James P. Cruse

Person

Soquel, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods and apparatus for providing a gas mixture to a pair of proc...
- Patent number 9,587,789
- Issue date Mar 7, 2017
- Applied Materials, Inc.
- Jared Ahmad Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for rapidly responsive heat control in plasma...
- Patent number 9,155,134
- Issue date Oct 6, 2015
- Applied Materials, Inc.
- Chunlei Zhang
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method for removing halogen-containing residues from substrate
- Patent number 8,992,689
- Issue date Mar 31, 2015
- Applied Materials, Inc.
- Adauto Diaz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas delivery system and method of use thereof
- Patent number 8,931,512
- Issue date Jan 13, 2015
- Applied Materials, Inc.
- James P. Cruse
- G05 - CONTROLLING REGULATING
Information Patent Grant
Methods and apparatus for rapidly responsive heat control in plasma...
- Patent number 8,895,889
- Issue date Nov 25, 2014
- Applied Materials, Inc.
- Chunlei Zhang
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method extending the service interval of a gas distribution plate
- Patent number 8,845,816
- Issue date Sep 30, 2014
- Applied Materials, Inc.
- Adauto Diaz
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for processing substrates in process systems having shared...
- Patent number 8,721,798
- Issue date May 13, 2014
- Applied Materials, Inc.
- James P. Cruse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for calibrating flow controllers in substrate...
- Patent number 8,707,754
- Issue date Apr 29, 2014
- Applied Materials, Inc.
- James P. Cruse
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Methods and apparatus for providing a gas mixture to a pair of proc...
- Patent number 8,616,224
- Issue date Dec 31, 2013
- Applied Materials, Inc.
- Jared Ahmad Lee
- F17 - STORING OF DISTRIBUTING GASES OR LIQUIDS
Information Patent Grant
Methods and apparatus for calibrating pressure gauges in a substrat...
- Patent number 8,616,043
- Issue date Dec 31, 2013
- Applied Materials, Inc.
- James P. Cruse
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus for radial delivery of gas to a chamber and methods of us...
- Patent number 8,562,742
- Issue date Oct 22, 2013
- Applied Materials, Inc.
- Jared Ahmad Lee
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Methods and apparatus for tuning matching networks
- Patent number 8,513,889
- Issue date Aug 20, 2013
- Applied Materials, Inc.
- Chunlei Zhang
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Methods for processing substrates in process systems having shared...
- Patent number 8,496,756
- Issue date Jul 30, 2013
- Applied Materials, Inc.
- James P. Cruse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for monitoring processing equipment
- Patent number 8,473,247
- Issue date Jun 25, 2013
- Applied Materials, Inc.
- James P. Cruse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for extending the lifetime of pressure gauges coupled to su...
- Patent number 8,454,756
- Issue date Jun 4, 2013
- Applied Materials, Inc.
- James P. Cruse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for multiple frequency power application
- Patent number 8,237,517
- Issue date Aug 7, 2012
- Applied Materials, Inc.
- Steven C. Shannon
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Low power RF tuning using optical and non-reflected power methods
- Patent number 8,144,329
- Issue date Mar 27, 2012
- Applied Materials, Inc.
- James P. Cruse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for processing substrates in a dual chamber processing syst...
- Patent number 8,097,088
- Issue date Jan 17, 2012
- Applied Materials, Inc.
- Eu Jin Lim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma process uniformity across a wafer by controlling a variable...
- Patent number 8,080,479
- Issue date Dec 20, 2011
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for controlling gas flow to a processing chamber
- Patent number 8,074,677
- Issue date Dec 13, 2011
- Applied Materials, Inc.
- Ezra Robert Gold
