Hari Soundararajan

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Steam-assisted single substrate cleaning process and apparatus
- Patent number 12,106,976
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Jianshe Tang
- B08 - CLEANING
Information Patent Grant
Steam treatment stations for chemical mechanical polishing system
- Patent number 12,030,093
- Issue date Jul 9, 2024
- Applied Materials, Inc.
- Haosheng Wu
- B08 - CLEANING
Information Patent Grant
Apparatus and method for CMP temperature control
- Patent number 11,919,123
- Issue date Mar 5, 2024
- Applied Materials, Inc.
- Surajit Kumar
- B24 - GRINDING POLISHING
Information Patent Grant
Control of steam generation for chemical mechanical polishing
- Patent number 11,833,637
- Issue date Dec 5, 2023
- Applied Materials, Inc.
- Hari Soundararajan
- F22 - STEAM GENERATION
Information Patent Grant
Temperature and slurry flow rate control in CMP
- Patent number 11,826,872
- Issue date Nov 28, 2023
- Applied Materials, Inc.
- Haosheng Wu
- B24 - GRINDING POLISHING
Information Patent Grant
Control of steam generation for chemical mechanical polishing
- Patent number 11,801,582
- Issue date Oct 31, 2023
- Applied Materials, Inc.
- Hari Soundararajan
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing temperature scanning apparatus for te...
- Patent number 11,752,589
- Issue date Sep 12, 2023
- Applied Materials, Inc.
- Hari Soundararajan
- B24 - GRINDING POLISHING
Information Patent Grant
Steam-assisted single substrate cleaning process and apparatus
- Patent number 11,728,185
- Issue date Aug 15, 2023
- Applied Materials, Inc.
- Jianshe Tang
- B08 - CLEANING
Information Patent Grant
Temperature-based assymetry correction during CMP and nozzle for me...
- Patent number 11,697,187
- Issue date Jul 11, 2023
- Applied Materials, Inc.
- Haosheng Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of steam for pre-heating of CMP components
- Patent number 11,633,833
- Issue date Apr 25, 2023
- Applied Materials, Inc.
- Haosheng Wu
- B24 - GRINDING POLISHING
Information Patent Grant
Steam cleaning of CMP components
- Patent number 11,628,478
- Issue date Apr 18, 2023
- Applied Materials, Inc.
- Haosheng Wu
- B08 - CLEANING
Information Patent Grant
Temperature control of chemical mechanical polishing
- Patent number 11,597,052
- Issue date Mar 7, 2023
- Applied Materials, Inc.
- Hari Soundararajan
- B24 - GRINDING POLISHING
Information Patent Grant
Steam treatment stations for chemical mechanical polishing system
- Patent number 11,446,711
- Issue date Sep 20, 2022
- Applied Materials, Inc.
- Haosheng Wu
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
STEAM TREATMENT STATIONS FOR CHEMICAL MECHANICAL POLISHING SYSTEM
- Publication number 20240307928
- Publication date Sep 19, 2024
- Applied Materials, Inc.
- Haosheng Wu
- B08 - CLEANING
Information Patent Application
APPARATUS AND METHOD FOR CMP TEMPERATURE CONTROL
- Publication number 20240157504
- Publication date May 16, 2024
- Applied Materials, Inc.
- Surajit Kumar
- B24 - GRINDING POLISHING
Information Patent Application
METHOD FOR CMP TEMPERATURE CONTROL
- Publication number 20240109163
- Publication date Apr 4, 2024
- Applied Materials, Inc.
- Haosheng Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE AND SLURRY FLOW RATE CONTROL IN CMP
- Publication number 20240025006
- Publication date Jan 25, 2024
- Applied Materials, Inc.
- Haosheng Wu
- B24 - GRINDING POLISHING
Information Patent Application
APPARATUS AND METHOD FOR CMP TEMPERATURE CONTROL
- Publication number 20230415296
- Publication date Dec 28, 2023
- Applied Materials, Inc.
- Shou-Sung Chang
- B24 - GRINDING POLISHING
Information Patent Application
CONTROL OF STEAM GENERATION FOR CHEMICAL MECHANICAL POLISHING
- Publication number 20230415297
- Publication date Dec 28, 2023
- Applied Materials, Inc.
- Hari Soundararajan
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING TEMPERATURE SCANNING APPARATUS FOR TE...
- Publication number 20230356351
- Publication date Nov 9, 2023
- Applied Materials, Inc.
- Hari Soundararajan
- B24 - GRINDING POLISHING
Information Patent Application
STEAM-ASSISTED SINGLE SUBSTRATE CLEANING PROCESS AND APPARATUS
- Publication number 20230335418
- Publication date Oct 19, 2023
- Applied Materials, Inc.
- Jianshe TANG
- B08 - CLEANING
Information Patent Application
USE OF STEAM FOR PRE-HEATING OF CMP COMPONENTS
- Publication number 20230256562
- Publication date Aug 17, 2023
- Applied Materials, Inc.
- Haosheng Wu
- B24 - GRINDING POLISHING
