Claims
- 1. A positive photoresist having increased sensitivity comprising:
- a polymer matrix,
- a photosensitive acid generator, and
- at least one compound selected from the group consisting of 2,2',5',1"-terthiophene and its derivatives having the formula: ##STR7## ##STR8## phenylsulfone, and derivatives having the formula: ##STR9##
- 4. 5-diphenyl-1,3-dioxol-2-one and mixtures thereof; and wherein R and R' in the above formulae II and III are individually selected from the group of H, alkyl having 1 to 12 carbon atoms, aryl having 6 to 18 carbon atoms, ##STR10## wherein R.sup.IV is H or alkyl having 1 to 12 carbon atoms; and wherein R.sup.v and R.sup.v1 in the above formula I are individually selected from the group of H, alkyl having 1 to 12 carbon atoms, ##STR11## wherein R.sup.IV is H or alkyl having 1 to 12 carbon atoms.
- 2. The photoresist of claim 1 wherein said acid generator is ##STR12## wherein R=C.sub.10 H.sub.21.
- 3. The positive photoresist of claim 1, wherein said polymer matrix comprises a copolymer of hydroxystyrene and a member selected from the group consisting of acrylate, methacrylate and mixtures thereof.
- 4. The photoresist of claim 3 wherein said acid generator is ##STR13## wherein R=C.sub.10 H.sub.21.
- 5. The photoresist of claim 3 wherein said acid generator is a sulfonium or iodonium salt.
- 6. The photoresist of claim 11 wherein said photosensitive acid generator is a sulfonium or iodonium salt.
- 7. The photoresist composition of claim 1 wherein said polymer matrix is selected from the group consisting of novolak resins and copolymers of hydroxystyrene and a member selected from the group consisting of acrylate, methacrylate and mixtures thereof; poly(hydroxystyrene); poly(hydroxystyrene-co-t-butyloxycarbonyloxystyrene); poly(hydroxystyrene-co-hydroxymethylstyrene); poly(hydroxystyrene-co-acetoxymethylstyrene); alkyl substituted polyvinyl phenols; poly (p-tert-butoxy carbonyloxy-A-methylstyrene); poly (p-tert-butoxycarbonyloxystyrene); poly(tert-bulyl p-vinylbenzoate); poly (tert-butyl p-isopropenyl phenyloxyacetate); and poly(tert-butyl methacrylate).
- 8. The positive photoresist of claim 1,wherein said polymer contains phenolic hydroxy groups.
- 9. The positive photoresist of claim 1 wherein said polymer comprises copolymer of hydroxystyrene and t-butyl methacrylate.
- 10. The positive photoresist of claim 1 wherein said dye is 2,2',5',1"-terthiophene.
- 11. The photoresist of claim 1 wherein said compound is 2,2',5',1"-terthiophene or derivatives thereof.
- 12. The photoresist of claim 1 wherein said compound is thianthrerne or derivative thereof.
- 13. The photoresist of claim 1 wherein said compound is 4,6-diphenylthieno (3,4-d)-1,3-dioxol-2-one-5,5-dioxide.
- 14. The photoresist of claim 1 wherein said compound is phenylsulfone or derivative thereof.
- 15. The photoresist of claim 1 wherein said compound is 4,5-diphenyl-1,3-dioxol-2-one.
Parent Case Info
This is a continuation of U.S. patent application Ser. No. 08/389,864, filed Feb. 17, 1995, now 5,593,812.
US Referenced Citations (10)
Foreign Referenced Citations (1)
Number |
Date |
Country |
893063 |
Apr 1962 |
GBX |
Continuations (1)
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Number |
Date |
Country |
Parent |
389864 |
Feb 1995 |
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