Hiromichi Enami

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing system and apparatus and a sample processing method
- Patent number 7,686,917
- Issue date Mar 30, 2010
- Hitachi, Ltd.
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Grant
Device and method for detecting foreign material on the surface of...
- Patent number 7,526,948
- Issue date May 5, 2009
- Hitachi High-Technologies Corporation
- Hideyuki Yamamoto
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing system and apparatus and a sample processing method
- Patent number 7,169,254
- Issue date Jan 30, 2007
- Hitachi, Ltd.
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing system and apparatus and a sample processing method
- Patent number 6,923,885
- Issue date Aug 2, 2005
- Hitachi, Ltd.
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Grant
Semiconductor integrated circuit device, process for fabricating th...
- Patent number 6,894,334
- Issue date May 17, 2005
- Hitachi, Ltd.
- Jun Sugiura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system and apparatus and a sample processing method
- Patent number 6,755,932
- Issue date Jun 29, 2004
- Hitachi, Ltd.
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Grant
Control apparatus for plasma utilizing equipment
- Patent number 6,754,552
- Issue date Jun 22, 2004
- Hitachi, Ltd.
- Masaharu Nishiumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE HAVING A FIRST WIRING STRIP...
- Patent number 6,548,847
- Issue date Apr 15, 2003
- Hitachi, Ltd.
- Jun Sugiura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor integrated circuit device, process for fabricating th...
- Patent number 6,342,412
- Issue date Jan 29, 2002
- Hitachi, Ltd.
- Jun Sugiura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor integrated circuit device, process for fabricating th...
- Patent number 6,169,324
- Issue date Jan 2, 2001
- Hitachi, Ltd.
- Jun Sugiura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor integrated circuit device, process for fabricating th...
- Patent number 6,127,255
- Issue date Oct 3, 2000
- Hitachi, Ltd.
- Jun Sugiura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor integrated circuit, method of fabricating the same an...
- Patent number 5,917,211
- Issue date Jun 29, 1999
- Hitachi, Ltd.
- Jun Murata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming teos oxide and silicon nitride passivation layer...
- Patent number 5,811,316
- Issue date Sep 22, 1998
- Hitachi Ltd.
- Jun Sugiura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor integrated circuit device, process for fabricating th...
- Patent number 5,780,882
- Issue date Jul 14, 1998
- Hitachi, Ltd.
- Jun Sugiura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor integrated circuit device process for fabricating the...
- Patent number 5,739,589
- Issue date Apr 14, 1998
- Hitachi, Ltd.
- Jun Sugiura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor integrated circuit, method of fabricating the same an...
- Patent number 5,734,188
- Issue date Mar 31, 1998
- Hitachi, Ltd.
- Jun Murata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generator with mode restricting means
- Patent number 5,646,489
- Issue date Jul 8, 1997
- Hitachi, Ltd.
- Yutaka Kakehi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor integrated circuit device, process for fabricating th...
- Patent number 5,557,147
- Issue date Sep 17, 1996
- Hitachi, Ltd.
- Jun Sugiura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Removing damage caused by plasma etching and high energy implantati...
- Patent number 5,543,336
- Issue date Aug 6, 1996
- Hitachi, Ltd.
- Hiromichi Enami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for generating plasma, and semiconductor proc...
- Patent number 5,433,789
- Issue date Jul 18, 1995
- Hitachi, Ltd.
- Yutaka Kakehi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and equipment for plasma processing
- Patent number 5,401,356
- Issue date Mar 28, 1995
- Hitachi, Ltd.
- Hiromichi Enami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching method and etching apparatus therefor
- Patent number 5,352,324
- Issue date Oct 4, 1994
- Hitachi, Ltd.
- Yasushi Gotoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor integrated circuit device, process for fabricating th...
- Patent number 5,331,191
- Issue date Jul 19, 1994
- Hitachi, Ltd.
- Jun Sugiura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor integrated circuit, method of fabricating the same an...
- Patent number 5,264,712
- Issue date Nov 23, 1993
- Hitachi, Ltd.
- Jun Murata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor integrated circuit device, process for fabricating th...
- Patent number 5,202,275
- Issue date Apr 13, 1993
- Hitachi Ltd.
- Jun Sugiura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor integrated circuit with dummy pedestals
- Patent number 4,949,162
- Issue date Aug 14, 1990
- Hitachi, Ltd.
- Yoichi Tamaki
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Plasma Processing Method
- Publication number 20100297783
- Publication date Nov 25, 2010
- Shoji Ikuhara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus
- Publication number 20100132888
- Publication date Jun 3, 2010
- Shoji Ikuhara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing System And Apparatus And A Sample Processing Method
- Publication number 20080011422
- Publication date Jan 17, 2008
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Application
Device and method for detecting foreign material on the surface of...
- Publication number 20070032088
- Publication date Feb 8, 2007
- Hideyuki Yamamoto
- G01 - MEASURING TESTING
Information Patent Application
Plasma processing apparatus
- Publication number 20060260746
- Publication date Nov 23, 2006
- Shoji Ikuhara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing system and apparatus and a sample processing method
- Publication number 20040177925
- Publication date Sep 16, 2004
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Application
Plasma processing system and apparatus and a sample processing method
- Publication number 20040118517
- Publication date Jun 24, 2004
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Application
Plasma processing system and apparatus and a sample processing method
- Publication number 20040118518
- Publication date Jun 24, 2004
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Application
Semiconductor integrated circuit device, process for fabricating th...
- Publication number 20030189255
- Publication date Oct 9, 2003
- Jun Sugiura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Control apparatus for plasma utilizing equipment
- Publication number 20020052668
- Publication date May 2, 2002
- Masaharu Nishiumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor integrated circuit device, process for fabricating th...
- Publication number 20020017669
- Publication date Feb 14, 2002
- Jun Sugiura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing system and apparatus and a sample processing method
- Publication number 20010015175
- Publication date Aug 23, 2001
- Toshio Masuda
- G01 - MEASURING TESTING

