Jon Opsal

Person

Livermore, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Modulated reflectance measurement system using UV probe
- Patent number 8,817,260
- Issue date Aug 26, 2014
- KLA-Tencor Corporation
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Grant
High resolution monitoring of CD variations
- Patent number 8,049,903
- Issue date Nov 1, 2011
- KLA-Tencor Corporation
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Grant
Methods for depth profiling in semiconductors using modulated optic...
- Patent number 7,982,867
- Issue date Jul 19, 2011
- KLA-Tencor Corporation
- Alex Salnik
- G01 - MEASURING TESTING
Information Patent Grant
High resolution monitoring of CD variations
- Patent number 7,933,026
- Issue date Apr 26, 2011
- KLA-Tencor Corporation
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Grant
Scatterometry multi-structure shape definition with multi-periodicity
- Patent number 7,747,424
- Issue date Jun 29, 2010
- KLA-Tencor Corporation
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Grant
Methods for depth profiling in semiconductors using modulated optic...
- Patent number 7,705,977
- Issue date Apr 27, 2010
- KLA-Tencor Corporation
- Alex Salnik
- G01 - MEASURING TESTING
Information Patent Grant
Detector configurations for optical metrology
- Patent number 7,667,841
- Issue date Feb 23, 2010
- KLA-Tencor Corporation
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Grant
Modulated reflectance measurement system using UV probe
- Patent number 7,646,486
- Issue date Jan 12, 2010
- KLA-Tencor Corporation
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Grant
Modulated reflectance measurement system with multiple wavelengths
- Patent number 7,619,741
- Issue date Nov 17, 2009
- KLA-Tencor Corp.
- Lena Nicolaides
- G01 - MEASURING TESTING
Information Patent Grant
Global shape definition method for scatterometry
- Patent number 7,613,598
- Issue date Nov 3, 2009
- KLA-Tencor Corp.
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Grant
High resolution monitoring of CD variations
- Patent number 7,567,351
- Issue date Jul 28, 2009
- KLA-Tencor Corporation
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Grant
Probe beam profile modulated optical reflectance system and methods
- Patent number 7,502,104
- Issue date Mar 10, 2009
- KLA-Tencor Corporation
- Alex Salnik
- G01 - MEASURING TESTING
Information Patent Grant
Combined modulated optical reflectance and electrical system for ul...
- Patent number 7,499,168
- Issue date Mar 3, 2009
- KLA-Tencor Corp.
- Alex Salnik
- G01 - MEASURING TESTING
Information Patent Grant
Multiple tool and structure analysis
- Patent number 7,478,019
- Issue date Jan 13, 2009
- KLA-Tencor Corporation
- Shahin Zangooie
- G01 - MEASURING TESTING
Information Patent Grant
Detector configurations for optical metrology
- Patent number 7,456,964
- Issue date Nov 25, 2008
- KLA-Tencor Corporation
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Grant
Systems and methods for immersion metrology
- Patent number 7,436,527
- Issue date Oct 14, 2008
- KLA-Tencor Corporation
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Grant
Modulated reflectance measurement system with multiple wavelengths
- Patent number 7,423,757
- Issue date Sep 9, 2008
- KLA-Tencor Corporation
- Lena Nicolaides
- G01 - MEASURING TESTING
Information Patent Grant
Method for measuring peak carrier concentration in ultra-shallow ju...
- Patent number 7,403,022
- Issue date Jul 22, 2008
- KLA-Tencor, Inc.
- Alex Salnik
- G01 - MEASURING TESTING
Information Patent Grant
Beam profile ellipsometer with rotating compensator
- Patent number 7,400,403
- Issue date Jul 15, 2008
- KLA-Tencor Corp.
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Grant
Modulated reflectance measurement system using UV probe
- Patent number 7,362,441
- Issue date Apr 22, 2008
- KLA-Tencor Corporation
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Grant
Method for measuring ion-implanted semiconductors with improved rep...
- Patent number 7,330,260
- Issue date Feb 12, 2008
- KLA-Tencor Corporation
- Lena Nicolaides
- G01 - MEASURING TESTING
Information Patent Grant
Photothermal system with spectroscopic pump and probe
- Patent number 7,280,215
- Issue date Oct 9, 2007
- Therma-Wave, Inc.
- Alex Salnik
- G01 - MEASURING TESTING
Information Patent Grant
Critical dimension analysis with simultaneous multiple angle of inc...
- Patent number 7,248,375
- Issue date Jul 24, 2007
- Therma-Wave, Inc.
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Grant
Characterization of ultra shallow junctions in semiconductor wafers
- Patent number 7,248,367
- Issue date Jul 24, 2007
- Therma-Wave, Inc.
- Alex Salnik
- G01 - MEASURING TESTING
Information Patent Grant
Scatterometry for samples with non-uniform edges
- Patent number 7,233,390
- Issue date Jun 19, 2007
- Therma-Wave, Inc.
- Yia Chung Chang
- G01 - MEASURING TESTING
Information Patent Grant
Systems and methods for immersion metrology
- Patent number 7,215,431
- Issue date May 8, 2007
- Therma-Wave, Inc.
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Grant
Position modulated optical reflectance measurement system for semic...
- Patent number 7,212,288
- Issue date May 1, 2007
- Therma-Wave, Inc.
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Grant
Detector configurations for optical metrology
- Patent number 7,206,071
- Issue date Apr 17, 2007
- Therma-Wave, Inc.
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Grant
Beam profile ellipsometer with rotating compensator
- Patent number 7,206,070
- Issue date Apr 17, 2007
- Therma-Wave, Inc.
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Grant
Global shape definition method for scatterometry
- Patent number 7,145,664
- Issue date Dec 5, 2006
- Therma-Wave, Inc.
- Jon Opsal
