Claims
- 1. A projection optical system capable of forming a reduced image of a first surface at a second surface, and that includes a plurality of lenses and at least one concave reflective mirror, wherein the projection optical system:
when used in an exposure apparatus to scan expose the first surface at the second surface while moving the first surface and the second surface along a scanning direction, forms a slit-shaped or arc-shaped exposure area at the second surface when not scanning; and satisfies the condition 0.5<(Dw·Nw)/Ew<1.4 (1) where Dw is a working distance of the second surface side, Nw is a numerical aperture of the second surface side, and Ew is a length in a direction orthogonal to the scanning direction of the slit-shaped or arc-shaped exposure area.
- 2. A projection optical system according to claim 1, wherein the slit-shaped or arc-shaped exposure area does not intersect an optical axis of the projection optical system, and the projection optical system further comprises:
a) a refractive type first optical imaging system to form a first intermediate image of the first surface; b) a second optical imaging system, having at least one negative lens and a concave reflective mirror, to form the first intermediate image into a second intermediate image of nearly the same magnification near the first intermediate image forming position based on the light beam from the first intermediate image; c) a refractive type third optical imaging system to form a reduced image of the second intermediate image onto the second surface based on the light beam from the second intermediate image; d) a first optical path folding mirror arranged in the optical path between the first optical imaging system and the second optical imaging system; and e) a second optical path folding mirror arranged in the optical path between the second optical imaging system and the third optical imaging system.
- 3. A projection optical system according to claim 2, wherein all lenses comprising the first optical imaging system and the third optical imaging system are arranged along a single straight line along the optical axis.
- 4. An exposure apparatus comprising:
an illumination system to illuminate a mask serving as the first surface; and a projection optical system according to claim 1 to form an image of a pattern on the mask onto a photosensitive substrate serving as the second surface.
- 5. A projection optical system including a plurality of lenses, a concave reflective mirror and a negative lens arranged in proximity to the concave reflective mirror, and capable of forming a reduced image of a first surface at a second surface, wherein the projection optical system:
a) when used in an exposure apparatus to scan expose the first surface at the second surface while moving the first surface and the second surface along a scanning direction, forms a slit-shaped or arc-shaped exposure area at the second surface when not scanning; and b) a numerical aperture of the second surface side is 0.82 or more.
- 6. A projection optical system according to claim 5, wherein:
a) the concave reflective mirror and the negative lens are arranged along an optical axis in a direction substantially different from a direction of gravity, and b) the following conditional expression is satisfied: 1.0<S/|R|<1.8 (2) wherein S is a clear aperture (diameter) of the concave reflective mirror and R is a radius of curvature of the concave reflective mirror.
- 7. An exposure apparatus comprising:
an illumination system to illuminate a mask serving as the first surface; and a projection optical system according to claim 5 to form an image of a pattern on the mask onto a photosensitive substrate serving as the second surface.
- 8. A projection optical system capable of forming a reduced image of a first surface at a second surface, wherein the projection optical system is arranged in an optical path between a pupil position of the second surface side and the second surface, has a substantially transmissive characteristic for light with a wavelength of 200 nm or less, and is provided with at least one radiation transmissive member formed such that a crystal axis [100] or an optically equivalent crystal axis to the crystal axis [100] nearly aligns with the optical axis.
- 9. An exposure apparatus comprising:
an illumination system to illuminate a mask serving as the first surface; and a projection optical system according to claim 8 to form an image of a pattern on the mask onto a photosensitive substrate serving as the second surface.
- 10. A projection optical system capable of forming a reduced image of a first surface at a second surface, wherein at least one radiation transmissive member of radiation transmissive members exceeding a maximum angle of the transmitting light ray of 20 degrees to the optical axis has substantially transmissive characteristics for light with a wavelength of 200 nm or less, and is formed such that a crystal axis [100] or an optically equivalent crystal axis to a crystal axis [100] nearly aligns with the optical axis.
- 11. An exposure apparatus comprising:
an illumination system to illuminate a mask serving as the first surface; and a projection optical system according to claim 10 to form an image of a pattern on the mask onto a photosensitive substrate serving as the second surface.
