Ki Ho Baik

Person

Kyoungki-do, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Process for forming a fine pattern using a top-coating composition...
- Patent number 7,329,477
- Issue date Feb 12, 2008
- Hynix Semiconductor Inc.
- Jae Chang Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Additive for photoresist composition for resist flow process
- Patent number 7,150,961
- Issue date Dec 19, 2006
- Hynix Semiconductor Inc.
- Min Ho Jung
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Top-coating composition for photoresist and process for forming fin...
- Patent number 6,984,482
- Issue date Jan 10, 2006
- Hynix Semiconductor Inc.
- Jae Chang Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organic anti-reflective polymer and preparation thereof
- Patent number 6,956,091
- Issue date Oct 18, 2005
- Hyundai Electronics Industries Co., Ltd.
- Sung-eun Hong
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
ArF photoresist copolymers
- Patent number 6,866,984
- Issue date Mar 15, 2005
- Hyundai Electronics Industries Co., Ltd.
- Jae Chang Jung
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist composition for resist flow process
- Patent number 6,824,951
- Issue date Nov 30, 2004
- Hynix Semiconductor Inc.
- Geun Su Lee
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Cross-linker monomer comprising double bond and photoresist copolym...
- Patent number 6,818,376
- Issue date Nov 16, 2004
- Hynix Semiconductor Inc.
- Geun Su Lee
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Partially crosslinked polymer for bilayer photoresist
- Patent number 6,811,960
- Issue date Nov 2, 2004
- Hyundai Electronics Industries Co., Ltd.
- Geun Su Lee
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
ArF photoresist copolymers
- Patent number 6,808,859
- Issue date Oct 26, 2004
- Hyundai Electronics Industries Co., Ltd.
- Jae Chang Jung
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Reflection-inhibiting resin used in process for forming photoresist...
- Patent number 6,797,451
- Issue date Sep 28, 2004
- Hynix Semiconductor Inc.
- Sung Eun Hong
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Organic polymer for anti-reflective coating layer and preparation t...
- Patent number 6,780,953
- Issue date Aug 24, 2004
- Hyundai Electronics Industries Co., Ltd.
- Min-Ho Jung
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist polymer for top-surface imaging process by silylation a...
- Patent number 6,770,415
- Issue date Aug 3, 2004
- Hynix Semiconductor Inc.
- Geun Su Lee
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Organic polymer for organic anti-reflective coating layer and prepa...
- Patent number 6,770,720
- Issue date Aug 3, 2004
- Hyundai Electronics Industries Co., Ltd.
- Jae-chang Jung
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Additive for photoresist composition for resist flow process
- Patent number 6,770,414
- Issue date Aug 3, 2004
- Hynix Semiconductor Inc.
- Min Ho Jung
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Over-coating composition for photoresist, and processes for forming...
- Patent number 6,764,806
- Issue date Jul 20, 2004
- Hyundai Electronics Industries Co., Ltd.
- Jae Chang Jung
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist monomers, polymers thereof and photoresist compositions...
- Patent number 6,753,448
- Issue date Jun 22, 2004
- Hyundai Electronics Industries Co., Ltd.
- Geun Su Lee
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process for forming a photoresist pattern comprising alkaline treat...
- Patent number 6,699,644
- Issue date Mar 2, 2004
- Hyundai Electronics Industries Co., Ltd.
- Geun Su Lee
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist composition containing photo radical generator with pho...
- Patent number 6,692,891
- Issue date Feb 17, 2004
- Hynix Semiconductor Inc.
- Jae Chang Jung
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process for forming photoresist pattern by using gas phase amine tr...
- Patent number 6,664,031
- Issue date Dec 16, 2003
- Hynix Semiconductor Inc.
- Jae Chang Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer-containing photoresist, and process for manufacturing the same
- Patent number 6,632,903
- Issue date Oct 14, 2003
- Hyundai Electronics Industries Co., Ltd.
- Min Ho Jung
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist composition for top-surface imaging processes by silyla...
- Patent number 6,630,281
- Issue date Oct 7, 2003
- Hynix Semiconductor Inc.
- Cha Won Koh
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist composition for resist flow process, and process for fo...
- Patent number 6,627,379
- Issue date Sep 30, 2003
- Hynix Semiconductor Inc.
- Jin Soo Kim
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist monomer comprising bisphenol derivatives and polymers t...
- Patent number 6,627,383
- Issue date Sep 30, 2003
- Hynix Semiconductor Inc.
- Geun Su Lee
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Copolymer resin, preparation thereof, and photoresist using the same
- Patent number 6,608,158
- Issue date Aug 19, 2003
- Hyundai Electronics Industries Co., Ltd.
- Min Ho Jung
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Organic anti-reflective coating polymer, anti-reflective coating co...
- Patent number 6,602,650
- Issue date Aug 5, 2003
- Hynix Semiconductor Inc.
- Sung-eun Hong
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Organic anti-reflective coating polymer, anti-reflective coating co...
- Patent number 6,599,678
- Issue date Jul 29, 2003
- Hynix Semiconductor Inc.
- Sung-eun Hong
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Organic polymer for organic anti-reflective coating layer and prepa...
- Patent number 6,593,446
- Issue date Jul 15, 2003
- Hyundai Electronics Industries Co., Ltd.
- Jae-Chang Jung
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Partially crosslinked polymer for bilayer photoresist
- Patent number 6,589,707
- Issue date Jul 8, 2003
- Hyundai Electronics Industries Co., Ltd.
- Geun Su Lee
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist monomer having hydroxy group and carboxy group, copolym...
- Patent number 6,586,619
- Issue date Jul 1, 2003
- Hyundai Electronics Industries Co., Ltd.
- Geun Su Lee
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Organic anti-reflective coating polymer, anti-reflective coating co...
- Patent number 6,582,883
- Issue date Jun 24, 2003
- Hynix Semiconductor Inc.
- Sung-eun Hong
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
Process for forming a fine pattern using a top-coating composition...
