Karen E. Petrillo

Person

Mahopac, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Reducing line edge roughness and mitigating defects by wafer freezing
- Patent number 12,087,601
- Issue date Sep 10, 2024
- International Business Machines Corporation
- Karen E. Petrillo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spin on scaffold film for forming topvia
- Patent number 11,688,636
- Issue date Jun 27, 2023
- International Business Machines Corporation
- Somnath Ghosh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dynamic adjustment of post exposure bake during lithography utilizi...
- Patent number 11,067,896
- Issue date Jul 20, 2021
- International Business Machines Corporation
- Cody John Murray
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dynamic adjustment of post exposure bake during lithography utilizi...
- Patent number 10,545,409
- Issue date Jan 28, 2020
- International Business Machines Corporation
- Cody John Murray
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist multilayer film-attached substrate and patterning process
- Patent number 10,514,605
- Issue date Dec 24, 2019
- International Business Machines Corporation
- Seiichiro Tachibana
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Approach to lowering extreme ultraviolet exposure dose for inorgani...
- Patent number 10,254,652
- Issue date Apr 9, 2019
- International Business Machines Corporation
- Ekmini A. De Silva
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Approach to lowering extreme ultraviolet exposure dose for inorgani...
- Patent number 10,082,736
- Issue date Sep 25, 2018
- International Business Machines Corporation
- Ekmini A. De Silva
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Patterning process using a boron phosphorus silicon glass film
- Patent number 9,580,623
- Issue date Feb 28, 2017
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microelectronic substrate having removable edge extension element
- Patent number 8,946,866
- Issue date Feb 3, 2015
- International Business Machines Corporation
- Charles W. Koburger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microelectronic substrate having removable edge extension element
- Patent number 8,202,460
- Issue date Jun 19, 2012
- International Business Machines Corporation
- Charles W. Koburger, III
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Use of mixed bases to enhance patterned resist profiles on chrome o...
- Patent number 7,960,095
- Issue date Jun 14, 2011
- International Business Machines Corporation
- Wayne M. Moreau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion lithography contamination gettering layer
- Patent number 7,807,335
- Issue date Oct 5, 2010
- International Business Machines Corporation
- Daniel A. Corliss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multilayered resist systems using tuned polymer films as underlayer...
- Patent number 7,736,833
- Issue date Jun 15, 2010
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multilayered resist systems using tuned polymer films as underlayer...
- Patent number 7,709,177
- Issue date May 4, 2010
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ultrathin polymeric photoacid generator layer and method of fabrica...
- Patent number 7,638,266
- Issue date Dec 29, 2009
- International Business Machines Corporation
- Marie Angelopoulos
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Multilayered resist systems using tuned polymer films as underlayer...
- Patent number 7,361,444
- Issue date Apr 22, 2008
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High sensitivity resist compositions for electron-based lithography
- Patent number 7,314,700
- Issue date Jan 1, 2008
- International Business Machines Corporation
- Wu-Song Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of making a packaged radiation sensitive resist film-coated...
- Patent number 7,168,224
- Issue date Jan 30, 2007
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Forming a pattern of a negative photoresist
- Patent number 6,617,086
- Issue date Sep 9, 2003
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Etch improved resist systems containing acrylate (or methacrylate)...
- Patent number 6,586,156
- Issue date Jul 1, 2003
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Packaged radiation sensitive coated workpiece process for making an...
- Patent number 6,543,617
- Issue date Apr 8, 2003
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma resistant composition and use thereof
- Patent number 6,436,605
- Issue date Aug 20, 2002
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Forming a pattern of a negative photoresist
- Patent number 6,251,569
- Issue date Jun 26, 2001
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developers for polychloroacrylate and polychloromethacrylate based...
- Patent number 6,221,568
- Issue date Apr 24, 2001
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
E-beam application to mask making using new improved KRS resist system
- Patent number 6,043,003
- Issue date Mar 28, 2000
- International Business Machines Corporation
- James J. Bucchignano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
E-beam application to mask making using new improved KRS resist system
- Patent number 6,037,097
- Issue date Mar 14, 2000
- International Business Machines Corporation
- James J. Bucchignano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer compositions for high resolution resist applications