- 12. A projection optical system capable of forming a reduced image of a first surface at a second surface, the projection optical system comprising:
a) a first group of radiation transmissive members formed such that a crystal axis [100] or an optically equivalent crystal axis to the crystal axis [100] nearly aligns with the optical axis, and has substantially transmissive characteristics for light with a wavelength of 200 nm or less; b) a second group of radiation transmissive members formed such that the crystal axis [100] or an optically equivalent crystal axis to the crystal axis [100] nearly aligns with the optical axis, and has substantially transmissive characteristics for light with a wavelength of 200 nm or less; wherein the first group of radiation transmissive members and the second group of radiation transmissive members have a positional relationship relatively rotated about 45 degrees around the optical axis; and both the first group of radiation transmissive members and the second group of radiation transmissive members are arranged in an optical path between a pupil position on the second surface side and the second surface.
- 13. A projection optical system according to claim 12, wherein at least one of the first group of radiation transmissive members and the second group of radiation transmissive members has at least one aspherical surface.
- 14. A projection optical system according to claim 13, that satisfies the following condition:
- 15. A projection optical system according to claim 12, that satisfies the following condition:
- 16. A projection optical system according to claim 12, wherein the first group of radiation transmissive members and the second group of radiation transmissive members are formed as one optical member by optical contact or by adhesion.
- 17. An exposure apparatus comprising:
an illumination system to illuminate a mask serving as the first surface; and a projection optical system according to claim 12 to form an image of a pattern on the mask onto a photosensitive substrate serving as the second surface.
- 18. A projection optical system capable of forming a reduced image of a first surface at a second surface, the projection optical system comprising:
a first group of radiation transmissive members formed such that a crystal axis [100] or an optically equivalent crystal axis to the crystal axis [100] nearly aligns with the optical axis, and has substantially transmissive characteristics for light with a wavelength of 200 nm or less; a second group of radiation transmissive members formed such that the crystal axis [100] or an optically equivalent crystal axis to the crystal axis [100] nearly aligns with the optical axis, and has substantially transmissive characteristics for light with a wavelength of 200 nm or less; wherein the first group of radiation transmissive members and the second group of radiation transmissive members have a positional relationship relatively rotated about 45 degrees around the optical axis; and in both the first group of radiation transmissive members and the second group of radiation transmissive members, the maximum angle of the transmitting light ray to the optical axis is greater than 20 degrees.
- 19. A projection optical system according to claim 18, wherein at least one of the first group of radiation transmissive members and the second group of radiation transmissive members has at least one aspherical surface.
- 20. A projection optical system according to claim 19, that satisfies the following condition:
- 21. A projection optical system according to claim 18, wherein the first group of radiation transmissive members and the second group of radiation transmissive members are formed as one optical member by optical contact or by adhesion.
- 22. A projection optical system according to claim 18, that satisfies the following condition:
- 23. An exposure apparatus comprising:
an illumination system to illuminate a mask serving as the first surface; and a projection optical system according to claim 18 to form an image of a pattern on the mask onto a photosensitive substrate serving as the second surface.
- 24. A projection optical system comprising a plurality of lenses, a concave reflective mirror and a negative lens arranged in proximity to the concave reflective mirror, and which is capable of forming a reduced image of a first surface at a second surface, wherein the negative lens has substantially transmissive characteristics for light with a wavelength of 200 nm or less, and is formed such that a crystal axis [100] or an optically equivalent crystal axis to the crystal axis [100] nearly aligns with the optical axis.
- 25. An exposure apparatus comprising:
an illumination system to illuminate a mask serving as the first surface; and a projection optical system according to claim 24 to form an image of a pattern on the mask onto a photosensitive substrate serving as the second surface.
