Joe Stevens

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Electro-chemical deposition system
- Patent number 7,497,932
- Issue date Mar 3, 2009
- Applied Materials, Inc.
- Yezdi Dordi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Flow diffuser to be used in electro-chemical plating system
- Patent number 7,427,338
- Issue date Sep 23, 2008
- Applied Materials, Inc.
- Yezdi N. Dordi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Electroless deposition apparatus
- Patent number 7,138,014
- Issue date Nov 21, 2006
- Applied Materials, Inc.
- Joseph J. Stevens
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for electro chemical deposition
- Patent number 7,005,046
- Issue date Feb 28, 2006
- Applied Materials Inc.
- Joseph J. Stevens
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Electroless plating system
- Patent number 6,824,612
- Issue date Nov 30, 2004
- Applied Materials, Inc.
- Joseph J. Stevens
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for rinsing substrates
- Patent number 6,742,279
- Issue date Jun 1, 2004
- Applied Materials Inc.
- Dmitry Lubomirsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Planarization of metal layers on a semiconductor wafer through non-...
- Patent number 6,720,263
- Issue date Apr 13, 2004
- Applied Materials Inc.
- Donald J. K. Olgado
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electro-chemical deposition system
- Patent number 6,635,157
- Issue date Oct 21, 2003
- Applied Materials, Inc.
- Yezdi Dordi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Electric contact element for electrochemical deposition system and...
- Patent number 6,613,214
- Issue date Sep 2, 2003
- Applied Materials, Inc.
- Yezdi N. Dordi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Dual post centrifugal wafer clip for spin rinse dry unit
- Patent number 6,612,014
- Issue date Sep 2, 2003
- Applied Materials, Inc.
- Bernardo Donoso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electro-chemical deposition cell for face-up processing of single s...
- Patent number 6,599,402
- Issue date Jul 29, 2003
- Applied Materials, Inc.
- Yezdi Dordi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flow diffuser to be used in electro-chemical plating system and method
- Patent number 6,585,876
- Issue date Jul 1, 2003
- Applied Materials Inc.
- Yezdi N. Dordi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method and associated apparatus for tilting a substrate upon entry...
- Patent number 6,582,578
- Issue date Jun 24, 2003
- Applied Materials, Inc.
- Yezdi N. Dordi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Edge bead removal/spin rinse dry (EBR/SRD) module
- Patent number 6,516,815
- Issue date Feb 11, 2003
- Applied Materials, Inc.
- Joe Stevens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self positioning vacuum chuck
- Patent number 6,517,130
- Issue date Feb 11, 2003
- Applied Materials, Inc.
- Bernardo Donoso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus with etchant mixing assembly for removal of unwanted elec...
- Patent number 6,494,219
- Issue date Dec 17, 2002
- Applied Materials, Inc.
- Radha Nayak
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inflatable compliant bladder assembly
- Patent number 6,475,357
- Issue date Nov 5, 2002
- Applied Materials, Inc.
- Jayant Lakshmikanthan
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Apparatus and method for electro chemical deposition
- Patent number 6,454,927
- Issue date Sep 24, 2002
- Applied Materials, Inc.
- Joseph J. Stevens
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Conductive biasing member for metal layering
- Patent number 6,444,101
- Issue date Sep 3, 2002
- Applied Materials, Inc.
- Joseph Stevens
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Method and apparatus for supplying electricity uniformly to a workp...
- Patent number 6,432,282
- Issue date Aug 13, 2002
- Applied Materials, Inc.
- Shamouil Shamouilian
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Electro-chemical deposition cell for face-up processing of single s...
- Patent number 6,416,647
- Issue date Jul 9, 2002
- Applied Materials, Inc.
- Yezdi Dordi
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Electro-chemical deposition system
- Patent number 6,267,853
- Issue date Jul 31, 2001
- Applied Materials, Inc.
- Yezdi Dordi
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Electro-chemical deposition system
- Patent number 6,258,220
- Issue date Jul 10, 2001
- Applied Materials, Inc.
- Yezdi Dordi
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Cathode contact ring for electrochemical deposition
- Patent number 6,251,236
- Issue date Jun 26, 2001
- Applied Materials, Inc.
- Joe Stevens
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Inflatable compliant bladder assembly
- Patent number 6,228,233
- Issue date May 8, 2001
- Applied Materials, Inc.
- Jayant Lakshmikanthan
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
RF electrode contact assembly for a detachable electrostatic chuck
- Patent number 6,159,055
- Issue date Dec 12, 2000
- Applied Materials, Inc.
- Peter Satitpunwaycha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for compressing high purity gas
- Patent number 5,993,170
