Katsuya HAYANO

Person

Tokyo-to, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photomask and methods for manufacturing and correcting photomask
- Patent number 10,634,990
- Issue date Apr 28, 2020
- Dai Nippon Printing Co., Ltd.
- Takaharu Nagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and methods for manufacturing and correcting photomask
- Patent number 10,394,118
- Issue date Aug 27, 2019
- Dai Nippon Printing Co., Ltd.
- Takaharu Nagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and methods for manufacturing and correcting photomask
- Patent number 10,048,580
- Issue date Aug 14, 2018
- Dai Nippon Printing Co., Ltd.
- Takaharu Nagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, phase shift mask, and production method thereof
- Patent number 9,971,238
- Issue date May 15, 2018
- Dai Nippon Printing Co., Ltd.
- Hiroshi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, mask blank with negative resist film, phase shift mask,...
- Patent number 9,874,808
- Issue date Jan 23, 2018
- Dai Nippon Printing Co., Ltd.
- Takashi Adachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and methods for manufacturing and correcting photomask
- Patent number 9,519,211
- Issue date Dec 13, 2016
- Dai Nippon Printing Co., Ltd.
- Takaharu Nagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and methods for manufacturing and correcting photomask
- Patent number 8,974,987
- Issue date Mar 10, 2015
- Dai Nippon Printing Co., Ltd.
- Takaharu Nagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing semiconductor device using overlapping exp...
- Patent number 7,736,985
- Issue date Jun 15, 2010
- Hitachi, Ltd.
- Hiroyuki Enomoto
- G01 - MEASURING TESTING
Information Patent Grant
Manufacturing method of semiconductor integrated circuit device
- Patent number 7,387,867
- Issue date Jun 17, 2008
- Hitachi, Ltd.
- Norio Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication method of semiconductor integrated circuit device and m...
- Patent number 7,252,910
- Issue date Aug 7, 2007
- Renesas Technology Corp.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing semiconductor integrated circuit devices
- Patent number 7,172,853
- Issue date Feb 6, 2007
- Renesas Technology Corp.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and pattern forming method employing the same
- Patent number 7,115,344
- Issue date Oct 3, 2006
- Renesas Technology Corp.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing method of semiconductor integrated circuit device
- Patent number 7,001,712
- Issue date Feb 21, 2006
- Renesas Technology Corp.
- Akira Imai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing mask and method of manufacturing semiconduc...
- Patent number 6,841,399
- Issue date Jan 11, 2005
- Renesas Technology Corp.
- Norio Hasegawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of manufacturing photomask and method of manufacturing semic...
- Patent number 6,824,958
- Issue date Nov 30, 2004
- Renesas Technology Corp.
- Katsuya Hayano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing method of semiconductor integrated circuit device, an...
- Patent number 6,750,496
- Issue date Jun 15, 2004
- Renesas Technology Corp.
- Katsuya Hayano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask and pattern forming method employing the same
- Patent number 6,733,953
- Issue date May 11, 2004
- Renesas Technology Corp.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing semiconductor integrated circuit devices
- Patent number 6,713,231
- Issue date Mar 30, 2004
- Renesas Technology Corporation
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing photomask and method of manufacturing semic...
- Patent number 6,706,452
- Issue date Mar 16, 2004
- Hitachi, Ltd.
- Katsuya Hayano
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Manufacturing method of semiconductor integrated circuit device
- Patent number 6,632,744
- Issue date Oct 14, 2003
- Hitachi, Ltd.
- Akira Imai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of semiconductor integrated circuit devices an...
- Patent number 6,548,312
- Issue date Apr 15, 2003
- Hitachi, Ltd.
- Katsuya Hayano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing method of semiconductor integrated circuit device hav...
- Patent number 6,403,413
- Issue date Jun 11, 2002
- Hitachi, Ltd.
- Katsuya Hayano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and pattern forming method employing the same
- Patent number 6,383,718
- Issue date May 7, 2002
- Hitachi, Ltd.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for measuring aberration of projection lens, method for form...
- Patent number 6,329,112
- Issue date Dec 11, 2001
- Hitachi, Ltd.
- Hiroshi Fukuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and pattern forming method employing the same
- Patent number 6,258,513
- Issue date Jul 10, 2001
- Hitachi, Ltd.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing semiconductor devices utilizing plurality...
- Patent number 6,225,011
- Issue date May 1, 2001
- Hitachi, Ltd.
- Yasuko Gotoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and pattern forming method employing the same
- Patent number 6,087,074
- Issue date Jul 11, 2000
- Hitachi, Ltd.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and pattern forming method employing the same