- 26. A projection optical system comprising a plurality of lenses, a concave reflective mirror, and a first negative lens and a second negative lens arranged in proximity to the concave reflective mirror, and capable of forming a reduced image of a first surface at a second surface, wherein:
a) the first negative lens is formed such that a crystal axis [100] or an optically equivalent crystal axis to the crystal axis [100] nearly aligns with the optical axis, and has substantially transmissive characteristics for light with a wavelength of 200 nm or less; b) the second negative lens is formed such that the crystal axis [100] or an optically equivalent crystal axis to the crystal axis [100] nearly aligns with the optical axis, and has substantially transmissive characteristics for light with a wavelength of 200 nm or less; and c) the first negative lens and second negative lens have a positional relationship relatively rotated about 45 degrees around the optical axis.
- 27. An exposure apparatus comprising:
an illumination system to illuminate a mask serving as the first surface; and a projection optical system according to claim 26 to form an image of a pattern on the mask onto a photosensitive substrate serving as the second surface.
- 28. A projection optical system capable of forming a reduced image of a first surface at a second surface, wherein the projection optical system is arranged in the optical path between a pupil position of the second surface side and the second surface, has a substantially transmissive characteristic for light with a wavelength of 200 nm or less, and is provided with at least one radiation transmissive member formed such that a crystal axis [110] or an optically equivalent crystal axis to the crystal axis [110] nearly aligns with the optical axis.
- 29. An exposure apparatus comprising:
an illumination system to illuminate a mask serving as the first surface; and a projection optical system according to claim 28 to form an image of a pattern on the mask onto a photosensitive substrate serving as the second surface.
- 30. A projection optical system capable of forming a reduced image of a first surface at a second surface, wherein at least one radiation transmissive member of radiation transmissive members exceeding a maximum angle of the transmitting light ray of 20 degrees to the optical axis has substantially transmissive characteristics for light with a wavelength of 200 nm or less, and is formed such that a crystal axis [110] or an optically equivalent crystal axis to a crystal axis [110] nearly aligns with the optical axis.
- 31. An exposure apparatus comprising:
an illumination system to illuminate a mask serving as the first surface; and a projection optical system according to claim 30 to form an image of a pattern on the mask onto a photosensitive substrate serving as the second surface.
- 32. A projection optical system capable of forming a reduced image of a first surface at a second surface, the projection optical system comprising:
a) a third group of radiation transmissive members formed such that a crystal axis [110] or an optically equivalent crystal axis to the crystal axis [110] nearly aligns with the optical axis, and has substantially transmissive characteristics for light with a wavelength of 200 nm or less; b) a fourth group of radiation transmissive members formed such that the crystal axis [110] or an optically equivalent crystal axis to the crystal axis [110] nearly aligns with the optical axis, and has substantially transmissive characteristics for light with a wavelength of 200 nm or less; wherein the third group of radiation transmissive members and the fourth group of radiation transmissive members have a positional relationship relatively rotated about 90 degrees around the optical axis; and both the third group of radiation transmissive members and the fourth group of radiation transmissive members are arranged in an optical path between a pupil position on the second surface side and the second surface.
- 33. A projection optical system according to claim 32, wherein at least one of the third group of radiation transmissive members and the fourth group of radiation transmissive members has at least one aspherical surface.
- 34. A projection optical system according to claim 33, wherein the projection optical system satisfies the following condition:
- 35. A projection optical system according to claim 32, wherein the projection optical system satisfies the following condition:
- 36. A projection optical system according to claim 32, wherein the third group of radiation transmissive members and the fourth group of radiation transmissive members are formed as one optical member by optical contact or by adhesion.
- 37. An exposure apparatus comprising:
an illumination system to illuminate a mask serving as the first surface; and a projection optical system according to claim 32 to form an image of a pattern on the mask onto a photosensitive substrate serving as the second surface.
- 38. A projection optical system capable of forming a reduced image of a first surface at a second surface, the projection optical system comprising:
a third group of radiation transmissive members formed such that a crystal axis [110] or an optically equivalent crystal axis to the crystal axis [110] nearly aligns with the optical axis, and has substantially transmissive characteristics for light with a wavelength of 200 nm or less; a fourth group of radiation transmissive members formed such that a crystal axis [110] or an optically equivalent crystal axis to the crystal axis [110] nearly aligns with the optical axis, and has substantially transmissive characteristics for light with a wavelength of 200 nm or less; wherein the third group of radiation transmissive members and the fourth group of radiation transmissive members have a positional relationship relatively rotated about 90 degrees around the optical axis; and in both the third group of radiation transmissive members and the fourth group of radiation transmissive members, the maximum angle of the transmitting light ray to the optical axis is greater than 20 degrees.