Information Patent Application
STEAM CLEANING OF CMP COMPONENTS
- Publication number 20230249225
- Publication date Aug 10, 2023
- Applied Materials, Inc.
- Haosheng Wu
- B24 - GRINDING POLISHING
Information Patent Application
POINT-OF-USE ULTRASONIC HOMOGENIZER FOR CMP SLURRY AGGLOMERATION RE...
- Publication number 20230054165
- Publication date Feb 23, 2023
- Applied Materials, Inc.
- Chih Chung Chou
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
TEMPERATURE CONTROL OF CHEMICAL MECHANICAL POLISHING
- Publication number 20230029290
- Publication date Jan 26, 2023
- Applied Materials, Inc.
- Hari Soundararajan
- B24 - GRINDING POLISHING
Information Patent Application
STEAM TREATMENT STATIONS FOR CHEMICAL MECHANICAL POLISHING SYSTEM
- Publication number 20220388041
- Publication date Dec 8, 2022
- Applied Materials, Inc.
- Haosheng Wu
- B24 - GRINDING POLISHING
Information Patent Application
HOT WATER GENERATION METHOD FOR CHEMICAL MECHANICAL POLISHING
- Publication number 20220355440
- Publication date Nov 10, 2022
- Applied Materials, Inc.
- Hari Soundararajan
- B24 - GRINDING POLISHING
Information Patent Application
Chemical Mechanical Polishing With Die-Based Modification
- Publication number 20220359219
- Publication date Nov 10, 2022
- Applied Materials, Inc.
- Haosheng Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSULATED FLUID LINES IN CHEMICAL MECHANICAL POLISHING
- Publication number 20220282807
- Publication date Sep 8, 2022
- Applied Materials, Inc.
- Chad Pollard
- B24 - GRINDING POLISHING
Information Patent Application
STEAM-ASSISTED SINGLE SUBSTRATE CLEANING PROCESS AND APPARATUS
- Publication number 20220216074
- Publication date Jul 7, 2022
- Applied Materials, Inc.
- Jianshe TANG
- B08 - CLEANING
Information Patent Application
TEMPERATURE AND SLURRY FLOW RATE CONTROL IN CMP
- Publication number 20210402553
- Publication date Dec 30, 2021
- Applied Materials, Inc.
- Haosheng Wu
- B24 - GRINDING POLISHING
Information Patent Application
APPARATUS AND METHOD FOR CMP TEMPERATURE CONTROL
- Publication number 20210402555
- Publication date Dec 30, 2021
- Applied Materials, Inc.
- Surajit Kumar
- B24 - GRINDING POLISHING
Information Patent Application
CONTROL OF STEAM GENERATION FOR CHEMICAL MECHANICAL POLISHING
- Publication number 20210402554
- Publication date Dec 30, 2021
- Applied Materials, Inc.
- Hari Soundararajan
- B24 - GRINDING POLISHING
Information Patent Application
SLURRY TEMPERATURE CONTROL BY MIXING AT DISPENSING
- Publication number 20210046603
- Publication date Feb 18, 2021
- Applied Materials, Inc.
- Haosheng Wu
- B24 - GRINDING POLISHING
Information Patent Application
APPARATUS AND METHOD FOR CMP TEMPERATURE CONTROL
- Publication number 20210046604
- Publication date Feb 18, 2021
- Applied Materials, Inc.
- Haosheng Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW-TEMPERATURE METAL CMP FOR MINIMIZING DISHING AND CORROSION, AND...
- Publication number 20210046602
- Publication date Feb 18, 2021
- Applied Materials, Inc.
- Haosheng Wu
- B24 - GRINDING POLISHING
Information Patent Application
STEAM GENERATION FOR CHEMICAL MECHANICAL POLISHING
- Publication number 20200406310
- Publication date Dec 31, 2020
- Applied Materials, Inc.
- Hari Soundararajan
- B08 - CLEANING
Information Patent Application
USE OF STEAM FOR PRE-HEATING OF CMP COMPONENTS
- Publication number 20200376626
- Publication date Dec 3, 2020
- Applied Materials, Inc.
- Haosheng Wu
- B24 - GRINDING POLISHING
Information Patent Application
STEAM TREATMENT STATIONS FOR CHEMICAL MECHANICAL POLISHING SYSTEM
- Publication number 20200376523
- Publication date Dec 3, 2020
- Applied Materials, Inc.
- Haosheng Wu
- B08 - CLEANING
Information Patent Application
STEAM CLEANING OF CMP COMPONENTS
- Publication number 20200376522
- Publication date Dec 3, 2020
- Applied Materials, Inc.
- Haosheng Wu
- B08 - CLEANING
Information Patent Application
TEMPERATURE-BASED IN-SITU EDGE ASSYMETRY CORRECTION DURING CMP
- Publication number 20200331114
- Publication date Oct 22, 2020
- Applied Materials, Inc.
- Haosheng Wu
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING TEMPERATURE SCANNING APPARATUS FOR TE...
- Publication number 20200331113
- Publication date Oct 22, 2020
- Applied Materials, Inc.
- Hari Soundararajan
- B24 - GRINDING POLISHING
Information Patent Application
TEMPERATURE-BASED ASSYMETRY CORRECTION DURING CMP AND NOZZLE FOR ME...
- Publication number 20200331117
- Publication date Oct 22, 2020
- Applied Materials, Inc.
- Haosheng Wu
- H01 - BASIC ELECTRIC ELEMENTS

