Junzou Azuma

Person

Yokohama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Visual inspection method and apparatus therefor
- Patent number 6,587,581
- Issue date Jul 1, 2003
- Hitachi, Ltd.
- Yukio Matsuyama
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Sample processing apparatus and method for removing charge on sampl...
- Patent number 6,507,029
- Issue date Jan 14, 2003
- Hitachi, Ltd.
- Norimasa Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for observing or processing and analyzing usin...
- Patent number 6,476,387
- Issue date Nov 5, 2002
- Hitachi, Ltd.
- Norimasa Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method using charged particle beam process and char...
- Patent number 6,344,115
- Issue date Feb 5, 2002
- Hitachi, Ltd.
- Junzou Azuma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and its apparatus for detecting a secondary electron beam im...
- Patent number 6,303,932
- Issue date Oct 16, 2001
- Hitachi, Ltd.
- Yuichi Hamamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method using charged particle beam process and char...
- Patent number 5,976,328
- Issue date Nov 2, 1999
- Hitachi, Ltd.
- Junzou Azuma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for judging milling end point for use in charged...
- Patent number 5,952,658
- Issue date Sep 14, 1999
- Hitachi, Ltd.
- Akira Shimase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing method and apparatus using focused ion beam generating m...
- Patent number 5,825,035
- Issue date Oct 20, 1998
- Hitachi, Ltd.
- Michinobu Mizumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing method and apparatus using focused energy beam
- Patent number 5,683,547
- Issue date Nov 4, 1997
- Hitachi, Ltd.
- Junzou Azuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process method and apparatus using focused ion beam generating means
- Patent number 5,583,344
- Issue date Dec 10, 1996
- Hitachi, Ltd.
- Michinobu Mizumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process method and apparatus using focused ion beam generating means
- Patent number 5,504,340
- Issue date Apr 2, 1996
- Hitachi, Ltd.
- Michinobu Mizumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing a sample using a charged beam and reactive gas...
- Patent number 5,447,614
- Issue date Sep 5, 1995
- Hitachi, Ltd.
- Yuuichi Hamamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical mask and method of correcting the same
- Patent number 5,439,763
- Issue date Aug 8, 1995
- Hitachi, Ltd.
- Akira Shimase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask, method of correcting the same and apparatus for c...
- Patent number 5,358,806
- Issue date Oct 25, 1994
- Hitachi, Ltd.
- Satoshi Haraichi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for processing a sample using a charged beam and reactive...
- Patent number 5,342,448
- Issue date Aug 30, 1994
- Hitachi, Ltd.
- Yuuichi Hamamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing method and apparatus
- Patent number 5,223,109
- Issue date Jun 29, 1993
- Hitachi, Ltd.
- Fumikazu Itoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus and method for plasma processing
- Patent number 5,134,965
- Issue date Aug 4, 1992
- Hitachi, Ltd.
- Mitsuo Tokuda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for plasma processing
- Patent number 4,985,109
- Issue date Jan 15, 1991
- Hitachi, Ltd.
- Toru Otsubo
- H01 - BASIC ELECTRIC ELEMENTS

Junzou Azuma

Person

Patents Grantslast 30 patents

Visual inspection method and apparatus therefor

Sample processing apparatus and method for removing charge on sampl...

Method and apparatus for observing or processing and analyzing usin...

Pattern forming method using charged particle beam process and char...

Method and its apparatus for detecting a secondary electron beam im...

Pattern forming method using charged particle beam process and char...

Method and system for judging milling end point for use in charged...

Processing method and apparatus using focused ion beam generating m...

Processing method and apparatus using focused energy beam

Process method and apparatus using focused ion beam generating means

Process method and apparatus using focused ion beam generating means

Method of processing a sample using a charged beam and reactive gas...

Optical mask and method of correcting the same

Phase shift mask, method of correcting the same and apparatus for c...

Apparatus for processing a sample using a charged beam and reactive...

Ion beam processing method and apparatus

Processing apparatus and method for plasma processing

Apparatus for plasma processing