- Patent number 6,013,398
- Issue date Jan 11, 2000
- Hitachi, Ltd.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask, manufacture of photomask, formation of pattern, manufact...
- Patent number 5,895,741
- Issue date Apr 20, 1999
- Hitachi, Ltd.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and pattern forming method employing the same
- Patent number 5,851,703
- Issue date Dec 22, 1998
- Hitachi, Ltd.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK
- Publication number 20190332006
- Publication date Oct 31, 2019
- DAI NIPPON PRINTING CO., LTD.
- Takaharu NAGAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK
- Publication number 20180321582
- Publication date Nov 8, 2018
- DAI NIPPON PRINTING CO., LTD.
- Takaharu NAGAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, AND PRODUCTION METHOD THEREOF
- Publication number 20170123305
- Publication date May 4, 2017
- DAI NIPPON PRINTING CO., LTD.
- Hiroshi WATANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK
- Publication number 20170075213
- Publication date Mar 16, 2017
- DAI NIPPON PRINTING CO., LTD.
- Takaharu NAGAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, MASK BLANK WITH NEGATIVE RESIST FILM, PHASE SHIFT MASK,...
- Publication number 20160195803
- Publication date Jul 7, 2016
- DAI NIPPON PRINTING CO., LTD.
- Takashi ADACHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK
- Publication number 20150140480
- Publication date May 21, 2015
- DAI NIPPON PRINTING CO., LTD.
- Takaharu NAGAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK
- Publication number 20110294045
- Publication date Dec 1, 2011
- DAI NIPPON PRINTING CO., LTD.
- Takaharu Nagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask and pattern forming method employing the same
- Publication number 20080057408
- Publication date Mar 6, 2008
- RENESAS TECHNOLOGY CORP.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE
- Publication number 20080001239
- Publication date Jan 3, 2008
- Hiroyuki Enomoto
- G01 - MEASURING TESTING
Information Patent Application
Method of manufacturing semiconductor integrated circuit devices
- Publication number 20070128556
- Publication date Jun 7, 2007
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of manufacturing a semiconductor device
- Publication number 20050277065
- Publication date Dec 15, 2005
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor device manufacturing method
- Publication number 20050208427
- Publication date Sep 22, 2005
- Katsuya Hayano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask and pattern forming method employing the same
- Publication number 20050158638
- Publication date Jul 21, 2005
- RENESAS TECHNOLOGY CORP.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Manufacturing method of semiconductor integrated circuit device
- Publication number 20050090120
- Publication date Apr 28, 2005
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask and pattern forming method employing the same
- Publication number 20040161707
- Publication date Aug 19, 2004
- RENESAS TECHNOLOGY CORP.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Fabrication method of semiconductor integrated circuit device and m...
- Publication number 20040151993
- Publication date Aug 5, 2004
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Manufacturing method of semiconductor integrated circuit device
- Publication number 20040110095
- Publication date Jun 10, 2004
- Akira Imai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Manufacturing method of photomask
- Publication number 20030143472
- Publication date Jul 31, 2003
- Yasuhiro Koizumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of manufacturing mask and method of manufacturing semiconduc...
- Publication number 20030139055
- Publication date Jul 24, 2003
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Manufacturing method of semiconductor integrated circuit device, an...
- Publication number 20020155656
- Publication date Oct 24, 2002
- Katsuya Hayano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing photomask and method of manufacturing semic...
- Publication number 20020102476
- Publication date Aug 1, 2002
- Katsuya Hayano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask and pattern forming method employing the same
- Publication number 20020102478
- Publication date Aug 1, 2002
- Hitachi, Ltd.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of manufacturing photomask and method of manufacturing semic...
- Publication number 20020081502
- Publication date Jun 27, 2002
- Katsuya Hayano
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Manufacturing method of semiconductor integrated circuit device
- Publication number 20020006734
- Publication date Jan 17, 2002
- Akira Imai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturing method of semiconductor integrated circuit device, an...
- Publication number 20020005542
- Publication date Jan 17, 2002
- Katsuya Hayano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Photomask and pattern forming method employing the same
- Publication number 20010036583
- Publication date Nov 1, 2001
- Hitachi, Ltd.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Katsuya HAYANO

