Isahiro Hasegawa

Person

Zushi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor memory device and method for manufacturing same
- Patent number 9,922,991
- Issue date Mar 20, 2018
- TOSHIBA MEMORY CORPORATION
- Tetsuya Kamigaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetron plasma process apparatus
- Patent number 6,261,428
- Issue date Jul 17, 2001
- Tokyo Electron Limited
- Toshihisa Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetron plasma processing apparatus and processing method
- Patent number 5,888,338
- Issue date Mar 30, 1999
- Tokyo Electron Limited
- Hiromi Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching film formed on semiconductor wafer
- Patent number 5,698,070
- Issue date Dec 16, 1997
- Tokyo Electron Limited
- Yoshihisa Hirano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating apparatus and surface processing apparatus
- Patent number 5,660,744
- Issue date Aug 26, 1997
- Kabushiki Kaisha Toshiba
- Makoto Sekine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetron plasma processing apparatus and processing method
- Patent number 5,660,671
- Issue date Aug 26, 1997
- Tokyo Electron Limited
- Hiromi Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck having a multilayer structure for attracting an...
- Patent number 5,539,179
- Issue date Jul 23, 1996
- Tokyo Electron Limited
- Toshihisa Nozawa
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Plasma processing apparatus
- Patent number 5,474,643
- Issue date Dec 12, 1995
- Tokyo Electron Limited
- Junichi Arami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating device and surface processing device and method f...
- Patent number 5,444,207
- Issue date Aug 22, 1995
- Kabushiki Kaisha Toshiba
- Makoto Sekine
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Permanent magnet magnetic circuit and magnetron plasma processing a...
- Patent number 5,387,893
- Issue date Feb 7, 1995
- Tokyo Electron Limited
- Masami Oguriyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetron plasma processing apparatus and processing method
- Patent number 5,376,211
- Issue date Dec 27, 1994
- Tokyo Electron Limited
- Hiromi Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method
- Patent number 5,356,515
- Issue date Oct 18, 1994
- Tokyo Electron Limited
- Yoshifumi Tahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method
- Patent number 5,310,454
- Issue date May 10, 1994
- Kabushiki Kaisha Toshiba
- Tokuhisa Ohiwa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching object to be processed including oxide or nitride...
- Patent number 5,302,236
- Issue date Apr 12, 1994
- Tokyo Electron Limited
- Yoshifumi Tahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus
- Patent number 5,290,381
- Issue date Mar 1, 1994
- Tokyo Electron Limited
- Toshihisa Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Permanent magnet magnetic circuit
- Patent number 5,289,152
- Issue date Feb 22, 1994
- TDK Corporation
- Masami Oguriyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 5,271,788
- Issue date Dec 21, 1993
- Tokyo Electron Limited
- Makoto Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of adjusting the temperature of a semiconductor wafer
- Patent number 5,270,266
- Issue date Dec 14, 1993
- Tokyo Electron Limited
- Yoshihisa Hirano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck and plasma apparatus equipped therewith
- Patent number 5,255,153
- Issue date Oct 19, 1993
- Tokyo Electron Limited
- Toshihisa Nozawa
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Plasma apparatus
- Patent number 5,236,556
- Issue date Aug 17, 1993
- Tokyo Electron Limited
- Takashi Yokota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for forming reduced pressure and for processing object
- Patent number 5,223,113
- Issue date Jun 29, 1993
- Tokyo Electron Limited
- Satoshi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Support table for plate-like body and processing apparatus using th...
- Patent number 5,221,403
- Issue date Jun 22, 1993
- Tokyo Electron Limited
- Toshihisa Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus having driving control section
- Patent number 5,203,945
- Issue date Apr 20, 1993
- Tokyo Electron Limited
- Isahiro Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conveying apparatus
- Patent number 5,195,866
- Issue date Mar 23, 1993
- Tokyo Electron Limited
- Isahiro Hasegawa
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Grant
Method of and apparatus for measuring pattern profile
- Patent number 5,161,201
- Issue date Nov 3, 1992
- Kabushiki Kaisha Toshiba
- Yasuhiro Kaga
- G01 - MEASURING TESTING
Information Patent Grant
Method of forming fine patterns
- Patent number 5,100,508
- Issue date Mar 31, 1992
- Kabushiki Kaisha Toshiba
- Yukimasa Yoshida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dry etching method
- Patent number 5,091,050
- Issue date Feb 25, 1992
- Kabushiki Kaisha Toshiba
- Makoto Fujino
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING SAME
- Publication number 20170271363
- Publication date Sep 21, 2017
- KABUSHIKI KAISHA TOSHIBA
- Tetsuya Kamigaki
- H01 - BASIC ELECTRIC ELEMENTS

Isahiro Hasegawa

Person

Patents Grantslast 30 patents

Semiconductor memory device and method for manufacturing same

Magnetron plasma process apparatus

Magnetron plasma processing apparatus and processing method

Method of etching film formed on semiconductor wafer

Plasma generating apparatus and surface processing apparatus

Magnetron plasma processing apparatus and processing method

Electrostatic chuck having a multilayer structure for attracting an...

Plasma processing apparatus

Plasma generating device and surface processing device and method f...

Permanent magnet magnetic circuit and magnetron plasma processing a...

Magnetron plasma processing apparatus and processing method

Dry etching method

Dry etching method

Method of etching object to be processed including oxide or nitride...

Plasma etching apparatus

Permanent magnet magnetic circuit

Plasma processing apparatus

Method of adjusting the temperature of a semiconductor wafer

Electrostatic chuck and plasma apparatus equipped therewith

Plasma apparatus

Apparatus for forming reduced pressure and for processing object

Support table for plate-like body and processing apparatus using th...

Plasma processing apparatus having driving control section

Conveying apparatus

Method of and apparatus for measuring pattern profile

Method of forming fine patterns

Dry etching method

Patents Applicationslast 30 patents

SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING SAME