- Patent number 5,908,732
- Issue date Jun 1, 1999
- International Business Machines Corporation
- Ari Aviram
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist having increased sensitivity and use thereof
- Patent number 5,770,345
- Issue date Jun 23, 1998
- International Business Machines Corporation
- Edward Darko Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist having increased sensitivity and use thereof
- Patent number 5,753,412
- Issue date May 19, 1998
- International Business Machines Corporation
- Edward Darko Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist having increased sensitivity and use thereof
- Patent number 5,593,812
- Issue date Jan 14, 1997
- International Business Machines Corporation
- Edward D. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SPIN ON SCAFFOLD FILM FOR FORMING TOPVIA
- Publication number 20220406657
- Publication date Dec 22, 2022
- International Business Machines Corporation
- SOMNATH GHOSH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DYNAMIC ADJUSTMENT OF POST EXPOSURE BAKE DURING LITHOGRAPHY UTILIZI...
- Publication number 20200379354
- Publication date Dec 3, 2020
- International Business Machines Corporation
- Cody John MURRAY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REDUCING LINE EDGE ROUGHNESS AND MITIGATING DEFECTS BY WAFER FREEZING
- Publication number 20200357666
- Publication date Nov 12, 2020
- International Business Machines Corporation
- Karen E. Petrillo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST MULTILAYER FILM-ATTACHED SUBSTRATE AND PATTERNING PROCESS
- Publication number 20190041753
- Publication date Feb 7, 2019
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro TACHIBANA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPROACH TO LOWERING EXTREME ULTRAVIOLET EXPOSURE DOSE FOR INORGANI...
- Publication number 20180348636
- Publication date Dec 6, 2018
- International Business Machines Corporation
- Ekmini A. De Silva
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST BRIDGING DEFECT REMOVAL BY REVERSE TONE WEAK DEVELOPER
- Publication number 20180239254
- Publication date Aug 23, 2018
- International Business Machines Corporation
- Zhenxing Bi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST BRIDGING DEFECT REMOVAL BY REVERSE TONE WEAK DEVELOPER
- Publication number 20180239253
- Publication date Aug 23, 2018
- International Business Machines Corporation
- Zhenxing Bi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPROACH TO LOWERING EXTREME ULTRAVIOLET EXPOSURE DOSE FOR INORGANI...
- Publication number 20180203355
- Publication date Jul 19, 2018
- International Business Machines Corporation
- Ekmini A. De Silva
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING PROCESS
- Publication number 20160276152
- Publication date Sep 22, 2016
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro TACHIBANA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROELECTRONIC SUBSTRATE HAVING REMOVABLE EDGE EXTENSION ELEMENT
- Publication number 20120241913
- Publication date Sep 27, 2012
- International Business Machines Corporation
- Charles W. Koburger, III
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Use of Mixed Bases to Enhance Patterned Resist Profiles on Chrome o...
- Publication number 20080227030
- Publication date Sep 18, 2008
- International Business Machines Corporation
- Wayne M. Moreau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multilayered resist systems using tuned polymer films as underlayer...
- Publication number 20080124649
- Publication date May 29, 2008
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multilayered resist systems using tuned polymer films as underlayer...
- Publication number 20080124650
- Publication date May 29, 2008
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROELECTRONIC SUBSTRATE HAVING REMOVABLE EDGE EXTENSION ELEMENT
- Publication number 20070063392
- Publication date Mar 22, 2007
- International Business Machines Corporation
- Charles W. Koburger III
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Immersion lithography contamination gettering layer
- Publication number 20060275706
- Publication date Dec 7, 2006
- International Business Machines Corporation
- Daniel A. Corliss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
High sensitivity resist compositions for electron-based lithography
- Publication number 20060127800
- Publication date Jun 15, 2006
- Wu-Song Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Ultrathin polymeric photoacid generator layer and method of fabrica...
- Publication number 20060035167
- Publication date Feb 16, 2006
- International Business Machines Corporation
- Marie Angelopoulos
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Packaged radiation sensitive coated workpiece process for making an...
- Publication number 20040045866
- Publication date Mar 11, 2004
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Etch improved resist systems containing acrylate (or methacrylate)...
- Publication number 20030049561
- Publication date Mar 13, 2003
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Packaged radiation sensitive coated workpiece process for making an...
- Publication number 20030019782
- Publication date Jan 30, 2003
- IBM Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Forming a pattern of a negative photoresist
- Publication number 20020123010
- Publication date Sep 5, 2002
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Karen E. Petrillo