Hari Soundararajan

Person

Patents Grantslast 30 patents

Steam-assisted single substrate cleaning process and apparatus

Steam treatment stations for chemical mechanical polishing system

Apparatus and method for CMP temperature control

Control of steam generation for chemical mechanical polishing

Temperature and slurry flow rate control in CMP

Control of steam generation for chemical mechanical polishing

Chemical mechanical polishing temperature scanning apparatus for te...

Steam-assisted single substrate cleaning process and apparatus

Temperature-based assymetry correction during CMP and nozzle for me...

Use of steam for pre-heating of CMP components

Steam cleaning of CMP components

Temperature control of chemical mechanical polishing

Steam treatment stations for chemical mechanical polishing system

Patents Applicationslast 30 patents

STEAM TREATMENT STATIONS FOR CHEMICAL MECHANICAL POLISHING SYSTEM

APPARATUS AND METHOD FOR CMP TEMPERATURE CONTROL

METHOD FOR CMP TEMPERATURE CONTROL

TEMPERATURE AND SLURRY FLOW RATE CONTROL IN CMP

APPARATUS AND METHOD FOR CMP TEMPERATURE CONTROL

CONTROL OF STEAM GENERATION FOR CHEMICAL MECHANICAL POLISHING

CHEMICAL MECHANICAL POLISHING TEMPERATURE SCANNING APPARATUS FOR TE...

STEAM-ASSISTED SINGLE SUBSTRATE CLEANING PROCESS AND APPARATUS

USE OF STEAM FOR PRE-HEATING OF CMP COMPONENTS

STEAM CLEANING OF CMP COMPONENTS

POINT-OF-USE ULTRASONIC HOMOGENIZER FOR CMP SLURRY AGGLOMERATION RE...

TEMPERATURE CONTROL OF CHEMICAL MECHANICAL POLISHING

STEAM TREATMENT STATIONS FOR CHEMICAL MECHANICAL POLISHING SYSTEM

HOT WATER GENERATION METHOD FOR CHEMICAL MECHANICAL POLISHING

Chemical Mechanical Polishing With Die-Based Modification

INSULATED FLUID LINES IN CHEMICAL MECHANICAL POLISHING

STEAM-ASSISTED SINGLE SUBSTRATE CLEANING PROCESS AND APPARATUS

TEMPERATURE AND SLURRY FLOW RATE CONTROL IN CMP

APPARATUS AND METHOD FOR CMP TEMPERATURE CONTROL

CONTROL OF STEAM GENERATION FOR CHEMICAL MECHANICAL POLISHING

SLURRY TEMPERATURE CONTROL BY MIXING AT DISPENSING

APPARATUS AND METHOD FOR CMP TEMPERATURE CONTROL

LOW-TEMPERATURE METAL CMP FOR MINIMIZING DISHING AND CORROSION, AND...

STEAM GENERATION FOR CHEMICAL MECHANICAL POLISHING

USE OF STEAM FOR PRE-HEATING OF CMP COMPONENTS

STEAM TREATMENT STATIONS FOR CHEMICAL MECHANICAL POLISHING SYSTEM

STEAM CLEANING OF CMP COMPONENTS

TEMPERATURE-BASED IN-SITU EDGE ASSYMETRY CORRECTION DURING CMP

CHEMICAL MECHANICAL POLISHING TEMPERATURE SCANNING APPARATUS FOR TE...

TEMPERATURE-BASED ASSYMETRY CORRECTION DURING CMP AND NOZZLE FOR ME...