Hidehito Saigusa

Person

Nirasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for an improved baffle plate in a plasma proce...
- Patent number 8,118,936
- Issue date Feb 21, 2012
- Tokyo Electron Limited
- Hidehito Saigusa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for an improved deposition shield in a plasma processing...
- Patent number 8,117,986
- Issue date Feb 21, 2012
- Tokyo Electron Limited
- Hidehito Saigusa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method and apparatus for an improved optical window deposition shie...
- Patent number 7,811,428
- Issue date Oct 12, 2010
- Tokyo Electron Limited
- Shinya Nishimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for an improved bellows shield in a plasma pro...
- Patent number 7,678,226
- Issue date Mar 16, 2010
- Tokyo Electron Limited
- Hidehito Saigusa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for an improved upper electrode plate in a pla...
- Patent number 7,566,368
- Issue date Jul 28, 2009
- Tokyo Electron Limited
- Hidehito Saigusa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for an improved bellows shield in a plasma pro...
- Patent number 7,204,912
- Issue date Apr 17, 2007
- Tokyo Electron Limited
- Hidehito Saigusa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for an improved baffle plate in a plasma proce...
- Patent number 7,166,166
- Issue date Jan 23, 2007
- Tokyo Electron Limited
- Hidehito Saigusa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for an improved upper electrode plate in a pla...
- Patent number 7,166,200
- Issue date Jan 23, 2007
- Tokyo Electron Limited
- Hidehito Saigusa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for an improved optical window deposition shie...
- Patent number 7,163,585
- Issue date Jan 16, 2007
- Tokyo Electron Limited
- Shinya Nishimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for an improved deposition shield in a plasma...
- Patent number 7,137,353
- Issue date Nov 21, 2006
- Tokyo Electron Limited
- Hidehito Saigusa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for an improved optical window deposition shie...
- Patent number 6,798,519
- Issue date Sep 28, 2004
- Tokyo Electron Limited
- Shinya Nishimoto
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND APPARATUS FOR AN IMPROVED BELLOWS SHIELD IN A PLASMA PRO...
- Publication number 20070125494
- Publication date Jun 7, 2007
- TOKYO ELECTRON LIMITED
- Hidehito Saigusa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR AN IMPROVED BAFFLE PLATE IN A PLASMA PROCE...
- Publication number 20070107846
- Publication date May 17, 2007
- TOKYO ELECTRON LIMITED
- Hidehito Saigusa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR AN IMPROVED OPTICAL WINDOW DEPOSITION SHIE...
- Publication number 20070102287
- Publication date May 10, 2007
- TOKYO ELECTRON LIMITED
- Shinya Nishimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR AN IMPROVED UPPER ELECTRODE PLATE IN A PLA...
- Publication number 20070096658
- Publication date May 3, 2007
- TOKYO ELECTRON LIMITED
- Hidehito Saigusa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for an improved deposition shield in a plasma...
- Publication number 20070028839
- Publication date Feb 8, 2007
- TOKYO ELECTRON LIMITED
- Hidehito Saigusa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for an improved optical window deposition shie...
- Publication number 20040173155
- Publication date Sep 9, 2004
- TOKYO ELECTRON LIMITED
- Shinya Nishimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for an improved bellows shield in a plasma pro...
- Publication number 20040060656
- Publication date Apr 1, 2004
- TOKYO ELECTRON LIMITED
- Hidehito Saigusa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for an improved deposition shield in a plasma...
- Publication number 20040060657
- Publication date Apr 1, 2004
- TOKYO ELECTRON LIMITED
- Hidehito Saigusa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR AN IMPROVED OPTICAL WINDOW DEPOSITION SHIE...
- Publication number 20040060516
- Publication date Apr 1, 2004
- TOKYO ELECTRON LIMITED
- Shinya Nishimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for an improved baffle plate in a plasma proce...
- Publication number 20040063333
- Publication date Apr 1, 2004
- TOKYO ELECTRON LIMITED
- Hidehito Saigusa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for an improved upper electrode plate in a pla...
- Publication number 20040061447
- Publication date Apr 1, 2004
- TOKYO ELECTRON LIMITED
- Hidehito Saigusa
- H01 - BASIC ELECTRIC ELEMENTS

Hidehito Saigusa

Person

Patents Grantslast 30 patents

Method and apparatus for an improved baffle plate in a plasma proce...

Apparatus for an improved deposition shield in a plasma processing...

Method and apparatus for an improved optical window deposition shie...

Method and apparatus for an improved bellows shield in a plasma pro...

Method and apparatus for an improved upper electrode plate in a pla...

Method and apparatus for an improved bellows shield in a plasma pro...

Method and apparatus for an improved baffle plate in a plasma proce...

Method and apparatus for an improved upper electrode plate in a pla...

Method and apparatus for an improved optical window deposition shie...

Method and apparatus for an improved deposition shield in a plasma...

Method and apparatus for an improved optical window deposition shie...

Patents Applicationslast 30 patents

METHOD AND APPARATUS FOR AN IMPROVED BELLOWS SHIELD IN A PLASMA PRO...

METHOD AND APPARATUS FOR AN IMPROVED BAFFLE PLATE IN A PLASMA PROCE...

METHOD AND APPARATUS FOR AN IMPROVED OPTICAL WINDOW DEPOSITION SHIE...

METHOD AND APPARATUS FOR AN IMPROVED UPPER ELECTRODE PLATE IN A PLA...

Method and apparatus for an improved deposition shield in a plasma...

Method and apparatus for an improved optical window deposition shie...

Method and apparatus for an improved bellows shield in a plasma pro...

Method and apparatus for an improved deposition shield in a plasma...

METHOD AND APPARATUS FOR AN IMPROVED OPTICAL WINDOW DEPOSITION SHIE...

Method and apparatus for an improved baffle plate in a plasma proce...

Method and apparatus for an improved upper electrode plate in a pla...