Kazuko Yamamoto

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Pattern forming method and pattern forming apparatus
- Patent number 6,806,941
- Issue date Oct 19, 2004
- Kabushiki Kaisha Toshiba
- Soichi Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and program for processing design pattern of semiconductor i...
- Patent number 6,637,010
- Issue date Oct 21, 2003
- Kabushiki Kaisha Toshiba
- Kazuko Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern correcting method and pattern verifying method
- Patent number 6,622,297
- Issue date Sep 16, 2003
- Kabushiki Kaisha Toshiba
- Taiga Uno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method and pattern forming apparatus
- Patent number 6,335,145
- Issue date Jan 1, 2002
- Kabushiki Kaisha Toshiba
- Soichi Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of designing an LSI pattern to be formed on a specimen with...
- Patent number 6,249,900
- Issue date Jun 19, 2001
- Kabushiki Kaisha Toshiba
- Toshiya Kotani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask data design method
- Patent number 6,243,855
- Issue date Jun 5, 2001
- Kabushiki Kaisha Toshiba
- Sachiko Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method and pattern forming apparatus
- Patent number 6,165,652
- Issue date Dec 26, 2000
- Kabushiki Kaisha Toshiba
- Soichi Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 6,110,647
- Issue date Aug 29, 2000
- Kabushiki Kaisha Toshiba
- Soichi Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical proximity correction system
- Patent number 6,077,310
- Issue date Jun 20, 2000
- Kabushiki Kaisha Toshiba
- Kazuko Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask pattern correction method
- Patent number 6,060,368
- Issue date May 9, 2000
- Kabushiki Kaisha Toshiba
- Koji Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method
- Patent number 6,040,114
- Issue date Mar 21, 2000
- Kabushiki Kaisha Toshiba
- Soichi Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for designing Levenson photomask
- Patent number 6,004,701
- Issue date Dec 21, 1999
- Kabushiki Kaisha Toshiba
- Taiga Uno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical proximity correction method
- Patent number 5,879,844
- Issue date Mar 9, 1999
- Kabushiki Kaisha Toshiba
- Kazuko Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and a system for designing a photomask for use in manufactur...
- Patent number 5,795,683
- Issue date Aug 18, 1998
- Kabushiki Kaisha Toshiba
- Taiga Uno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Pattern forming method and pattern forming apparatus
- Publication number 20020045132
- Publication date Apr 18, 2002
- Soichi Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern correcting method and pattern verifying method
- Publication number 20020040468
- Publication date Apr 4, 2002
- Taiga Uno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and program for processing design pattern of semiconductor i...
- Publication number 20020038445
- Publication date Mar 28, 2002
- Kazuko Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Kazuko Yamamoto

Person

Patents Grantslast 30 patents

Pattern forming method and pattern forming apparatus

Method and program for processing design pattern of semiconductor i...

Pattern correcting method and pattern verifying method

Pattern forming method and pattern forming apparatus

Method of designing an LSI pattern to be formed on a specimen with...

Mask data design method

Pattern forming method and pattern forming apparatus

Method of manufacturing semiconductor device

Optical proximity correction system

Mask pattern correction method

Pattern forming method

Method for designing Levenson photomask

Optical proximity correction method

Method and a system for designing a photomask for use in manufactur...

Patents Applicationslast 30 patents

Pattern forming method and pattern forming apparatus

Pattern correcting method and pattern verifying method

Method and program for processing design pattern of semiconductor i...