Jen Chieh Shih

Person

Jhubei City, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Mirror display module
- Patent number 10,809,586
- Issue date Oct 20, 2020
- Au Optronics Corporation
- Jen-Hao Shih
- G02 - OPTICS
Information Patent Grant
Device and method for providing wavelength reduction with a photomask
- Patent number 8,563,198
- Issue date Oct 22, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Burn Jeng Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Material and method for photolithography
- Patent number 8,460,856
- Issue date Jun 11, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiao-Wei Yeh
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Si device making method by using a novel material for packing and u...
- Patent number 8,039,195
- Issue date Oct 18, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jen-Chieh Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Material and method for photolithography
- Patent number 8,029,969
- Issue date Oct 4, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiao-Wei Yeh
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of making openings in a layer of a semiconductor device
- Patent number 7,972,957
- Issue date Jul 5, 2011
- Taiwan Semiconductor Manufacturing Company
- Bang-Chein Ho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor using specific contact angle for immersion lithography
- Patent number 7,948,096
- Issue date May 24, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Bang-Ching Ho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Seal ring arrangements for immersion lithography systems
- Patent number 7,924,401
- Issue date Apr 12, 2011
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Burn Jeng Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for photoresist characterization and analysis
- Patent number 7,777,184
- Issue date Aug 17, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiao-Wei Yeh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scatterometric method of monitoring hot plate temperature and facil...
- Patent number 7,751,025
- Issue date Jul 6, 2010
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Li-Jui Chen
- G01 - MEASURING TESTING
Information Patent Grant
Multi-focus scanning with a tilted mask or wafer
- Patent number 7,667,821
- Issue date Feb 23, 2010
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Burn-J. Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for dual damascene process
- Patent number 7,642,184
- Issue date Jan 5, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ching-Yu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Seal ring arrangements for immersion lithography systems
- Patent number 7,517,639
- Issue date Apr 14, 2009
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Burn Jeng Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion lithography system with wafer sealing mechanisms
- Patent number 7,501,226
- Issue date Mar 10, 2009
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Burn Jeng Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Via plug formation in dual damascene process
- Patent number 7,452,822
- Issue date Nov 18, 2008
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jen-Chieh Shih
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for manufacturing semiconductor devices using an...
- Patent number 7,279,793
- Issue date Oct 9, 2007
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Bang-Ching Ho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Immersion lithography apparatus and method
- Patent number 7,268,357
- Issue date Sep 11, 2007
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chin-Hsiang Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for manufacturing semiconductor devices using a v...
- Patent number 7,238,624
- Issue date Jul 3, 2007
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jen-Chieh Shih
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Immersion optical projection system
- Patent number 7,180,572
- Issue date Feb 20, 2007
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jen-Chieh Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scatterometric method of monitoring hot plate temperature and facil...
- Patent number 7,135,259
- Issue date Nov 14, 2006
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Li-Jui Chen
- G01 - MEASURING TESTING
Information Patent Grant
Method using specific contact angle for immersion lithography
- Patent number 7,119,035
- Issue date Oct 10, 2006
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Bang-Ching Ho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming openings in a substrate using bottom antireflect...
- Patent number 6,900,134
- Issue date May 31, 2005
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jen-Chieh Shih
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MIRROR DISPLAY MODULE
- Publication number 20190196290
- Publication date Jun 27, 2019
- AU OPTRONICS CORPORATION
- Jen-Hao Shih
- G02 - OPTICS
Information Patent Application
MATERIAL AND METHOD FOR PHOTOLITHOGRAPHY
- Publication number 20120009524
- Publication date Jan 12, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiao-Wei Yeh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Si Device Making Method By Using A Novel Material For Packing and U...
- Publication number 20090203224
- Publication date Aug 13, 2009
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jen-Chieh Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Seal Ring Arrangements for Immersion Lithography Systems
- Publication number 20090180087
- Publication date Jul 16, 2009
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Burn Jeng Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PHOTORESIST CHARACTERIZATION AND ANALYSIS
- Publication number 20090057554
- Publication date Mar 5, 2009
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiao-Wei Yeh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATERIAL AND METHOD FOR PHOTOLITHOGRAPHY
- Publication number 20080286682
- Publication date Nov 20, 2008
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiao-Wei Yeh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method For Dual Damascene Process
- Publication number 20080227287
- Publication date Sep 18, 2008
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ching-Yu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of making openings in a layer of a semiconductor device
- Publication number 20070202690
- Publication date Aug 30, 2007
- Taiwan Semiconductor Manufacturing Co., Ltd.,
- Bang-Chein Ho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Via plug formation in dual damascene process
- Publication number 20070190778
- Publication date Aug 16, 2007
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jen-Chieh Shih
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Scatterometric method of monitoring hot plate temperature and facil...
- Publication number 20070068453
- Publication date Mar 29, 2007
- Taiwan Semiconductor Manufacturing Co., LTD
- Li-Jui Chen
- G01 - MEASURING TESTING
Information Patent Application
Seal ring arrangements for immersion lithography systems
- Publication number 20070008508
- Publication date Jan 11, 2007
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Burn Jeng Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithography process with an enhanced depth-on-focus
- Publication number 20060292501
- Publication date Dec 28, 2006
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jen-Chieh Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Immersion lithography apparatus and method
- Publication number 20060256306
- Publication date Nov 16, 2006
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chin-Hsiang Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for semiconductor manufacturing using a negative photoresist...
- Publication number 20060228894
- Publication date Oct 12, 2006
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Bang-Ching Ho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Dual-damascene process for manufacturing semiconductor devices
- Publication number 20060223309
- Publication date Oct 5, 2006
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Bang-Ching Ho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and method for manufacturing semiconductor devices using a v...
- Publication number 20060199388
- Publication date Sep 7, 2006
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jen-Chieh Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for manufacturing semiconductor devices using a photo acid g...
- Publication number 20060199111
- Publication date Sep 7, 2006
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jen-Chieh Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method using specific contact angle for immersion lithography
- Publication number 20060189172
- Publication date Aug 24, 2006
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Bang-Ching Ho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Plug filling without step-height difference for dual damascene process
- Publication number 20060145355
- Publication date Jul 6, 2006
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jen-Chieh Shih
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and method for manufacturing semiconductor devices using an...
- Publication number 20060118956
- Publication date Jun 8, 2006
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Bang-Ching Ho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method using specific contact angle for immersion lithography
- Publication number 20060110945
- Publication date May 25, 2006
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Bang-Ching Ho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask with wavelength reduction material and pellicle
- Publication number 20060083997
- Publication date Apr 20, 2006
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Burn Jeng Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Immersion lithography system with wafer sealing mechanisms
- Publication number 20050286033
- Publication date Dec 29, 2005
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Burn Jeng Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Immersion optical projection system
- Publication number 20050286030
- Publication date Dec 29, 2005
- Jen-Chieh Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multi-focus scanning with a tilted mask or wafer
- Publication number 20050270508
- Publication date Dec 8, 2005
- Burn-J. Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming openings in a substrate using a packing and unpa...
- Publication number 20050181313
- Publication date Aug 18, 2005
- Jen-Chieh Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Device and method for providing wavelength reduction with a photomask
- Publication number 20050100798
- Publication date May 12, 2005
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Burn Jeng Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Scatterometric method of monitoring hot plate temperature and facil...
- Publication number 20040241561
- Publication date Dec 2, 2004
- Li-Jui Chen
- G01 - MEASURING TESTING