- Publication number 20050069816
- Publication date Mar 31, 2005
- Hynix Semiconductor Inc.
- Jae Chang Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Additive for photoresist composition for resist flow process
- Publication number 20040166437
- Publication date Aug 26, 2004
- Hynix Semiconductor Inc.
- Min Ho Jung
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Novel ArF photoresist copolymers
- Publication number 20040131968
- Publication date Jul 8, 2004
- HYUNDAI ELECTRONICS INDUSTRIES CO., LTD.
- Jae Chang Jung
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Partially crosslinked polymer for bilayer photoresist
- Publication number 20030207205
- Publication date Nov 6, 2003
- HYUNDAI ELECTRONICS INDUSTRIES CO., LTD.
- Geun Su Lee
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Organic anti-reflective polymer and preparation thereof
- Publication number 20030208018
- Publication date Nov 6, 2003
- Hyundai Electronics Industries Co., Ltd.
- Sung-Eun Hong
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Novel photoresist monomers, polymers thereof and photoresist compos...
- Publication number 20030144567
- Publication date Jul 31, 2003
- HYUNDAI ELECTRONICS INDUSTRIES CO., LTD.
- Geun Su Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Organic polymer for anti-reflective coating layer and preparation t...
- Publication number 20030118736
- Publication date Jun 26, 2003
- Hyundai Electronics Industries Co., Ltd.
- Min-Ho Jung
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Top-coating composition for photoresist and process for forming fin...
- Publication number 20030108815
- Publication date Jun 12, 2003
- Hynix Semiconductor Inc.
- Jae Chang Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Organic polymer for organic anti-reflective coating layer and prepa...
- Publication number 20030100695
- Publication date May 29, 2003
- HYUNDAI ELECTRONICS INDUSTRIES CO., LTD.
- Jae-chang Jung
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Reflection-inhibiting resinn used in process for forming photoresis...
- Publication number 20030018150
- Publication date Jan 23, 2003
- Hynix Semiconductor Inc.
- Sung Eun Hong
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Organic anti-reflective coating polymer, anti-reflective coating co...
- Publication number 20030003397
- Publication date Jan 2, 2003
- Sung-eun Hong
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Cross-linking monomers for photoresist, and process for preparing p...
- Publication number 20020177069
- Publication date Nov 28, 2002
- HYUNDAI ELECTRONICS INDUSTRIES CO., LTD.
- Jae Chang Jung
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Cross-linker monomer comprising double bond and photoresist copolym...
- Publication number 20020160301
- Publication date Oct 31, 2002
- HYUNDAI ELECTRONICS INDUSTRIES CO., LTD.
- Geun Su Lee
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Novel photoresist monomer, polymer thereof and photoresist composit...
- Publication number 20020151666
- Publication date Oct 17, 2002
- HYUNDAI ELECTRONICS INDUSTRIES CO., LTD.
- Min Ho Jung
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Organic anti-reflective polymer and method for manufacturing therof
- Publication number 20020136834
- Publication date Sep 26, 2002
- Hyundai Electronics Industries Co., Ltd.
- Min-Ho Jung
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Organic anti-reflective polymer and method for manufacturing thereof
- Publication number 20020137826
- Publication date Sep 26, 2002
- Hyundai Electronics Industries Co., Ltd.
- Min-Ho Jung
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Organic anti-reflective coating material and its preparation
- Publication number 20020132183
- Publication date Sep 19, 2002
- Hyundai Electronics Industries Co., Ltd.
- Min-Ho Jung
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Organic anti-reflective coating polymer, anti-reflective coating co...
- Publication number 20020127789
- Publication date Sep 12, 2002
- Sung-Eun Hong
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Organic anti-reflective coating polymer, anti-reflective coating co...
- Publication number 20020123586
- Publication date Sep 5, 2002
- Sung-Eun Hong
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Anti reflective coating polymers and the preparation method thereof
- Publication number 20020120070
- Publication date Aug 29, 2002
- Hyundai Electronics Industries Co., Ltd.
- Sung-Eun Hong
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Organic anti-reflective coating polymer, anti-reflective coating co...
- Publication number 20020093069
- Publication date Jul 18, 2002
- Sung-Eun Hong
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Novel photoresist monomer having hydroxy group and carboxy group, c...
- Publication number 20020091216
- Publication date Jul 11, 2002
- HYUNDAI ELECTRONICS INDUSTRIES CO., LTD.
- Geun Su Lee
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Organic anti-reflective coating polymer, anti-reflective coating co...
- Publication number 20020090452
- Publication date Jul 11, 2002
- Sung-Eun Hong
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Copolymer resin, preparation thereof, and photoresist using the same
- Publication number 20020068803
- Publication date Jun 6, 2002
- HYUNDAI ELECTRONICS INDUSTRIES CO., LTD.
- Min Ho Jung
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photoresist polymer for top-surface imaging process by silylation a...
- Publication number 20020061461
- Publication date May 23, 2002
- Geun Su Lee
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photoresist composition for resist flow process
- Publication number 20020048723
- Publication date Apr 25, 2002
- Geun Su Lee
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Photoresist composition for top-surface imaging processes by silyla...
- Publication number 20020031721
- Publication date Mar 14, 2002
- Cha Won Koh
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Photoresist composition for resist flow process, and process for fo...
- Publication number 20020028405
- Publication date Mar 7, 2002
- Jin Soo Kim
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Partially crosslinked polymer for bilayer photoresist
- Publication number 20020028406
- Publication date Mar 7, 2002
- Geun Su Lee
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Additive for photoresist composition for resist flow process
- Publication number 20020022197
- Publication date Feb 21, 2002
- Min Ho Jung
- C07 - ORGANIC CHEMISTRY

