Hiroki Ohno

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of cleaning substrate processing apparatus and system of cle...
- Patent number 10,950,465
- Issue date Mar 16, 2021
- Tokyo Electron Limited
- Shotaro Kitayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method, and st...
- Patent number 10,923,368
- Issue date Feb 16, 2021
- Tokyo Electron Limited
- Takao Inada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 10,692,739
- Issue date Jun 23, 2020
- Tokyo Electron Limited
- Yosuke Kawabuchi
- F26 - DRYING
Information Patent Grant
Substrate processing apparatus, substrate processing method and rec...
- Patent number 10,651,061
- Issue date May 12, 2020
- Tokyo Electron Limited
- Hiroki Ohno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method, and st...
- Patent number 10,504,718
- Issue date Dec 10, 2019
- Tokyo Electron Limited
- Hiroki Ohno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method, and re...
- Patent number 10,395,950
- Issue date Aug 27, 2019
- Tokyo Electron Limited
- Gentaro Goshi
- B08 - CLEANING
Information Patent Grant
High-pressure container, substrate processing apparatus, and method...
- Patent number 10,207,349
- Issue date Feb 19, 2019
- Tokyo Electron Limited
- Kazuyuki Mitsuoka
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Substrate processing method, substrate processing apparatus, and st...
- Patent number 10,199,240
- Issue date Feb 5, 2019
- TOSHIBA MEMORY CORPORATION
- Hidekazu Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Separation and regeneration apparatus and substrate processing appa...
- Patent number 10,115,609
- Issue date Oct 30, 2018
- Tokyo Electron Limited
- Kazuyuki Mitsuoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and storage medium
- Patent number 10,096,462
- Issue date Oct 9, 2018
- TOSHIBA MEMORY CORPORATION
- Hidekazu Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method, fluid...
- Patent number 10,046,370
- Issue date Aug 14, 2018
- Tokyo Electron Limited
- Gentaro Goshi
- B08 - CLEANING
Information Patent Grant
Substrate processing method, substrate processing apparatus, and st...
- Patent number 9,881,784
- Issue date Jan 30, 2018
- Tokyo Electron Limited
- Hiroki Ohno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method, fluid...
- Patent number 9,662,685
- Issue date May 30, 2017
- Tokyo Electron Limited
- Gentaro Goshi
- B08 - CLEANING
Information Patent Grant
Supercritical drying method for semiconductor substrate and supercr...
- Patent number 9,583,330
- Issue date Feb 28, 2017
- Tokyo Electron Limited
- Linan Ji
- F26 - DRYING
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 8,794,250
- Issue date Aug 5, 2014
- Tokyo Electron Limited
- Takehiko Orii
- F26 - DRYING
Information Patent Grant
Supercritical drying method for semiconductor substrate and supercr...
- Patent number 8,771,429
- Issue date Jul 8, 2014
- Kabushiki Kaisha Toshiba
- Linan Ji
- F26 - DRYING
Information Patent Grant
Liquid processing method, liquid processing apparatus and storage m...
- Patent number 8,747,689
- Issue date Jun 10, 2014
- Tokyo Electron Limited
- Hiroki Ohno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Supercritical drying method and apparatus for semiconductor substrates
- Patent number 8,372,212
- Issue date Feb 12, 2013
- Kabushiki Kaisha Toshiba
- Yohei Sato
- F26 - DRYING
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 8,337,659
- Issue date Dec 25, 2012
- Tokyo Electron Limited
- Takehiko Orii
- F26 - DRYING
Information Patent Grant
Substrate cleaning method, substrate cleaning apparatus, control pr...
- Patent number 8,197,606
- Issue date Jun 12, 2012
- Tokyo Electron Limited
- Tsukasa Watanabe
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate cleaning method and computer readable storage medium
- Patent number 8,147,617
- Issue date Apr 3, 2012
- Tokyo Electron Limited
- Kenji Sekiguchi
- B08 - CLEANING
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 8,137,478
- Issue date Mar 20, 2012
- Tokyo Electron Limited
- Kenji Sekiguchi
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 8,056,257
- Issue date Nov 15, 2011
- Tokyo Electron Limited
- Hiroki Ohno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Noncontact IC label and method and apparatus for manufacturing the...
- Patent number 8,042,742
- Issue date Oct 25, 2011
- Toppan Forms Co., Ltd.
- Hitoshi Kagaya
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Substrate cleaning method, substrate cleaning equipment, computer p...
- Patent number 7,837,804
- Issue date Nov 23, 2010
- Tokyo Electron Limited
- Hiroki Ohno
- B08 - CLEANING
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 7,806,989
- Issue date Oct 5, 2010
- Tokyo Electron Limited
- Kenji Sekiguchi
- B08 - CLEANING
Information Patent Grant
Substrate cleaning apparatus, substrate cleaning method, and medium...
- Patent number 7,803,230
- Issue date Sep 28, 2010
- Tokyo Electron Limited
- Masaru Amai
- B08 - CLEANING
Information Patent Grant
Ozone processing apparatus and ozone processing method
- Patent number 7,767,006
- Issue date Aug 3, 2010
- Tokyo Electron Limited
- Yoshichika Tokuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of removing polymer and apparatus for doing the same
- Patent number 7,064,079
- Issue date Jun 20, 2006
- NEC Electronics Corporation
- Hiroyuki Sonoda
- B08 - CLEANING
Information Patent Grant
Processing apparatus and processing method
- Patent number 6,895,979
- Issue date May 24, 2005
- Tokyo Electron Limited
