Kenji Takeshita

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of enhancing etching selectivity using a pulsed plasma
- Patent number 11,495,470
- Issue date Nov 8, 2022
- Applied Materials, Inc.
- Hailong Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Precise critical dimension control using bilayer ALD
- Patent number 9,443,716
- Issue date Sep 13, 2016
- Applied Materials, Inc.
- Kenji Takeshita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Prevention of line bending and tilting for etch with tri-layer mask
- Patent number 8,946,091
- Issue date Feb 3, 2015
- Lam Research Corporation
- Youn-Jin Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated capacitive and inductive power sources for a plasma etch...
- Patent number 8,911,590
- Issue date Dec 16, 2014
- Lam Research Corporation
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniform etch system
- Patent number 8,801,892
- Issue date Aug 12, 2014
- Lam Research Corporation
- Dean J. Larson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for low-K dielectric etch with reduced damage
- Patent number 8,236,188
- Issue date Aug 7, 2012
- Lam Research Corporation
- Bing Ji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selectivity control in a plasma processing system
- Patent number 8,222,155
- Issue date Jul 17, 2012
- Lam Research Corporation
- Kenji Takeshita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for dielectric material removal between conductive lines
- Patent number 8,114,780
- Issue date Feb 14, 2012
- Lam Research Corporation
- Mayumi Block
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer electrical discharge control using argon free dechucking gas
- Patent number 7,892,445
- Issue date Feb 22, 2011
- Lam Research Corporation
- David Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for providing uniform removal of organic material
- Patent number 7,534,363
- Issue date May 19, 2009
- Lam Research Corporation
- Rao V. Annapragada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for the optimization of ion energy control in a plasma proc...
- Patent number 7,521,362
- Issue date Apr 21, 2009
- Lam Research Corporation
- Kenji Takeshita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for selectivity control in a plasma processing system
- Patent number 7,517,801
- Issue date Apr 14, 2009
- Lam Research Corporation
- Kenji Takeshita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniform etch system
- Patent number 7,371,332
- Issue date May 13, 2008
- Lam Research Corporation
- Dean J. Larson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for protecting silicon or silicon carbide electrode surface...
- Patent number 7,226,869
- Issue date Jun 5, 2007
- Lam Research Corporation
- Kenji Takeshita
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Gas distribution system with tuning gas
- Patent number 7,169,231
- Issue date Jan 30, 2007
- Lam Research Corporation
- Dean J. Larson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch with uniformity control
- Patent number 7,090,782
- Issue date Aug 15, 2006
- Lam Research Corporation
- Seiji Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of preventing damage to porous low-k materials during resist...
- Patent number 7,081,407
- Issue date Jul 25, 2006
- Lam Research Corporation
- Rao Annapragada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum plasma processor method
- Patent number 6,897,156
- Issue date May 24, 2005
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Moveable barrier for multiple etch processes
- Patent number 6,709,547
- Issue date Mar 23, 2004
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum plasma processor apparatus and method
- Patent number 6,531,029
- Issue date Mar 11, 2003
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for improving uniformity and reducing etch rate variation of...
- Patent number 6,514,378
- Issue date Feb 4, 2003
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High temperature tungsten etching process
- Patent number 6,461,974
- Issue date Oct 8, 2002
- Lam Research Corporation
- Tuqiang Ni
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
BIAS VOLTAGE MODULATION APPROACH FOR SiO/SiN LAYER ALTERNATING ETCH...
- Publication number 20230223268
- Publication date Jul 13, 2023
- Applied Materials, Inc.
- Sean KANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CHAMBER WITH A MULTIPHASE ROTATING CROSS-FLOW WITH UNIFORMIT...
- Publication number 20230057145
- Publication date Feb 23, 2023
- Applied Materials, Inc.
- DAISUKE SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ENHANCING ETCHING SELECTIVITY USING A PULSED PLASMA
- Publication number 20220336222
- Publication date Oct 20, 2022
- Applied Materials, Inc.
- Hailong ZHOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Module With Slotted Ground Plate
- Publication number 20170076917
- Publication date Mar 16, 2017
- Applied Materials, Inc.
- Joseph Yudovsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Precise Critical Dimension Control Using Bilayer ALD
- Publication number 20160104613
- Publication date Apr 14, 2016
- Applied Materials, Inc.
- Kenji Takeshita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PREVENTION OF LINE BENDING AND TILTING FOR ETCH WITH TRI-LAYER MASK
- Publication number 20120276747
- Publication date Nov 1, 2012
- LAM RESEARCH CORPORATION
- Youn-Jin Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR REPAIRING LOW-K DIELECTRIC DAMAGE
- Publication number 20110097904
- Publication date Apr 28, 2011
- LAM RESEARCH CORPORATION
- Stephen M. Sirard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR LOW-K DIELECTRIC ETCH WITH REDUCED DAMAGE
- Publication number 20100261352
- Publication date Oct 14, 2010
- LAM RESEARCH CORPORATION
- Bing Ji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DIELECTRIC MATERIAL REMOVAL BETWEEN CONDUCTIVE LINES
- Publication number 20100248485
- Publication date Sep 30, 2010
- LAM RESEARCH CORPORATION
- Mayumi Block
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNING VIA FACET WITH MINIMAL RIE LAG
- Publication number 20090068767
- Publication date Mar 12, 2009
- LAM RESEARCH CORPORATION
- Stephen Sirard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNIFORM ETCH SYSTEM
- Publication number 20080210377
- Publication date Sep 4, 2008
- LAM RESEARCH CORPORATION
- Dean J. Larson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVITY CONTROL IN A PLASMA PROCESSING SYSTEM
- Publication number 20080113516
- Publication date May 15, 2008
- Kenji Takeshita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated capacitive and inductive power sources for a plasma etch...
- Publication number 20070199658
- Publication date Aug 30, 2007
- LAM RESEARCH CORPORATION
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of preventing damage to porous low-K materials during resist...
- Publication number 20060240661
- Publication date Oct 26, 2006
- Rao Annapragada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for the optimization of ion energy control in a plasma proc...
- Publication number 20060121729
- Publication date Jun 8, 2006
- Kenji Takeshita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for protecting silicon or silicon carbide electrode surface...
- Publication number 20060091104
- Publication date May 4, 2006
- Kenji Takeshita
- B08 - CLEANING
Information Patent Application
Method of preventing damage to porous low-k materials during resist...
- Publication number 20050130435
- Publication date Jun 16, 2005
- Rao Annapragada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for providing uniform removal of organic material
- Publication number 20050006346
- Publication date Jan 13, 2005
- Rao V. Annapragada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Moveable barrier for multiple etch processes
- Publication number 20040144493
- Publication date Jul 29, 2004
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Uniform etch system
- Publication number 20040112540
- Publication date Jun 17, 2004
- Lam Research Corporation
- Dean J. Larson
- G05 - CONTROLLING REGULATING
Information Patent Application
Gas distribution system with tuning gas
- Publication number 20040112538
- Publication date Jun 17, 2004
- Lam Research Corporation
- Dean J. Larson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Uniform etch system
- Publication number 20040112539
- Publication date Jun 17, 2004
- Lam Research Corporation
- Dean J. Larson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum plasma processor apparatus and method
- Publication number 20030106645
- Publication date Jun 12, 2003
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS

Kenji Takeshita

Person

Patents Grantslast 30 patents

Method of enhancing etching selectivity using a pulsed plasma

Precise critical dimension control using bilayer ALD

Prevention of line bending and tilting for etch with tri-layer mask

Integrated capacitive and inductive power sources for a plasma etch...

Uniform etch system

Method for low-K dielectric etch with reduced damage

Selectivity control in a plasma processing system

Method for dielectric material removal between conductive lines

Wafer electrical discharge control using argon free dechucking gas

Method for providing uniform removal of organic material

Methods for the optimization of ion energy control in a plasma proc...

Method for selectivity control in a plasma processing system

Uniform etch system

Methods for protecting silicon or silicon carbide electrode surface...

Gas distribution system with tuning gas

Etch with uniformity control

Method of preventing damage to porous low-k materials during resist...

Vacuum plasma processor method

Moveable barrier for multiple etch processes

Vacuum plasma processor apparatus and method

Method for improving uniformity and reducing etch rate variation of...

High temperature tungsten etching process

Patents Applicationslast 30 patents

BIAS VOLTAGE MODULATION APPROACH FOR SiO/SiN LAYER ALTERNATING ETCH...

PLASMA CHAMBER WITH A MULTIPHASE ROTATING CROSS-FLOW WITH UNIFORMIT...

METHOD OF ENHANCING ETCHING SELECTIVITY USING A PULSED PLASMA

Plasma Module With Slotted Ground Plate

Precise Critical Dimension Control Using Bilayer ALD

PREVENTION OF LINE BENDING AND TILTING FOR ETCH WITH TRI-LAYER MASK

METHOD FOR REPAIRING LOW-K DIELECTRIC DAMAGE

METHOD FOR LOW-K DIELECTRIC ETCH WITH REDUCED DAMAGE

METHOD FOR DIELECTRIC MATERIAL REMOVAL BETWEEN CONDUCTIVE LINES

TUNING VIA FACET WITH MINIMAL RIE LAG

UNIFORM ETCH SYSTEM

SELECTIVITY CONTROL IN A PLASMA PROCESSING SYSTEM

Integrated capacitive and inductive power sources for a plasma etch...

Method of preventing damage to porous low-K materials during resist...

Methods for the optimization of ion energy control in a plasma proc...

Methods for protecting silicon or silicon carbide electrode surface...

Method of preventing damage to porous low-k materials during resist...

Method for providing uniform removal of organic material

Moveable barrier for multiple etch processes

Uniform etch system

Gas distribution system with tuning gas

Uniform etch system

Vacuum plasma processor apparatus and method