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Jianshe Tang
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Sunnyvale, CA, US
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Patents Grants
last 30 patents
Information
Patent Grant
Steam-assisted single substrate cleaning process and apparatus
Patent number
12,106,976
Issue date
Oct 1, 2024
Applied Materials, Inc.
Jianshe Tang
B08 - CLEANING
Information
Patent Grant
Steam treatment stations for chemical mechanical polishing system
Patent number
12,030,093
Issue date
Jul 9, 2024
Applied Materials, Inc.
Haosheng Wu
B08 - CLEANING
Information
Patent Grant
Slurry distribution device for chemical mechanical polishing
Patent number
11,986,926
Issue date
May 21, 2024
Applied Materials, Inc.
Yen-Chu Yang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Wafer edge asymmetry correction using groove in polishing pad
Patent number
11,951,589
Issue date
Apr 9, 2024
Applied Materials, Inc.
Jimin Zhang
B24 - GRINDING POLISHING
Information
Patent Grant
Methods and apparatus for forming dual metal interconnects
Patent number
11,948,885
Issue date
Apr 2, 2024
Applied Materials, Inc.
Suketu A Parikh
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Chemical mechanical polishing using time share control
Patent number
11,931,854
Issue date
Mar 19, 2024
Applied Materials, Inc.
Jimin Zhang
B24 - GRINDING POLISHING
Information
Patent Grant
Low-temperature metal CMP for minimizing dishing and corrosion, and...
Patent number
11,897,079
Issue date
Feb 13, 2024
Applied Materials, Inc.
Haosheng Wu
B24 - GRINDING POLISHING
Information
Patent Grant
Chemical mechanical polishing using time share control
Patent number
11,883,923
Issue date
Jan 30, 2024
Applied Materials, Inc.
Jimin Zhang
B24 - GRINDING POLISHING
Information
Patent Grant
Temperature-based in-situ edge assymetry correction during CMP
Patent number
11,865,671
Issue date
Jan 9, 2024
Applied Materials, Inc.
Haosheng Wu
B24 - GRINDING POLISHING
Information
Patent Grant
Temperature and slurry flow rate control in CMP
Patent number
11,826,872
Issue date
Nov 28, 2023
Applied Materials, Inc.
Haosheng Wu
B24 - GRINDING POLISHING
Information
Patent Grant
Apparatus and method of substrate edge cleaning and substrate carri...
Patent number
11,823,916
Issue date
Nov 21, 2023
Applied Materials, Inc.
Wei Lu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Slurry distribution device for chemical mechanical polishing
Patent number
11,806,835
Issue date
Nov 7, 2023
Applied Materials, Inc.
Yen-Chu Yang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Chemical mechanical polishing with applied magnetic field
Patent number
11,787,008
Issue date
Oct 17, 2023
Applied Materials, Inc.
Xingfeng Wang
B24 - GRINDING POLISHING
Information
Patent Grant
Chemical mechanical polishing temperature scanning apparatus for te...
Patent number
11,752,589
Issue date
Sep 12, 2023
Applied Materials, Inc.
Hari Soundararajan
B24 - GRINDING POLISHING
Information
Patent Grant
Steam-assisted single substrate cleaning process and apparatus
Patent number
11,728,185
Issue date
Aug 15, 2023
Applied Materials, Inc.
Jianshe Tang
B08 - CLEANING
Information
Patent Grant
Temperature-based assymetry correction during CMP and nozzle for me...
Patent number
11,697,187
Issue date
Jul 11, 2023
Applied Materials, Inc.
Haosheng Wu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Use of steam for pre-heating of CMP components
Patent number
11,633,833
Issue date
Apr 25, 2023
Applied Materials, Inc.
Haosheng Wu
B24 - GRINDING POLISHING
Information
Patent Grant
Steam cleaning of CMP components
Patent number
11,628,478
Issue date
Apr 18, 2023
Applied Materials, Inc.
Haosheng Wu
B08 - CLEANING
Information
Patent Grant
Temperature control of chemical mechanical polishing
Patent number
11,597,052
Issue date
Mar 7, 2023
Applied Materials, Inc.
Hari Soundararajan
B24 - GRINDING POLISHING
Information
Patent Grant
Steam treatment stations for chemical mechanical polishing system
Patent number
11,446,711
Issue date
Sep 20, 2022
Applied Materials, Inc.
Haosheng Wu
B08 - CLEANING
Information
Patent Grant
Chemical mechanical polishing using time share control
Patent number
11,298,794
Issue date
Apr 12, 2022
Applied Materials, Inc.
Jimin Zhang
B24 - GRINDING POLISHING
Information
Patent Grant
Slurry distribution device for chemical mechanical polishing
Patent number
11,077,536
Issue date
Aug 3, 2021
Applied Materials, Inc.