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma process uniformity across a wafer by controlling RF phase be...
- Patent number 8,076,247
- Issue date Dec 13, 2011
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for multiple frequency power application
- Patent number 7,994,872
- Issue date Aug 9, 2011
- Applied Materials, Inc.
- Steven C. Shannon
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Plasma reactor with reduced electrical skew using electrical bypass...
- Patent number 7,988,815
- Issue date Aug 2, 2011
- Applied Materials, Inc.
- Shahid Rauf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for gas flow measurement
- Patent number 7,975,558
- Issue date Jul 12, 2011
- Applied Materials, Inc.
- Jared Ahmad Lee
- G01 - MEASURING TESTING
Information Patent Grant
Method of processing a workpiece in a plasma reactor with variable...
- Patent number 7,968,469
- Issue date Jun 28, 2011
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Elimination of flow and pressure gradients in low utilization proce...
- Patent number 7,955,646
- Issue date Jun 7, 2011
- Applied Materials, Inc.
- James P. Cruse
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma process uniformity across a wafer by apportioning ground ret...
- Patent number 7,884,025
- Issue date Feb 8, 2011
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Improving plasma process uniformity across a wafer by apportioning...
- Patent number 7,879,731
- Issue date Feb 1, 2011
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for controlling gas flow to a processing chamber
- Patent number 7,846,497
- Issue date Dec 7, 2010
- Applied Materials, Inc.
- Ezra Robert Gold
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for controlling gas flow to a processing chamber
- Patent number 7,775,236
- Issue date Aug 17, 2010
- Applied Materials, Inc.
- Ezra Robert Gold
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ETCH PROCESS HAVING ADAPTIVE CONTROL WITH ETCH DEPTH OF PRESSURE AN...
- Publication number 20140342570
- Publication date Nov 20, 2014
- Applied Materials, Inc.
- Kenny Linh Doan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PROVIDING A GAS MIXTURE TO A PAIR OF PROC...
- Publication number 20140076850
- Publication date Mar 20, 2014
- Applied Materials, Inc.
- JARED AHMAD LEE
- F17 - STORING OF DISTRIBUTING GASES OR LIQUIDS
Information Patent Application
METHODS AND APPARATUS FOR RAPIDLY RESPONSIVE HEAT CONTROL IN PLASMA...
- Publication number 20130180963
- Publication date Jul 18, 2013
- Applied Materials, Inc.
- CHUNLEI ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS DELIVERY SYSTEM AND METHOD OF USE THEREOF
- Publication number 20120227817
- Publication date Sep 13, 2012
- Applied Materials, Inc.
- JAMES P. CRUSE
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
METHOD EXTENDING THE SERVICE INTERVAL OF A GAS DISTRIBUTION PLATE
- Publication number 20120222752
- Publication date Sep 6, 2012
- Applied Materials, Inc.
- Adauto Diaz
- B08 - CLEANING
Information Patent Application
METHOD FOR REMOVING HALOGEN-CONTAINING RESIDUES FROM SUBSTRATE
- Publication number 20120222699
- Publication date Sep 6, 2012
- Applied Materials, Inc.
- Adauto Diaz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR REMOVING BYPRODUCTS FROM LOAD LOCK CHAMBERS
- Publication number 20110304078
- Publication date Dec 15, 2011
- Applied Materials, Inc.
- JARED AHMAD LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR MULTIPLE FREQUENCY POWER APPLICATION
- Publication number 20110291771
- Publication date Dec 1, 2011
- Applied Materials, Inc.
- Steven C. Shannon
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
PROCESS CHAMBERS HAVING SHARED RESOURCES AND METHODS OF USE THEREOF
- Publication number 20110269314
- Publication date Nov 3, 2011
- Applied Materials, Inc.
- JARED AHMAD LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TWIN CHAMBER PROCESSING SYSTEM
- Publication number 20110265951
- Publication date Nov 3, 2011
- Applied Materials, Inc.
- MING XU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHOD FOR CALIBRATING PRESSURE GAUGES IN A SUBSTRATE PR...