Person

Patents Grantslast 30 patents

Process for forming a fine pattern using a top-coating composition...

Additive for photoresist composition for resist flow process

Top-coating composition for photoresist and process for forming fin...

Organic anti-reflective polymer and preparation thereof

ArF photoresist copolymers

Photoresist composition for resist flow process

Cross-linker monomer comprising double bond and photoresist copolym...

Partially crosslinked polymer for bilayer photoresist

ArF photoresist copolymers

Reflection-inhibiting resin used in process for forming photoresist...

Organic polymer for anti-reflective coating layer and preparation t...

Photoresist polymer for top-surface imaging process by silylation a...

Organic polymer for organic anti-reflective coating layer and prepa...

Additive for photoresist composition for resist flow process

Over-coating composition for photoresist, and processes for forming...

Photoresist monomers, polymers thereof and photoresist compositions...

Process for forming a photoresist pattern comprising alkaline treat...

Photoresist composition containing photo radical generator with pho...

Process for forming photoresist pattern by using gas phase amine tr...

Polymer-containing photoresist, and process for manufacturing the same

Photoresist composition for top-surface imaging processes by silyla...

Photoresist composition for resist flow process, and process for fo...

Photoresist monomer comprising bisphenol derivatives and polymers t...

Copolymer resin, preparation thereof, and photoresist using the same

Organic anti-reflective coating polymer, anti-reflective coating co...

Organic anti-reflective coating polymer, anti-reflective coating co...

Organic polymer for organic anti-reflective coating layer and prepa...

Partially crosslinked polymer for bilayer photoresist

Photoresist monomer having hydroxy group and carboxy group, copolym...

Organic anti-reflective coating polymer, anti-reflective coating co...

Patents Applicationslast 30 patents

Process for forming a fine pattern using a top-coating composition...

Additive for photoresist composition for resist flow process

Novel ArF photoresist copolymers

Partially crosslinked polymer for bilayer photoresist

Organic anti-reflective polymer and preparation thereof

Novel photoresist monomers, polymers thereof and photoresist compos...

Organic polymer for anti-reflective coating layer and preparation t...

Top-coating composition for photoresist and process for forming fin...

Organic polymer for organic anti-reflective coating layer and prepa...

Reflection-inhibiting resinn used in process for forming photoresis...

Organic anti-reflective coating polymer, anti-reflective coating co...

Cross-linking monomers for photoresist, and process for preparing p...

Cross-linker monomer comprising double bond and photoresist copolym...

Novel photoresist monomer, polymer thereof and photoresist composit...

Organic anti-reflective polymer and method for manufacturing therof

Organic anti-reflective polymer and method for manufacturing thereof

Organic anti-reflective coating material and its preparation

Organic anti-reflective coating polymer, anti-reflective coating co...

Organic anti-reflective coating polymer, anti-reflective coating co...

Anti reflective coating polymers and the preparation method thereof

Organic anti-reflective coating polymer, anti-reflective coating co...

Novel photoresist monomer having hydroxy group and carboxy group, c...

Organic anti-reflective coating polymer, anti-reflective coating co...

Copolymer resin, preparation thereof, and photoresist using the same

Photoresist polymer for top-surface imaging process by silylation a...

Photoresist composition for resist flow process

Photoresist composition for top-surface imaging processes by silyla...

Photoresist composition for resist flow process, and process for fo...

Partially crosslinked polymer for bilayer photoresist

Additive for photoresist composition for resist flow process