Katsutoshi Ishii

Person

Sagamihara, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus, exhaust pipe coating method and sub...
- Patent number 10,876,204
- Issue date Dec 29, 2020
- Tokyo Electron Limited
- Katsutoshi Ishii
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, method of coating particle in proce...
- Patent number 10,799,896
- Issue date Oct 13, 2020
- Tokyo Electron Limited
- Katsutoshi Ishii
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Film forming apparatus and film forming method
- Patent number 10,559,460
- Issue date Feb 11, 2020
- Tokyo Electron Limited
- Akira Shimizu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming apparatus, film forming method and non-transitory stor...
- Patent number 10,535,501
- Issue date Jan 14, 2020
- Tokyo Electron Limited
- Yamato Tonegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for removing metal impurity from quartz component part used...
- Patent number 8,834,817
- Issue date Sep 16, 2014
- Tokyo Electron Limited
- Masahisa Watanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vertical plasma processing apparatus for semiconductor process
- Patent number 8,394,200
- Issue date Mar 12, 2013
- Tokyo Electron Limited
- Hiroyuki Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
RF electrode for a process tube of semiconductor manufacturing appa...
- Patent number D564462
- Issue date Mar 18, 2008
- Tokyo Electron Limited
- Katsutoshi Ishii
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Silicon dioxide film forming method
- Patent number 7,211,295
- Issue date May 1, 2007
- Tokyo Electron Limited
- Yutaka Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process tube for semiconductor device manufacturing apparatus
- Patent number D521464
- Issue date May 23, 2006
- Tokyo Electron Limited
- Katsutoshi Ishii
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Process tube for semiconductor device manufacturing apparatus
- Patent number D521465
- Issue date May 23, 2006
- Tokyo Electron Limited
- Katsutoshi Ishii
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Process tube for semiconductor device manufacturing apparatus
- Patent number D520467
- Issue date May 9, 2006
- Tokyo Electron Limited
- Katsutoshi Ishii
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
System and method for heat treating semiconductor
- Patent number 6,903,030
- Issue date Jun 7, 2005
- Tokyo Electron Limited
- Katsutoshi Ishii
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming oxynitride film or the like and system for carryi...
- Patent number 6,884,295
- Issue date Apr 26, 2005
- Tokyo Electron Limited
- Katsutoshi Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat treatment system and method
- Patent number 6,863,732
- Issue date Mar 8, 2005
- Tokyo Electron Limited
- Takanobu Asano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Heat treatment system and method
- Patent number 6,540,509
- Issue date Apr 1, 2003
- Tokyo Electron Limited
- Takanobu Asano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fluid heating apparatus
- Patent number 6,516,143
- Issue date Feb 4, 2003
- Toshiba Ceramics Co., Ltd.
- Eiichi Toya
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Vertical processing unit
- Patent number 6,110,286
- Issue date Aug 29, 2000
- Tokyo Electron Limited
- Seungho Oh
- C30 - CRYSTAL GROWTH
Information Patent Grant
Quartz fin heat retaining tube
- Patent number D429224
- Issue date Aug 8, 2000
- Tokyo Electron Limited
- Katsutoshi Ishii
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Quartz fin heat retaining tube
- Patent number D428858
- Issue date Aug 1, 2000
- Tokyo Electron Limited
- Katsutoshi Ishii
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Quartz fin heat retaining tube
- Patent number D427570
- Issue date Jul 4, 2000
- Tokyo Electron Limited
- Katsutoshi Ishii
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Quartz fin heat retaining tube
- Patent number D426521
- Issue date Jun 13, 2000
- Tokyo Electron Limited
- Katsutoshi Ishii
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Quartz fin heat retaining tube
- Patent number D425871
- Issue date May 30, 2000
- Tokyo Electron Limited
- Katsutoshi Ishii
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Heat retaining tube for use in a semiconductor wafer heat processin...
- Patent number D410438
- Issue date Jun 1, 1999
- Tokyo Electron Limited
- Katsutoshi Ishii
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Heat retaining tube for use in a semiconductor wafer heat processin...
- Patent number D405428
- Issue date Feb 9, 1999
- Tokyo Electron Ltd.
- Katsutoshi Ishii
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Heat retaining tube for use in a semiconductor wafer heat processin...
- Patent number D405427
- Issue date Feb 9, 1999
- Tokyo Electron Limited
- Katsutoshi Ishii
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Ring for use in a semiconductor wafer heat processing apparatus
- Patent number D404372
- Issue date Jan 19, 1999
- Tokyo Electron Limited
- Katsutoshi Ishii
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Heat retaining tube for use in a semiconductor wafer heat processin...
- Patent number D404016
- Issue date Jan 12, 1999
- Tokyo Electron Limited
- Katsutoshi Ishii
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Object-supporting boat
- Patent number 5,820,683
- Issue date Oct 13, 1998
- Tokyo Electron Limited
- Katsutoshi Ishii
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer boat
- Patent number D380454
- Issue date Jul 1, 1997
- Tokyo Electron Limited
- Hiroyuki Iwai
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Vertical heat treatment apparatus
- Patent number 5,221,201
- Issue date Jun 22, 1993
- Tokyo Electron Sagami Limited
- Kenichi Yamaga
- C30 - CRYSTAL GROWTH

