Horatio S. Wildman

Person

Wappingers Falls, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and process for forming a self-aligned silicide contact
- Patent number 8,101,518
- Issue date Jan 24, 2012
- International Business Machines Corporation
- Cyril Cabral, Jr.
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure and method of mapping signal intensity to surface voltage...
- Patent number 7,772,866
- Issue date Aug 10, 2010
- International Business Machines Corporation
- Oliver D. Patterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and process for forming a self-aligned silicide contact
- Patent number 7,544,610
- Issue date Jun 9, 2009
- International Business Machines Corporation
- Cyril Cabral, Jr.
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Buried short location determination using voltage contrast inspection
- Patent number 7,474,107
- Issue date Jan 6, 2009
- International Business Machines Corporation
- Oliver D. Patterson
- G01 - MEASURING TESTING
Information Patent Grant
Diffusion barrier layer and semiconductor device containing same
- Patent number 6,784,485
- Issue date Aug 31, 2004
- International Business Machines Corporation
- Stephan Alan Cohen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laminated diffusion barrier
- Patent number 6,726,996
- Issue date Apr 27, 2004
- International Business Machines Corporation
- Edward Paul Barth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming Co-W-P-Au films
- Patent number 6,646,345
- Issue date Nov 11, 2003
- International Business Machines Corporation
- Carlos Juan Sambucetti
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for manufacturing a contact barrier
- Patent number 6,509,265
- Issue date Jan 21, 2003
- International Business Machines Corporation
- Patrick W. DeHaven
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flat interface for a metal-silicon contract barrier film
- Patent number 6,417,567
- Issue date Jul 9, 2002
- International Business Machines Corporation
- Anthony G. Domenicucci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a solute-enriched layer in a substrate surface an...
- Patent number 6,413,866
- Issue date Jul 2, 2002
- International Business Machines Corporation
- Horatio S. Wildman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capping layer for improved silicide formation in narrow semiconduct...
- Patent number 6,388,327
- Issue date May 14, 2002
- International Business Machines Corporation
- Kenneth J. Giewont
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Capacitor stack structure and method of fabricating description
- Patent number 6,339,007
- Issue date Jan 15, 2002
- International Business Machines Corporation
- Yun-Yu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming Co-W-P-Au films
- Patent number 6,323,128
- Issue date Nov 27, 2001
- International Business Machines Corporation
- Carlos Juan Sambucetti
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for manufacturing a contact barrier
- Patent number 6,180,521
- Issue date Jan 30, 2001
- International Business Machines Corporation
- Patrick W. DeHaven
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flat interface for a metal-silicon contact barrier film
- Patent number 6,124,639
- Issue date Sep 26, 2000
- International Business Machines Corporation
- Anthony G. Domenicucci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of argon sputtering to modify surface properties by thin film d...
- Patent number 6,068,923
- Issue date May 30, 2000
- International Business Machines Corporation
- Thomas E. Dinan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming an atomically flat interface for a highly disord...
- Patent number 6,022,801
- Issue date Feb 8, 2000
- International Business Machines Corporation
- Anthony G. Domenicucci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of argon sputtering to modify surface properties by thin film d...
- Patent number 5,956,573
- Issue date Sep 21, 1999
- International Business Machines Corporation
- Thomas E. Dinan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of metal silicide formation in integrated circuit devices
- Patent number 5,401,677
- Issue date Mar 28, 1995
- International Business Machines Corporation
- Robert D. Bailey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND PROCESS FOR FORMING A SELF-ALIGNED SILICIDE CONTACT
- Publication number 20080274611
- Publication date Nov 6, 2008
- International Business Machines Corporation
- Cyril Cabral
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE AND METHOD OF MAPPING SIGNAL INTENSITY TO SURFACE VOLTAGE...
- Publication number 20080217612
- Publication date Sep 11, 2008
- International Business Machines Corporation
- Oliver D. Patterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BURIED SHORT LOCATION DETERMINATION USING VOLTAGE CONTRAST INSPECTION
- Publication number 20070222470
- Publication date Sep 27, 2007
- International Business Machines Corporation
- Oliver D. Patterson
- G01 - MEASURING TESTING
Information Patent Application
ELECTROLESS COBALT-CONTAINING LINER FOR MIDDLE-OF-THE-LINE (MOL) AP...
- Publication number 20070210448
- Publication date Sep 13, 2007
- International Business Machines Corporation
- Keith Kwong Hon Wong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS TO FORM HETEROGENEOUS SILICIDES/GERMANIDES IN CMOS TECHNOLOGY
- Publication number 20070123042
- Publication date May 31, 2007
- International Business Machines Corporation
- Kern Rim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and process for forming a self-aligned silicide contact
- Publication number 20060051961
- Publication date Mar 9, 2006
- International Business Machines Corporation
- Cyril Cabral
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A LOW THERMAL BUDGET (MOL) LINER, A SEMICONDUCTOR DEVICE COMPRISING...
- Publication number 20050221612
- Publication date Oct 6, 2005
- International Business Machines Corporation
- Laura Brown
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for removing backside edge polymer
- Publication number 20040137745
- Publication date Jul 15, 2004
- International Business Machines Corporation
- Thomas F. Houghton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method for forming uniformly thick anodized films on...
- Publication number 20040077140
- Publication date Apr 22, 2004
- Panayotis C. Andricacos
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Method for producing a flat interface for a metal-silicon contact b...
- Publication number 20020180046
- Publication date Dec 5, 2002
- International Business Machines Corporation
- Yun-Yu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Laminated diffusion barrier
- Publication number 20020172811
- Publication date Nov 21, 2002
- International Business Machines Corporation
- Edward Paul Barth
- B32 - LAYERED PRODUCTS
Information Patent Application
Method for forming Co-W-P-Au films
- Publication number 20020123220
- Publication date Sep 5, 2002
- International Business Machines Corporation
- Carlos Juan Sambucetti
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Horatio S. Wildman

