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Kenetsu YOKOGAWA

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  • Tokyo, JP
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Patents Grantslast 30 patents

Patents Applicationslast 30 patents

  • Information Patent Application

    ETCHING METHOD
    • Publication number 20240297046
    • Publication date Sep 5, 2024
    • Hitachi High-Tech Corporation
    • Kazunori SHINODA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    ETCHING METHOD
    • Publication number 20240047222
    • Publication date Feb 8, 2024
    • Hitachi High-Tech Corporation
    • Kazunori Shinoda
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS
    • Publication number 20220157576
    • Publication date May 19, 2022
    • Hitachi High-Tech Corporation
    • Taku Iwase
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS
    • Publication number 20210249233
    • Publication date Aug 12, 2021
    • Hitachi High-Tech Corporation
    • Hiroyuki Kajifusa
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING DEVICE
    • Publication number 20210159055
    • Publication date May 27, 2021
    • HITACHI HIGH-TECH CORPORATION
    • Tooru ARAMAKI
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PLASMA PROCESSING APPARATUS
    • Publication number 20210111002
    • Publication date Apr 15, 2021
    • Hitachi High-Technologies Corporation
    • Yuki KONDO
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
    • Publication number 20200411291
    • Publication date Dec 31, 2020
    • HITACHI HIGH-TECH CORPORATION
    • Tooru ARAMAKI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING METHOD
    • Publication number 20200328099
    • Publication date Oct 15, 2020
    • HITACHI HIGH-TECH CORPORATION
    • Hiroyuki KOBAYASHI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS
    • Publication number 20200234924
    • Publication date Jul 23, 2020
    • Hitachi High-Technologies Corporation
    • Kenetsu YOKOGAWA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING DEVICE
    • Publication number 20200083026
    • Publication date Mar 12, 2020
    • Hitachi High-Technologies Corporation
    • Takamasa ICHINO
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS
    • Publication number 20190295823
    • Publication date Sep 26, 2019
    • Hitachi High-Technologies Corporation
    • Naoyuki KOFUJI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS
    • Publication number 20190287770
    • Publication date Sep 19, 2019
    • Hitachi High-Technologies Corporation
    • Taku IWASE
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS
    • Publication number 20190244795
    • Publication date Aug 8, 2019
    • Hitachi High-Technologies Corporation
    • Takumi Tandou
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS
    • Publication number 20190214235
    • Publication date Jul 11, 2019
    • Hitachi High-Technologies Corporation
    • Kenetsu YOKOGAWA
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
    • Publication number 20190198297
    • Publication date Jun 27, 2019
    • Hitachi High-Technologies Corporation
    • Tooru ARAMAKI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    WAFER PROCESSING METHOD AND WAFER PROCESSING APPARATUS
    • Publication number 20190198299
    • Publication date Jun 27, 2019
    • Hitachi High-Technologies Corporation
    • Tomoyuki WATANABE
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS
    • Publication number 20190189396
    • Publication date Jun 20, 2019
    • Hitachi High-Technologies Corporation
    • Taku IWASE
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
    • Publication number 20190122864
    • Publication date Apr 25, 2019
    • Hitachi High-Technologies Corporation
    • Tooru ARAMAKI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS
    • Publication number 20180122665
    • Publication date May 3, 2018
    • Hitachi High-Technologies Corporation
    • Hiroyuki KOBAYASHI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    OPERATION METHOD OF PLASMA PROCESSING APPARATUS
    • Publication number 20180090345
    • Publication date Mar 29, 2018
    • Hitachi High-Technologies Corporation
    • Yutaka KOUZUMA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS
    • Publication number 20180068835
    • Publication date Mar 8, 2018
    • Hitachi High-Technologies Corporation
    • Makoto SATAKE
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
    • Publication number 20180040459
    • Publication date Feb 8, 2018
    • Hitachi High-Technologies Corporation
    • Taku IWASE
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
    • Publication number 20170338086
    • Publication date Nov 23, 2017
    • Hitachi High-Technologies Corporation
    • Takao Arase
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
    • Publication number 20170278730
    • Publication date Sep 28, 2017
    • Hitachi High-Technologies Corporation
    • Takumi TANDOU
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    MANUFACTURING METHOD OF MAGNETORESISTIVE ELEMENT AND VACUUM PROCESS...
    • Publication number 20170194560
    • Publication date Jul 6, 2017
    • Hitachi High-Technologies Corporation
    • Makoto SATAKE
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS
    • Publication number 20170025255
    • Publication date Jan 26, 2017
    • Hitachi High-Technologies Corporation
    • Takumi TANDOU
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS
    • Publication number 20170025254
    • Publication date Jan 26, 2017
    • Hitachi High-Technologies Corporation
    • Takumi TANDOU
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PLASMA PROCESSING DEVICE
    • Publication number 20170011890
    • Publication date Jan 12, 2017
    • Hitachi High-Technologies Corporation
    • Tooru ARAMAKI
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
    • Publication number 20160351404
    • Publication date Dec 1, 2016
    • Hitachi High-Technologies Corporation
    • Tooru ARAMAKI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
    • Publication number 20160203958
    • Publication date Jul 14, 2016
    • Hitachi High-Technologies Corporation
    • Takao Arase
    • H01 - BASIC ELECTRIC ELEMENTS