J. Brett Rolfson

Person

Boise, ID, US

People

Patents Grantslast 30 patents

Information Patent Grant
Reticles with subdivided blocking regions
- Patent number 8,822,108
- Issue date Sep 2, 2014
- Micron Technology, Inc.
- J. Brett Rolfson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of fabricating reticles with subdivided blocking regions
- Patent number 8,383,301
- Issue date Feb 26, 2013
- Micron Technology, Inc.
- J. Brett Rolfson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticles with subdivided blocking regions
- Patent number 8,071,262
- Issue date Dec 6, 2011
- Micron Technology, Inc.
- J. Brett Rolfson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-layer, attenuated phase-shifting mask
- Patent number 7,838,183
- Issue date Nov 23, 2010
- Micron Technology, Inc.
- J. Brett Rolfson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for forming and cleaning photolithography reticles
- Patent number 7,767,365
- Issue date Aug 3, 2010
- Micron Technology, Inc.
- Craig M. Carpenter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-layer, attenuated phase-shifting mask
- Patent number 7,611,809
- Issue date Nov 3, 2009
- Micron Technology, Inc.
- J. Brett Rolfson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for converting reticle configurations and methods for modif...
- Patent number 7,592,105
- Issue date Sep 22, 2009
- Micron Technology, Inc.
- Randall W. Chance
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Semiconductor constructions comprising multi-level patterns of radi...
- Patent number 7,535,112
- Issue date May 19, 2009
- Micron Technology, Inc.
- John Aiton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reticles
- Patent number 7,494,750
- Issue date Feb 24, 2009
- Micron Technology, Inc.
- J. Brett Rolfson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticles and methods of forming reticles
- Patent number 7,455,937
- Issue date Nov 25, 2008
- Micron Technology, Inc.
- J. Brett Rolfson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Partial edge bead removal to allow improved grounding during e-beam...
- Patent number 7,338,609
- Issue date Mar 4, 2008
- Micron Technology, Inc.
- J. Brett Rolfson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of forming wire bonds for semiconductor constructions
- Patent number 7,262,123
- Issue date Aug 28, 2007
- Micron Technology, Inc.
- John Aiton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-layer, attenuated phase-shifting mask
- Patent number 7,226,708
- Issue date Jun 5, 2007
- Micron Technology, Inc.
- J. Brett Rolfson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for converting reticle configurations
- Patent number 7,147,974
- Issue date Dec 12, 2006
- Micron Technology, Inc.
- Randall W. Chance
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Semiconductor wafer assemblies comprising photoresist over silicon...
- Patent number 7,057,263
- Issue date Jun 6, 2006
- Micron Technology, Inc.
- John T. Moore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implant lithography method of processing a semiconductor substrate
- Patent number 7,018,936
- Issue date Mar 28, 2006
- Micron Technology, Inc.
- J. Brett Rolfson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Partial edge bead removal to allow improved grounding during e-beam...
- Patent number 6,986,850
- Issue date Jan 17, 2006
- Micron Technology, Inc.
- J. Brett Rolfson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for uniformly baking substrates such as photom...
- Patent number 6,979,528
- Issue date Dec 27, 2005
- Micron Technology, Inc.
- J. Brett Rolfson
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Apparatus for uniformly baking substrates such as photomasks
- Patent number 6,908,511
- Issue date Jun 21, 2005
- Micron Technology, Inc.
- J. Brett Rolfson
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Multi-layer, attenuated phase-shifting mask
- Patent number 6,908,715
- Issue date Jun 21, 2005
- Micron Technology, Inc.
- J. Brett Rolfson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device addressing gas contamination in a wet process
- Patent number 6,866,049
- Issue date Mar 15, 2005
- Micron Technology, Inc.
- J. Brett Rolfson
- B08 - CLEANING
Information Patent Grant
Radiation shielding for field emitters
- Patent number 6,860,777
- Issue date Mar 1, 2005
- Micron Technology, Inc.
- Terry N. Williams
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated capacitor bottom electrode for use with conformal dielec...
- Patent number 6,838,338
- Issue date Jan 4, 2005
- Micron Technology, Inc.
- Gurtej S. Sandhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making a resistor, method of making a diode, and SRAM cir...
- Patent number 6,767,785
- Issue date Jul 27, 2004
- Micron Technology, Inc.
- J. Brett Rolfson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming patterns across photoresist and methods of formi...
- Patent number 6,767,690
- Issue date Jul 27, 2004
- Micron Technology, Inc.
- J. Brett Rolfson
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Methods of masking and etching a semiconductor substrate, and ion i...
- Patent number 6,696,224
- Issue date Feb 24, 2004
- Micron Technology, Inc.
- J. Brett Rolfson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafer assemblies comprising photoresist over silicon...
- Patent number 6,693,345
- Issue date Feb 17, 2004
- Micron Technology, Inc.
- John T. Moore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of alloying a semiconductor device
- Patent number 6,664,171
- Issue date Dec 16, 2003
- Micron Technology, Inc.
- Fernando Gonzalez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-layer, attenuated phase-shifting mask
- Patent number 6,599,666
- Issue date Jul 29, 2003
- Micron Technology, Inc.
- J. Brett Rolfson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflectance method for evaluating the surface characteristics of op...
- Patent number 6,594,013