Yen-Chu Yang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Methods and apparatus for forming dual metal interconnects
Patent number
11,075,165
Issue date
Jul 27, 2021
Applied Materials, Inc.
Suketu A Parikh
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Slurry distribution device for chemical mechanical polishing
Patent number
10,967,483
Issue date
Apr 6, 2021
Applied Materials, Inc.
Yen-Chu Yang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Acoustic emission monitoring and endpoint for chemical mechanical p...
Patent number
10,478,937
Issue date
Nov 19, 2019
Applied Materials, Inc.
Jianshe Tang
B24 - GRINDING POLISHING
Information
Patent Grant
Overpolishing based on electromagnetic inductive monitoring of tren...
Patent number
10,350,723
Issue date
Jul 16, 2019
Applied Materials, Inc.
Shih-Haur Shen
B24 - GRINDING POLISHING
Information
Patent Grant
Systems, methods and apparatus for post-chemical mechanical planari...
Patent number
10,256,120
Issue date
Apr 9, 2019
Applied Materials, Inc.
Clinton P. Sakata
B08 - CLEANING
Information
Patent Grant
Single wafer dryer and drying methods
Patent number
7,980,255
Issue date
Jul 19, 2011
Applied Materials, Inc.
Younes Achkire
B08 - CLEANING
Information
Patent Grant
Cleaning submicron structures on a semiconductor wafer surface
Patent number
7,718,009
Issue date
May 18, 2010
Applied Materials, Inc.
Steven Verhaverbeke
C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information
Patent Grant
Frontside structure damage protected megasonics clean
Patent number
7,682,457
Issue date
Mar 23, 2010
Applied Materials, Inc.
Zhiyong Li
B08 - CLEANING
Patents Applications
last 30 patents
Information
Patent Application
METHOD AND APPARATUS TO CLEAN SUBSTRATE WITH ATOMIZING NOZZLE
Publication number
20240408650
Publication date
Dec 12, 2024
Applied Materials, Inc.
Haosheng Wu
B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information
Patent Application
CHEMICAL MECHANICAL POLISH PAD CONDITIONER WITH MULTIPLE DISKS
Publication number
20240391056
Publication date
Nov 28, 2024
Applied Materials, Inc.
Nai-Chieh HUANG
B24 - GRINDING POLISHING
Information
Patent Application
PROCESS CONTROL METHOD FOR PATTERN WAFER INDEX POLISHING
Publication number
20240371646
Publication date
Nov 7, 2024
Applied Materials, Inc.
Jimin ZHANG
B24 - GRINDING POLISHING
Information
Patent Application
DETERMINING THE ORIENTATION OF A SUBSTRATE IN-SITU
Publication number
20240359291
Publication date
Oct 31, 2024
Applied Materials, Inc.
Wei LU
B24 - GRINDING POLISHING
Information
Patent Application
STEAM GENERATION FOR CHEMICAL MECHANICAL POLISHING
Publication number
20240342855
Publication date
Oct 17, 2024
Applied Materials, Inc.
Chad Pollard
B24 - GRINDING POLISHING
Information
Patent Application
STEAM TREATMENT STATIONS FOR CHEMICAL MECHANICAL POLISHING SYSTEM
Publication number
20240307928
Publication date
Sep 19, 2024
Applied Materials, Inc.
Haosheng Wu
B08 - CLEANING
Information
Patent Application
METHOD FOR DETECTION OF WAFER SLIPPAGE
Publication number
20240308019
Publication date
Sep 19, 2024
Applied Materials, Inc.
Wei Lu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
INDEX POLISHING FOR PROCESS CONTROL SIGNAL AND WAFER UNIFORMITY
Publication number
20240269796
Publication date
Aug 15, 2024
Applied Materials, Inc.
Jimin Zhang
B24 - GRINDING POLISHING
Information
Patent Application
APPARATUS AND METHOD FOR CONTROLLING SUBSTRATE POLISH EDGE UNIFORMITY
Publication number
20240253183
Publication date
Aug 1, 2024
Applied Materials, Inc.
Priscilla Michelle Diep LAROSA
B24 - GRINDING POLISHING
Information
Patent Application
ACOUSTIC CARRIER HEAD MONITORING
Publication number
20240139900
Publication date
May 2, 2024
Applied Materials, Inc.
Jeonghoon Oh
B24 - GRINDING POLISHING
Information
Patent Application
METHOD FOR CMP TEMPERATURE CONTROL
Publication number
20240109163
Publication date
Apr 4, 2024
Applied Materials, Inc.
Haosheng Wu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
WAFER EDGE ASYMMETRY CORRECTION USING GROOVE IN POLISHING PAD
Publication number
20240075583
Publication date
Mar 7, 2024
Applied Materials, Inc.