Patents Applicationslast 30 patents

Information Patent Application
FILLING METHOD AND FILM FORMING APPARATUS
- Publication number 20230374656
- Publication date Nov 23, 2023
- Tokyo Electron Limited
- Toshio HASEGAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE FILM FORMATION METHOD
- Publication number 20230175115
- Publication date Jun 8, 2023
- TOKYO ELECTRON LIMITED
- Shuji AZUMO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING APPARATUS AND FILM FORMING METHOD
- Publication number 20190074177
- Publication date Mar 7, 2019
- TOKYO ELECTRON LIMITED
- Akira SHIMIZU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF REMOVING PARTICLES IN INJ...
- Publication number 20180312967
- Publication date Nov 1, 2018
- TOKYO ELECTRON LIMITED
- Katsutoshi ISHII
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate Processing Apparatus, Exhaust Pipe Coating Method and Sub...
- Publication number 20180312969
- Publication date Nov 1, 2018
- TOKYO ELECTRON LIMITED
- Katsutoshi ISHII
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF COATING PARTICLE IN PROCE...
- Publication number 20180304286
- Publication date Oct 25, 2018
- TOKYO ELECTRON LIMITED
- Katsutoshi ISHII
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING APPARATUS, FILM FORMING METHOD AND NON-TRANSITORY STOR...
- Publication number 20140356550
- Publication date Dec 4, 2014
- TOKYO ELECTRON LIMITED
- Yamato TONEGAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VERTICAL HEAT PROCESSING APPARATUS AND COMPONENT FOR SAME, FOR FORM...
- Publication number 20100186667
- Publication date Jul 29, 2010
- TOKYO ELECTRON LIMITED
- Katsutoshi ISHII
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for removing metal impurity from quartz component part used...
- Publication number 20100135877
- Publication date Jun 3, 2010
- Masahisa Watanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VERTICAL PLASMA PROCESSING APPARATUS FOR SEMICONDUCTOR PROCESS
- Publication number 20090078201
- Publication date Mar 26, 2009
- Hiroyuki Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for removing metal impurity from quartz component part used...
- Publication number 20090041650
- Publication date Feb 12, 2009
- Masahisa Watanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VERTICAL PLASMA PROCESSING APPARATUS FOR SEMICONDUCTOR PROCESS
- Publication number 20070240644
- Publication date Oct 18, 2007
- Hiroyuki Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Vacuum evacuation device and method, and substrate processing appar...
- Publication number 20070048145
- Publication date Mar 1, 2007
- Katsutoshi Ishii
- F04 - POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC...
Information Patent Application
Oxynitride film forming system
- Publication number 20040209482
- Publication date Oct 21, 2004
- Yutaka Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Silicon dioxide film forming method
- Publication number 20040194707
- Publication date Oct 7, 2004
- Yutaka Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and method for heat treating semiconductor
- Publication number 20040168638
- Publication date Sep 2, 2004
- Katsutoshi Ishii
- C30 - CRYSTAL GROWTH
Information Patent Application
Heat treatment apparatus and cleaning method of the same
- Publication number 20040163677
- Publication date Aug 26, 2004
- Yutaka Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Heat treatment system and method
- Publication number 20030106495
- Publication date Jun 12, 2003
- Takanobu Asano
- C30 - CRYSTAL GROWTH
Information Patent Application
Fluid heating apparatus
- Publication number 20020023919
- Publication date Feb 28, 2002
- TOSHIBA CERAMICS CO., LTD.
- Eiichi Toya
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Heat treatment apparatus and cleaning method of the same
- Publication number 20010055738
- Publication date Dec 27, 2001
- Yutaka Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Heat treatment system and method
- Publication number 20010049080
- Publication date Dec 6, 2001
- Takanobu Asano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of forming oxynitride film or the like and system for carryi...
- Publication number 20010046792
- Publication date Nov 29, 2001
- Yutaka Takahashi
- H01 - BASIC ELECTRIC ELEMENTS