- Issue date Jul 15, 2003
- Micron Technology, Inc.
- Randhir P. S. Thakur
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
RETICLES WITH SUBDIVIDED BLOCKING REGIONS
- Publication number 20130157179
- Publication date Jun 20, 2013
- Micron Technology, Inc.
- J. Brett Rolfson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLES WITH SUBDIVIDED BLOCKING REGIONS AND METHODS OF FABRICATION
- Publication number 20120070768
- Publication date Mar 22, 2012
- Micron Technology, Inc.
- J. Brett Rolfson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLES WITH SUBDIVIDED BLOCKING REGIONS
- Publication number 20100112462
- Publication date May 6, 2010
- Micron Technology, Inc.
- J. Brett Rolfson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI-LAYER, ATTENUATED PHASE-SHIFTING MASK
- Publication number 20100040962
- Publication date Feb 18, 2010
- Micron Technology, Inc.
- J. Brett Rolfson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods for forming and cleaning photolithography reticles
- Publication number 20080057411
- Publication date Mar 6, 2008
- Craig M. Carpenter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI LAYER, ATTENUATED PHASE SHIFTING MASK
- Publication number 20070202418
- Publication date Aug 30, 2007
- Micron Technology, Inc.
- J. Brett Rolfson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor constructions comprising multi-level patterns of radi...
- Publication number 20070072343
- Publication date Mar 29, 2007
- John Aiton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for converting reticle configurations
- Publication number 20060257757
- Publication date Nov 16, 2006
- Randall W. Chance
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reticles
- Publication number 20060251974
- Publication date Nov 9, 2006
- J. Brett Rolfson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Partial edge bead removal to allow improved grounding during e-beam...
- Publication number 20060130969
- Publication date Jun 22, 2006
- J. Brett Rolfson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reticles and methods of forming reticles
- Publication number 20060121361
- Publication date Jun 8, 2006
- Micron Technology, Inc.
- J. Brett Rolfson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Partial edge bead removal to allow improved grounding during e-beam...
- Publication number 20060113280
- Publication date Jun 1, 2006
- J. Brett Rolfson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Device and method addressing gas contamination in a wet process
- Publication number 20060037628
- Publication date Feb 23, 2006
- J. Brett Rolfson
- B08 - CLEANING
Information Patent Application
Semiconductor constructions comprising multi-level patterns of radi...
- Publication number 20060024942
- Publication date Feb 2, 2006
- John Aiton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-layer, attenuated phase-shifting mask
- Publication number 20060008710
- Publication date Jan 12, 2006
- J. Brett Rolfson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus for uniformly baking substrates such as photomasks
- Publication number 20050205007
- Publication date Sep 22, 2005
- J. Brett Rolfson
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
Methods for converting reticle configurations
- Publication number 20050077266
- Publication date Apr 14, 2005
- Randal W. Chance
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Partial edge bead removal to allow improved grounding during e-beam...
- Publication number 20050008943
- Publication date Jan 13, 2005
- J. Brett Rolfson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods of masking and etching a semiconductor substrate, and ion i...
- Publication number 20040147129
- Publication date Jul 29, 2004
- J. Brett Rolfson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor wafer assemblies comprising photoresist over silicon...
- Publication number 20040124441
- Publication date Jul 1, 2004
- John T. Moore
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Device addressing gas contamination in a wet process
- Publication number 20040069330
- Publication date Apr 15, 2004
- J. Brett Rolfson
- B08 - CLEANING
Information Patent Application
Multi-layer, attenuated phase-shifting mask
- Publication number 20040023134
- Publication date Feb 5, 2004
- J. Brett Rolfson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of alloying a semiconductor device
- Publication number 20030173565
- Publication date Sep 18, 2003
- Micron Technology, Inc.
- Fernando Gonzalez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of forming patterns across photoresist and methods of formi...
- Publication number 20030162106
- Publication date Aug 28, 2003
- J. Brett Rolfson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Integrated capacitor bottom electrode for use with conformal dielec...
- Publication number 20030153145
- Publication date Aug 14, 2003
- Gurtej S. Sandhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for uniformly baking substrates such as photom...
- Publication number 20030124469
- Publication date Jul 3, 2003
- J. Brett Rolfson
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
Method and apparatus for uniformly baking substrates such as photom...
- Publication number 20030124470
- Publication date Jul 3, 2003
- J. Brett Rolfson
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
Methods of masking and etching a semiconductor substrate, and ion i...
- Publication number 20030096195
- Publication date May 22, 2003
- J. Brett Rolfson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of alloying a semiconductor device
- Publication number 20030077913
- Publication date Apr 24, 2003
- Micron Technology, Inc.
- Fernando Gonzalez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Radiation shielding for field emitters
- Publication number 20030057861
- Publication date Mar 27, 2003
- Micron Technology, Inc.
- Terry N. Williams
- H01 - BASIC ELECTRIC ELEMENTS