Jen Chieh Shih

Person

Patents Grantslast 30 patents

Mirror display module

Device and method for providing wavelength reduction with a photomask

Material and method for photolithography

Si device making method by using a novel material for packing and u...

Material and method for photolithography

Method of making openings in a layer of a semiconductor device

Semiconductor using specific contact angle for immersion lithography

Seal ring arrangements for immersion lithography systems

Method for photoresist characterization and analysis

Scatterometric method of monitoring hot plate temperature and facil...

Multi-focus scanning with a tilted mask or wafer

Method for dual damascene process

Seal ring arrangements for immersion lithography systems

Immersion lithography system with wafer sealing mechanisms

Via plug formation in dual damascene process

System and method for manufacturing semiconductor devices using an...

Immersion lithography apparatus and method

System and method for manufacturing semiconductor devices using a v...

Immersion optical projection system

Scatterometric method of monitoring hot plate temperature and facil...

Method using specific contact angle for immersion lithography

Method for forming openings in a substrate using bottom antireflect...

Patents Applicationslast 30 patents

MIRROR DISPLAY MODULE

MATERIAL AND METHOD FOR PHOTOLITHOGRAPHY

Si Device Making Method By Using A Novel Material For Packing and U...

Seal Ring Arrangements for Immersion Lithography Systems

METHOD FOR PHOTORESIST CHARACTERIZATION AND ANALYSIS

MATERIAL AND METHOD FOR PHOTOLITHOGRAPHY

Method For Dual Damascene Process

Method of making openings in a layer of a semiconductor device

Via plug formation in dual damascene process

Scatterometric method of monitoring hot plate temperature and facil...

Seal ring arrangements for immersion lithography systems

Lithography process with an enhanced depth-on-focus

Immersion lithography apparatus and method

Method for semiconductor manufacturing using a negative photoresist...

Dual-damascene process for manufacturing semiconductor devices

System and method for manufacturing semiconductor devices using a v...

Method for manufacturing semiconductor devices using a photo acid g...

Method using specific contact angle for immersion lithography

Plug filling without step-height difference for dual damascene process

System and method for manufacturing semiconductor devices using an...

Method using specific contact angle for immersion lithography

Photomask with wavelength reduction material and pellicle

Immersion lithography system with wafer sealing mechanisms

Immersion optical projection system

Multi-focus scanning with a tilted mask or wafer

Method for forming openings in a substrate using a packing and unpa...

Device and method for providing wavelength reduction with a photomask

Scatterometric method of monitoring hot plate temperature and facil...