Hiroji HANAWA

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing using multiple radio frequency power feeds for im...
- Patent number 11,276,562
- Issue date Mar 15, 2022
- Applied Materials, Inc.
- Zheng John Ye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing using multiple radio frequency power feeds for im...
- Patent number 10,580,623
- Issue date Mar 3, 2020
- Applied Materials, Inc.
- Zheng John Ye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Rotatable substrate support having radio frequency applicator
- Patent number 10,460,915
- Issue date Oct 29, 2019
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus of processing wafers with compressive or tensi...
- Patent number 10,403,535
- Issue date Sep 3, 2019
- Applied Materials, Inc.
- Zheng John Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of directing magnetic fields in a plasma source, and associ...
- Patent number 9,305,749
- Issue date Apr 5, 2016
- Applied Materials, Inc.
- Zheng John Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas distribution showerhead and method of cleaning
- Patent number 8,980,379
- Issue date Mar 17, 2015
- Applied Materials, Inc.
- Hiroji Hanawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In-situ VHF current sensor for a plasma reactor
- Patent number 8,970,226
- Issue date Mar 3, 2015
- Applied Materials, Inc.
- Hiroji Hanawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method and apparatus for inducing turbulent flow of a processing ch...
- Patent number 8,910,644
- Issue date Dec 16, 2014
- Applied Materials, Inc.
- Hua Chung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma immersion ion implantation reactor with extended cathode pro...
- Patent number 8,900,405
- Issue date Dec 2, 2014
- Applied Materials, Inc.
- Peter I. Porshnev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for conformal plasma immersed ion implantation assisted by a...
- Patent number 8,709,924
- Issue date Apr 29, 2014
- Applied Materials, Inc.
- Hiroji Hanawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for VHF impedance match tuning
- Patent number 8,578,879
- Issue date Nov 12, 2013
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ VHF voltage sensor for a plasma reactor
- Patent number 8,513,939
- Issue date Aug 20, 2013
- Applied Materials, Inc.
- Hiroji Hanawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Radiation heating efficiency by increasing optical absorption of a...
- Patent number 8,455,374
- Issue date Jun 4, 2013
- Applied Materials, Inc.
- Hiroji Hanawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with uniform process rate distribution by improved R...
- Patent number 8,360,003
- Issue date Jan 29, 2013
- Applied Materials, Inc.
- Andrew Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support having fluid channel
- Patent number 8,279,577
- Issue date Oct 2, 2012
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning plate for inducing turbulent flow of a processing chamber...
- Patent number D664170
- Issue date Jul 24, 2012
- Applied Materials, Inc.
- Hua Chung
- D15 - Machines not elsewhere specified
Information Patent Grant
Plasma immersion ion implantation method using a pure or nearly pur...
- Patent number 8,168,519
- Issue date May 1, 2012
- Applied Materials, Inc.
- Shijian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for characterizing a magnetic field in a magnetically enh...
- Patent number 8,148,977
- Issue date Apr 3, 2012
- Applied Materials, Inc.
- Kartik Ramaswamy
- G01 - MEASURING TESTING
Information Patent Grant
Plasma process uniformity across a wafer by controlling a variable...
- Patent number 8,080,479
- Issue date Dec 20, 2011
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma process uniformity across a wafer by controlling RF phase be...
- Patent number 8,076,247
- Issue date Dec 13, 2011
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma immersion ion implantation reactor having multiple ion showe...