- Publication number 20110265899
- Publication date Nov 3, 2011
- Applied Materials, Inc.
- JAMES P. CRUSE
- G01 - MEASURING TESTING
Information Patent Application
METHODS AND APPARATUS FOR CALIBRATING FLOW CONTROLLERS IN SUBSTRATE...
- Publication number 20110265549
- Publication date Nov 3, 2011
- Applied Materials, Inc.
- JAMES P. CRUSE
- G01 - MEASURING TESTING
Information Patent Application
METHODS FOR PROCESSING SUBSTRATES IN PROCESS SYSTEMS HAVING SHARED...
- Publication number 20110265814
- Publication date Nov 3, 2011
- Applied Materials, Inc.
- JAMES P. CRUSE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR EXTENDING THE LIFETIME OF PRESSURE GAUGES COUPLED TO SU...
- Publication number 20110265824
- Publication date Nov 3, 2011
- Applied Materials, Inc.
- JAMES P. CRUSE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PROVIDING A GAS MIXTURE TO A PAIR OF PROC...
- Publication number 20110265831
- Publication date Nov 3, 2011
- Applied Materials, Inc.
- JARED AHMAD LEE
- F17 - STORING OF DISTRIBUTING GASES OR LIQUIDS
Information Patent Application
METHODS FOR MONITORING PROCESSING EQUIPMENT
- Publication number 20110270574
- Publication date Nov 3, 2011
- Applied Materials, Inc.
- JAMES P. CRUSE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR PROCESSING SUBSTRATES IN PROCESS SYSTEMS HAVING SHARED...
- Publication number 20110266256
- Publication date Nov 3, 2011
- Applied Materials, Inc.
- JAMES P. CRUSE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR REDUCING FLOW SPLITTING ERRORS USING ORIF...
- Publication number 20110265883
- Publication date Nov 3, 2011
- Applied Materials, Inc.
- JAMES P. CRUSE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR RADIAL DELIVERY OF GAS TO A CHAMBER AND METHODS OF US...
- Publication number 20110265887
- Publication date Nov 3, 2011
- Applied Materials, Inc.
- JARED AHMAD LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW POWER RF TUNING USING OPTICAL AND NON-REFLECTED POWER METHODS
- Publication number 20110263050
- Publication date Oct 27, 2011
- James P. Cruse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR TUNING MATCHING NETWORKS
- Publication number 20110162798
- Publication date Jul 7, 2011
- Applied Materials, Inc.
- CHUNLEI ZHANG
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
LOW POWER RF TUNING USING OPTICAL AND NON-REFLECTED POWER METHODS
- Publication number 20110011743
- Publication date Jan 20, 2011
- James P. Cruse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR WITH RF GENERATOR AND AUTOMATIC IMPEDANCE MATCH WITH...
- Publication number 20110009999
- Publication date Jan 13, 2011
- Applied Materials, Inc.
- Chunlei Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR GAS FLOW MEASUREMENT
- Publication number 20100251828
- Publication date Oct 7, 2010
- Jared Ahmad Lee
- G01 - MEASURING TESTING
Information Patent Application
METHODS AND APPARATUS FOR RAPIDLY RESPONSIVE HEAT CONTROL IN PLASMA...
- Publication number 20100096109
- Publication date Apr 22, 2010
- Applied Materials, Inc.
- CHUNLEI ZHANG
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
APPARATUS FOR MULTIPLE FREQUENCY POWER APPLICATION
- Publication number 20100013572
- Publication date Jan 21, 2010
- Applied Materials, Inc.
- STEVEN C. SHANNON
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
METHOD AND APPARATUS OF A SUBSTRATE ETCHING SYSTEM AND PROCESS
- Publication number 20090272717
- Publication date Nov 5, 2009
- Applied Materials, Inc.
- Sharma V. Pamarthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR LOW TEMPERATURE OXIDATION OF A SEMICONDUCTOR DEVICE
- Publication number 20090035952
- Publication date Feb 5, 2009
- Applied Materials, Inc.
- THAI CHENG CHUA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR WITH REDUCED ELECTRICAL SKEW USING ELECTRICAL BYPASS...
- Publication number 20090025878
- Publication date Jan 29, 2009
- Shahid Rauf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR WITH REDUCED ELECTRICAL SKEW USING A CONDUCTIVE BAFFLE
- Publication number 20090025879
- Publication date Jan 29, 2009
- Shahid Rauf
- H01 - BASIC ELECTRIC ELEMENTS

James P. Cruse

Person

Patents Grantslast 30 patents

Methods and apparatus for providing a gas mixture to a pair of proc...

Methods and apparatus for rapidly responsive heat control in plasma...

Method for removing halogen-containing residues from substrate

Gas delivery system and method of use thereof

Methods and apparatus for rapidly responsive heat control in plasma...

Method extending the service interval of a gas distribution plate

Methods for processing substrates in process systems having shared...

Methods and apparatus for calibrating flow controllers in substrate...

Methods and apparatus for providing a gas mixture to a pair of proc...

Methods and apparatus for calibrating pressure gauges in a substrat...

Apparatus for radial delivery of gas to a chamber and methods of us...

Methods and apparatus for tuning matching networks

Methods for processing substrates in process systems having shared...

Methods for monitoring processing equipment

Methods for extending the lifetime of pressure gauges coupled to su...

Apparatus for multiple frequency power application

Low power RF tuning using optical and non-reflected power methods

Methods for processing substrates in a dual chamber processing syst...

Plasma process uniformity across a wafer by controlling a variable...

Method and apparatus for controlling gas flow to a processing chamber

Plasma process uniformity across a wafer by controlling RF phase be...

Apparatus for multiple frequency power application

Plasma reactor with reduced electrical skew using electrical bypass...

Method and apparatus for gas flow measurement

Method of processing a workpiece in a plasma reactor with variable...

Elimination of flow and pressure gradients in low utilization proce...

Plasma process uniformity across a wafer by apportioning ground ret...

Improving plasma process uniformity across a wafer by apportioning...

Method and apparatus for controlling gas flow to a processing chamber

Method and apparatus for controlling gas flow to a processing chamber

Patents Applicationslast 30 patents

ETCH PROCESS HAVING ADAPTIVE CONTROL WITH ETCH DEPTH OF PRESSURE AN...

METHODS AND APPARATUS FOR PROVIDING A GAS MIXTURE TO A PAIR OF PROC...

METHODS AND APPARATUS FOR RAPIDLY RESPONSIVE HEAT CONTROL IN PLASMA...

GAS DELIVERY SYSTEM AND METHOD OF USE THEREOF

METHOD EXTENDING THE SERVICE INTERVAL OF A GAS DISTRIBUTION PLATE

METHOD FOR REMOVING HALOGEN-CONTAINING RESIDUES FROM SUBSTRATE

METHODS FOR REMOVING BYPRODUCTS FROM LOAD LOCK CHAMBERS

APPARATUS FOR MULTIPLE FREQUENCY POWER APPLICATION

PROCESS CHAMBERS HAVING SHARED RESOURCES AND METHODS OF USE THEREOF

TWIN CHAMBER PROCESSING SYSTEM

SYSTEM AND METHOD FOR CALIBRATING PRESSURE GAUGES IN A SUBSTRATE PR...

METHODS AND APPARATUS FOR CALIBRATING FLOW CONTROLLERS IN SUBSTRATE...

METHODS FOR PROCESSING SUBSTRATES IN PROCESS SYSTEMS HAVING SHARED...

METHODS FOR EXTENDING THE LIFETIME OF PRESSURE GAUGES COUPLED TO SU...

METHODS AND APPARATUS FOR PROVIDING A GAS MIXTURE TO A PAIR OF PROC...

METHODS FOR MONITORING PROCESSING EQUIPMENT

METHODS FOR PROCESSING SUBSTRATES IN PROCESS SYSTEMS HAVING SHARED...

METHODS AND APPARATUS FOR REDUCING FLOW SPLITTING ERRORS USING ORIF...

APPARATUS FOR RADIAL DELIVERY OF GAS TO A CHAMBER AND METHODS OF US...

LOW POWER RF TUNING USING OPTICAL AND NON-REFLECTED POWER METHODS

METHODS AND APPARATUS FOR TUNING MATCHING NETWORKS

LOW POWER RF TUNING USING OPTICAL AND NON-REFLECTED POWER METHODS

PLASMA REACTOR WITH RF GENERATOR AND AUTOMATIC IMPEDANCE MATCH WITH...

METHOD AND APPARATUS FOR GAS FLOW MEASUREMENT

METHODS AND APPARATUS FOR RAPIDLY RESPONSIVE HEAT CONTROL IN PLASMA...

APPARATUS FOR MULTIPLE FREQUENCY POWER APPLICATION

METHOD AND APPARATUS OF A SUBSTRATE ETCHING SYSTEM AND PROCESS

METHODS FOR LOW TEMPERATURE OXIDATION OF A SEMICONDUCTOR DEVICE

PLASMA REACTOR WITH REDUCED ELECTRICAL SKEW USING ELECTRICAL BYPASS...

PLASMA REACTOR WITH REDUCED ELECTRICAL SKEW USING A CONDUCTIVE BAFFLE