J. Brett Rolfson

Person

Patents Grantslast 30 patents

Reticles with subdivided blocking regions

Methods of fabricating reticles with subdivided blocking regions

Reticles with subdivided blocking regions

Multi-layer, attenuated phase-shifting mask

Methods for forming and cleaning photolithography reticles

Multi-layer, attenuated phase-shifting mask

Methods for converting reticle configurations and methods for modif...

Semiconductor constructions comprising multi-level patterns of radi...

Reticles

Reticles and methods of forming reticles

Partial edge bead removal to allow improved grounding during e-beam...

Methods of forming wire bonds for semiconductor constructions

Multi-layer, attenuated phase-shifting mask

Methods for converting reticle configurations

Semiconductor wafer assemblies comprising photoresist over silicon...

Ion implant lithography method of processing a semiconductor substrate

Partial edge bead removal to allow improved grounding during e-beam...

Method and apparatus for uniformly baking substrates such as photom...

Apparatus for uniformly baking substrates such as photomasks

Multi-layer, attenuated phase-shifting mask

Device addressing gas contamination in a wet process

Radiation shielding for field emitters

Integrated capacitor bottom electrode for use with conformal dielec...

Method of making a resistor, method of making a diode, and SRAM cir...

Methods of forming patterns across photoresist and methods of formi...

Methods of masking and etching a semiconductor substrate, and ion i...

Semiconductor wafer assemblies comprising photoresist over silicon...

Method of alloying a semiconductor device

Multi-layer, attenuated phase-shifting mask

Reflectance method for evaluating the surface characteristics of op...

Patents Applicationslast 30 patents

RETICLES WITH SUBDIVIDED BLOCKING REGIONS

RETICLES WITH SUBDIVIDED BLOCKING REGIONS AND METHODS OF FABRICATION

RETICLES WITH SUBDIVIDED BLOCKING REGIONS

MULTI-LAYER, ATTENUATED PHASE-SHIFTING MASK

Methods for forming and cleaning photolithography reticles

MULTI LAYER, ATTENUATED PHASE SHIFTING MASK

Semiconductor constructions comprising multi-level patterns of radi...

Methods for converting reticle configurations

Reticles

Partial edge bead removal to allow improved grounding during e-beam...

Reticles and methods of forming reticles

Partial edge bead removal to allow improved grounding during e-beam...

Device and method addressing gas contamination in a wet process

Semiconductor constructions comprising multi-level patterns of radi...

Multi-layer, attenuated phase-shifting mask

Apparatus for uniformly baking substrates such as photomasks

Methods for converting reticle configurations

Partial edge bead removal to allow improved grounding during e-beam...

Methods of masking and etching a semiconductor substrate, and ion i...

Semiconductor wafer assemblies comprising photoresist over silicon...

Device addressing gas contamination in a wet process

Multi-layer, attenuated phase-shifting mask

Method of alloying a semiconductor device

Methods of forming patterns across photoresist and methods of formi...

Integrated capacitor bottom electrode for use with conformal dielec...

Method and apparatus for uniformly baking substrates such as photom...

Method and apparatus for uniformly baking substrates such as photom...

Methods of masking and etching a semiconductor substrate, and ion i...

Method of alloying a semiconductor device

Radiation shielding for field emitters