- Kyouji Kohama
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...
- Publication number 20190148183
- Publication date May 16, 2019
- TOKYO ELECTRON LIMITED
- Takao Inada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND REC...
- Publication number 20190122905
- Publication date Apr 25, 2019
- TOKYO ELECTRON LIMITED
- Hiroki Ohno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND REC...
- Publication number 20190096710
- Publication date Mar 28, 2019
- TOKYO ELECTRON LIMITED
- Hideaki Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20190096711
- Publication date Mar 28, 2019
- TOKYO ELECTRON LIMITED
- Hiroki Ohno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20180254200
- Publication date Sep 6, 2018
- TOKYO ELECTRON LIMITED
- Yosuke Kawabuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CLEANING SUBSTRATE PROCESSING APPARATUS AND SYSTEM OF CLE...
- Publication number 20180158699
- Publication date Jun 7, 2018
- TOKYO ELECTRON LIMITED
- Shotaro Kitayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...
- Publication number 20180138058
- Publication date May 17, 2018
- TOKYO ELECTRON LIMITED
- Keisuke Egashira
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...
- Publication number 20180138035
- Publication date May 17, 2018
- TOKYO ELECTRON LIMITED
- Hiroki Ohno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND RE...
- Publication number 20180130675
- Publication date May 10, 2018
- TOKYO ELECTRON LIMITED
- Gentaro Goshi
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, FLUID...
- Publication number 20170320107
- Publication date Nov 9, 2017
- TOKYO ELECTRON LIMITED
- Gentaro GOSHI
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND ST...
- Publication number 20170011907
- Publication date Jan 12, 2017
- TOKYO ELECTRON LIMITED
- Kazuyuki Mitsuoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND ST...
- Publication number 20160118242
- Publication date Apr 28, 2016
- TOKYO ELECTRON LIMITED
- Hiroki Ohno
- B08 - CLEANING
Information Patent Application
SEPARATION AND REGENERATION APPARATUS AND SUBSTRATE PROCESSING APPA...
- Publication number 20150258466
- Publication date Sep 17, 2015
- TOKYO ELECTRON LIMITED
- Kazuyuki Mitsuoka
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
SEPARATION AND REGENERATION APPARATUS AND SUBSTRATE PROCESSING APPA...
- Publication number 20150258465
- Publication date Sep 17, 2015
- TOKYO ELECTRON LIMITED
- Kazuyuki Mitsuoka
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
SEPARATION AND REGENERATION APPARATUS AND SUBSTRATE PROCESSING APPA...
- Publication number 20150258584
- Publication date Sep 17, 2015
- TOKYO ELECTRON LIMITED
- Kazuyuki Mitsuoka
- B08 - CLEANING
Information Patent Application
SUPERCRITICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE AND SUPERCR...
- Publication number 20140250714
- Publication date Sep 11, 2014
- Kabushiki Kaisha Toshiba
- Linan JI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-PRESSURE CONTAINER, SUBSTRATE PROCESSING APPARATUS, AND METHOD...
- Publication number 20140145390
- Publication date May 29, 2014
- TOKYO ELECTRON LIMITED
- Kazuyuki Mitsuoka
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND STO...
- Publication number 20140020721
- Publication date Jan 23, 2014
- Hidekazu HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, FLUID...
- Publication number 20130333726
- Publication date Dec 19, 2013
- Gentaro GOSHI
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20130145643
- Publication date Jun 13, 2013
- TOKYO ELECTRON LIMITED
- Takehiko ORII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPERCRITICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE AND SUPERCR...
- Publication number 20130019905
- Publication date Jan 24, 2013
- Linan JI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND ST...
- Publication number 20120304485
- Publication date Dec 6, 2012
- TOKYO ELECTRON LIMITED
- Hidekazu Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPERCRITICAL DRYING METHOD AND APPARATUS FOR SEMICONDUCTOR SUBSTRATES
- Publication number 20120247516
- Publication date Oct 4, 2012
- Yohei SATO
- F26 - DRYING
Information Patent Application
LIQUID PROCESSING METHOD, LIQUID PROCESSING APPARATUS AND STORAGE M...
- Publication number 20120187088
- Publication date Jul 26, 2012
- TOKYO ELECTRON LIMITED
- Hiroki Ohno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20100307543
- Publication date Dec 9, 2010
- TOKYO ELECTRON LIMITED
- Kenji SEKIGUCHI
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING APPARATUS, CONTROL PR...
- Publication number 20100206329
- Publication date Aug 19, 2010
- TOKYO ELECTRON LIMITED
- Tsukasa WATANABE
- B24 - GRINDING POLISHING
Information Patent Application
Substrate Cleaning Method, Substrate Cleaning Equipment, Computer P...
- Publication number 20080251101
- Publication date Oct 16, 2008
- Hiroki Ohno
- B08 - CLEANING
Information Patent Application
Substrate processing apparatus and substrate processing method
- Publication number 20080127508
- Publication date Jun 5, 2008
- Hiroki Ohno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Noncontact Ic Label and Method and Apparatus for Manufacturing the...
- Publication number 20080042266
- Publication date Feb 21, 2008
- TOPPAN FORMS CO., LTD.
- Hitoshi Kagaya
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Substrate Cleaning Method and Computer Readable Storage Medium
- Publication number 20080041420
- Publication date Feb 21, 2008
- Kenji Sekiguchi
- B08 - CLEANING

