Kazufumi SATO

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 12,099,298
- Issue date Sep 24, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern forming method and developer for lithography
- Patent number 9,964,851
- Issue date May 8, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming resist pattern by nanoimprint lithography
- Patent number 8,828,304
- Issue date Sep 9, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photosensitive resin composition and method of forming pattern
- Patent number 8,216,763
- Issue date Jul 10, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and method for forming resist pattern
- Patent number 7,666,569
- Issue date Feb 23, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive-working chemical-amplification photoresist composition
- Patent number 6,890,697
- Issue date May 10, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive-working chemical-amplification photoresist composition
- Patent number 6,869,745
- Issue date Mar 22, 2005
- Tokyo Ohka Kogyo, Co., Inc.
- Katsumi Oomori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for the preparation of a semiconductor device
- Patent number 6,818,380
- Issue date Nov 16, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Satoshi Maemori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working chemical-amplification photoresist composition
- Patent number 6,815,144
- Issue date Nov 9, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive-working photoresist composition and resist patterning meth...
- Patent number 6,787,290
- Issue date Sep 7, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Kazuyuki Nitta
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for the preparation of a semiconductor device
- Patent number 6,777,158
- Issue date Aug 17, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Satoshi Maemori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working chemical-amplification photoresist composition
- Patent number 6,773,863
- Issue date Aug 10, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive-working photoresist composition
- Patent number 6,677,103
- Issue date Jan 13, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Coating composition for chemically amplified positive resist and me...
- Patent number 6,673,516
- Issue date Jan 6, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Satoshi Kumon
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photosensitive laminate, process for forming resist pattern using s...
- Patent number 6,638,684
- Issue date Oct 28, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Waki Okubo
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition
- Patent number RE38254
- Issue date Sep 16, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- 525 - Synthetic resins or natural rubbers
Information Patent Grant
Positive-working chemical-amplification photoresist composition and...
- Patent number 6,548,229
- Issue date Apr 15, 2003
- Tokyo Ohka Kogyo, Co., Ltd.
- Katsumi Oomori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive-working photoresist composition
- Patent number 6,444,394
- Issue date Sep 3, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working chemical-amplification photoresist composition
- Patent number 6,387,587
- Issue date May 14, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical-sensitization photoresist composition
- Patent number 6,388,101
- Issue date May 14, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive-working chemical-amplification photoresist composition and...
- Patent number 6,284,430
- Issue date Sep 4, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for formation of patterned resist layer
- Patent number 6,255,041
- Issue date Jul 3, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical-sensitization resist composition
- Patent number 6,245,930
- Issue date Jun 12, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working photoresist composition
- Patent number 6,225,476
- Issue date May 1, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition
- Patent number 6,159,652
- Issue date Dec 12, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working photoresist composition
- Patent number 6,087,063
- Issue date Jul 11, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working resist composition
- Patent number 6,077,644
- Issue date Jun 20, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemical-sensitization resist composition
- Patent number 5,976,760
- Issue date Nov 2, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition
- Patent number 5,955,240
- Issue date Sep 21, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working photoresist composition
- Patent number 5,948,589
- Issue date Sep 7, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20220107565
- Publication date Apr 7, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru TAKESHITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN FORMING METHOD AND DEVELOPER FOR LITHOGRAPHY
- Publication number 20170059994
- Publication date Mar 2, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi SATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming photoresist pattern and photoresist laminate
- Publication number 20090311625
- Publication date Dec 17, 2009
- Akiyoshi Yamazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN
- Publication number 20090220889
- Publication date Sep 3, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING RESIST PATTERN BY NANOIMPRINT LITHOGRAPHY
- Publication number 20090189317
- Publication date Jul 30, 2009
- TOKYO OHKA KOGYO CO., LTD.
- Kazufumi Sato
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Method for forming photoresist pattern and photoresist laminate
- Publication number 20080227027
- Publication date Sep 18, 2008
- Akiyoshi Yamazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition for forming antireflection coating
- Publication number 20070281098
- Publication date Dec 6, 2007
- Taku Hirayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Positive-working photoresist composition and photosensitive materia...
- Publication number 20070122744
- Publication date May 31, 2007
- Satoshi Maemori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition, resist laminates and process for formi...
- Publication number 20070009828
- Publication date Jan 11, 2007
- Tokyo Ohka Kogyo, Co., LTD.
- Koki Tamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition for formation of antireflection film, and antireflectio...
- Publication number 20060292488
- Publication date Dec 28, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Toshikazu Takayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Positive resist composition and method for forming resist pattern
- Publication number 20060251986
- Publication date Nov 9, 2006
- Kazufumi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition for forming antireflection coating
- Publication number 20060021964
- Publication date Feb 2, 2006
- Taku Hirayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Chemical amplification type silicone based positive photoresist com...
- Publication number 20060003252
- Publication date Jan 5, 2006
- Taku Hirayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Composition for forming antireflection coating
- Publication number 20050282090
- Publication date Dec 22, 2005
- Kawasaki-shi Hirayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method for forming photoresist pattern and photoresist laminate
- Publication number 20050266346
- Publication date Dec 1, 2005
- Akiyoshi Yamazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive-working chemical-amplification photoresist composition
- Publication number 20050042544
- Publication date Feb 24, 2005
- Katsumi Oomori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming photoresist pattern and photoresist laminate
- Publication number 20040248033
- Publication date Dec 9, 2004
- Akiyoshi Yamazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive-working photoresist composition
- Publication number 20040072103
- Publication date Apr 15, 2004
- Kazufumi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for the preparation of a semiconductor device
- Publication number 20040067615
- Publication date Apr 8, 2004
- Satoshi Maemori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive-working chemical-amplification photoresist composition
- Publication number 20030152865
- Publication date Aug 14, 2003
- Katsumi Oomori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming photoresist pattern and photoresist laminate
- Publication number 20030129534
- Publication date Jul 10, 2003
- Akiyoshi Yamazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive-working photoresist composition
- Publication number 20020110750
- Publication date Aug 15, 2002
- Kazufumi Sato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Method for forming a hole-patterned photoresist layer
- Publication number 20020106580
- Publication date Aug 8, 2002
- Kazuyuki Nitta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive-working chemical-amplification photoresist composition
- Publication number 20020094489
- Publication date Jul 18, 2002
- Katsumi Oomori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Positive-working chemical-amplification photoresist composition and...
- Publication number 20020090567
- Publication date Jul 11, 2002
- Katsumi Oomori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Positive-working chemical-amplification photoresist composition
- Publication number 20020090570
- Publication date Jul 11, 2002
- Katsumi Oomori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Positive-working chemical-amplification photoresist composition
- Publication number 20020090571
- Publication date Jul 11, 2002
- Katsumi Oomori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Positive-working photoresist composition and photosensitive materia...
- Publication number 20020058202
- Publication date May 16, 2002
- Satoshi Maemori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Coating composition for chemically amplified positive resist and me...
- Publication number 20020055063
- Publication date May 9, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Satoshi Kumon
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Photosensitive laminate, process for forming resist pattern using s...
- Publication number 20020045123
- Publication date Apr 18, 2002
- Waki Okubo
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Kazufumi SATO