Person

Patents Grantslast 30 patents

Method and process for forming a self-aligned silicide contact

Structure and method of mapping signal intensity to surface voltage...

Method and process for forming a self-aligned silicide contact

Buried short location determination using voltage contrast inspection

Diffusion barrier layer and semiconductor device containing same

Laminated diffusion barrier

Method for forming Co-W-P-Au films

Process for manufacturing a contact barrier

Flat interface for a metal-silicon contract barrier film

Method of forming a solute-enriched layer in a substrate surface an...

Capping layer for improved silicide formation in narrow semiconduct...

Capacitor stack structure and method of fabricating description

Method for forming Co-W-P-Au films

Process for manufacturing a contact barrier

Flat interface for a metal-silicon contact barrier film

Use of argon sputtering to modify surface properties by thin film d...

Method for forming an atomically flat interface for a highly disord...

Use of argon sputtering to modify surface properties by thin film d...

Method of metal silicide formation in integrated circuit devices

Patents Applicationslast 30 patents

METHOD AND PROCESS FOR FORMING A SELF-ALIGNED SILICIDE CONTACT

STRUCTURE AND METHOD OF MAPPING SIGNAL INTENSITY TO SURFACE VOLTAGE...

BURIED SHORT LOCATION DETERMINATION USING VOLTAGE CONTRAST INSPECTION

ELECTROLESS COBALT-CONTAINING LINER FOR MIDDLE-OF-THE-LINE (MOL) AP...

METHODS TO FORM HETEROGENEOUS SILICIDES/GERMANIDES IN CMOS TECHNOLOGY

Method and process for forming a self-aligned silicide contact

A LOW THERMAL BUDGET (MOL) LINER, A SEMICONDUCTOR DEVICE COMPRISING...

Method and apparatus for removing backside edge polymer

Apparatus and method for forming uniformly thick anodized films on...

Method for producing a flat interface for a metal-silicon contact b...

Laminated diffusion barrier

Method for forming Co-W-P-Au films