Hiroaki Nakaoka

Person

Kyotanabe-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 7,067,382
- Issue date Jun 27, 2006
- Matsushita Electric Industrial Co., Ltd.
- Hiroaki Nakaoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming insulating film and method of fabricating semicon...
- Patent number 7,033,874
- Issue date Apr 25, 2006
- Matsushita Electric Industrial Co., Ltd.
- Kazuichiro Itonaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 7,015,554
- Issue date Mar 21, 2006
- Matsushita Electric Industrial Co., Ltd.
- Hiroaki Nakaoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and its manufacturing method
- Patent number 6,995,415
- Issue date Feb 7, 2006
- Matsushita Electric Industrial Co., Ltd.
- Hisashi Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device, method for evaluating the same, and method fo...
- Patent number 6,884,643
- Issue date Apr 26, 2005
- Matsushita Electric Industrial Co., Ltd.
- Kentaro Nakanishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating semiconductor device
- Patent number 6,861,375
- Issue date Mar 1, 2005
- Matsushita Electric Industrial Co., Ltd.
- Hiroaki Nakaoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Evaluation method for evaluating insulating film, evaluation device...
- Patent number 6,859,023
- Issue date Feb 22, 2005
- Matsushita Electric Industrial Co., Ltd.
- Michinari Yamanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating semiconductor device
- Patent number 6,831,020
- Issue date Dec 14, 2004
- Matsushita Electric Industrial Co., Ltd.
- Takayuki Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming insulating film and method of fabricating semicon...
- Patent number 6,800,512
- Issue date Oct 5, 2004
- Matsushita Electric Industrial Co., Ltd.
- Kazuichiro Itonaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device by sputter doping
- Patent number 6,784,080
- Issue date Aug 31, 2004
- Matsushita Electric Industrial Co., Ltd.
- Bunji Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 6,770,517
- Issue date Aug 3, 2004
- Matsushita Electric Industrial Co., Ltd.
- Hiroaki Nakaoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 6,337,500
- Issue date Jan 8, 2002
- Matsushita Electric Industrial Co., Ltd.
- Hiroaki Nakaoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Impurity introduction method and apparatus thereof and method of ma...
- Patent number 6,217,951
- Issue date Apr 17, 2001
- Matsushita Electric Industrial Co., Ltd.
- Bunji Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Impurity doping method
- Patent number 5,851,906
- Issue date Dec 22, 1998
- Matsushita Electric Industrial Co., Ltd.
- Bunji Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with a vertical field effect transistor and me...
- Patent number 5,780,898
- Issue date Jul 14, 1998
- Matsushita Electric Industrial Co. Ltd.
- Tokuhiko Tamaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of CMOS transistor
- Patent number 5,756,382
- Issue date May 26, 1998
- Matsushita Electric Industrial Co., Ltd.
- Mizuki Segawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of CMOS transistor
- Patent number 5,726,071
- Issue date Mar 10, 1998
- Matsushita Electric Industrial Co., Ltd.
- Mizuki Segawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 5,696,008
- Issue date Dec 9, 1997
- Matsushita Electric Industrial Co., Ltd.
- Tokuhiko Tamaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of CMOS transistor
- Patent number 5,686,340
- Issue date Nov 11, 1997
- Matsushita Electric Industrial Co., Ltd.
- Mizuki Segawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with a vertical field effect transistor
- Patent number 5,670,810
- Issue date Sep 23, 1997
- Matsushita Electric Industrial Co., Ltd.
- Tokuhiko Tamaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of CMOS transistor with no reduction of punch-...
- Patent number 5,618,748
- Issue date Apr 8, 1997
- Matsushita Electric Industrial Co., Ltd.
- Mizuki Segawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of CMOS transistor including heat treatments o...
- Patent number 5,447,872
- Issue date Sep 5, 1995
- Matsushita Electric Industrial Co., Ltd.
- Mizuki Segawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a silicon rich dielectric layer
- Patent number 5,428,244
- Issue date Jun 27, 1995
- Matsushita Electric Industrial Co., Ltd.
- Mizuki Segawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of CMOS transistor in which heat treatment at...
- Patent number 5,409,847
- Issue date Apr 25, 1995
- Matsushita Electric Industrial Co., Ltd.
- Mizuki Segawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Semiconductor device and method for fabricating the same
- Publication number 20050003621
- Publication date Jan 6, 2005
- MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- Hiroaki Nakaoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming insulating film and method of fabricating semicon...
- Publication number 20040224450
- Publication date Nov 11, 2004
- Matsushita Electric Co., Ltd.
- Kazuichiro Itonaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method for fabricating the same
- Publication number 20040183141
- Publication date Sep 23, 2004
- MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- Hiroaki Nakaoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and its manufacturing method
- Publication number 20040137667
- Publication date Jul 15, 2004
- Hisashi Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device, method for evaluating the same, and method fo...
- Publication number 20040031997
- Publication date Feb 19, 2004
- Kentaro Nakanishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing semiconductor devices by sputter-doping
- Publication number 20030166328
- Publication date Sep 4, 2003
- Bunji Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for fabricating semiconductor device
- Publication number 20030109097
- Publication date Jun 12, 2003
- Matsushita Electric Industrial Co., Ltd.
- Takayuki Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Evaluation method for evaluating insulating film, evaluation device...
- Publication number 20030040132
- Publication date Feb 27, 2003
- Matsushita Electric Industrial Co., Ltd.
- Michinari Yamanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method for fabricating the same
- Publication number 20020058361
- Publication date May 16, 2002
- Matsushita Electric Industrial Co., Ltd.
- Hiroaki Nakaoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPURITY INTRODUCING APPARATUS AND METHOD
- Publication number 20010037939
- Publication date Nov 8, 2001
- Hiroaki Nakaoka
- HIROAKI NAKAOKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Hiroaki Nakaoka

Person

Patents Grantslast 30 patents

Semiconductor device and method for fabricating the same

Method of forming insulating film and method of fabricating semicon...

Semiconductor device and method for fabricating the same

Semiconductor device and its manufacturing method

Semiconductor device, method for evaluating the same, and method fo...

Method of fabricating semiconductor device

Evaluation method for evaluating insulating film, evaluation device...

Method for fabricating semiconductor device

Method of forming insulating film and method of fabricating semicon...

Method of manufacturing semiconductor device by sputter doping

Semiconductor device and method for fabricating the same

Semiconductor device and method for fabricating the same

Impurity introduction method and apparatus thereof and method of ma...

Impurity doping method

Semiconductor device with a vertical field effect transistor and me...

Manufacturing method of CMOS transistor

Manufacturing method of CMOS transistor

Semiconductor device and method of manufacturing the same

Manufacturing method of CMOS transistor

Semiconductor device with a vertical field effect transistor

Manufacturing method of CMOS transistor with no reduction of punch-...

Manufacturing method of CMOS transistor including heat treatments o...

Semiconductor device having a silicon rich dielectric layer

Manufacturing method of CMOS transistor in which heat treatment at...

Patents Applicationslast 30 patents

Semiconductor device and method for fabricating the same

Method of forming insulating film and method of fabricating semicon...

Semiconductor device and method for fabricating the same

Semiconductor device and its manufacturing method

Semiconductor device, method for evaluating the same, and method fo...

Method of manufacturing semiconductor devices by sputter-doping

Method for fabricating semiconductor device

Evaluation method for evaluating insulating film, evaluation device...

Semiconductor device and method for fabricating the same

IMPURITY INTRODUCING APPARATUS AND METHOD