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Patents Grants
last 30 patents
Information
Patent Grant
Etch processing system having reflective endpoint detection
Patent number
12,007,686
Issue date
Jun 11, 2024
Applied Materials, Inc.
Michael N. Grimbergen
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Etch processing system having reflective endpoint detection
Patent number
11,022,877
Issue date
Jun 1, 2021
Applied Materials, Inc.
Michael N. Grimbergen
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Lift pin holder
Patent number
10,535,549
Issue date
Jan 14, 2020
Applied Materials, Inc.
Khiem K. Nguyen
B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information
Patent Grant
Plasma reactor having an array of plural individually controlled ga...
Patent number
10,170,280
Issue date
Jan 1, 2019
Applied Materials, Inc.
Madhavi R. Chandrachood
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Direct lift process apparatus
Patent number
9,978,632
Issue date
May 22, 2018
Applied Materials, Inc.
Khiem Nguyen
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Mask etch plasma reactor having an array of optical sensors viewing...
Patent number
9,218,944
Issue date
Dec 22, 2015
Applied Materials, Inc.
Madhavi R. Chandrachood
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Optical alignment systems for forming LEDs having a rough surface
Patent number
8,781,213
Issue date
Jul 15, 2014
Ultratech, Inc.
Robert L. Hsieh
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Optical alignment methods for forming LEDs having a rough surface
Patent number
8,088,633
Issue date
Jan 3, 2012
Ultratech, Inc.
Robert L. Hsieh
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Plasma mask etch method of controlling a reactor tunable element in...
Patent number
8,017,029
Issue date
Sep 13, 2011
Applied Materials, Inc.
Madhavi R. Chandrachood
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Process for etching a transparent workpiece including backside endp...
Patent number
8,012,366
Issue date
Sep 6, 2011
Applied Materials, Inc.
Richard Lewington
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Mask etch plasma reactor with cathode providing a uniform distribut...
Patent number
8,002,946
Issue date
Aug 23, 2011
Applied Materials, Inc.
Richard Lewington
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Mask etch plasma reactor with variable process gas distribution
Patent number
7,976,671
Issue date
Jul 12, 2011
Applied Materials, Inc.
Madhavi R. Chandrachood
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma reactor for processing a workpiece and having a tunable cathode
Patent number
7,967,930
Issue date
Jun 28, 2011
Applied Materials, Inc.
Richard Lewington
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Mask etch processing apparatus
Patent number
7,879,151
Issue date
Feb 1, 2011
Applied Materials, Inc.
Khiem Nguyen
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Cluster tool with integrated metrology chamber for transparent subs...
Patent number
7,846,848
Issue date
Dec 7, 2010
Applied Materials, Inc.
Richard Lewington
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Interferometer endpoint monitoring device
Patent number
7,682,984
Issue date
Mar 23, 2010
Applied Materials, Inc.
Khiem K. Nguyen
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method and apparatus for integrating metrology with etch processing
Patent number
7,601,272
Issue date
Oct 13, 2009
Applied Materials, Inc.
Khiem K. Nguyen
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Mask etch processing apparatus
Patent number
7,128,806
Issue date
Oct 31, 2006
Applied Materials, Inc.
Khiem Nguyen
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
ETCH PROCESSING SYSTEM HAVING REFLECTIVE ENDPOINT DETECTION
Publication number
20210263408
Publication date
Aug 26, 2021
Applied Materials, Inc.
Michael N. GRIMBERGEN
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
LIFT PIN HOLDER
Publication number
20190131165
Publication date
May 2, 2019
Khiem K. Nguyen
B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information
Patent Application
ETCH PROCESSING SYSTEM HAVING REFLECTIVE ENDPOINT DETECTION
Publication number
20180259848
Publication date
Sep 13, 2018
Applied Materials, Inc.
Michael N. GRIMBERGEN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PLASMA REACTOR HAVING AN ARRAY OF PLURAL INDIVIDUALLY CONTROLLED GA...
Publication number
20160042917
Publication date
Feb 11, 2016
Applied Materials, Inc.
Madhavi R. Chandrachood
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
DIRECT LIFT PROCESS APPARATUS
Publication number
20150364347
Publication date
Dec 17, 2015
Applied Materials, Inc.
Khiem NGUYEN
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Optical alignment systems for forming LEDs having a rough surface
Publication number
20120062726
Publication date
Mar 15, 2012
Robert L. Hsieh
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Optical alignment methods for forming LEDs having a rough surface
Publication number
20110129948
Publication date
Jun 2, 2011
ULTRATECH, INC.
Robert L. Hsieh
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Plasma mask etch method of controlling a reactor tunable element in...
Publication number
20080099434
Publication date
May 1, 2008
Madhavi R. Chandrachood
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Mask etch plasma reactor with variable process gas distribution
Publication number
20080102202
Publication date
May 1, 2008
APPLIED MATERIALS, INC.
Madhavi R. Chandrachood
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Mask etch plasma reactor having an array of optical sensors viewing...
Publication number
20080102001
Publication date
May 1, 2008
Madhavi R. Chandrachood
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Process for etching a transparent workpiece including backside endp...
Publication number
20080099432
Publication date
May 1, 2008
APPLIED MATERIALS, INC.
Richard Lewington
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Plasma reactor for processing a transparent workpiece with backside...
Publication number
20080099437
Publication date
May 1, 2008
Richard Lewington
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Workpiece rotation apparatus for a plasma reactor system
Publication number
20080099451
Publication date
May 1, 2008
Richard Lewington
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Mask etch plasma reactor with cathode providing a uniform distribut...
Publication number
20080100222
Publication date
May 1, 2008
APPLIED MATERIALS, INC.
Richard Lewington
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma reactor for processing a workpiece and having a tunable cathode
Publication number
20080100223
Publication date
May 1, 2008
Richard Lewington
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD AND APPARATUS FOR INTEGRATING METROLOGY WITH ETCH PROCESSING
Publication number
20070097383
Publication date
May 3, 2007
KHIEM K. NGUYEN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
INTERFEROMETER ENDPOINT MONITORING DEVICE
Publication number
20070023393
Publication date
Feb 1, 2007
Khiem K. Nguyen
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
CLUSTER TOOL WITH INTEGRATED METROLOGY CHAMBER FOR TRANSPARENT SUBS...
Publication number
20070012660
Publication date
Jan 18, 2007
Richard Lewington
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MASK ETCH PROCESSING APPARATUS
Publication number
20070007660
Publication date
Jan 11, 2007
Khiem Nguyen
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Integrated metrology chamber for transparent substrates
Publication number
20060154388
Publication date
Jul 13, 2006
Richard Lewington
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Mask handler apparatus
Publication number
20050133158
Publication date
Jun 23, 2005
APPLIED MATERIALS, INC.
Khiem K. Nguyen
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Tuned potential pedestal for mask etch processing apparatus
Publication number
20050133166
Publication date
Jun 23, 2005
APPLIED MATERIALS, INC.
Peter Satitpunwaycha
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Mask etch processing apparatus
Publication number
20050082007
Publication date
Apr 21, 2005
APPLIED MATERIALS, INC.
Khiem Nguyen
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Interferometer endpoint monitoring device
Publication number
20050067103
Publication date
Mar 31, 2005
APPLIED MATERIALS, INC.
Khiem K. Nguyen
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY