JEFF FARBER

Person

DELMAR, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and system for uniformly applying a multi-phase cleaning sol...
- Patent number 8,726,919
- Issue date May 20, 2014
- Lam Research Corporation
- Jeffrey J. Farber
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method and apparatus for cleaning a substrate using non-newtonian f...
- Patent number 8,671,959
- Issue date Mar 18, 2014
- Lam Research Corporation
- John M. de Larios
- B08 - CLEANING
Information Patent Grant
Method and system for uniformly applying a multi-phase cleaning sol...
- Patent number 8,567,421
- Issue date Oct 29, 2013
- Lam Research Corporation
- Jeffrey J. Farber
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method and apparatus for cleaning semiconductor wafers using compre...
- Patent number 8,535,451
- Issue date Sep 17, 2013
- Lam Research Corporation
- John M. de Larios
- B08 - CLEANING
Information Patent Grant
Method and apparatus for cleaning a substrate using non-Newtonian f...
- Patent number 8,043,441
- Issue date Oct 25, 2011
- Lam Research Corporation
- John M. de Larios
- B08 - CLEANING
Information Patent Grant
Method and apparatus for uniformly applying a multi-phase cleaning...
- Patent number 7,913,703
- Issue date Mar 29, 2011
- Lam Research Corporation
- Jeffrey J. Farber
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Reducing mechanical resonance and improved distribution of fluids i...
- Patent number 7,811,424
- Issue date Oct 12, 2010
- Lam Research Corporation
- Carl Woods
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Brush core assembly
- Patent number 7,735,177
- Issue date Jun 15, 2010
- Lam Research Corporation
- Jeffrey J. Farber
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controls of ambient environment during wafer drying using proximity...
- Patent number 7,614,411
- Issue date Nov 10, 2009
- Lam Research Corporation
- Mikhail Korolik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for cleaning semiconductor wafers using compre...
- Patent number 7,568,490
- Issue date Aug 4, 2009
- Lam Research Corporation
- John M. de Larios
- B08 - CLEANING
Information Patent Grant
System and method for producing bubble free liquids for nanometer s...
- Patent number 7,452,408
- Issue date Nov 18, 2008
- Lam Research Corporation
- Jeffrey J. Farber
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Method and apparatus for controlling CMP pad surface finish
- Patent number 6,939,207
- Issue date Sep 6, 2005
- Lam Research Corporation
- Alan J. Jensen
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for controlling CMP pad surface finish
- Patent number 6,645,052
- Issue date Nov 11, 2003
- Lam Research Corporation
- Alan J. Jensen
- B24 - GRINDING POLISHING
Information Patent Grant
Method and system of cleaning a wafer after chemical mechanical pol...
- Patent number 6,405,399
- Issue date Jun 18, 2002
- Lam Research Corporation
- Jeffrey J. Farber
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for cleaning substrate surfaces after etch operations
- Patent number 6,187,684
- Issue date Feb 13, 2001
- Lam Research Corporation
- Jeffrey J. Farber
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Controls of Ambient Environment During Wafer Drying Using Proximity...
- Publication number 20140332037
- Publication date Nov 13, 2014
- LAM RESEARCH CORPORATION
- Mikhail Korolik
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
METHOD AND SYSTEM FOR UNIFORMLY APPLYING A MULTI-PHASE CLEANING SOL...
- Publication number 20140202503
- Publication date Jul 24, 2014
- LAM RESEARCH CORPORATION
- Jeffrey J. Farber
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR CLEANING A SUBSTRATE USING NON-NEWTONIAN F...
- Publication number 20140158167
- Publication date Jun 12, 2014
- LAM RESEARCH CORPORATION
- John M. de Larios
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
Method and System for Uniformly Applying a Multi-Phase Cleaning Sol...
- Publication number 20140014146
- Publication date Jan 16, 2014
- LAM RESEARCH CORPORATION
- Jeffrey J. Farber
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS AND APPARATUS FOR REMOVAL OF CONTAMINATING MATERIAL FROM SU...
- Publication number 20120129344
- Publication date May 24, 2012
- Helmuth Treichel
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
METHOD AND APPARATUS FOR CLEANING A SUBSTRATE USING NON-NEWTONIAN F...
- Publication number 20120017950
- Publication date Jan 26, 2012
- LAM RESEARCH CORPORATION
- John M. de Larios
- B08 - CLEANING
Information Patent Application
Method and System for Uniformly Applying a Multi-Phase Cleaning Sol...
- Publication number 20110132400
- Publication date Jun 9, 2011
- LAM RESEARCH CORPORATION
- Jeffrey J. Farber
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Modifications to Surface Topography of Proximity Head
- Publication number 20100294742
- Publication date Nov 25, 2010
- Enrico Magni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROLS OF AMBIENT ENVIRONMENT DURING WAFER DRYING USING PROXIMITY...
- Publication number 20090320884
- Publication date Dec 31, 2009
- Mikhail Korolik
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Method and Apparatus for Cleaning Semiconductor Wafers Using Compre...
- Publication number 20090078282
- Publication date Mar 26, 2009
- Lam Research Corporation
- John M. de Larios
- B08 - CLEANING
Information Patent Application
System and method for producing bubble free liquids for nanometer s...
- Publication number 20070000387
- Publication date Jan 4, 2007
- LAM RESEARCH CORPORATION
- Jeffrey J. Farber
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Method and apparatus for cleaning a substrate using non-newtonian f...
- Publication number 20060283486
- Publication date Dec 21, 2006
- LAM RESEARCH CORPORATION
- John M. de Larios
- B08 - CLEANING
Information Patent Application
Method and apparatus for cleaning semiconductor wafers using compre...
- Publication number 20050133060
- Publication date Jun 23, 2005
- John M. de Larios
- B08 - CLEANING
Information Patent Application
Method and apparatus for controlling CMP pad surface finish
- Publication number 20040127144
- Publication date Jul 1, 2004
- Lam Research Corporation
- Alan J. Jensen
- B24 - GRINDING POLISHING
Information Patent Application
Method and apparatus for controlling CMP pad surface finish
- Publication number 20030082997
- Publication date May 1, 2003
- Alan J. Jensen
- B24 - GRINDING POLISHING
Information Patent Application
POST-PLASMA PROCESSING WAFER CLEANING METHOD AND SYSTEM
- Publication number 20020031914
- Publication date Mar 14, 2002
- JULIA S. SVIRCHEVSKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH RPM MEGASONIC CLEANING
- Publication number 20010047810
- Publication date Dec 6, 2001
- JEFF FARBER
- B08 - CLEANING

JEFF FARBER

Person

Patents Grantslast 30 patents

Method and system for uniformly applying a multi-phase cleaning sol...

Method and apparatus for cleaning a substrate using non-newtonian f...

Method and system for uniformly applying a multi-phase cleaning sol...

Method and apparatus for cleaning semiconductor wafers using compre...

Method and apparatus for cleaning a substrate using non-Newtonian f...

Method and apparatus for uniformly applying a multi-phase cleaning...

Reducing mechanical resonance and improved distribution of fluids i...

Brush core assembly

Controls of ambient environment during wafer drying using proximity...

Method and apparatus for cleaning semiconductor wafers using compre...

System and method for producing bubble free liquids for nanometer s...

Method and apparatus for controlling CMP pad surface finish

Method and apparatus for controlling CMP pad surface finish

Method and system of cleaning a wafer after chemical mechanical pol...

Methods for cleaning substrate surfaces after etch operations

Patents Applicationslast 30 patents

Controls of Ambient Environment During Wafer Drying Using Proximity...

METHOD AND SYSTEM FOR UNIFORMLY APPLYING A MULTI-PHASE CLEANING SOL...

METHOD AND APPARATUS FOR CLEANING A SUBSTRATE USING NON-NEWTONIAN F...

Method and System for Uniformly Applying a Multi-Phase Cleaning Sol...

PROCESS AND APPARATUS FOR REMOVAL OF CONTAMINATING MATERIAL FROM SU...

METHOD AND APPARATUS FOR CLEANING A SUBSTRATE USING NON-NEWTONIAN F...

Method and System for Uniformly Applying a Multi-Phase Cleaning Sol...

Modifications to Surface Topography of Proximity Head

CONTROLS OF AMBIENT ENVIRONMENT DURING WAFER DRYING USING PROXIMITY...

Method and Apparatus for Cleaning Semiconductor Wafers Using Compre...

System and method for producing bubble free liquids for nanometer s...

Method and apparatus for cleaning a substrate using non-newtonian f...

Method and apparatus for cleaning semiconductor wafers using compre...

Method and apparatus for controlling CMP pad surface finish

Method and apparatus for controlling CMP pad surface finish

POST-PLASMA PROCESSING WAFER CLEANING METHOD AND SYSTEM

HIGH RPM MEGASONIC CLEANING