- Issue date Nov 30, 1999
- Applied Materials, Inc.
- Joe Stevens
- F04 - POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC...
Information Patent Grant
High pressure/high temperature process chamber
- Patent number 5,990,453
- Issue date Nov 23, 1999
- Applied Materials, Inc.
- Ashok K. Das
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High aspect ratio clamp ring
- Patent number 5,810,931
- Issue date Sep 22, 1998
- Applied Materials, Inc.
- Joe Stevens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Two piece anti-stick clamp ring
- Patent number 5,632,873
- Issue date May 27, 1997
- Joseph J. Stevens
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Electro-chemical deposition system
- Publication number 20060246690
- Publication date Nov 2, 2006
- APPLIED MATERIALS, INC.
- Yezdi Dordi
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Patterned wafer thickness detection system
- Publication number 20060062897
- Publication date Mar 23, 2006
- APPLIED MATERIALS, INC.
- Yuping Gu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Electroless deposition apparatus
- Publication number 20050199489
- Publication date Sep 15, 2005
- APPLIED MATERIALS, INC.
- Joseph J. Stevens
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Electro-chemical deposition system
- Publication number 20040084301
- Publication date May 6, 2004
- APPLIED MATERIALS, INC.
- Yezdi Dordi
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Flow diffuser to be used in electro-chemical plating system
- Publication number 20040035695
- Publication date Feb 26, 2004
- APPLIED MATERIALS, INC.
- Yezdi N. Dordi
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Electro-chemical deposition cell for face-up processing of single s...
- Publication number 20040020781
- Publication date Feb 5, 2004
- APPLIED MATERIALS, INC.
- Yezdi Dordi
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Integrated semiconductor substrate bevel cleaning apparatus and method
- Publication number 20030213772
- Publication date Nov 20, 2003
- Yeuk-Fai Edwin Mok
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and associated apparatus for tilting a substrate upon entry...
- Publication number 20030201184
- Publication date Oct 30, 2003
- APPLIED MATERIALS, INC.
- Yezdi N. Dordi
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Electroless deposition apparatus
- Publication number 20030141018
- Publication date Jul 31, 2003
- APPLIED MATERIALS, INC.
- Joseph J. Stevens
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Apparatus and method for rinsing substrates
- Publication number 20030131494
- Publication date Jul 17, 2003
- APPLIED MATERIALS, INC.
- Dmitry Lubomirsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electroless plating system
- Publication number 20030118732
- Publication date Jun 26, 2003
- Joseph J. Stevens
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Planarization of metal layers on a semiconductor wafer through non-...
- Publication number 20030073310
- Publication date Apr 17, 2003
- APPLIED MATERIALS, INC.
- Donald J.K. Olgado
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Method and apparatus for removal of unwanted electroplating deposits
- Publication number 20030038107
- Publication date Feb 27, 2003
- APPLIED MATERIALS, INC.
- Radha Nayak
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and method for electro chemical deposition
- Publication number 20030000841
- Publication date Jan 2, 2003
- APPLIED MATERIALS, INC.
- Joseph J. Stevens
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Electro-chemical deposition cell for face-up processing of single s...
- Publication number 20020157960
- Publication date Oct 31, 2002
- APPLIED MATERIALS, INC.
- Yezdi Dordi
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Integrated semiconductor substrate bevel cleaning apparatus and method
- Publication number 20020113039
- Publication date Aug 22, 2002
- Yeuk-Fai Edwin Mok
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for supplying electricity uniformly to a workp...
- Publication number 20020066664
- Publication date Jun 6, 2002
- APPLIED MATERIALS, INC.
- Shamouil Shamouilian
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Electro-chemical deposition system
- Publication number 20020029961
- Publication date Mar 14, 2002
- APPLIED MATERIALS, INC.
- Yezdi Dordi
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
CONDUCTIVE BIASING MEMBER FOR METAL LAYERING
- Publication number 20020029962
- Publication date Mar 14, 2002
- JOSEPH STEVENS
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Inflatable compliant bladder assembly
- Publication number 20020027071
- Publication date Mar 7, 2002
- APPLIED MATERIALS, INC.
- Jayant Lakshmikanthan
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Flow diffuser to be used in electro-chemical plating system
- Publication number 20010052465
- Publication date Dec 20, 2001
- APPLIED MATERIALS, INC.
- Yezdi N. Dordi
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Electric contact element for electrochemical deposition system
- Publication number 20010000396
- Publication date Apr 26, 2001
- Applied Materials Inc.
- Yezdi N. Dordi
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR

Joe Stevens

Person

Patents Grantslast 30 patents

Electro-chemical deposition system

Flow diffuser to be used in electro-chemical plating system

Electroless deposition apparatus

Apparatus for electro chemical deposition

Electroless plating system

Apparatus and method for rinsing substrates

Planarization of metal layers on a semiconductor wafer through non-...

Electro-chemical deposition system

Electric contact element for electrochemical deposition system and...

Dual post centrifugal wafer clip for spin rinse dry unit

Electro-chemical deposition cell for face-up processing of single s...

Flow diffuser to be used in electro-chemical plating system and method

Method and associated apparatus for tilting a substrate upon entry...

Edge bead removal/spin rinse dry (EBR/SRD) module

Self positioning vacuum chuck

Apparatus with etchant mixing assembly for removal of unwanted elec...

Inflatable compliant bladder assembly

Apparatus and method for electro chemical deposition

Conductive biasing member for metal layering

Method and apparatus for supplying electricity uniformly to a workp...

Electro-chemical deposition cell for face-up processing of single s...

Electro-chemical deposition system

Electro-chemical deposition system

Cathode contact ring for electrochemical deposition

Inflatable compliant bladder assembly

RF electrode contact assembly for a detachable electrostatic chuck

Apparatus and method for compressing high purity gas

High pressure/high temperature process chamber

High aspect ratio clamp ring

Two piece anti-stick clamp ring

Patents Applicationslast 30 patents

Electro-chemical deposition system

Patterned wafer thickness detection system

Electroless deposition apparatus

Electro-chemical deposition system

Flow diffuser to be used in electro-chemical plating system

Electro-chemical deposition cell for face-up processing of single s...

Integrated semiconductor substrate bevel cleaning apparatus and method

Method and associated apparatus for tilting a substrate upon entry...

Electroless deposition apparatus

Apparatus and method for rinsing substrates

Electroless plating system

Planarization of metal layers on a semiconductor wafer through non-...

Method and apparatus for removal of unwanted electroplating deposits

Apparatus and method for electro chemical deposition

Electro-chemical deposition cell for face-up processing of single s...

Integrated semiconductor substrate bevel cleaning apparatus and method

Method and apparatus for supplying electricity uniformly to a workp...

Electro-chemical deposition system

CONDUCTIVE BIASING MEMBER FOR METAL LAYERING

Inflatable compliant bladder assembly

Flow diffuser to be used in electro-chemical plating system

Electric contact element for electrochemical deposition system