- Patent number 8,058,156
- Issue date Nov 15, 2011
- Applied Materials, Inc.
- Hiroji Hanawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor with reduced electrical skew using electrical bypass...
- Patent number 7,988,815
- Issue date Aug 2, 2011
- Applied Materials, Inc.
- Shahid Rauf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Removal of surface dopants from a substrate
- Patent number 7,989,329
- Issue date Aug 2, 2011
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 7,972,469
- Issue date Jul 5, 2011
- Applied Materials, Inc.
- Hiroji Hanawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing a workpiece in a plasma reactor with variable...
- Patent number 7,968,469
- Issue date Jun 28, 2011
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for wafer backside polymer removal and wafer front side pho...
- Patent number 7,967,996
- Issue date Jun 28, 2011
- Applied Materials, Inc.
- Kenneth S. Collins
- B08 - CLEANING
Information Patent Grant
Plasma immersion ion implantation method using a pure or nearly pur...
- Patent number 7,968,439
- Issue date Jun 28, 2011
- Applied Materials, Inc.
- Shijian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma process uniformity across a wafer by apportioning ground ret...
- Patent number 7,884,025
- Issue date Feb 8, 2011
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Improving plasma process uniformity across a wafer by apportioning...
- Patent number 7,879,731
- Issue date Feb 1, 2011
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support having heat transfer system
- Patent number 7,768,765
- Issue date Aug 3, 2010
- Applied Materials, Inc.
- Andrew Nguyen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING USING MULTIPLE RADIO FREQUENCY POWER FEEDS FOR IM...
- Publication number 20200203132
- Publication date Jun 25, 2020
- Applied Materials, Inc.
- Zheng John YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ROTATABLE SUBSTRATE SUPPORT HAVING RADIO FREQUENCY APPLICATOR
- Publication number 20170236693
- Publication date Aug 17, 2017
- Applied Materials, Inc.
- Satoru KOBAYASHI
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
METHOD AND APPARATUS FOR CLAMPING AND DECLAMPING SUBSTRATES USING E...
- Publication number 20170162417
- Publication date Jun 8, 2017
- Applied Materials, Inc.
- Zheng John YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS OF PROCESSING WAFERS WITH COMPRESSIVE OR TENSI...
- Publication number 20160049323
- Publication date Feb 18, 2016
- Applied Materials, Inc.
- Zheng John YE
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
METHODS OF DIRECTING MAGNETIC FIELDS IN A PLASMA SOURCE, AND ASSOCI...
- Publication number 20150228456
- Publication date Aug 13, 2015
- Applied Materials, Inc.
- ZHENG JOHN YE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING USING MULTIPLE RADIO FREQUENCY POWER FEEDS FOR IM...
- Publication number 20150136325
- Publication date May 21, 2015
- Applied Materials, Inc.
- Zheng John YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ROTATABLE SUBSTRATE SUPPORT HAVING RADIO FREQUENCY APPLICATOR
- Publication number 20150083042
- Publication date Mar 26, 2015
- Applied Materials, Inc.
- Satoru KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU VHF CURRENT SENSOR FOR A PLASMA REACTOR
- Publication number 20130320998
- Publication date Dec 5, 2013
- Applied Materials, Inc.
- Hiroji Hanawa
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHOD FOR HVPE PROCESSING USING A PLASMA
- Publication number 20130087093
- Publication date Apr 11, 2013
- Applied Materials, Inc.
- Donald J.K. Olgado
- C30 - CRYSTAL GROWTH
Information Patent Application
PLASMA ASSISTED HVPE CHAMBER DESIGN
- Publication number 20130032085
- Publication date Feb 7, 2013
- Applied Materials, Inc.
- Hiroji HANAWA
- C30 - CRYSTAL GROWTH
Information Patent Application
PLASMA IMMERSION CHAMBER
- Publication number 20120199071
- Publication date Aug 9, 2012
- Applied Materials, Inc.
