Horst Roeschert

Person

Biebelried, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Process for producing oxymethylene polymers
- Patent number 8,993,709
- Issue date Mar 31, 2015
- Ticona GmbH
- Michael Hoffmockel
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Oxymethylene polymers, process for the preparation thereof and use...
- Patent number 8,742,065
- Issue date Jun 3, 2014
- Ticona GmbH
- Michael Haubs
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Oxymethylene polymers, process for the preparation thereof and use...
- Patent number 8,188,211
- Issue date May 29, 2012
- Ticona GmbH
- Michael Haubs
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative-working radiation-sensitive mixture, and radiation-sensiti...
- Patent number 6,063,545
- Issue date May 16, 2000
- Clariant GmbH
- Horst Roeschert
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive-working radiation-sensitive mixture and recording material...
- Patent number 5,736,297
- Issue date Apr 7, 1998
- Clariant GmbH
- Horst Roeschert
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonic acid esters, radiation-sensitive mixtures prepared therewi...
- Patent number 5,716,756
- Issue date Feb 10, 1998
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive-acting radiation-sensitive mixture and recording material...
- Patent number 5,498,506
- Issue date Mar 12, 1996
- Hoechst Aktiengesellschaft
- Horst Wengenroth
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive sulfonic acid esters and their use
- Patent number 5,442,061
- Issue date Aug 15, 1995
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Negative-working radiation-sensitive mixture containing diazomethan...
- Patent number 5,424,166
- Issue date Jun 13, 1995
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working radiation-sensitive mixture and radiation-sensitiv...
- Patent number 5,401,608
- Issue date Mar 28, 1995
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Postive-working radiation-sensitive mixture and radiation-sensitive...
- Patent number 5,364,734
- Issue date Nov 15, 1994
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acid-cleavable radiation-sensitive compounds, radiation-sensitive m...
- Patent number 5,346,806
- Issue date Sep 13, 1994
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Acid-cleavable radiation-sensitive compounds, positive working radi...
- Patent number 5,346,804
- Issue date Sep 13, 1994
- Hoechst Aktiengesellschaft
- Geog Pawlowski
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive-working radiation-sensitive mixture and copying material p...
- Patent number 5,340,682
- Issue date Aug 23, 1994
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working radiation-sensitive mixture and copying material p...
- Patent number 5,338,641
- Issue date Aug 16, 1994
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive mixture with a polymeric binder containing unit...
- Patent number 5,328,973
- Issue date Jul 12, 1994
- Hoechst Aktiengesellschaft
- Horst Roeschert
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive polymers containing diazocarbonyl groups and a...
- Patent number 5,326,826
- Issue date Jul 5, 1994
- Hoechst Aktiengesellschaft
- Horst Roeschert
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive mixture containing novel polymers embodying uni...
- Patent number 5,326,840
- Issue date Jul 5, 1994
- Hoechst Aktiengesellschaft
- Klaus-Juergen Przybilla
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive-working radiation sensitive mixture comprising sulfonic ac...
- Patent number 5,314,786
- Issue date May 24, 1994
- Hoechst Aktiengesellschaft
- Horst Roeschert
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive polymers containing naphthoquinone-2-diazide-4-...
- Patent number 5,302,488
- Issue date Apr 12, 1994
- Hoechst Aktiengesellschaft
- Horst Roeschert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive sulfonic acid esters and their use
- Patent number 5,298,364
- Issue date Mar 29, 1994
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Acid-cleavable compounds, positive-working radiation-sensitive mixt...
- Patent number 5,286,602
- Issue date Feb 15, 1994
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive-working radiation-sensitive mixture and recording material...
- Patent number 5,256,517
- Issue date Oct 26, 1993
- Hoechst Aktiengesellschaft
- Horst Roeschert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for preparing N-tert-butoxycarbonylmaleimide
- Patent number 5,247,096
- Issue date Sep 21, 1993
- Hoechst Aktiengesellschaft
- Horst Roeschert
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Negative-working radiation-sensitive mixture, and radiation-sensiti...
- Patent number 5,227,276
- Issue date Jul 13, 1993
- Hoechst Aktiengesellschaft
- Horst Roeschert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polyfunctional compounds containing .alpha.-diazo-.beta.-keto ester...
- Patent number 5,191,069
- Issue date Mar 2, 1993
- Hoechst Aktiengesellschaft
- Horst Roeschert
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
Process for Producing Oxymethylene Polymers
- Publication number 20130018170
- Publication date Jan 17, 2013
- Ticona LLC
- Michael Hoffmockel
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Oxymethylene Polymers, Process for the Preparation Thereof and Use...
- Publication number 20120232246
- Publication date Sep 13, 2012
- TICONA GMBH
- Michael Haubs
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Oxymethylene Polymers, Process for the Preparation Thereof and Use...
- Publication number 20090270587
- Publication date Oct 29, 2009
- Michael Haubs
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Horst Roeschert

Person

Patents Grantslast 30 patents

Process for producing oxymethylene polymers

Oxymethylene polymers, process for the preparation thereof and use...

Oxymethylene polymers, process for the preparation thereof and use...

Negative-working radiation-sensitive mixture, and radiation-sensiti...

Positive-working radiation-sensitive mixture and recording material...

Sulfonic acid esters, radiation-sensitive mixtures prepared therewi...

Positive-acting radiation-sensitive mixture and recording material...

Radiation-sensitive sulfonic acid esters and their use

Negative-working radiation-sensitive mixture containing diazomethan...

Negative-working radiation-sensitive mixture and radiation-sensitiv...

Postive-working radiation-sensitive mixture and radiation-sensitive...

Acid-cleavable radiation-sensitive compounds, radiation-sensitive m...

Acid-cleavable radiation-sensitive compounds, positive working radi...

Positive-working radiation-sensitive mixture and copying material p...

Positive-working radiation-sensitive mixture and copying material p...

Radiation-sensitive mixture with a polymeric binder containing unit...

Radiation-sensitive polymers containing diazocarbonyl groups and a...

Radiation-sensitive mixture containing novel polymers embodying uni...

Positive-working radiation sensitive mixture comprising sulfonic ac...

Radiation-sensitive polymers containing naphthoquinone-2-diazide-4-...

Radiation-sensitive sulfonic acid esters and their use

Acid-cleavable compounds, positive-working radiation-sensitive mixt...

Positive-working radiation-sensitive mixture and recording material...

Process for preparing N-tert-butoxycarbonylmaleimide

Negative-working radiation-sensitive mixture, and radiation-sensiti...

Polyfunctional compounds containing .alpha.-diazo-.beta.-keto ester...

Patents Applicationslast 30 patents

Process for Producing Oxymethylene Polymers

Oxymethylene Polymers, Process for the Preparation Thereof and Use...

Oxymethylene Polymers, Process for the Preparation Thereof and Use...