Person

Patents Grantslast 30 patents

Reducing line edge roughness and mitigating defects by wafer freezing

Spin on scaffold film for forming topvia

Dynamic adjustment of post exposure bake during lithography utilizi...

Dynamic adjustment of post exposure bake during lithography utilizi...

Resist multilayer film-attached substrate and patterning process

Approach to lowering extreme ultraviolet exposure dose for inorgani...

Approach to lowering extreme ultraviolet exposure dose for inorgani...

Patterning process using a boron phosphorus silicon glass film

Microelectronic substrate having removable edge extension element

Microelectronic substrate having removable edge extension element

Use of mixed bases to enhance patterned resist profiles on chrome o...

Immersion lithography contamination gettering layer

Multilayered resist systems using tuned polymer films as underlayer...

Multilayered resist systems using tuned polymer films as underlayer...

Ultrathin polymeric photoacid generator layer and method of fabrica...

Multilayered resist systems using tuned polymer films as underlayer...

High sensitivity resist compositions for electron-based lithography

Method of making a packaged radiation sensitive resist film-coated...

Forming a pattern of a negative photoresist

Etch improved resist systems containing acrylate (or methacrylate)...

Packaged radiation sensitive coated workpiece process for making an...

Plasma resistant composition and use thereof

Forming a pattern of a negative photoresist

Developers for polychloroacrylate and polychloromethacrylate based...

E-beam application to mask making using new improved KRS resist system

E-beam application to mask making using new improved KRS resist system

Polymer compositions for high resolution resist applications

Photoresist having increased sensitivity and use thereof

Photoresist having increased sensitivity and use thereof

Photoresist having increased sensitivity and use thereof

Patents Applicationslast 30 patents

SPIN ON SCAFFOLD FILM FOR FORMING TOPVIA

DYNAMIC ADJUSTMENT OF POST EXPOSURE BAKE DURING LITHOGRAPHY UTILIZI...

REDUCING LINE EDGE ROUGHNESS AND MITIGATING DEFECTS BY WAFER FREEZING

RESIST MULTILAYER FILM-ATTACHED SUBSTRATE AND PATTERNING PROCESS

APPROACH TO LOWERING EXTREME ULTRAVIOLET EXPOSURE DOSE FOR INORGANI...

PHOTORESIST BRIDGING DEFECT REMOVAL BY REVERSE TONE WEAK DEVELOPER

PHOTORESIST BRIDGING DEFECT REMOVAL BY REVERSE TONE WEAK DEVELOPER

APPROACH TO LOWERING EXTREME ULTRAVIOLET EXPOSURE DOSE FOR INORGANI...

PATTERNING PROCESS

MICROELECTRONIC SUBSTRATE HAVING REMOVABLE EDGE EXTENSION ELEMENT

Use of Mixed Bases to Enhance Patterned Resist Profiles on Chrome o...

Multilayered resist systems using tuned polymer films as underlayer...

Multilayered resist systems using tuned polymer films as underlayer...

MICROELECTRONIC SUBSTRATE HAVING REMOVABLE EDGE EXTENSION ELEMENT

Immersion lithography contamination gettering layer

High sensitivity resist compositions for electron-based lithography

Ultrathin polymeric photoacid generator layer and method of fabrica...

Packaged radiation sensitive coated workpiece process for making an...

Etch improved resist systems containing acrylate (or methacrylate)...

Packaged radiation sensitive coated workpiece process for making an...

Forming a pattern of a negative photoresist