- KENNETH S. COLLINS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU VHF VOLTAGE/CURRENT SENSORS FOR A PLASMA REACTOR
- Publication number 20120086464
- Publication date Apr 12, 2012
- Applied Materials, Inc.
- Hiroji Hanawa
- G01 - MEASURING TESTING
Information Patent Application
GAS DISTRIBUTION SHOWERHEAD WITH HIGH EMISSIVITY SURFACE
- Publication number 20120052216
- Publication date Mar 1, 2012
- Applied Materials, Inc.
- Hiroji Hanawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR INDUCING TURBULENT FLOW OF A PROCESSING CH...
- Publication number 20110308551
- Publication date Dec 22, 2011
- Applied Materials, Inc.
- Hua Chung
- B08 - CLEANING
Information Patent Application
RADIATION HEATING EFFICIENCY BY INCREASING OPTICAL ABSORPTION OF A...
- Publication number 20110272709
- Publication date Nov 10, 2011
- Applied Materials, Inc.
- HIROJI HANAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-Zone Induction Heating for Improved Temperature Uniformity in...
- Publication number 20110259879
- Publication date Oct 27, 2011
- Applied Materials, Inc.
- Hiroji Hanawa
- C30 - CRYSTAL GROWTH
Information Patent Application
REMOVAL OF SURFACE DOPANTS FROM A SUBSTRATE
- Publication number 20110256691
- Publication date Oct 20, 2011
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA IMMERSION ION IMPLANTATION METHOD USING A PURE OR NEARLY PUR...
- Publication number 20110207307
- Publication date Aug 25, 2011
- Applied Materials, Inc.
- Shijian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NOVEL METHOD FOR CONFORMAL PLASMA IMMERSED ION IMPLANTATION ASSISTE...
- Publication number 20110159673
- Publication date Jun 30, 2011
- HIROJI HANAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS DISTRIBUTION SHOWERHEAD AND METHOD OF CLEANING
- Publication number 20110052833
- Publication date Mar 3, 2011
- Applied Materials, Inc.
- HIROJI HANAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE SUPPORT HAVING FLUID CHANNEL
- Publication number 20110024047
- Publication date Feb 3, 2011
- Applied Materials, Inc.
- Andrew NGUYEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR VHF IMPEDANCE MATCH TUNING
- Publication number 20110023780
- Publication date Feb 3, 2011
- Applied Materials, Inc.
- KARTIK RAMASWAMY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR WITH RF GENERATOR AND AUTOMATIC IMPEDANCE MATCH WITH...
- Publication number 20110009999
- Publication date Jan 13, 2011
- Applied Materials, Inc.
- Chunlei Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA UNIFORMITY CONTROL THROUGH VHF CATHODE GROUND RETURN WITH F...
- Publication number 20110005679
- Publication date Jan 13, 2011
- Applied Materials, Inc.
- HIROJI HANAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR WITH UNIFORM PROCESS RATE DISTRIBUTION BY IMPROVED R...
- Publication number 20110005685
- Publication date Jan 13, 2011
- Applied Materials, Inc.
- Andrew Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING LOW-K DIELECTRIC OR REMOVING RESIST WITH A FILTERED IONIZED...
- Publication number 20100270262
- Publication date Oct 28, 2010
- Applied Materials, Inc.
- Hiroji HANAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR CHARACTERIZING A MAGNETIC FIELD IN A MAGNETICALLY ENH...
- Publication number 20100188077
- Publication date Jul 29, 2010
- Applied Materials, Inc.
- KARTIK RAMASWAMY
- G01 - MEASURING TESTING
Information Patent Application
WORKPIECE SUPPORT FOR A PLASMA REACTOR WITH CONTROLLED APPORTIONMEN...
- Publication number 20100018648
- Publication date Jan 28, 2010
- Applied Marterials, Inc.
- KENNETH S. COLLINS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPACITIVELY COUPLED PLASMA ETCH CHAMBER WITH MULTIPLE RF FEEDS
- Publication number 20100015357
- Publication date Jan 21, 2010
- Hiroji Hanawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOLDED COAXIAL RESONATORS
- Publication number 20090257927
- Publication date Oct 15, 2009
- Applied Materials, Inc.
- KARTIK RAMASWAMY
- H01 - BASIC ELECTRIC ELEMENTS

