Imad Yousif

Person

People

Patents Grantslast 30 patents

Information Patent Grant
Wafer edge ring lifting solution
- Patent number 12,094,752
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Michael R. Rice
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas hub for plasma reactor
- Patent number 11,728,141
- Issue date Aug 15, 2023
- Applied Materials, Inc.
- Yan Rozenzon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for substrate transfer and radical confinement
- Patent number 11,574,831
- Issue date Feb 7, 2023
- Applied Materials, Inc.
- Jared Ahmad Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer edge ring lifting solution
- Patent number 11,393,710
- Issue date Jul 19, 2022
- Applied Materials, Inc.
- Michael R. Rice
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with highly symmetrical four-fold gas injection
- Patent number 11,244,811
- Issue date Feb 8, 2022
- Applied Materials, Inc.
- Yan Rozenzon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Abatement and strip process chamber in a dual loadlock configuration
- Patent number 11,177,136
- Issue date Nov 16, 2021
- APPLIED MATERIALS, INC.
- Jared Ahmad Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Abatement and strip process chamber in a dual load lock configuration
- Patent number 11,171,008
- Issue date Nov 9, 2021
- Applied Materials, Inc.
- Jared Ahmad Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nozzle for multi-zone gas injection assembly
- Patent number 11,139,150
- Issue date Oct 5, 2021
- Applied Materials, Inc.
- Yan Rozenzon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process kit components for use with an extended and independent RF...
- Patent number 10,825,708
- Issue date Nov 3, 2020
- Applied Materials, Inc.
- Valentin Todorow
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Method and apparatus for substrate transfer and radical confinement
- Patent number 10,468,282
- Issue date Nov 5, 2019
- Applied Materials, Inc.
- Jared Ahmad Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Abatement and strip process chamber in a dual loadlock configuration
- Patent number 10,453,694
- Issue date Oct 22, 2019
- Applied Materials, Inc.
- Jared Ahmad Lee
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Side gas injection kit for multi-zone gas injection assembly
- Patent number 10,410,841
- Issue date Sep 10, 2019
- Applied Materials, Inc.
- Yan Rozenzon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thin heated substrate support
- Patent number 10,204,805
- Issue date Feb 12, 2019
- Applied Materials, Inc.
- Imad Yousif
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with highly symmetrical four-fold gas injection
- Patent number 10,163,606
- Issue date Dec 25, 2018
- Applied Materials, Inc.
- Yan Rozenzon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for substrate transfer and radical confinement
- Patent number 10,090,181
- Issue date Oct 2, 2018
- Applied Materials, Inc.
- Jared Ahmad Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-zone gas injection assembly with azimuthal and radial distrib...
- Patent number 10,008,368
- Issue date Jun 26, 2018
- Applied Materials, Inc.
- Yan Rozenzon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thermal management of edge ring in semiconductor processing
- Patent number 9,947,559
- Issue date Apr 17, 2018
- Applied Materials, Inc.
- Aniruddha Pal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for uniform pumping within a substrate process chamber
- Patent number 9,464,732
- Issue date Oct 11, 2016
- Applied Materials, Inc.
- Paul Benjamin Reuter
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Plasma reactor with tiltable overhead RF inductive source
- Patent number 9,330,887
- Issue date May 3, 2016
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extended and independent RF powered cathode substrate for extreme e...
- Patent number 8,988,848
- Issue date Mar 24, 2015
- Applied Materials, Inc.
- Valentin Todorow
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Upper liner
- Patent number D699692
- Issue date Feb 18, 2014
- Applied Materials, Inc.
- Imad Yousif
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Plasma reactor with tiltable overhead RF inductive source
- Patent number 8,414,736
- Issue date Apr 9, 2013
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for removing polymer from the wafer backside a...
- Patent number 8,329,593
- Issue date Dec 11, 2012
- Applied Materials, Inc.
- Imad Yousif
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic confinement of a plasma
- Patent number 8,092,605
- Issue date Jan 10, 2012
- Applied Materials, Inc.
- Steven C. Shannon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for wafer backside polymer removal and wafer front side pho...
- Patent number 7,967,996
- Issue date Jun 28, 2011
- Applied Materials, Inc.
- Kenneth S. Collins
- B08 - CLEANING
Information Patent Grant
Apparatus and method for front side protection during backside clea...
- Patent number 7,879,183
- Issue date Feb 1, 2011
- Applied Materials, Inc.
- Imad Yousif
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Process for wafer backside polymer removal with a ring of plasma un...
- Patent number 7,552,736
- Issue date Jun 30, 2009
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for optical detection of effluent composition
- Patent number 6,366,346
- Issue date Apr 2, 2002
- Applied Materials, Inc.
- Thomas Nowak
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and methods for controlling process chamber pressure
- Patent number 6,123,097
- Issue date Sep 26, 2000
- Applied Materials, Inc.
- Quoc Truong
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...