- 39. A projection optical system according to claim 38, wherein at least one of the third group of radiation transmissive members and the fourth group of radiation transmissive members has at least one aspherical surface.
- 40. A projection optical system according to claim 39, wherein the projection optical system satisfies the following condition:
- 41. A projection optical system according to claim 38, wherein the third group of radiation transmissive members and the fourth group of radiation transmissive members are formed as one optical member by optical contact or by adhesion.
- 42. A projection optical system according to claim 38, wherein the projection optical system satisfies the following condition:
- 43. An exposure apparatus comprising:
an illumination system to illuminate a mask serving as the first surface; and a projection optical system according to claim 38 to form an image of a pattern on the mask onto a photosensitive substrate serving as the second surface.
- 44. A projection optical system comprising a plurality of lenses, a concave reflective mirror and a negative lens arranged in proximity to the concave reflective mirror, and which is capable of forming a reduced image of a first surface at a second surface, wherein the negative lens has substantially transmissive characteristics for light with a wavelength of 200 nm or less, and is formed such that a crystal axis [110] or an optically equivalent crystal axis to the crystal axis [110] nearly aligns with the optical axis.
- 45. An exposure apparatus comprising:
an illumination system to illuminate a mask serving as the first surface; and a projection optical system according to claim 44 to form an image of a pattern on the mask onto a photosensitive substrate serving as the second surface.
- 46. A projection optical system comprising a plurality of lenses, a concave reflective mirror, and a first negative lens and a second negative lens arranged in proximity to the concave reflective mirror, and capable of forming a reduced image of a first surface at a second surface, wherein:
a) the first negative lens is formed such that a crystal axis [110] or an optically equivalent crystal axis to the crystal axis [110] nearly aligns with the optical axis, and has substantially transmissive characteristics for light with a wavelength of 200 nm or less; b) the second negative lens is formed such that the crystal axis [110] or an optically equivalent crystal axis to the crystal axis [110] nearly aligns with the optical axis, and has substantially transmissive characteristics for light with a wavelength of 200 nm or less; and c) the first negative lens and second negative lens have a positional relationship relatively rotated about 90 degrees around the optical axis.
- 47. An exposure apparatus comprising:
an illumination system to illuminate a mask serving as the first surface; and a projection optical system according to claim 46 to form an image of a pattern on the mask onto a photosensitive substrate serving as the second surface.
- 48. A projection optical system capable of forming a reduced image of a first surface at a second surface, the projection optical system comprising:
a) a fifth group of radiation transmissive members formed such that a crystal axis [111] or an optically equivalent crystal axis to the crystal axis [111] nearly aligns with the optical axis, and has substantially transmissive characteristics for light with a wavelength of 200 nm or less; b) a sixth group of radiation transmissive members formed such that the crystal axis [111] or an optically equivalent crystal axis to the crystal axis [111] nearly aligns with the optical axis, and has substantially transmissive, characteristics for light with a wavelength of 200 nm or less; wherein the fifth group of radiation transmissive members and the sixth group of radiation transmissive members have a positional relationship relatively rotated about 60 degrees around the optical axis; and both the fifth group of radiation transmissive members and the sixth group of radiation transmissive members are arranged in an optical path between a pupil position on the second surface side and the second surface.
- 49. A projection optical system according to claim 48, wherein at least one of the fifth group of radiation transmissive members and the sixth group of radiation transmissive members has at least one aspherical surface.
- 50. A projection optical system according to claim 49, wherein the projection optical system satisfies the following condition:
- 51. A projection optical system according to claim 48, wherein the projection optical system satisfies the following condition:
- 52. A projection optical system according to claim 48, wherein the fifth group of radiation transmissive members and the sixth group of radiation transmissive members are formed as one optical member by optical contact or by adhesion.