Hiroji HANAWA

Person

Patents Grantslast 30 patents

Plasma processing using multiple radio frequency power feeds for im...

Plasma processing using multiple radio frequency power feeds for im...

Rotatable substrate support having radio frequency applicator

Method and apparatus of processing wafers with compressive or tensi...

Methods of directing magnetic fields in a plasma source, and associ...

Gas distribution showerhead and method of cleaning

In-situ VHF current sensor for a plasma reactor

Method and apparatus for inducing turbulent flow of a processing ch...

Plasma immersion ion implantation reactor with extended cathode pro...

Method for conformal plasma immersed ion implantation assisted by a...

Apparatus for VHF impedance match tuning

In-situ VHF voltage sensor for a plasma reactor

Radiation heating efficiency by increasing optical absorption of a...

Plasma reactor with uniform process rate distribution by improved R...

Substrate support having fluid channel

Cleaning plate for inducing turbulent flow of a processing chamber...

Plasma immersion ion implantation method using a pure or nearly pur...

Apparatus for characterizing a magnetic field in a magnetically enh...

Plasma process uniformity across a wafer by controlling a variable...

Plasma process uniformity across a wafer by controlling RF phase be...

Plasma immersion ion implantation reactor having multiple ion showe...

Plasma reactor with reduced electrical skew using electrical bypass...

Removal of surface dopants from a substrate

Plasma processing apparatus

Method of processing a workpiece in a plasma reactor with variable...

Process for wafer backside polymer removal and wafer front side pho...

Plasma immersion ion implantation method using a pure or nearly pur...

Plasma process uniformity across a wafer by apportioning ground ret...

Improving plasma process uniformity across a wafer by apportioning...

Substrate support having heat transfer system

Patents Applicationslast 30 patents

PLASMA PROCESSING USING MULTIPLE RADIO FREQUENCY POWER FEEDS FOR IM...

ROTATABLE SUBSTRATE SUPPORT HAVING RADIO FREQUENCY APPLICATOR

METHOD AND APPARATUS FOR CLAMPING AND DECLAMPING SUBSTRATES USING E...

METHOD AND APPARATUS OF PROCESSING WAFERS WITH COMPRESSIVE OR TENSI...

METHODS OF DIRECTING MAGNETIC FIELDS IN A PLASMA SOURCE, AND ASSOCI...

PLASMA PROCESSING USING MULTIPLE RADIO FREQUENCY POWER FEEDS FOR IM...

ROTATABLE SUBSTRATE SUPPORT HAVING RADIO FREQUENCY APPLICATOR

IN-SITU VHF CURRENT SENSOR FOR A PLASMA REACTOR

APPARATUS AND METHOD FOR HVPE PROCESSING USING A PLASMA

PLASMA ASSISTED HVPE CHAMBER DESIGN

PLASMA IMMERSION CHAMBER

IN-SITU VHF VOLTAGE/CURRENT SENSORS FOR A PLASMA REACTOR

GAS DISTRIBUTION SHOWERHEAD WITH HIGH EMISSIVITY SURFACE

METHOD AND APPARATUS FOR INDUCING TURBULENT FLOW OF A PROCESSING CH...

RADIATION HEATING EFFICIENCY BY INCREASING OPTICAL ABSORPTION OF A...

Multi-Zone Induction Heating for Improved Temperature Uniformity in...

REMOVAL OF SURFACE DOPANTS FROM A SUBSTRATE

PLASMA IMMERSION ION IMPLANTATION METHOD USING A PURE OR NEARLY PUR...

NOVEL METHOD FOR CONFORMAL PLASMA IMMERSED ION IMPLANTATION ASSISTE...

GAS DISTRIBUTION SHOWERHEAD AND METHOD OF CLEANING

SUBSTRATE SUPPORT HAVING FLUID CHANNEL

APPARATUS FOR VHF IMPEDANCE MATCH TUNING

PLASMA REACTOR WITH RF GENERATOR AND AUTOMATIC IMPEDANCE MATCH WITH...

PLASMA UNIFORMITY CONTROL THROUGH VHF CATHODE GROUND RETURN WITH F...

PLASMA REACTOR WITH UNIFORM PROCESS RATE DISTRIBUTION BY IMPROVED R...

ETCHING LOW-K DIELECTRIC OR REMOVING RESIST WITH A FILTERED IONIZED...

APPARATUS FOR CHARACTERIZING A MAGNETIC FIELD IN A MAGNETICALLY ENH...

WORKPIECE SUPPORT FOR A PLASMA REACTOR WITH CONTROLLED APPORTIONMEN...

CAPACITIVELY COUPLED PLASMA ETCH CHAMBER WITH MULTIPLE RF FEEDS

FOLDED COAXIAL RESONATORS