Jiao SONG

Person

Singapore, SG

People

Patents Grantslast 30 patents

Information Patent Grant
Methods and apparatus for extended chamber for through silicon via...
- Patent number 11,846,013
- Issue date Dec 19, 2023
- Applied Materials, Inc.
- David Gunther
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Target profile for a physical vapor deposition chamber target
- Patent number D1007449
- Issue date Dec 12, 2023
- Applied Materials, Inc.
- David Gunther
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 11,784,033
- Issue date Oct 10, 2023
- Applied Materials, Inc.
- Mengxue Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low profile deposition ring for enhanced life
- Patent number 11,581,166
- Issue date Feb 14, 2023
- Applied Materials, Inc.
- Kirankumar Neelasandra Savandaiah
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Target profile for a physical vapor deposition chamber target
- Patent number D966357
- Issue date Oct 11, 2022
- Applied Materials, Inc.
- David Gunther
- D15 - Machines not elsewhere specified
Information Patent Grant
Multi-radius magnetron for physical vapor deposition (PVD) and meth...
- Patent number 11,295,938
- Issue date Apr 5, 2022
- Applied Materials, Inc.
- Jiao Song
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Target profile for a physical vapor deposition chamber target
- Patent number D940765
- Issue date Jan 11, 2022
- Applied Materials, Inc.
- David Gunther
- D15 - Machines not elsewhere specified
Information Patent Grant
Cathode assembly having a dual position magnetron and centrally fed...
- Patent number 11,189,472
- Issue date Nov 30, 2021
- Applied Materials, Inc.
- Irena H. Wysok
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition ring for a semiconductor processing chamber
- Patent number D933726
- Issue date Oct 19, 2021
- Applied Materials, Inc.
- Kirankumar Neelasandra Savandaiah
- D15 - Machines not elsewhere specified
Information Patent Grant
Methods for reducing copper overhang in a feature of a substrate
- Patent number 9,978,639
- Issue date May 22, 2018
- Applied Materials, Inc.
- Siew Kit Hoi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20220384165
- Publication date Dec 1, 2022
- Mengxue WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR EXTENDED CHAMBER FOR THROUGH SILICON VIA...
- Publication number 20220033956
- Publication date Feb 3, 2022
- Applied Materials, Inc.
- David GUNTHER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW PROFILE DEPOSITION RING FOR ENHANCED LIFE
- Publication number 20220037128
- Publication date Feb 3, 2022
- Applied Materials, Inc.
- Kirankumar Neelasandra SAVANDAIAH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-RADIUS MAGNETRON FOR PHYSICAL VAPOR DEPOSITION (PVD) AND METH...
- Publication number 20210407778
- Publication date Dec 30, 2021
- Applied Materials, Inc.
- Jiao SONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CATHODE ASSEMBLY HAVING A DUAL POSITION MAGNETRON AND CENTRALLY FED...
- Publication number 20190019658
- Publication date Jan 17, 2019
- Applied Materials, Inc.
- Irena H. Wysok
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR REDUCING COPPER OVERHANG IN A FEATURE OF A SUBSTRATE
- Publication number 20170117180
- Publication date Apr 27, 2017
- Siew Kit HOI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Methods and apparatus for extended chamber for through silicon via...

Target profile for a physical vapor deposition chamber target

Methods and apparatus for processing a substrate

Low profile deposition ring for enhanced life

Target profile for a physical vapor deposition chamber target

Multi-radius magnetron for physical vapor deposition (PVD) and meth...

Target profile for a physical vapor deposition chamber target

Cathode assembly having a dual position magnetron and centrally fed...

Deposition ring for a semiconductor processing chamber

Methods for reducing copper overhang in a feature of a substrate

Patents Applicationslast 30 patents

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

METHODS AND APPARATUS FOR EXTENDED CHAMBER FOR THROUGH SILICON VIA...

LOW PROFILE DEPOSITION RING FOR ENHANCED LIFE

MULTI-RADIUS MAGNETRON FOR PHYSICAL VAPOR DEPOSITION (PVD) AND METH...

CATHODE ASSEMBLY HAVING A DUAL POSITION MAGNETRON AND CENTRALLY FED...

METHODS FOR REDUCING COPPER OVERHANG IN A FEATURE OF A SUBSTRATE