Katsutoshi Ishii

Person

Patents Grantslast 30 patents

Substrate processing apparatus, exhaust pipe coating method and sub...

Substrate processing apparatus, method of coating particle in proce...

Film forming apparatus and film forming method

Film forming apparatus, film forming method and non-transitory stor...

Method for removing metal impurity from quartz component part used...

Vertical plasma processing apparatus for semiconductor process

RF electrode for a process tube of semiconductor manufacturing appa...

Silicon dioxide film forming method

Process tube for semiconductor device manufacturing apparatus

Process tube for semiconductor device manufacturing apparatus

Process tube for semiconductor device manufacturing apparatus

System and method for heat treating semiconductor

Method of forming oxynitride film or the like and system for carryi...

Heat treatment system and method

Heat treatment system and method

Fluid heating apparatus

Vertical processing unit

Quartz fin heat retaining tube

Quartz fin heat retaining tube

Quartz fin heat retaining tube

Quartz fin heat retaining tube

Quartz fin heat retaining tube

Heat retaining tube for use in a semiconductor wafer heat processin...

Heat retaining tube for use in a semiconductor wafer heat processin...

Heat retaining tube for use in a semiconductor wafer heat processin...

Ring for use in a semiconductor wafer heat processing apparatus

Heat retaining tube for use in a semiconductor wafer heat processin...

Object-supporting boat

Wafer boat

Vertical heat treatment apparatus

Patents Applicationslast 30 patents

FILLING METHOD AND FILM FORMING APPARATUS

SELECTIVE FILM FORMATION METHOD

FILM FORMING APPARATUS AND FILM FORMING METHOD

SUBSTRATE PROCESSING APPARATUS, METHOD OF REMOVING PARTICLES IN INJ...

Substrate Processing Apparatus, Exhaust Pipe Coating Method and Sub...

SUBSTRATE PROCESSING APPARATUS, METHOD OF COATING PARTICLE IN PROCE...

FILM FORMING APPARATUS, FILM FORMING METHOD AND NON-TRANSITORY STOR...

VERTICAL HEAT PROCESSING APPARATUS AND COMPONENT FOR SAME, FOR FORM...

Method for removing metal impurity from quartz component part used...

VERTICAL PLASMA PROCESSING APPARATUS FOR SEMICONDUCTOR PROCESS

Method for removing metal impurity from quartz component part used...

VERTICAL PLASMA PROCESSING APPARATUS FOR SEMICONDUCTOR PROCESS

Vacuum evacuation device and method, and substrate processing appar...

Oxynitride film forming system

Silicon dioxide film forming method

System and method for heat treating semiconductor

Heat treatment apparatus and cleaning method of the same

Heat treatment system and method

Fluid heating apparatus

Heat treatment apparatus and cleaning method of the same

Heat treatment system and method

Method of forming oxynitride film or the like and system for carryi...