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
HIGH RESOLUTION MONITORING OF CD VARIATIONS
- Publication number 20110205554
- Publication date Aug 25, 2011
- KLA-Tencor Corporation
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Application
METHODS FOR DEPTH PROFILING IN SEMICONDUCTORS USING MODULATED OPTIC...
- Publication number 20100315625
- Publication date Dec 16, 2010
- KLA-Tencor Corporation
- Alex SALNIK
- G01 - MEASURING TESTING
Information Patent Application
MODULATED REFLECTANCE MEASUREMENT SYSTEM USING UV PROBE
- Publication number 20100134785
- Publication date Jun 3, 2010
- KLA-Tencor Corp.
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Application
HIGH RESOLUTION MONITORING OF CD VARIATIONS
- Publication number 20090259605
- Publication date Oct 15, 2009
- KLA-Tencor Corporation
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Application
Detector configurations for optical metrology
- Publication number 20090066954
- Publication date Mar 12, 2009
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Application
MODULATED REFLECTANCE MEASUREMENT SYSTEM WITH MULTIPLE WAVELENGTHS
- Publication number 20080309943
- Publication date Dec 18, 2008
- Lena Nicolaides
- G01 - MEASURING TESTING
Information Patent Application
MODULATED REFLECTANCE MEASUREMENT SYSTEM USING UV PROBE
- Publication number 20080158565
- Publication date Jul 3, 2008
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Application
Methods for depth profiling in semiconductors using modulated optic...
- Publication number 20080151247
- Publication date Jun 26, 2008
- Alex Salnik
- G01 - MEASURING TESTING
Information Patent Application
Modulated optical reflectance measurement system with enhanced sens...
- Publication number 20080074668
- Publication date Mar 27, 2008
- Alex Salnik
- G01 - MEASURING TESTING
Information Patent Application
Probe beam profile modulated optical reflectance system and methods
- Publication number 20080036998
- Publication date Feb 14, 2008
- Alex Salnik
- G01 - MEASURING TESTING
Information Patent Application
Systems and methods for immersion metrology
- Publication number 20080024780
- Publication date Jan 31, 2008
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Application
Detector configurations for optical metrology
- Publication number 20080018895
- Publication date Jan 24, 2008
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Application
Scatterometry multi-structure shape definition with multi-periodicity
- Publication number 20070219737
- Publication date Sep 20, 2007
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Application
High resolution monitoring of CD variations
- Publication number 20070201017
- Publication date Aug 30, 2007
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Application
Combined modulated optical reflectance and electrical system for ul...
- Publication number 20070188761
- Publication date Aug 16, 2007
- Alex Salnik
- G01 - MEASURING TESTING
Information Patent Application
Beam profile ellipsometer with rotating compensator
- Publication number 20070159630
- Publication date Jul 12, 2007
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Application
Global shape definition method for scatterometry
- Publication number 20070040852
- Publication date Feb 22, 2007
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Application
Modulated reflectance measurement system using UV probe
- Publication number 20070008541
- Publication date Jan 11, 2007
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Application
Modulated reflectance measurement system with multiple wavelengths
- Publication number 20060262314
- Publication date Nov 23, 2006
- Lena Nicolaides
- G01 - MEASURING TESTING
Information Patent Application
Multiple tool and structure analysis
- Publication number 20060167651
- Publication date Jul 27, 2006
- Shahin Zangooie
- G05 - CONTROLLING REGULATING
Information Patent Application
Method for measuring peak carrier concentration in ultra-shallow ju...
- Publication number 20060166385
- Publication date Jul 27, 2006
- Alex Salnik
- G01 - MEASURING TESTING
Information Patent Application
Beam profile ellipsometer with rotating compensator
- Publication number 20060103844
- Publication date May 18, 2006
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Application
Modulated reflectance measurement system with multiple wavelengths
- Publication number 20060092425
- Publication date May 4, 2006
- Lena Nicolaides
- G01 - MEASURING TESTING
Information Patent Application
Detector configurations for optical metrology
- Publication number 20060066868
- Publication date Mar 30, 2006
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Application
Critical dimension analysis with simultaneous multiple angle of inc...
- Publication number 20060012803
- Publication date Jan 19, 2006
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Application
Real time analysis of periodic structures on semiconductors
- Publication number 20050251350
- Publication date Nov 10, 2005
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Application
Systems and methods for immersion metrology
- Publication number 20050195412
- Publication date Sep 8, 2005
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Application
Method for measuring ion-implanted semiconductors with improved rep...
- Publication number 20050195399
- Publication date Sep 8, 2005
- Lena Nicolaides
- G01 - MEASURING TESTING
Information Patent Application
Ion implant monitoring through measurement of modulated optical res...
- Publication number 20050190369
- Publication date Sep 1, 2005
- Alex Salnik
- G01 - MEASURING TESTING
Information Patent Application
Systems and methods for evaluating semiconductor layers
- Publication number 20050162654
- Publication date Jul 28, 2005
- Jon Opsal
- G01 - MEASURING TESTING

