Joerg Bischoff

Person

Ilmenau, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Computation efficiency by diffraction order truncation
- Patent number 9,625,937
- Issue date Apr 18, 2017
- KLA-Tencor Corporation
- Joerg Bischoff
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Numerical aperture integration for optical critical dimension (OCD)...
- Patent number 8,762,100
- Issue date Jun 24, 2014
- Tokyo Electron Limited
- Hanyou Chu
- G01 - MEASURING TESTING
Information Patent Grant
Hybrid diffraction modeling of diffracting structures
- Patent number 8,195,435
- Issue date Jun 5, 2012
- Tokyo Electron Limited
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Grant
Training a machine learning system to determine photoresist parameters
- Patent number 7,949,618
- Issue date May 24, 2011
- Tokyo Electron Limited
- Joerg Bischoff
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Determining photoresist parameters using optical metrology
- Patent number 7,728,976
- Issue date Jun 1, 2010
- Tokyo Electron Limited
- Joerg Bischoff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for deriving an iso-dense bias
- Patent number 7,639,370
- Issue date Dec 29, 2009
- Tokyo Electron Limited
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Grant
Approximating eigensolutions for use in determining the profile of...
- Patent number 7,630,873
- Issue date Dec 8, 2009
- Tokyo Electron Limited
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology optimization for repetitive structures
- Patent number 7,616,325
- Issue date Nov 10, 2009
- Tokyo Electron Limited
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Grant
Method of controlling a fabrication process using an iso-dense bias
- Patent number 7,598,099
- Issue date Oct 6, 2009
- Tokyo Electron Limited
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology of single features
- Patent number 7,586,623
- Issue date Sep 8, 2009
- Tokyo Electron Limited
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Grant
Automated process control using optical metrology and photoresist p...
- Patent number 7,567,353
- Issue date Jul 28, 2009
- Tokyo Electron Limited
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Grant
Generating simulated diffraction signals for two-dimensional struct...
- Patent number 7,427,521
- Issue date Sep 23, 2008
- Timbre Technologies, Inc.
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Grant
Azimuthal scanning of a structure formed on a semiconductor wafer
- Patent number 7,414,733
- Issue date Aug 19, 2008
- Timbre Technologies, Inc.
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology optimization for repetitive structures
- Patent number 7,388,677
- Issue date Jun 17, 2008
- Timbre Technologies, Inc.
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology of single features
- Patent number 7,379,192
- Issue date May 27, 2008
- Timbre Technologies, Inc.
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology of a structure formed on a semiconductor wafer us...
- Patent number 7,274,465
- Issue date Sep 25, 2007
- Timbre Technologies, Inc.
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Grant
Resolution enhanced optical metrology
- Patent number 7,274,472
- Issue date Sep 25, 2007
- Timbre Technologies, Inc.
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Grant
Azimuthal scanning of a structure formed on a semiconductor wafer
- Patent number 7,224,471
- Issue date May 29, 2007
- Timbre Technologies, Inc.
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Grant
Edge roughness measurement in optical metrology
- Patent number 7,046,375
- Issue date May 16, 2006
- Timbre Technologies, Inc.
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology of single features
- Patent number 7,030,999
- Issue date Apr 18, 2006
- Timbre Technologies, Inc.
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Grant
Overlay measurements using zero-order cross polarization measurements
- Patent number 6,947,141
- Issue date Sep 20, 2005
- Timbre Technologies, Inc.
- Joerg Bischoff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay measurements using zero-order cross polarization measurements
- Patent number 6,804,005
- Issue date Oct 12, 2004
- Timbre Technologies, Inc.
- Joerg Bischoff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical metrology of single features
- Patent number 6,775,015
- Issue date Aug 10, 2004
- Timbre Technologies, Inc.
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Grant
Overlay measurements using periodic gratings
- Patent number 6,772,084
- Issue date Aug 3, 2004
- Timbre Technologies, Inc.
- Joerg Bischoff
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
HYBRID DIFFRACTION MODELING OF DIFFRACTING STRUCTURES
- Publication number 20100157315
- Publication date Jun 24, 2010
- TOKYO ELECTRON LIMITED
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Application
COMPUTATION EFFICIENCY BY DIFFRACTION ORDER TRUNCATION
- Publication number 20100042388
- Publication date Feb 18, 2010
- Joerg Bischoff
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method of Controlling a Fabrication Process Using an Iso-Dense Bias
- Publication number 20090118857
- Publication date May 7, 2009
- TOKYO ELECTRON LIMITED
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Application
Apparatus for Deriving an Iso-Dense Bias
- Publication number 20090116010
- Publication date May 7, 2009
- TOKYO ELECTRON LIMITED
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Application
Method of Deriving an Iso-Dense Bias Using a Hybrid Grating Layer
- Publication number 20090116040
- Publication date May 7, 2009
- TOKYO ELECTRON LIMITED
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL METROLOGY OPTIMIZATION FOR REPETITIVE STRUCTURES
- Publication number 20080285054
- Publication date Nov 20, 2008
- Timbre Technologies, Inc.
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL METROLOGY OF SINGLE FEATURES
- Publication number 20080259357
- Publication date Oct 23, 2008
- Timbre Technologies, Inc.
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Application
Automated process control using optical metrology and photoresist p...
- Publication number 20080241975
- Publication date Oct 2, 2008
- TOKYO ELECTRON LIMITED
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Application
Determining photoresist parameters using optical metrology
- Publication number 20080241974
- Publication date Oct 2, 2008
- TOKYO ELECTRON LIMITED
- Joerg Bischoff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Training a machine learning system to determine photoresist parameters
- Publication number 20080243730
- Publication date Oct 2, 2008
- TOKYO ELECTRON LIMITED
- Joerg Bischoff
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Generating a profile model to characterize a structure to be examin...
- Publication number 20080013107
- Publication date Jan 17, 2008
- TOKYO ELECTRON LIMITED
- Jeffrey A. Chard
- G01 - MEASURING TESTING
Information Patent Application
Azimuthal scanning of a structure formed on a semiconductor wafer
- Publication number 20070236705
- Publication date Oct 11, 2007
- TIMBRE TECHNOLOGIES INC.
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Application
Selecting unit cell configuration for repeating structures in optic...
- Publication number 20060187466
- Publication date Aug 24, 2006
- Timbre Technologies, Inc.
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Application
Optical metrology of single features
- Publication number 20060187468
- Publication date Aug 24, 2006
- Timbre Technologies, Inc.
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Application
Optical metrology of a structure formed on a semiconductor wafer us...
- Publication number 20060181713
- Publication date Aug 17, 2006
- Timbre Technologies, Inc.
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Application
Shape roughness measurement in optical metrology
- Publication number 20050275850
- Publication date Dec 15, 2005
- Timbre Technologies, Inc.
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Application
Optical metrology optimization for repetitive structures
- Publication number 20050209816
- Publication date Sep 22, 2005
- Timbre Technologies, Inc.
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Application
Azimuthal scanning of a structure formed on a semiconductor wafer
- Publication number 20050088665
- Publication date Apr 28, 2005
- Timbre Technologies, Inc.
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Application
Overlay measurements using zero-order cross polarization measurements
- Publication number 20050030536
- Publication date Feb 10, 2005
- Timbre Technologies, Inc.
- Joerg Bischoff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resolution enhanced optical metrology
- Publication number 20040239954
- Publication date Dec 2, 2004
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Application
Edge roughness measurement in optical metrology
- Publication number 20040218192
- Publication date Nov 4, 2004
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Application
Optical metrology of single features
- Publication number 20040212812
- Publication date Oct 28, 2004
- Timbre Technologies, Inc.
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Application
Approximating eigensolutions for use in determining the profile of...
- Publication number 20040167754
- Publication date Aug 26, 2004
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Application
Generating simulated diffraction signals for two-dimensional struct...
- Publication number 20040078173
- Publication date Apr 22, 2004
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Application
Optical metrology of single features
- Publication number 20030232454
- Publication date Dec 18, 2003
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Application
Overlay measurements using periodic gratings
- Publication number 20030212525
- Publication date Nov 13, 2003
- Joerg Bischoff
- G01 - MEASURING TESTING
Information Patent Application
Overlay measurements using zero-order cross polarization measurements
- Publication number 20030206298
- Publication date Nov 6, 2003
- Joerg Bischoff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Joerg Bischoff

