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Yokohama-shi, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Exposure apparatus and device manufacturing method
Patent number
7,911,582
Issue date
Mar 22, 2011
Nikon Corporation
Shigeru Hirukawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Exposure apparatus and device manufacturing method
Patent number
7,505,111
Issue date
Mar 17, 2009
Nikon Corporation
Shigeru Hirukawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Optical system and exposure apparatus provided with the optical system
Patent number
6,844,915
Issue date
Jan 18, 2005
Nikon Corporation
Soichi Owa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Projection optical system and an exposure apparatus with the projec...
Patent number
6,831,731
Issue date
Dec 14, 2004
Nikon Corporation
Yasuhiro Omura
G02 - OPTICS
Information
Patent Grant
Illumination optical system and method of making exposure apparatus
Patent number
6,710,930
Issue date
Mar 23, 2004
Nikon Corporation
Takeshi Suzuki
G02 - OPTICS
Information
Patent Grant
Exposure apparatus
Patent number
RE38465
Issue date
Mar 16, 2004
Nikon Corporation
Hitoshi Matsuzawa
359 - Optical: systems and elements
Information
Patent Grant
Projection optical system, production method thereof, and projectio...
Patent number
6,583,931
Issue date
Jun 24, 2003
Nikon Corporation
Hiroyuki Hiraiwa
G02 - OPTICS
Information
Patent Grant
Projection optical system, production method thereof, and projectio...
Patent number
6,366,404
Issue date
Apr 2, 2002
Nikon Corporation
Hiroyuki Hiraiwa
G02 - OPTICS
Information
Patent Grant
Optical member for photolithography, method for evaluating optical...
Patent number
6,181,469
Issue date
Jan 30, 2001
Nikon Corporation
Hiroyuki Hiraiwa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Exposure apparatus
Patent number
6,104,544
Issue date
Aug 15, 2000
Nikon Corporation
Hitoshi Matsuzawa
G02 - OPTICS
Information
Patent Grant
Optical member for photolithography, method for evaluating optical...
Patent number
6,025,955
Issue date
Feb 15, 2000
Nikon Corporation
Hiroyuki Hiraiwa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Silica glass member for UV-lithography, method for silica glass pro...
Patent number
5,719,698
Issue date
Feb 17, 1998
Nikon Corporation
Hiroyuki Hiraiwa
G02 - OPTICS
Information
Patent Grant
Silica glass member for UV-lithography, method for silica glass pro...
Patent number
5,699,183
Issue date
Dec 16, 1997
Nikon Corporation
Hiroyuki Hiraiwa
G02 - OPTICS
Patents Applications
last 30 patents
Information
Patent Application
Exposure apparatus and device manufacturing method
Publication number
20110279794
Publication date
Nov 17, 2011
Nikon Corporation
Shigeru Hirukawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Exposure apparatus and device manufacturing method
Publication number
20110051106
Publication date
Mar 3, 2011
Nikon Corporation
Shigeru Hirukawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Exposure apparatus and device manufacturing method
Publication number
20090015807
Publication date
Jan 15, 2009
Nikon Corporation
Shigeru Hirukawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Exposure apparatus and device manufacturing method
Publication number
20080151203
Publication date
Jun 26, 2008
Nikon Corporation
Shigeru Hirukawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Exposure apparatus and device manufacturing method
Publication number
20070263196
Publication date
Nov 15, 2007
Nikon Corporation
Shigeru Hirukawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Exposure apparatus and device manufacturing method
Publication number
20070115447
Publication date
May 24, 2007
Nikon Corporation
Shigeru Hirukawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Exposure apparatus and device manufacturing method
Publication number
20070115448
Publication date
May 24, 2007
Nikon Corporation
Shigeru Hirukawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Exposure apparatus and device manufacturing method
Publication number
20050259234
Publication date
Nov 24, 2005
Nikon Corporation
Shigeru Hirukawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Projection optical system and an exposure apparatus with the projec...
Publication number
20050122499
Publication date
Jun 9, 2005
Nikon Corporation
Yasuhiro Omura
G02 - OPTICS
Information
Patent Application
Projection optical system, method of making projection optical syst...
Publication number
20030063394
Publication date
Apr 3, 2003
Nikon Corporation
Takeshi Suzuki
G02 - OPTICS
Information
Patent Application
Projection optical system and an exposure apparatus with the projec...
Publication number
20030058421
Publication date
Mar 27, 2003
Nikon Corporation
Yasuhiro Omura
G02 - OPTICS
Information
Patent Application
Optical system and exposure apparatus provided with the optical system
Publication number
20030025894
Publication date
Feb 6, 2003
Nikon Corporation
Soichi Owa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Projection optical system, production method thereof, and projectio...
Publication number
20020085176
Publication date
Jul 4, 2002
NIKON CORPORATION
Hiroyuki Hiraiwa
G02 - OPTICS