Jimin Zhang
B24 - GRINDING POLISHING
Information
Patent Application
PAD SURFACE CLEANING DEVICE AROUND PAD CONDITIONER TO ENABLE INSITU...
Publication number
20240066664
Publication date
Feb 29, 2024
Applied Materials, Inc.
Shou-Sung CHANG
B08 - CLEANING
Information
Patent Application
LOW-TEMPERATURE METAL CMP FOR MINIMIZING DISHING AND CORROSION, AND...
Publication number
20240066660
Publication date
Feb 29, 2024
Applied Materials, Inc.
Haosheng Wu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
APPARATUS AND METHOD OF SUBSTRATE EDGE CLEANING AND SUBSTRATE CARRI...
Publication number
20240047238
Publication date
Feb 8, 2024
Applied Materials, Inc.
Wei LU
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
CLEANING OF CMP TEMPERATURE CONTROL SYSTEM
Publication number
20240042570
Publication date
Feb 8, 2024
Applied Materials, Inc.
Haosheng Wu
B24 - GRINDING POLISHING
Information
Patent Application
TEMPERATURE AND SLURRY FLOW RATE CONTROL IN CMP
Publication number
20240025006
Publication date
Jan 25, 2024
Applied Materials, Inc.
Haosheng Wu
B24 - GRINDING POLISHING
Information
Patent Application
APPARATUS AND METHOD FOR CMP TEMPERATURE CONTROL
Publication number
20230415296
Publication date
Dec 28, 2023
Applied Materials, Inc.
Shou-Sung Chang
B24 - GRINDING POLISHING
Information
Patent Application
MONITORING OF ACOUSTIC EVENTS ON A SUBSTRATE
Publication number
20230390886
Publication date
Dec 7, 2023
Applied Materials, Inc.
Upendra Ummethala
B24 - GRINDING POLISHING
Information
Patent Application
IN-SITU CONDITIONER DISK CLEANING DURING CMP
Publication number
20230390895
Publication date
Dec 7, 2023
Applied Materials, Inc.
Haosheng Wu
B24 - GRINDING POLISHING
Information
Patent Application
CHEMICAL MECHANICAL POLISHING TEMPERATURE SCANNING APPARATUS FOR TE...
Publication number
20230356351
Publication date
Nov 9, 2023
Applied Materials, Inc.
Hari Soundararajan
B24 - GRINDING POLISHING
Information
Patent Application
STEAM-ASSISTED SINGLE SUBSTRATE CLEANING PROCESS AND APPARATUS
Publication number
20230335418
Publication date
Oct 19, 2023
Applied Materials, Inc.
Jianshe TANG
B08 - CLEANING
Information
Patent Application
USE OF STEAM FOR PRE-HEATING OF CMP COMPONENTS
Publication number
20230256562
Publication date
Aug 17, 2023
Applied Materials, Inc.
Haosheng Wu
B24 - GRINDING POLISHING
Information
Patent Application
STEAM CLEANING OF CMP COMPONENTS
Publication number
20230249225
Publication date
Aug 10, 2023
Applied Materials, Inc.
Haosheng Wu
B24 - GRINDING POLISHING
Information
Patent Application
POINT-OF-USE ULTRASONIC HOMOGENIZER FOR CMP SLURRY AGGLOMERATION RE...
Publication number
20230054165
Publication date
Feb 23, 2023
Applied Materials, Inc.
Chih Chung Chou
B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information
Patent Application
TEMPERATURE CONTROL OF CHEMICAL MECHANICAL POLISHING
Publication number
20230029290
Publication date
Jan 26, 2023
Applied Materials, Inc.
Hari Soundararajan
B24 - GRINDING POLISHING
Information
Patent Application
SLURRY DISTRIBUTION DEVICE FOR CHEMICAL MECHANICAL POLISHING
Publication number
20220402096
Publication date
Dec 22, 2022
Applied Materials, Inc.
Yen-Chu Yang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
STEAM TREATMENT STATIONS FOR CHEMICAL MECHANICAL POLISHING SYSTEM
Publication number
20220388041
Publication date
Dec 8, 2022
Applied Materials, Inc.
Haosheng Wu
B24 - GRINDING POLISHING
Information
Patent Application
HOT WATER GENERATION METHOD FOR CHEMICAL MECHANICAL POLISHING
Publication number
20220355440
Publication date
Nov 10, 2022
Applied Materials, Inc.
Hari Soundararajan
B24 - GRINDING POLISHING
Information
Patent Application
Chemical Mechanical Polishing With Die-Based Modification
Publication number
20220359219
Publication date
Nov 10, 2022
Applied Materials, Inc.
Haosheng Wu
H01 - BASIC ELECTRIC ELEMENTS