Hiroki Ohno

Person

Patents Grantslast 30 patents

Method of cleaning substrate processing apparatus and system of cle...

Substrate processing apparatus, substrate processing method, and st...

Substrate processing apparatus

Substrate processing apparatus, substrate processing method and rec...

Substrate processing apparatus, substrate processing method, and st...

Substrate processing apparatus, substrate processing method, and re...

High-pressure container, substrate processing apparatus, and method...

Substrate processing method, substrate processing apparatus, and st...

Separation and regeneration apparatus and substrate processing appa...

Substrate processing method and storage medium

Substrate processing apparatus, substrate processing method, fluid...

Substrate processing method, substrate processing apparatus, and st...

Substrate processing apparatus, substrate processing method, fluid...

Supercritical drying method for semiconductor substrate and supercr...

Substrate processing method and substrate processing apparatus

Supercritical drying method for semiconductor substrate and supercr...

Liquid processing method, liquid processing apparatus and storage m...

Supercritical drying method and apparatus for semiconductor substrates

Substrate processing method and substrate processing apparatus

Substrate cleaning method, substrate cleaning apparatus, control pr...

Substrate cleaning method and computer readable storage medium

Substrate processing method and substrate processing apparatus

Substrate processing apparatus and substrate processing method

Noncontact IC label and method and apparatus for manufacturing the...

Substrate cleaning method, substrate cleaning equipment, computer p...

Substrate processing method and substrate processing apparatus

Substrate cleaning apparatus, substrate cleaning method, and medium...

Ozone processing apparatus and ozone processing method

Method of removing polymer and apparatus for doing the same

Processing apparatus and processing method

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND REC...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND REC...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS

METHOD OF CLEANING SUBSTRATE PROCESSING APPARATUS AND SYSTEM OF CLE...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND RE...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, FLUID...

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND ST...

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND ST...

SEPARATION AND REGENERATION APPARATUS AND SUBSTRATE PROCESSING APPA...

SEPARATION AND REGENERATION APPARATUS AND SUBSTRATE PROCESSING APPA...

SEPARATION AND REGENERATION APPARATUS AND SUBSTRATE PROCESSING APPA...

SUPERCRITICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE AND SUPERCR...

HIGH-PRESSURE CONTAINER, SUBSTRATE PROCESSING APPARATUS, AND METHOD...

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND STO...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, FLUID...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUPERCRITICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE AND SUPERCR...

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND ST...

SUPERCRITICAL DRYING METHOD AND APPARATUS FOR SEMICONDUCTOR SUBSTRATES

LIQUID PROCESSING METHOD, LIQUID PROCESSING APPARATUS AND STORAGE M...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING APPARATUS, CONTROL PR...

Substrate Cleaning Method, Substrate Cleaning Equipment, Computer P...

Substrate processing apparatus and substrate processing method

Noncontact Ic Label and Method and Apparatus for Manufacturing the...

Substrate Cleaning Method and Computer Readable Storage Medium