Hiroki Sasano

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Shallow trench isolation etch process
- Patent number 8,133,817
- Issue date Mar 13, 2012
- Applied Materials, Inc.
- Hiroki Sasano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for controlling etch processes during fabricat...
- Patent number 7,498,106
- Issue date Mar 3, 2009
- Applied Materials, Inc.
- David S L Mui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chamber stability monitoring using an integrated metrology tool
- Patent number 7,482,178
- Issue date Jan 27, 2009
- Applied Materials, Inc.
- David S. L. Mui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for controlling a calibration cycle or a metro...
- Patent number 7,262,865
- Issue date Aug 28, 2007
- Applied Materials, Inc.
- David Mui
- G01 - MEASURING TESTING
Information Patent Grant
Method for controlling accuracy and repeatability of an etch process
- Patent number 7,094,613
- Issue date Aug 22, 2006
- Applied Materials, Inc.
- David Mui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for controlling etch processes during fabricat...
- Patent number 6,960,416
- Issue date Nov 1, 2005
- Applied Materials, Inc.
- David S L Mui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for realtime CD microloading control
- Patent number 6,924,088
- Issue date Aug 2, 2005
- Applied Materials, Inc.
- David S. L. Mui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methodology for repeatable post etch CD in a production tool
- Patent number 6,858,361
- Issue date Feb 22, 2005
- David S. L. Mui
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SHALLOW TRENCH ISOLATION ETCH PROCESS
- Publication number 20090170333
- Publication date Jul 2, 2009
- APPLIED MATERIALS, INC.
- Hiroki Sasano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR TUNABLE ISOTROPIC RECESS ETCHING OF SILICO...
- Publication number 20090032880
- Publication date Feb 5, 2009
- APPLIED MATERIALS, INC.
- Mark Naoshi Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for controlling etch processes during fabricat...
- Publication number 20060091108
- Publication date May 4, 2006
- APPLIED MATERIALS, INC.
- David S L Mui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for controlling a calibration cycle or a metro...
- Publication number 20050190381
- Publication date Sep 1, 2005
- APPLIED MATERIALS, INC.
- David Mui
- G01 - MEASURING TESTING
Information Patent Application
Method for controlling accuracy and repeatability of an etch process
- Publication number 20050085090
- Publication date Apr 21, 2005
- APPLIED MATERIALS, INC.
- David Mui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for controlling critical dimensions during an etch process
- Publication number 20050064714
- Publication date Mar 24, 2005
- APPLIED MATERIALS, INC.
- David Mui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chamber stability monitoring using an integrated metrology tool
- Publication number 20050032250
- Publication date Feb 10, 2005
- APPLIED MATERIALS, INC.
- David S.L. Mui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for realtime CD microloading control
- Publication number 20040038139
- Publication date Feb 26, 2004
- David S.L. Mui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for controlling etch processes during fabricat...
- Publication number 20030228532
- Publication date Dec 11, 2003
- APPLIED MATERIALS, INC.
- David S.L. Mui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methodology for repeatable post etch CD in a production tool
- Publication number 20030165755
- Publication date Sep 4, 2003
- APPLIED MATERIALS, INC.
- David S.L. Mui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hiroki Sasano

Person

Patents Grantslast 30 patents

Shallow trench isolation etch process

Method and apparatus for controlling etch processes during fabricat...

Chamber stability monitoring using an integrated metrology tool

Method and apparatus for controlling a calibration cycle or a metro...

Method for controlling accuracy and repeatability of an etch process

Method and apparatus for controlling etch processes during fabricat...

Method and system for realtime CD microloading control

Methodology for repeatable post etch CD in a production tool

Patents Applicationslast 30 patents

SHALLOW TRENCH ISOLATION ETCH PROCESS

METHOD AND APPARATUS FOR TUNABLE ISOTROPIC RECESS ETCHING OF SILICO...

Method and apparatus for controlling etch processes during fabricat...

Method and apparatus for controlling a calibration cycle or a metro...

Method for controlling accuracy and repeatability of an etch process

Method for controlling critical dimensions during an etch process

Chamber stability monitoring using an integrated metrology tool

Method and system for realtime CD microloading control

Method and apparatus for controlling etch processes during fabricat...

Methodology for repeatable post etch CD in a production tool