Person

Patents Grantslast 30 patents

Computation efficiency by diffraction order truncation

Numerical aperture integration for optical critical dimension (OCD)...

Hybrid diffraction modeling of diffracting structures

Training a machine learning system to determine photoresist parameters

Determining photoresist parameters using optical metrology

Apparatus for deriving an iso-dense bias

Approximating eigensolutions for use in determining the profile of...

Optical metrology optimization for repetitive structures

Method of controlling a fabrication process using an iso-dense bias

Optical metrology of single features

Automated process control using optical metrology and photoresist p...

Generating simulated diffraction signals for two-dimensional struct...

Azimuthal scanning of a structure formed on a semiconductor wafer

Optical metrology optimization for repetitive structures

Optical metrology of single features

Optical metrology of a structure formed on a semiconductor wafer us...

Resolution enhanced optical metrology

Azimuthal scanning of a structure formed on a semiconductor wafer

Edge roughness measurement in optical metrology

Optical metrology of single features

Overlay measurements using zero-order cross polarization measurements

Overlay measurements using zero-order cross polarization measurements

Optical metrology of single features

Overlay measurements using periodic gratings

Patents Applicationslast 30 patents

HYBRID DIFFRACTION MODELING OF DIFFRACTING STRUCTURES

COMPUTATION EFFICIENCY BY DIFFRACTION ORDER TRUNCATION

Method of Controlling a Fabrication Process Using an Iso-Dense Bias

Apparatus for Deriving an Iso-Dense Bias

Method of Deriving an Iso-Dense Bias Using a Hybrid Grating Layer

OPTICAL METROLOGY OPTIMIZATION FOR REPETITIVE STRUCTURES

OPTICAL METROLOGY OF SINGLE FEATURES

Automated process control using optical metrology and photoresist p...

Determining photoresist parameters using optical metrology

Training a machine learning system to determine photoresist parameters

Generating a profile model to characterize a structure to be examin...

Azimuthal scanning of a structure formed on a semiconductor wafer

Selecting unit cell configuration for repeating structures in optic...

Optical metrology of single features

Optical metrology of a structure formed on a semiconductor wafer us...

Shape roughness measurement in optical metrology

Optical metrology optimization for repetitive structures

Azimuthal scanning of a structure formed on a semiconductor wafer

Overlay measurements using zero-order cross polarization measurements

Resolution enhanced optical metrology

Edge roughness measurement in optical metrology

Optical metrology of single features

Approximating eigensolutions for use in determining the profile of...

Generating simulated diffraction signals for two-dimensional struct...

Optical metrology of single features

Overlay measurements using periodic gratings

Overlay measurements using zero-order cross polarization measurements