Kazuhiro Tomioka

Person

Tsukuba-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,381,198
- Issue date Aug 13, 2019
- TOSHIBA MEMORY CORPORATION
- Akio Ui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 9,287,495
- Issue date Mar 15, 2016
- Kabushiki Kaisha Toshiba
- Kazuhiro Tomioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device having a magnetic fi...
- Patent number 8,987,007
- Issue date Mar 24, 2015
- Kabushiki Kaisha Toshiba
- Kazuhiro Tomioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 8,586,390
- Issue date Nov 19, 2013
- Kabushiki Kaisha Toshiba
- Kazuhiro Tomioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method, substrate processing system, and compu...
- Patent number 8,187,981
- Issue date May 29, 2012
- Tokyo Electron Limited
- Kazuhiro Tomioka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device having multiple wiring layers and method of pr...
- Patent number 7,855,141
- Issue date Dec 21, 2010
- Kabushiki Kaisha Toshiba
- Yoshiaki Shimooka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 7,767,582
- Issue date Aug 3, 2010
- Kabushiki Kaisha Toshiba
- Nobuyasu Nishiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having multiple wiring layers and method of pr...
- Patent number 7,745,326
- Issue date Jun 29, 2010
- Kabushiki Kaisha Toshiba
- Yoshiaki Shimooka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having multiple wiring layers and method of pr...
- Patent number 7,589,014
- Issue date Sep 15, 2009
- Kabushiki Kaisha Toshiba
- Yoshiaki Shimooka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and mask pattern
- Patent number 7,504,680
- Issue date Mar 17, 2009
- Kabushiki Kaisha Toshiba
- Osamu Arisumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor memory device having ferroelectric capacitors with hy...
- Patent number 7,400,005
- Issue date Jul 15, 2008
- Kabushiki Kaisha Toshiba
- Yoshinori Kumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 7,115,522
- Issue date Oct 3, 2006
- Kabushiki Kaisha Toshiba
- Kazuhiro Tomioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hardmask with high selectivity for Ir barriers for ferroelectric ca...
- Patent number 7,045,837
- Issue date May 16, 2006
- Infineon Technologies AG
- Ulrich Egger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sidewall structure and method of fabrication for reducing oxygen di...
- Patent number 7,042,705
- Issue date May 9, 2006
- Infineon Technologies AG
- Haoren Zhuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fence-free etching of iridium barrier having a steep taper angle
- Patent number 7,015,049
- Issue date Mar 21, 2006
- Infineon Technologies AG
- Ulrich Egger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus with reduced parasitic capacity and los...
- Patent number 6,780,278
- Issue date Aug 24, 2004
- Kabushiki Kaisha Toshiba
- Hisataka Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for fabrication of a ferrocapacitor
- Patent number 6,762,064
- Issue date Jul 13, 2004
- Infineon Technologies AG
- Haoren Zhuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating apparatus
- Patent number 5,897,713
- Issue date Apr 27, 1999
- Kabushiki Kaisha Toshiba
- Kazuhiro Tomioka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and method
- Patent number 5,810,963
- Issue date Sep 22, 1998
- Kabushiki Kaisha Toshiba
- Kazuhiro Tomioka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 5,445,710
- Issue date Aug 29, 1995
- Kabushiki Kaisha Toshiba
- Masaru Hori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 5,302,240
- Issue date Apr 12, 1994
- Kabushiki Kaisha Toshiba
- Masaru Hori
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHDO
- Publication number 20170169996
- Publication date Jun 15, 2017
- Kabushiki Kaisha Toshiba
- Akio UI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20140083977
- Publication date Mar 27, 2014
- Kabushiki Kaisha Toshiba
- Akio UI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20140087485
- Publication date Mar 27, 2014
- Kazuhiro TOMIOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Manufacturing Semiconductor Device
- Publication number 20140080227
- Publication date Mar 20, 2014
- Kazuhiro TOMIOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20130149795
- Publication date Jun 13, 2013
- Kabushiki Kaisha Toshiba
- Kazuhiro Tomioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20130017626
- Publication date Jan 17, 2013
- Kazuhiro TOMIOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20120244641
- Publication date Sep 27, 2012
- Kabushiki Kaisha Toshiba
- Kazuhiro TOMIOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETORESISTIVE ELEMENT AND METHOD OF MANUFACTURING THE SAME
- Publication number 20120032288
- Publication date Feb 9, 2012
- Kabushiki Kaisha Toshiba
- Kazuhiro TOMIOKA
- G11 - INFORMATION STORAGE
Information Patent Application
SEMICONDUCTOR DEVICE HAVING MULTIPLE WIRING LAYERS AND METHOD OF PR...
- Publication number 20090280642
- Publication date Nov 12, 2009
- Kabushiki Kaisha Toshiba
- Yoshiaki SHIMOOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING MULTIPLE WIRING LAYERS AND METHOD OF PR...
- Publication number 20090275194
- Publication date Nov 5, 2009
- Kabushiki Kaisha Toshiba
- Yoshiaki Shimooka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING SYSTEM, AND COMPU...
- Publication number 20090014414
- Publication date Jan 15, 2009
- TOKYO ELECTRON LIMITED
- Kazuhiro Tomioka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE HAVE MULTIPLE WIRING LAYERS AND METHOD OF PROD...
- Publication number 20070093052
- Publication date Apr 26, 2007
- Kabushiki Kaisha Toshiba
- Yoshiaki Shimooka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing semiconductor device
- Publication number 20070082493
- Publication date Apr 12, 2007
- Nobuyasu Nishiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and mask pattern
- Publication number 20060231876
- Publication date Oct 19, 2006
- Osamu Arisumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor memory device and its manufacturing method
- Publication number 20060180894
- Publication date Aug 17, 2006
- Yoshinori Kumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device
- Publication number 20060071258
- Publication date Apr 6, 2006
- Kazuhiro Tomioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for manufacturing semiconductor device
- Publication number 20060009040
- Publication date Jan 12, 2006
- Kazuhiro Tomioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20050128663
- Publication date Jun 16, 2005
- Soichi Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method for manufacturing the same
- Publication number 20050070043
- Publication date Mar 31, 2005
- Koji Yamakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FENCE-FREE ETCHING OF IRIDIUM BARRIER HAVING A STEEP TAPER ANGLE
- Publication number 20050045937
- Publication date Mar 3, 2005
- Infineon Technologies AG
- Ulrich Egger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus with reduced parasitic capacity and los...
- Publication number 20040238126
- Publication date Dec 2, 2004
- KABUSHIKI KAISHA TOSHIBA
- Hisataka Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for formation of hardmask elements during a semiconductor de...
- Publication number 20040171274
- Publication date Sep 2, 2004
- Haoren Zhuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Sidewall structure and method of fabrication for reducing oxygen di...
- Publication number 20040149477
- Publication date Aug 5, 2004
- Haoren Zhuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Hardmask with high selectivity for Ir barriers for ferroelectic cap...
- Publication number 20040150923
- Publication date Aug 5, 2004
- Ulrich Egger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device have multiple wiring layers and method of prod...
- Publication number 20020187625
- Publication date Dec 12, 2002
- Kabushiki Kaisha Toshiba
- Yoshiaki Shimooka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus with reduced parasitic capacity and los...
- Publication number 20020042204
- Publication date Apr 11, 2002
- Hisataka Hayashi
- H01 - BASIC ELECTRIC ELEMENTS

