Kazumasa Endo

Person

Kanagawa-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Polarized light defect detection in pupil images
- Patent number 8,730,465
- Issue date May 20, 2014
- Nikon Corporation
- Kazumasa Endo
- G01 - MEASURING TESTING
Information Patent Grant
Defect inspection device and defect inspection method
- Patent number 8,705,840
- Issue date Apr 22, 2014
- Nikon Corporation
- Kazumasa Endo
- G01 - MEASURING TESTING
Information Patent Grant
Polarized light defect detection in pupil images
- Patent number 8,599,370
- Issue date Dec 3, 2013
- Nikon Corporation
- Kazumasa Endo
Information Patent Grant
Optical member, method of manufacturing the same, and projection ex...
- Patent number 7,166,163
- Issue date Jan 23, 2007
- Nikon Corporation
- Hideki Obara
- G02 - OPTICS
Information Patent Grant
Projection exposure apparatus and method with adjustment of rotatio...
- Patent number 6,958,803
- Issue date Oct 25, 2005
- Nikon Corporation
- Toshihiro Sasaya
- F21 - LIGHTING
Information Patent Grant
Optical member and method of producing the same, and projection ali...
- Patent number 6,850,371
- Issue date Feb 1, 2005
- Nikon Corporation
- Hideki Obara
- G02 - OPTICS
Information Patent Grant
Optical member for photolithography and method of evaluating the same
- Patent number 6,829,039
- Issue date Dec 7, 2004
- Nikon Corporation
- Kazumasa Endo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection optical system and exposure apparatus using the same
- Patent number RE37846
- Issue date Sep 17, 2002
- Nikon Corporation
- Hitoshi Matsuzawa
- 359 - Optical: systems and elements
Information Patent Grant
Method of manufacturing and using correction member to correct aber...
- Patent number 6,262,793
- Issue date Jul 17, 2001
- Nikon Corporation
- Toshihiro Sasaya
- G02 - OPTICS
Information Patent Grant
Exposure apparatus
- Patent number 6,084,723
- Issue date Jul 4, 2000
- Nikon Corporation
- Hitoshi Matsuzawa
- G02 - OPTICS
Information Patent Grant
Projection-optical system for use in a projection-exposure apparatus
- Patent number 5,903,400
- Issue date May 11, 1999
- Nikon Corporation
- Kazumasa Endo
- G02 - OPTICS
Information Patent Grant
Projection optical system and exposure apparatus using the same
- Patent number 5,835,285
- Issue date Nov 10, 1998
- Nikon Corporation
- Hitoshi Matsuzawa
- G02 - OPTICS
Information Patent Grant
Projection exposure apparatus
- Patent number 4,758,864
- Issue date Jul 19, 1988
- Nippon Kogaku K.K.
- Kazumasa Endo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical path length compensating optical system in an alignment app...
- Patent number 4,723,846
- Issue date Feb 9, 1988
- Nippon Kogaku K.K.
- Makoto Uehara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical alignment apparatus
- Patent number 4,660,966
- Issue date Apr 28, 1987
- Nippon Kogaku K.K.
- Kinya Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
DEFECT INSPECTION DEVICE AND DEFECT INSPECTION METHOD
- Publication number 20110249112
- Publication date Oct 13, 2011
- Nikon Corporation
- Kazumasa ENDO
- G01 - MEASURING TESTING
Information Patent Application
Defect detecting apparatus and defect detecting method
- Publication number 20090147247
- Publication date Jun 11, 2009
- Nikon Corporation
- Kazumasa Endo
- G01 - MEASURING TESTING
Information Patent Application
Optical member, method of manufacturing the same, and projection ex...
- Publication number 20050081777
- Publication date Apr 21, 2005
- Nikon Corporation
- Hideki Obara
- C30 - CRYSTAL GROWTH
Information Patent Application
Projection exposure apparatus and method with adjustment of rotatio...
- Publication number 20040046950
- Publication date Mar 11, 2004
- Nikon Corporation
- Toshihiro Sasaya
- G02 - OPTICS
Information Patent Application
Optical Member for Photolithography and Method of Evaluating the Same
- Publication number 20030174300
- Publication date Sep 18, 2003
- Kazumasa Endo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical member and method of producing the same, and projection ali...
- Publication number 20030089299
- Publication date May 15, 2003
- Hideki Obara
- C30 - CRYSTAL GROWTH
Information Patent Application
Projection exposure apparatus
- Publication number 20020054282
- Publication date May 9, 2002
- NIKON CORPORATION
- Toshihiro Sasaya
- G02 - OPTICS

Kazumasa Endo

Person

Patents Grantslast 30 patents

Polarized light defect detection in pupil images

Defect inspection device and defect inspection method

Polarized light defect detection in pupil images

Optical member, method of manufacturing the same, and projection ex...

Projection exposure apparatus and method with adjustment of rotatio...

Optical member and method of producing the same, and projection ali...

Optical member for photolithography and method of evaluating the same

Projection optical system and exposure apparatus using the same

Method of manufacturing and using correction member to correct aber...

Exposure apparatus

Projection-optical system for use in a projection-exposure apparatus

Projection optical system and exposure apparatus using the same

Projection exposure apparatus

Optical path length compensating optical system in an alignment app...

Optical alignment apparatus

Patents Applicationslast 30 patents

DEFECT INSPECTION DEVICE AND DEFECT INSPECTION METHOD

Defect detecting apparatus and defect detecting method

Optical member, method of manufacturing the same, and projection ex...

Projection exposure apparatus and method with adjustment of rotatio...

Optical Member for Photolithography and Method of Evaluating the Same

Optical member and method of producing the same, and projection ali...

Projection exposure apparatus