems GmbH
- Uwe B. Sleytr
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for the purpose of producing a stencil mask
- Patent number 6,156,217
- Issue date Dec 5, 2000
- IMS Ionen Mikrofabrikations Systeme GmbH
- Ernst Hammel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for producing a carbon film on a substrate
- Patent number 6,136,160
- Issue date Oct 24, 2000
- IMS Ionen Mikrofabrikations Systeme GmbH
- Pavol Hrkut
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for producing a structured mask
- Patent number 5,876,880
- Issue date Mar 2, 1999
- IMS Ionen Mikrofabrikations Systeme Gellschaft M.B.H.
- Herbert Vonach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon membrane and method of making same
- Patent number 5,672,449
- Issue date Sep 30, 1997
- IMS Ionen Mikrofabrikations Systeme GmbH
- Hans Loschner
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Method and apparatus for image alignment in ion lithography
- Patent number 4,967,088
- Issue date Oct 30, 1990
- Oesterreichische Investitionskredit Aktiengesellschaft
- Gerhard Stengl
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Ion beam apparatus and method of modifying substrate
- Patent number 4,924,104
- Issue date May 8, 1990
- IMS Ionen Mikrofabrikations Systeme Gesellschaft mbH
- Gerhard Stengl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Arrangement for stabilizing an irradiated mask
- Patent number 4,916,322
- Issue date Apr 10, 1990
- Osterreichische Investitionskredit Aktiengesellschaft
- Hilton F. Glavish
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Particle or radiation beam mask and process for making same
- Patent number 4,891,547
- Issue date Jan 2, 1990
- IMS Ionen Mikrofabrikations Systeme Gesellschaft GmbH
- Gerhard Stengl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ion-projection apparatus and method of operating same
- Patent number 4,859,857
- Issue date Aug 22, 1989
- IMS Ionen Mikrofabrikations Systeme Gesellschaft
- Gerhard Stengl
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Ion-projection apparatus
- Patent number 4,835,392
- Issue date May 30, 1989
- IMS Ionen Mikrofabrikations Systeme Gesellschaft m.b.H.
- Hans Loschner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion-projection lithographic apparatus with means for aligning the m...
- Patent number 4,823,011
- Issue date Apr 18, 1989
- Ionen Mikrofabrikations Systeme Gesellschaft mbH
- Gerhard Stengl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for making a transmission mask
- Patent number 4,780,382
- Issue date Oct 25, 1988
- IMS Ionen Mikrofabrikations Systems Gesellschaft mbH
- Gerhard Stengl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of stabilizing a mask
- Patent number 4,775,797
- Issue date Oct 4, 1988
- IMS Ionen Mikrofabrikations Systeme Gesellschaft mbH
- Gerhard Stengl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Self-supporting mask, method for production as well as use of same
- Patent number 4,370,556
- Issue date Jan 25, 1983
- Rudolf Sacher Gesellschaft m.b.H.
- Gerhard Stengl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Multi-Beam Tool for Cutting Patterns
- Publication number 20150311030
- Publication date Oct 29, 2015
- IMS Nanofabrication AG
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-Beam Tool for Cutting Patterns
- Publication number 20150311031
- Publication date Oct 29, 2015
- IMS Nanofabrication AG
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM DEFLECTOR ARRAY DEVICE FOR MASKLESS PARTICLE-BEAM PROCES...
- Publication number 20080203317
- Publication date Aug 28, 2008
- IMS Nanofabrication AG
- Elmar Platzgummer
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD OF SYNTHESISING CARBON NANO TUBES
- Publication number 20060068096
- Publication date Mar 30, 2006
- ELECTROVAC, FABRIKATION ELEKTROTECHNISCHER SPEZIALARTIKEL GESELLSCHAFT M.B.H.
- Xinhe Tang
- C30 - CRYSTAL GROWTH
Information Patent Application
Charged-particle multi-beam exposure apparatus
- Publication number 20050104013
- Publication date May 19, 2005
- IMS Nanofabrication GmbH
- Gerhard Stengl
- B82 - NANO-TECHNOLOGY
Information Patent Application
Apparatus for enhancing the lifetime of stencil masks
- Publication number 20040188243
- Publication date Sep 30, 2004
- Elmar Platzgummer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for producing a superconducting circuit
- Publication number 20030236169
- Publication date Dec 25, 2003
- Wolfgang Lang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE MULTIBEAM LITHOGRAPHY
- Publication number 20030209676
- Publication date Nov 13, 2003
- HANS LOSCHNER
- B82 - NANO-TECHNOLOGY
Information Patent Application
Field ionization ion source
- Publication number 20030122085
- Publication date Jul 3, 2003
- Gerhard Stengl
- B82 - NANO-TECHNOLOGY
Information Patent Application
Large-area membrane mask and method for fabricating the mask
- Publication number 20030031939
- Publication date Feb 13, 2003
- Jorg Butschke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern lock system
- Publication number 20020033457
- Publication date Mar 21, 2002
- Alfred Chalupka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Lithographic imaging of a structure pattern onto one or more fields...
- Publication number 20010036588
- Publication date Nov 1, 2001
- IMS-Ionen Mikrofabrikations Systeme GmbH
- Herbert Buschbeck
- B82 - NANO-TECHNOLOGY

Hans Loschner

Person

Patents Grantslast 30 patents

Multi-beam tool for cutting patterns

Multi-beam deflector array device for maskless particle-beam proces...

Charged-particle multi-beam exposure apparatus

Charged-particle multi-beam exposure apparatus

Method of synthesising carbon nano tubes

Particle multibeam lithography

Apparatus for enhancing the lifetime of stencil masks

Large-area membrane mask and method for fabricating the mask

Pattern lock system

Structuring device for processing a substrate

Method of producing a structured layer

Method for the purpose of producing a stencil mask

Process for producing a carbon film on a substrate

Process for producing a structured mask

Silicon membrane and method of making same

Method and apparatus for image alignment in ion lithography

Ion beam apparatus and method of modifying substrate

Arrangement for stabilizing an irradiated mask

Particle or radiation beam mask and process for making same

Ion-projection apparatus and method of operating same

Ion-projection apparatus

Ion-projection lithographic apparatus with means for aligning the m...

Process for making a transmission mask

Method of stabilizing a mask

Self-supporting mask, method for production as well as use of same

Patents Applicationslast 30 patents

Multi-Beam Tool for Cutting Patterns

Multi-Beam Tool for Cutting Patterns

MULTI-BEAM DEFLECTOR ARRAY DEVICE FOR MASKLESS PARTICLE-BEAM PROCES...

METHOD OF SYNTHESISING CARBON NANO TUBES

Charged-particle multi-beam exposure apparatus

Apparatus for enhancing the lifetime of stencil masks

Method for producing a superconducting circuit

PARTICLE MULTIBEAM LITHOGRAPHY

Field ionization ion source

Large-area membrane mask and method for fabricating the mask

Pattern lock system

Lithographic imaging of a structure pattern onto one or more fields...