Person

Patents Grantslast 30 patents

Modulated reflectance measurement system using UV probe

High resolution monitoring of CD variations

Methods for depth profiling in semiconductors using modulated optic...

High resolution monitoring of CD variations

Scatterometry multi-structure shape definition with multi-periodicity

Methods for depth profiling in semiconductors using modulated optic...

Detector configurations for optical metrology

Modulated reflectance measurement system using UV probe

Modulated reflectance measurement system with multiple wavelengths

Global shape definition method for scatterometry

High resolution monitoring of CD variations

Probe beam profile modulated optical reflectance system and methods

Combined modulated optical reflectance and electrical system for ul...

Multiple tool and structure analysis

Detector configurations for optical metrology

Systems and methods for immersion metrology

Modulated reflectance measurement system with multiple wavelengths

Method for measuring peak carrier concentration in ultra-shallow ju...

Beam profile ellipsometer with rotating compensator

Modulated reflectance measurement system using UV probe

Method for measuring ion-implanted semiconductors with improved rep...

Photothermal system with spectroscopic pump and probe

Critical dimension analysis with simultaneous multiple angle of inc...

Characterization of ultra shallow junctions in semiconductor wafers

Scatterometry for samples with non-uniform edges

Systems and methods for immersion metrology

Position modulated optical reflectance measurement system for semic...

Detector configurations for optical metrology

Beam profile ellipsometer with rotating compensator

Global shape definition method for scatterometry

Patents Applicationslast 30 patents

HIGH RESOLUTION MONITORING OF CD VARIATIONS

METHODS FOR DEPTH PROFILING IN SEMICONDUCTORS USING MODULATED OPTIC...

MODULATED REFLECTANCE MEASUREMENT SYSTEM USING UV PROBE

HIGH RESOLUTION MONITORING OF CD VARIATIONS

Detector configurations for optical metrology

MODULATED REFLECTANCE MEASUREMENT SYSTEM WITH MULTIPLE WAVELENGTHS

MODULATED REFLECTANCE MEASUREMENT SYSTEM USING UV PROBE

Methods for depth profiling in semiconductors using modulated optic...

Modulated optical reflectance measurement system with enhanced sens...

Probe beam profile modulated optical reflectance system and methods

Systems and methods for immersion metrology

Detector configurations for optical metrology

Scatterometry multi-structure shape definition with multi-periodicity

High resolution monitoring of CD variations

Combined modulated optical reflectance and electrical system for ul...

Beam profile ellipsometer with rotating compensator

Global shape definition method for scatterometry

Modulated reflectance measurement system using UV probe

Modulated reflectance measurement system with multiple wavelengths

Multiple tool and structure analysis

Method for measuring peak carrier concentration in ultra-shallow ju...

Beam profile ellipsometer with rotating compensator

Modulated reflectance measurement system with multiple wavelengths

Detector configurations for optical metrology

Critical dimension analysis with simultaneous multiple angle of inc...

Real time analysis of periodic structures on semiconductors

Systems and methods for immersion metrology

Method for measuring ion-implanted semiconductors with improved rep...

Ion implant monitoring through measurement of modulated optical res...

Systems and methods for evaluating semiconductor layers