Person

Patents Grantslast 30 patents

Photomask and methods for manufacturing and correcting photomask

Photomask and methods for manufacturing and correcting photomask

Photomask and methods for manufacturing and correcting photomask

Mask blank, phase shift mask, and production method thereof

Mask blank, mask blank with negative resist film, phase shift mask,...

Photomask and methods for manufacturing and correcting photomask

Photomask and methods for manufacturing and correcting photomask

Method for manufacturing semiconductor device using overlapping exp...

Manufacturing method of semiconductor integrated circuit device

Fabrication method of semiconductor integrated circuit device and m...

Method of manufacturing semiconductor integrated circuit devices

Photomask and pattern forming method employing the same

Manufacturing method of semiconductor integrated circuit device

Method of manufacturing mask and method of manufacturing semiconduc...

Method of manufacturing photomask and method of manufacturing semic...

Manufacturing method of semiconductor integrated circuit device, an...

Photomask and pattern forming method employing the same

Method of manufacturing semiconductor integrated circuit devices

Method of manufacturing photomask and method of manufacturing semic...

Manufacturing method of semiconductor integrated circuit device

Manufacturing method of semiconductor integrated circuit devices an...

Manufacturing method of semiconductor integrated circuit device hav...

Photomask and pattern forming method employing the same

Method for measuring aberration of projection lens, method for form...

Photomask and pattern forming method employing the same

Method for manufacturing semiconductor devices utilizing plurality...

Photomask and pattern forming method employing the same

Photomask and pattern forming method employing the same

Photomask, manufacture of photomask, formation of pattern, manufact...

Photomask and pattern forming method employing the same

Patents Applicationslast 30 patents

PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK

PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK

MASK BLANK, PHASE SHIFT MASK, AND PRODUCTION METHOD THEREOF

PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK

MASK BLANK, MASK BLANK WITH NEGATIVE RESIST FILM, PHASE SHIFT MASK,...

PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK

PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK

Photomask and pattern forming method employing the same

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE

Method of manufacturing semiconductor integrated circuit devices

Method of manufacturing a semiconductor device

Semiconductor device manufacturing method

Photomask and pattern forming method employing the same

Manufacturing method of semiconductor integrated circuit device

Photomask and pattern forming method employing the same

Fabrication method of semiconductor integrated circuit device and m...

Manufacturing method of semiconductor integrated circuit device

Manufacturing method of photomask

Method of manufacturing mask and method of manufacturing semiconduc...

Manufacturing method of semiconductor integrated circuit device, an...

Method of manufacturing photomask and method of manufacturing semic...

Photomask and pattern forming method employing the same

Method of manufacturing photomask and method of manufacturing semic...

Manufacturing method of semiconductor integrated circuit device

Manufacturing method of semiconductor integrated circuit device, an...

Photomask and pattern forming method employing the same