- 53. An exposure apparatus comprising:
an illumination system to illuminate a mask serving as the first surface; and a projection optical system according to claim 48 to form an image of a pattern on the mask onto a photosensitive substrate serving as the second surface.
- 54. A projection optical system capable of forming a reduced image of a first surface at a second surface, the projection optical system comprising:
a fifth group of radiation transmissive members formed such that a crystal axis [111] or an optically equivalent crystal axis to the crystal axis [111] nearly aligns with the optical axis, and has substantially transmissive characteristics for light with a wavelength of 200 nm or less; a sixth group of radiation transmissive members formed such that the crystal axis [111] or an optically equivalent crystal axis to the crystal axis [111] nearly aligns with the optical axis, and has substantially transmissive characteristics for light with a wavelength of 200 nm or less; wherein the fifth group of radiation transmissive members and the sixth group of radiation transmissive members have a positional relationship relatively rotated about 60 degrees around the optical axis; and in both the fifth group of radiation transmissive members and the sixth group of radiation transmissive members, the maximum angle of the transmitting light ray to the optical axis is greater than 20 degrees.
- 55. A projection optical system according to claim 54, wherein at least one of the fifth group of radiation transmissive members and the sixth group of radiation transmissive members has at least one aspherical surface.
- 56. A projection optical system according to claim 55, wherein the projection optical system satisfies the following condition:
- 57. A projection optical system according to claim 54, wherein the fifth group of radiation transmissive members and the sixth group of radiation transmissive members are formed as one optical member by optical contact or by adhesion.
- 58. A projection optical system according to claim 54, wherein the projection optical system satisfies the following condition:
- 59. An exposure apparatus comprising:
an illumination system to illuminate a mask serving as the first surface; and a projection optical system according to claim 54 to form an image of a pattern on the mask onto a photosensitive substrate serving as the second surface.
- 60. A projection optical system including a plurality of lenses, a concave reflective mirror, and a first negative lens and a second negative lens arranged in proximity to the concave reflective mirror, and capable of forming a reduced image of a first surface at a second surface, wherein:
a) the first negative lens is formed such that a crystal axis [111] or an optically equivalent crystal axis to the crystal axis [111] nearly aligns with the optical axis, and has substantially transmissive characteristics for light with a wavelength of 200 nm or less; b) the second negative lens is formed such that a crystal axis [111] or an optically equivalent crystal axis to the crystal axis [111] nearly aligns with the optical axis, and has substantially transmissive characteristics for light with a wavelength of 200 nm or less; and c) the first negative lens and second negative lens have a positional relationship relatively rotated about 60 degrees around the optical axis.
- 61. An exposure apparatus comprising:
an illumination system to illuminate a mask serving as the first surface; and a projection optical system according to claim 60 to form an image of a pattern on the mask onto a photosensitive substrate serving as the second surface.
- 62. A projection optical system capable of forming a reduced image of a first surface at a second surface, the projection optical system comprising:
a) a radiation transmissive member formed of a crystal having substantially transmissive characteristics for light with a wavelength of 200 nm or less; b) a crystal coat formed of the crystal formed on a surface of the radiation transmissive member; and c) the crystal direction of the radiation transmissive member and the crystal direction of the crystal coat are different.
- 63. A projection optical system according to claim 62, wherein the crystal direction along the optical axis of the radiation transmissive member and the crystal direction along the optical axis of the crystal coat are different.
- 64. A projection optical system according to claim 62, wherein:
a) the crystal direction along the optical axis of the radiation transmissive member and the crystal direction along the optical axis of the crystal coat nearly align; and b) the radiation transmissive member and the crystal coat have a positional relationship relatively rotated to a predetermined angle with the optical axis serving as a center.
- 65. An exposure apparatus comprising:
an illumination system to illuminate a mask serving as the first surface; and a projection optical system according to claim 62 to form an image of a pattern on the mask onto a photosensitive substrate serving as the second surface.