Person

Patents Grantslast 30 patents

Resist composition and method of forming resist pattern

Resist pattern forming method and developer for lithography

Method of forming resist pattern by nanoimprint lithography

Photosensitive resin composition and method of forming pattern

Positive resist composition and method for forming resist pattern

Positive-working chemical-amplification photoresist composition

Positive-working chemical-amplification photoresist composition

Method for the preparation of a semiconductor device

Positive-working chemical-amplification photoresist composition

Positive-working photoresist composition and resist patterning meth...

Method for the preparation of a semiconductor device

Positive-working chemical-amplification photoresist composition

Positive-working photoresist composition

Coating composition for chemically amplified positive resist and me...

Photosensitive laminate, process for forming resist pattern using s...

Positive resist composition

Positive-working chemical-amplification photoresist composition and...

Positive-working photoresist composition

Positive-working chemical-amplification photoresist composition

Chemical-sensitization photoresist composition

Positive-working chemical-amplification photoresist composition and...

Method for formation of patterned resist layer

Chemical-sensitization resist composition

Positive-working photoresist composition

Positive resist composition

Positive-working photoresist composition

Positive-working resist composition

Chemical-sensitization resist composition

Positive resist composition

Positive-working photoresist composition

Patents Applicationslast 30 patents

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST PATTERN FORMING METHOD AND DEVELOPER FOR LITHOGRAPHY

Method for forming photoresist pattern and photoresist laminate

PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN

METHOD OF FORMING RESIST PATTERN BY NANOIMPRINT LITHOGRAPHY

Method for forming photoresist pattern and photoresist laminate

Composition for forming antireflection coating

Positive-working photoresist composition and photosensitive materia...

Positive resist composition, resist laminates and process for formi...

Composition for formation of antireflection film, and antireflectio...

Positive resist composition and method for forming resist pattern

Composition for forming antireflection coating

Chemical amplification type silicone based positive photoresist com...

Composition for forming antireflection coating

Method for forming photoresist pattern and photoresist laminate

Positive-working chemical-amplification photoresist composition

Method for forming photoresist pattern and photoresist laminate

Positive-working photoresist composition

Method for the preparation of a semiconductor device

Positive-working chemical-amplification photoresist composition

Method for forming photoresist pattern and photoresist laminate

Positive-working photoresist composition

Method for forming a hole-patterned photoresist layer

Positive-working chemical-amplification photoresist composition

Positive-working chemical-amplification photoresist composition and...

Positive-working chemical-amplification photoresist composition

Positive-working chemical-amplification photoresist composition

Positive-working photoresist composition and photosensitive materia...

Coating composition for chemically amplified positive resist and me...

Photosensitive laminate, process for forming resist pattern using s...