Hiromichi Enami

Person

Patents Grantslast 30 patents

Plasma processing system and apparatus and a sample processing method

Device and method for detecting foreign material on the surface of...

Plasma processing system and apparatus and a sample processing method

Plasma processing system and apparatus and a sample processing method

Semiconductor integrated circuit device, process for fabricating th...

Plasma processing system and apparatus and a sample processing method

Control apparatus for plasma utilizing equipment

SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE HAVING A FIRST WIRING STRIP...

Semiconductor integrated circuit device, process for fabricating th...

Semiconductor integrated circuit device, process for fabricating th...

Semiconductor integrated circuit device, process for fabricating th...

Semiconductor integrated circuit, method of fabricating the same an...

Method of forming teos oxide and silicon nitride passivation layer...

Semiconductor integrated circuit device, process for fabricating th...

Semiconductor integrated circuit device process for fabricating the...

Semiconductor integrated circuit, method of fabricating the same an...

Plasma generator with mode restricting means

Semiconductor integrated circuit device, process for fabricating th...

Removing damage caused by plasma etching and high energy implantati...

Methods and apparatus for generating plasma, and semiconductor proc...

Method and equipment for plasma processing

Etching method and etching apparatus therefor

Semiconductor integrated circuit device, process for fabricating th...

Semiconductor integrated circuit, method of fabricating the same an...

Semiconductor integrated circuit device, process for fabricating th...

Semiconductor integrated circuit with dummy pedestals

Patents Applicationslast 30 patents

Plasma Processing Method

Plasma Processing Apparatus

Plasma Processing System And Apparatus And A Sample Processing Method

Device and method for detecting foreign material on the surface of...

Plasma processing apparatus

Plasma processing system and apparatus and a sample processing method

Plasma processing system and apparatus and a sample processing method

Plasma processing system and apparatus and a sample processing method

Semiconductor integrated circuit device, process for fabricating th...

Control apparatus for plasma utilizing equipment

Semiconductor integrated circuit device, process for fabricating th...

Plasma processing system and apparatus and a sample processing method