- 66. A projection optical system capable of forming a reduced image of a first surface at a second surface, the projection optical system comprising:
a) a first group of radiation transmissive members formed such that a crystal axis [100] or an optically equivalent crystal axis to the crystal axis [100] nearly aligns with the optical axis, and has substantially transmissive characteristics for light with a wavelength of 200 nm or less; b) a third group of radiation transmissive members formed such that a crystal axis [110] or an optically equivalent crystal axis to the crystal axis [110] nearly aligns with the optical axis, and has substantially transmissive characteristics for light with a wavelength of 200 nm or less; and c) a fifth group of radiation transmissive members formed such that a crystal axis [111] or an optically equivalent crystal axis to the crystal axis [111] nearly aligns with the optical axis, and has substantially transmissive characteristics for light with a wavelength of 200 nm or less.
- 67. An exposure apparatus comprising:
an illumination system to illuminate a mask serving as the first surface; and a projection optical system according to claim 66 to form an image of a pattern on the mask onto a photosensitive substrate serving as the second surface.
- 68. A projection optical system capable of forming a reduced image of a first surface onto a second surface, comprising:
at least one radiation transmissive member formed of a crystal having substantially transmissive characteristics for light with a wavelength below 200 nm; and a coat on a surface of the radiation transmissive member; wherein the coat reduces a phase difference between a first polarized light and a second polarized light which is different from the first polarized light when the first polarized light and the second polarized light pass through the projection optical system.
- 69. A projection optical system according to claim 68, wherein the coat reduces the phase difference between the first polarized light and the second polarized light when the first polarized light and the second polarized light pass through the radiation transmissive member.
- 70. A projection optical system according to claim 69, comprising at least two of the radiation transmissive members formed of the crystal having substantially transmissive characteristics for light with a wavelength below 200 nm;
wherein crystal axes of the at least two radiation transmissive members are set to reduce the phase difference between the first polarized light and the second polarized light which pass through the projection optical system; and wherein the coat further reduces the phase difference, reduced by the at least two radiation transmissive members, between the first polarized light and the second polarized light which pass through the projection optical system.
- 71. A projection optical system according to claim 70, wherein the coat comprises an anti-reflecting coat.
- 72. A projection optical system according to claim 71, wherein a crystal coat is formed of the crystal on a surface of the radiation transmissive member, and a crystal direction of the radiation transmissive member and a crystal direction of the crystal coat are substantially different.
- 73. A projection optical system according to claim 69, wherein a crystal coat is formed of the crystal on a surface of the radiation transmissive member, and a crystal direction of the radiation transmissive member and a crystal direction of the crystal coat are substantially different.
- 74. A projection optical system according to claim 68, comprising at least two of the radiation transmissive members formed of the crystal having substantially transmissive characteristics for light with a wavelength below 200 nm;
wherein crystal axes of the at least two radiation transmissive members are set to reduce the phase difference between the first polarized, light and the second polarized light which pass through the projection optical system; and wherein the coat further reduces the phase difference, reduced by the at least two radiation transmissive members, between the first polarized light and the second polarized light which pass through the projection optical system.
- 75. A projection optical system according to claim 68, wherein the coat comprises an anti-reflecting coat.
- 76. A projection optical system according to claim 68, wherein a crystal coat is formed of the crystal on a surface of the radiation transmissive member, and a crystal direction of the radiation transmissive member and a crystal direction of the crystal coat are substantially different.
- 77. An exposure apparatus comprising:
an illumination system to illuminate a mask serving as the first surface; and a projection optical system according to claim 68 to form an image of a pattern on the mask onto a photosensitive substrate serving as the second surface.
Priority Claims (1)
Number |
Date |
Country |
Kind |
2001-196123 |
Jun 2001 |
JP |
|
Parent Case Info
[0001] This non-provisional application claims the benefit of U.S. Provisional Application No. 60/308,867 filed Aug. 1, 2001. The disclosure of Japanese Priority Application No. 2001−196123 filed Jun. 28, 2001, is incorporated herein by reference in its entirety.
Provisional Applications (1)
|
Number |
Date |
Country |
|
60308867 |
Aug 2001 |
US |