Kazuhiro Tomioka

Person

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Method of manufacturing semiconductor device

Method of manufacturing a semiconductor device having a magnetic fi...

Method for manufacturing semiconductor device

Substrate processing method, substrate processing system, and compu...

Semiconductor device having multiple wiring layers and method of pr...

Method of manufacturing semiconductor device

Semiconductor device having multiple wiring layers and method of pr...

Semiconductor device having multiple wiring layers and method of pr...

Semiconductor device and mask pattern

Semiconductor memory device having ferroelectric capacitors with hy...

Method for manufacturing semiconductor device

Hardmask with high selectivity for Ir barriers for ferroelectric ca...

Sidewall structure and method of fabrication for reducing oxygen di...

Fence-free etching of iridium barrier having a steep taper angle

Plasma processing apparatus with reduced parasitic capacity and los...

Process for fabrication of a ferrocapacitor

Plasma generating apparatus

Plasma processing apparatus and method

Method of manufacturing semiconductor device

Method of manufacturing semiconductor device

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHDO

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

Method of Manufacturing Semiconductor Device

ETCHING METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

ETCHING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

MAGNETORESISTIVE ELEMENT AND METHOD OF MANUFACTURING THE SAME

SEMICONDUCTOR DEVICE HAVING MULTIPLE WIRING LAYERS AND METHOD OF PR...

SEMICONDUCTOR DEVICE HAVING MULTIPLE WIRING LAYERS AND METHOD OF PR...

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING SYSTEM, AND COMPU...

SEMICONDUCTOR DEVICE HAVE MULTIPLE WIRING LAYERS AND METHOD OF PROD...

Method of manufacturing semiconductor device

Semiconductor device and mask pattern

Semiconductor memory device and its manufacturing method

Semiconductor device

Method for manufacturing semiconductor device

Semiconductor device and method of manufacturing the same

Semiconductor device and method for manufacturing the same

FENCE-FREE ETCHING OF IRIDIUM BARRIER HAVING A STEEP TAPER ANGLE

Plasma processing apparatus with reduced parasitic capacity and los...

Method for formation of hardmask elements during a semiconductor de...

Sidewall structure and method of fabrication for reducing oxygen di...

Hardmask with high selectivity for Ir barriers for ferroelectic cap...

Semiconductor device have multiple wiring layers and method of prod...

Plasma processing apparatus with reduced parasitic capacity and los...