Patents Applicationslast 30 patents

Information Patent Application
Remote Plasma Source and Plasma Processing Chamber Having Same
- Publication number 20250006465
- Publication date Jan 2, 2025
- Yang YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER EDGE RING LIFTING SOLUTION
- Publication number 20240429088
- Publication date Dec 26, 2024
- Applied Materials, Inc.
- Michael R. RICE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMBER LID Temperature COOLING SYSTEM
- Publication number 20240363313
- Publication date Oct 31, 2024
- Applied Materials, Inc.
- Santosh S. NESARKAR
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REMOTE SURFACE WAVE PROPAGATION FOR SEMICONDUCTOR CHAMBERS
- Publication number 20230335376
- Publication date Oct 19, 2023
- Yang YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER EDGE RING LIFTING SOLUTION
- Publication number 20220319904
- Publication date Oct 6, 2022
- Applied Materials, Inc.
- Michael R. RICE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS HUB FOR PLASMA REACTOR
- Publication number 20220157562
- Publication date May 19, 2022
- Applied Materials, Inc.
- Yan Rozenzon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR SUBSTRATE TRANSFER AND RADICAL CONFINEMENT
- Publication number 20200411350
- Publication date Dec 31, 2020
- Applied Materials, Inc.
- Jared Ahmad LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING CHAMBER COMPONENT ASSEMBLY WITH PLASMA RESISTA...
- Publication number 20200152425
- Publication date May 14, 2020
- Applied Materials, Inc.
- Vahid FIROUZDOR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ABATEMENT AND STRIP PROCESS CHAMBER IN A DUAL LOADLOCK CONFIGURATION
- Publication number 20200126802
- Publication date Apr 23, 2020
- Appled Materials, Inc.
- Jared Ahmad LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR SUBSTRATE TRANSFER AND RADICAL CONFINEMENT
- Publication number 20200066563
- Publication date Feb 27, 2020
- Applied Materials, Inc.
- Jared Ahmad LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ABATEMENT AND STRIP PROCESS CHAMBER IN A DUAL LOADLOCK CONFIGURATION
- Publication number 20200027742
- Publication date Jan 23, 2020
- Applied Materials, Inc.
- Jared Ahmad Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NOZZLE FOR MULTI-ZONE GAS INJECTION ASSEMBLY
- Publication number 20190385824
- Publication date Dec 19, 2019
- Applied Materials, Inc.
- Yan Rozenzon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS KIT COMPONENTS FOR USE WITH AN EXTENDED AND INDEPENDENT RF...
- Publication number 20190221463
- Publication date Jul 18, 2019
- Applied Materials, Inc.
- VALENTIN TODOROW
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
Plasma Reactor with Highly Symmetrical Four-Fold Gas Injection
- Publication number 20190122861
- Publication date Apr 25, 2019
- Applied Materials, Inc.
- Yan Rozenzon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Multi-Zone Gas Injection Assembly with Azimuthal and Radial Distrib...
- Publication number 20180269038
- Publication date Sep 20, 2018
- Applied Materials, Inc.
- Yan Rozenzon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR SUBSTRATE TRANSFER AND RADICAL CONFINEMENT
- Publication number 20180247850
- Publication date Aug 30, 2018
- Applied Materials, Inc.
- Jared Ahmad LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ENDPOINT GAS LINE FILTER FOR SUBSTRATE PROCESSING EQUIPMENT
- Publication number 20180122655
- Publication date May 3, 2018
- Applied Materials, Inc.
- Vahid FIROUZDOR
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
PLASMA SCREEN FOR PLASMA PROCESSING CHAMBER
- Publication number 20180061618
- Publication date Mar 1, 2018
- Applied Materials, Inc.
- Michael Thomas NICHOLS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW PRESSURE LIFT PIN CAVITY HARDWARE
- Publication number 20180061616
- Publication date Mar 1, 2018
- Applied Materials, Inc.
- Michael Thomas NICHOLS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING CHAMBER COMPONENT ASSEMBLY WITH PLASMA RESISTA...
- Publication number 20180019104
- Publication date Jan 18, 2018
- Applied Materials, Inc.
- Vahid FIROUZDOR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER EDGE RING LIFTING SOLUTION
- Publication number 20170213758
- Publication date Jul 27, 2017
- Applied Materials, Inc.
- Michael R. RICE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN HEATED SUBSTRATE SUPPORT
- Publication number 20170040192
- Publication date Feb 9, 2017
- Applied Materials, Inc.
- Imad Yousif
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR WITH HIGHLY SYMMETRICAL FOUR-FOLD GAS INJECTION
- Publication number 20150371826
- Publication date Dec 24, 2015
- Applied Materials, Inc.
- Yan Rozenzon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ZONE GAS INJECTION ASSEMBLY WITH AZIMUTHAL AND RADIAL DISTRIB...
- Publication number 20150371831
- Publication date Dec 24, 2015
- Applied Materials, Inc.
- Yan Rozenzon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MU METAL SHIELD COVER
- Publication number 20140262044
- Publication date Sep 18, 2014
- IMAD YOUSIF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR SUBSTRATE TRANSFER AND RADICAL CONFINEMENT
- Publication number 20140087561
- Publication date Mar 27, 2014
- Applied Materials, Inc.
- Jared Ahmad Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN HEATED SUBSTRATE SUPPORT
- Publication number 20130334199
- Publication date Dec 19, 2013
- Applied Materials, Inc.
- Imad Yousif
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ABATEMENT AND STRIP PROCESS CHAMBER IN A DUAL LOADLOCK CONFIGURATION
- Publication number 20130337655
- Publication date Dec 19, 2013
- Applied Materials, Inc.
- Jared Ahmad Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR UNIFORM PUMPING WITHIN A SUBSTRATE PROCESS CHAMBER
- Publication number 20130284287
- Publication date Oct 31, 2013
- Applied Materials, Inc.
- PAUL BENJAMIN REUTER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR WITH TILTABLE OVERHEAD RF INDUCTIVE SOURCE
- Publication number 20130206594
- Publication date Aug 15, 2013
- APPLIED MATERIALS, INC.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS

Imad Yousif

Person

Patents Grantslast 30 patents

Wafer edge ring lifting solution

Gas hub for plasma reactor

Method and apparatus for substrate transfer and radical confinement

Wafer edge ring lifting solution

Plasma reactor with highly symmetrical four-fold gas injection

Abatement and strip process chamber in a dual loadlock configuration

Abatement and strip process chamber in a dual load lock configuration

Nozzle for multi-zone gas injection assembly

Process kit components for use with an extended and independent RF...

Method and apparatus for substrate transfer and radical confinement

Abatement and strip process chamber in a dual loadlock configuration

Side gas injection kit for multi-zone gas injection assembly

Thin heated substrate support

Plasma reactor with highly symmetrical four-fold gas injection

Method and apparatus for substrate transfer and radical confinement

Multi-zone gas injection assembly with azimuthal and radial distrib...

Thermal management of edge ring in semiconductor processing

Apparatus for uniform pumping within a substrate process chamber

Plasma reactor with tiltable overhead RF inductive source

Extended and independent RF powered cathode substrate for extreme e...

Upper liner

Plasma reactor with tiltable overhead RF inductive source

Method and apparatus for removing polymer from the wafer backside a...

Magnetic confinement of a plasma

Process for wafer backside polymer removal and wafer front side pho...

Apparatus and method for front side protection during backside clea...

Process for wafer backside polymer removal with a ring of plasma un...

Method and apparatus for optical detection of effluent composition

Apparatus and methods for controlling process chamber pressure

Patents Applicationslast 30 patents

Remote Plasma Source and Plasma Processing Chamber Having Same

WAFER EDGE RING LIFTING SOLUTION

CHAMBER LID Temperature COOLING SYSTEM

REMOTE SURFACE WAVE PROPAGATION FOR SEMICONDUCTOR CHAMBERS

WAFER EDGE RING LIFTING SOLUTION

GAS HUB FOR PLASMA REACTOR

METHOD AND APPARATUS FOR SUBSTRATE TRANSFER AND RADICAL CONFINEMENT

SUBSTRATE PROCESSING CHAMBER COMPONENT ASSEMBLY WITH PLASMA RESISTA...

ABATEMENT AND STRIP PROCESS CHAMBER IN A DUAL LOADLOCK CONFIGURATION

METHOD AND APPARATUS FOR SUBSTRATE TRANSFER AND RADICAL CONFINEMENT

ABATEMENT AND STRIP PROCESS CHAMBER IN A DUAL LOADLOCK CONFIGURATION

NOZZLE FOR MULTI-ZONE GAS INJECTION ASSEMBLY

PROCESS KIT COMPONENTS FOR USE WITH AN EXTENDED AND INDEPENDENT RF...

Plasma Reactor with Highly Symmetrical Four-Fold Gas Injection

Multi-Zone Gas Injection Assembly with Azimuthal and Radial Distrib...

METHOD AND APPARATUS FOR SUBSTRATE TRANSFER AND RADICAL CONFINEMENT

ENDPOINT GAS LINE FILTER FOR SUBSTRATE PROCESSING EQUIPMENT

PLASMA SCREEN FOR PLASMA PROCESSING CHAMBER

LOW PRESSURE LIFT PIN CAVITY HARDWARE

SUBSTRATE PROCESSING CHAMBER COMPONENT ASSEMBLY WITH PLASMA RESISTA...

WAFER EDGE RING LIFTING SOLUTION

THIN HEATED SUBSTRATE SUPPORT

PLASMA REACTOR WITH HIGHLY SYMMETRICAL FOUR-FOLD GAS INJECTION

MULTI-ZONE GAS INJECTION ASSEMBLY WITH AZIMUTHAL AND RADIAL DISTRIB...

MU METAL SHIELD COVER

METHOD AND APPARATUS FOR SUBSTRATE TRANSFER AND RADICAL CONFINEMENT

THIN HEATED SUBSTRATE SUPPORT

ABATEMENT AND STRIP PROCESS CHAMBER IN A DUAL LOADLOCK CONFIGURATION

APPARATUS FOR UNIFORM PUMPING WITHIN A SUBSTRATE PROCESS CHAMBER

PLASMA REACTOR WITH TILTABLE OVERHEAD RF INDUCTIVE SOURCE